Exposure apparatus
    1.
    发明授权
    Exposure apparatus 有权
    曝光装置

    公开(公告)号:US06496249B2

    公开(公告)日:2002-12-17

    申请号:US09766337

    申请日:2001-01-19

    IPC分类号: G03B2760

    摘要: The present invention aims at preventing deterioration of flatness of a substrate and contamination of a substrate-holding surface of a substrate holder, which are caused by a resist leaking into the back surface of the substrate. A substrate-holding surface of a substrate holder is provided with a first pair of grooves 31 and 32 extending from one end to the other along a scanning direction and a second pair of grooves 33 and 34 extending from one end to the other along a direction generally perpendicular to the scanning direction. The first and second grooves are positioned such that they make contact with the periphery of the substrate when the substrate is vertically or horizontally placed on the substrate holder. Even when a resist on a substrate leaks into the periphery of the back surface, the resist escapes into the grooves, thereby preventing deterioration of the flatness of the substrate or contamination of the substrate-holding surface.

    摘要翻译: 本发明的目的在于防止由于抗蚀剂渗透到基板的后表面而导致的基板的平坦度的劣化和基板保持件的基板保持表面的污染。基板保持器的基板保持表面是 设置有沿着扫描方向从一端延伸到另一端的第一对槽31和32以及沿着与扫描方向大致垂直的方向从一端延伸到另一端的第二对槽33和34。 第一和第二槽定位成使得当衬底垂直或水平放置在衬底保持器上时,它们与衬底的周边接触。 即使当基板上的抗蚀剂泄漏到背面的周边时,抗蚀剂也可以逸出到槽中,从而防止基板的平坦度的劣化或基板保持面的污染。

    Board-stage for an aligner
    2.
    发明授权
    Board-stage for an aligner 失效
    对准器的板级

    公开(公告)号:US06597432B2

    公开(公告)日:2003-07-22

    申请号:US10137574

    申请日:2002-05-02

    申请人: Ryoichi Ida

    发明人: Ryoichi Ida

    IPC分类号: G03B2760

    摘要: A board stage of an aligner that can avoid bending of a printed circuit board to be exposed and accomplish high accurate exposure. In one preferred mode a suction plate 2 having small holes 20 is mounted on a supporting body on which a space 30 bigger than the small holes is provided. The holes 20 are connected to the space 30 and to a vacuum device via an air passage 31 and a bottom passage 32. The diameter of the suction hole 20 is so less than 0.4 mm not to make at the printed circuit board such bending that causes exposure troubles.

    摘要翻译: 对准器的板级,可以避免印刷电路板弯曲以进行曝光,并实现高精度曝光。 在一个优选方式中,具有小孔20的吸盘2安装在其上设置有比小孔大的空间30的支撑体上。 孔20经由空气通道31和底部通道32连接到空间30和真空装置。吸入孔20的直径小于0.4mm,不会在印刷电路板上产生这种弯曲,从而导致 暴露烦恼

    Stage device and a method of manufacturing same, a position controlling method, an exposure device and a method of manufacturing same, and a device and a method of manufacturing same
    3.
    发明授权
    Stage device and a method of manufacturing same, a position controlling method, an exposure device and a method of manufacturing same, and a device and a method of manufacturing same 失效
    平台装置及其制造方法,位置控制方法,曝光装置及其制造方法,以及其制造方法

    公开(公告)号:US06304320B1

    公开(公告)日:2001-10-16

    申请号:US09512766

    申请日:2000-02-25

    IPC分类号: G03B2760

    摘要: In a stage device, prior to two-dimensional movement of a stage, a first driving device disposed on a side of the stage where an object is loaded drives the stage in a first-axis direction, and a second driving device disposed on a side of the stage opposite to the side where the object is loaded drives the stage in a second-axis direction that is different from the first-axis direction. Thus, the stage is moved in two-dimensional directions. Therefore, in order to perform two-dimensional movement of the stage, a structure is possible in which each driving device is defined as a one-dimensional driving device, and in which one driving device is not driven by another driving device. Therefore, it is possible to move the object at high speed and to accurately control the position of the object with a simple structure. By using the stage device in order to move the wafer or the like, an exposure device of high throughput and high accuracy can be realized.

    摘要翻译: 在舞台装置中,在舞台的二维移动之前,设置在被加载物的舞台的一侧的第一驱动装置沿第一轴方向驱动舞台,并且设置在一侧的第二驱动装置 在与第一轴方向不同的第二轴方向上与载物侧相对的台阶驱动台。 因此,阶段在二维方向上移动。 因此,为了进行平台的二维运动,可以将各驱动装置定义为一维驱动装置,其中一个驱动装置不被其他驱动装置驱动的结构。 因此,可以高速地移动物体并且以简单的结构精确地控制物体的位置。 通过使用平台装置来移动晶片等,可以实现高吞吐量和高精度的曝光装置。

    System for exposing photopolymer with light from compact movable light source
    4.
    发明授权
    System for exposing photopolymer with light from compact movable light source 有权
    用于从轻巧的可移动光源曝光光聚合物的系统

    公开(公告)号:US06266134B1

    公开(公告)日:2001-07-24

    申请号:US09477378

    申请日:2000-01-04

    申请人: Daniel Gelbart

    发明人: Daniel Gelbart

    IPC分类号: G03B2760

    摘要: An exposure system for liquid photopolymer printing plates has a small movable illumination source. The illumination source moves to expose all of a photopolymer object, such as a printing plate being exposed. The area covered by the light source can be adjusted to match the area of the printing plate. The system does not require a large uniform source of illumination. The collimation of the light source is variable. This permits control over the cross sectional profile of exposed features in the photopolymer. Preferably a flat horizontal glass plate supported by air pressure supports the photopolymer being exposed. An optical sensor and a control system are used in preferred embodiments to keep the plate flat by controlling air pressure in an enclosure beneath the plate.

    摘要翻译: 液体光聚合物印版的曝光系统具有小的可移动照明光源。 照射源移动以暴露所有的光聚合物物体,例如暴露的印版。 可以调整光源所覆盖的区域以匹配印版的面积。 该系统不需要大的均匀的照明源。 光源的准直是可变的。 这允许控制光聚合物中暴露特征的横截面轮廓。 优选地,由空气压力支撑的扁平水平玻璃板支撑曝光的光聚合物。 在优选实施例中使用光学传感器和控制系统,以通过控制板下面的外壳中的空气压力来将板保持平坦。

    Vacuum surface for wet dye hard copy apparatus
    5.
    发明授权
    Vacuum surface for wet dye hard copy apparatus 有权
    真空表面用于湿染料硬拷贝装置

    公开(公告)号:US06172741B2

    公开(公告)日:2001-01-09

    申请号:US09292838

    申请日:1999-04-14

    IPC分类号: G03B2760

    摘要: A platen surface structure construct, particularly useful in a hard copy apparatus for a vacuum holddown, is configured by dimensioning print media platen surface structure channels and ports in order to ensure print media leading edge and trailing edge holddown. Moreover, the vacuum is distributed across the platen surface in accordance with predetermined dye flow characteristics based upon known dye composition and known print medium composition and such that print artifacts are not created by vacuum pulling wet dye through the capillaries of the medium.

    摘要翻译: 特别适用于用于真空压紧的硬拷贝装置中的压板表面结构构造通过使打印介质压板表面结构通道和端口的尺寸确定,以确保打印介质的前缘和后缘保持力。 此外,根据已知的染料组成和已知的打印介质组合物,根据预定的染料流动特性,真空分布在压板表面上,并且使得真空吸湿湿染料通过介质的毛细管不产生印刷伪影。