摘要:
The present invention aims at preventing deterioration of flatness of a substrate and contamination of a substrate-holding surface of a substrate holder, which are caused by a resist leaking into the back surface of the substrate. A substrate-holding surface of a substrate holder is provided with a first pair of grooves 31 and 32 extending from one end to the other along a scanning direction and a second pair of grooves 33 and 34 extending from one end to the other along a direction generally perpendicular to the scanning direction. The first and second grooves are positioned such that they make contact with the periphery of the substrate when the substrate is vertically or horizontally placed on the substrate holder. Even when a resist on a substrate leaks into the periphery of the back surface, the resist escapes into the grooves, thereby preventing deterioration of the flatness of the substrate or contamination of the substrate-holding surface.
摘要:
A board stage of an aligner that can avoid bending of a printed circuit board to be exposed and accomplish high accurate exposure. In one preferred mode a suction plate 2 having small holes 20 is mounted on a supporting body on which a space 30 bigger than the small holes is provided. The holes 20 are connected to the space 30 and to a vacuum device via an air passage 31 and a bottom passage 32. The diameter of the suction hole 20 is so less than 0.4 mm not to make at the printed circuit board such bending that causes exposure troubles.
摘要:
In a stage device, prior to two-dimensional movement of a stage, a first driving device disposed on a side of the stage where an object is loaded drives the stage in a first-axis direction, and a second driving device disposed on a side of the stage opposite to the side where the object is loaded drives the stage in a second-axis direction that is different from the first-axis direction. Thus, the stage is moved in two-dimensional directions. Therefore, in order to perform two-dimensional movement of the stage, a structure is possible in which each driving device is defined as a one-dimensional driving device, and in which one driving device is not driven by another driving device. Therefore, it is possible to move the object at high speed and to accurately control the position of the object with a simple structure. By using the stage device in order to move the wafer or the like, an exposure device of high throughput and high accuracy can be realized.
摘要:
An exposure system for liquid photopolymer printing plates has a small movable illumination source. The illumination source moves to expose all of a photopolymer object, such as a printing plate being exposed. The area covered by the light source can be adjusted to match the area of the printing plate. The system does not require a large uniform source of illumination. The collimation of the light source is variable. This permits control over the cross sectional profile of exposed features in the photopolymer. Preferably a flat horizontal glass plate supported by air pressure supports the photopolymer being exposed. An optical sensor and a control system are used in preferred embodiments to keep the plate flat by controlling air pressure in an enclosure beneath the plate.
摘要:
A platen surface structure construct, particularly useful in a hard copy apparatus for a vacuum holddown, is configured by dimensioning print media platen surface structure channels and ports in order to ensure print media leading edge and trailing edge holddown. Moreover, the vacuum is distributed across the platen surface in accordance with predetermined dye flow characteristics based upon known dye composition and known print medium composition and such that print artifacts are not created by vacuum pulling wet dye through the capillaries of the medium.