公开(公告)号：US20040126721A1

公开(公告)日：2004-07-01

申请号：US10671939

申请日：2003-09-29

Inventor： Mitsunori Hirano ,  Kunio Ishigaki ,  Tokuju Oikawa

IPC: G03C001/06 ,  G03C001/005 ,  G03C001/494

CPC classification number: G03C1/28 ,  G03C1/035 ,  G03C1/061 ,  G03C1/18 ,  G03C1/26 ,  G03C2001/03594 ,  G03C2007/3025

Abstract: Disclosed is a silver halide photographic light-sensitive material wherein a silver halide emulsion layer and/or a hydrophilic colloid layer contains at least one hydrazine derivative, and a silver halide emulsion is spectrally sensitized with a particular dye, and which contains a benzotriazol compound. There is provided a silver halide photographic light-sensitive material that exhibits superior residual color property and can provide stable photographic performance even after a long term running with a reduced silver amount.

Abstract translation: 公开了一种卤化银照相感光材料，其中卤化银乳剂层和/或亲水胶体层含有至少一种肼衍生物，并且卤化银乳剂用特定染料进行光谱增感，并含有苯并三唑化合物。 提供了一种卤化银照相感光材料，其表现出优异的残留色性，并且即使在长时间运行之后也能提供稳定的照相性能，其中银量降低。

公开(公告)号：US20020182514A1

公开(公告)日：2002-12-05

申请号：US09848859

申请日：2001-05-03

Applicant: APPLIED MATERIALS, INC.

Inventor： Melvin W. Montgomery ,  Jeffrey A. Albelo

IPC: G03C005/00 ,  G03F009/00 ,  G03C001/492 ,  G03C001/494 ,  G03C001/76

CPC classification number: G03F1/46 ,  G03F1/76 ,  G03F7/091

Abstract: The disclosure pertains to a method of optically fabricating a photomask using a direct write continuous wave laser, comprising a series of steps including applying an organic antireflection coating over a chrome-containing layer; applying a chemically-amplified DUV photoresist over the organic antireflection coating; and exposing a surface of the DUV photoresist to the direct write continuous wave laser. The direct write continuous wave laser operates at a wavelength of 244 nm or 257 nm. In an alternative embodiment, the organic antireflection coating may be applied over an inorganic antireflection coating which overlies the chrome containing layer.

Abstract translation: 本公开涉及一种使用直写式连续波激光器光学制造光掩模的方法，包括一系列步骤，包括在含铬层上施加有机抗反射涂层; 在有机抗反射涂层上施加化学放大的DUV光致抗蚀剂; 并将DUV光致抗蚀剂的表面暴露于直写式连续波激光器。 直写式连续波激光器在244nm或257nm波长下工作。 在替代实施例中，有机抗反射涂层可以涂覆在覆盖含铬层的无机抗反射涂层上。

公开(公告)号：US20020168585A1

公开(公告)日：2002-11-14

申请号：US10101171

申请日：2002-03-20

Inventor： Masaki Yoshizawa

IPC: G03C001/492 ,  G03C001/494 ,  G03C001/76

CPC classification number: G03F7/0382 ,  G03F7/0392 ,  Y10S430/143

Abstract: A method of designing a chemical amplification type photosensitive composition containing an acid generating agent, wherein the average distance between exposure particles in an exposure area of the photosensitive composition upon pattern exposure of the photosensitive composition or the average distance between the acids generated by the pattern exposure is calculated based on the sensitivity required of the photosensitive composition, and the composition of the photosensitive composition is so set that the diffusion length of the acid generated from the acid generating agent by the pattern exposure is greater than the calculated average distance.

Abstract translation: 一种设计含有酸产生剂的化学放大型光敏组合物的方法，其中感光组合物的曝光区域中的曝光区域之间的平均距离或由图案曝光产生的酸的平均距离 是基于光敏组合物所需的灵敏度计算的，并且光敏组合物的组成设定为使得通过图案曝光从酸产生剂产生的酸的扩散长度大于所计算的平均距离。

公开(公告)号：US20010053497A1

公开(公告)日：2001-12-20

申请号：US09909585

申请日：2001-07-20

Applicant: 3M Innovative Properties Company

Inventor： Sanjay L. Patil ,  Kurt J. Halverson ,  Robin E. Wright

IPC: G03C001/492 ,  G03C001/494

CPC classification number: B41M3/00 ,  B01J19/0046 ,  B01J2219/00527 ,  B01J2219/00585 ,  B01J2219/00596 ,  B01J2219/00605 ,  B01J2219/0061 ,  B01J2219/00621 ,  B01J2219/00626 ,  B01J2219/00635 ,  B01J2219/00637 ,  B01J2219/00639 ,  B01J2219/00659 ,  B01J2219/00664

Abstract: The present invention provides high-density arrays including mask layers and methods of manufacturing the same. The arrays are formed on a polymeric substrate and include a mask layer. Various linking agents, linking agent coatings, and/or reactants may be provided on the mask layer. Where present, the linking agents and reactants preferably operate together to capture a desired analyte which can then be detected based on an electromagnetic signal, e.g., fluorescence, that is emitted by the analyte in response to excitation energy incident on the array. With the mask layer in place, the signal-to-background ratio provided by the arrays can be increased.

公开(公告)号：US20010029000A1

公开(公告)日：2001-10-11

申请号：US09754371

申请日：2001-01-05

Inventor： Yasuhiro Yoshioka ,  Kouta Fukui ,  Makoto Suzuki

IPC: G03C001/494 ,  G03C001/34

CPC classification number: G03C1/49827 ,  G03C1/49845

Abstract: A photothermographic material comprising a defined amount of a compound represented by the following general formula as a reducing agent is disclosed. In the following general formula, R1 and R1null each independently represent an alkyl group, at least one of which is a secondary or tertiary alkyl group; R2 and R2null each independently represent hydrogen atom or a group that can be a substituent on benzene ring; L represents nullSnull group or a nullCH(R3)null group where R3 represents hydrogen atom or an alkyl group; and X and Xnull each independently represent hydrogen atom or a group that can be a substituent on benzene ring. The photothermographic material is characterized by providing sufficient image density by heat development, and showing good silver color tone and little change with time after the development.

Abstract translation: 公开了一种含有限定量的由以下通式表示的化合物作为还原剂的光热敏成像材料。 在下列通式中，R 1和R 1'各自独立地表示烷基，其中至少一个是仲或叔烷基; R2和R2'各自独立地表示氢原子或可以是苯环上的取代基的基团; L表示-S-基或-CH（R3） - 基，其中R3表示氢原子或烷基; X和X'各自独立地表示氢原子或可以作为苯环上的取代基的基团。 光热照相材料的特征在于通过热显影提供足够的图像密度，并且在显影后显示出良好的银色调和随时间的变化。

公开(公告)号：US20010026895A1

公开(公告)日：2001-10-04

申请号：US09812688

申请日：2001-03-21

Applicant: Kabushiki Kaisha Toshiba

Inventor： Masamitsu Itoh ,  Takehiro Kondoh

IPC: G03F007/004 ,  G03C005/00 ,  G03C001/76 ,  G03C001/494 ,  G03C001/492 ,  G03F009/00

CPC classification number: G03F7/039 ,  G03F7/0045 ,  G03F7/38 ,  Y10S430/143

Abstract: This invention provides a pattern formation material for electron beam lithography, which contains an alkali-soluble resin, a photoacid generator, and dissolution inhibiting groups, and also provides a pattern formation method and exposure mask fabrication method using the material. As the dissolution inhibiting groups, this invention uses a first dissolution inhibiting group which increases the sensitivity of the pattern formation material when the material is left to stand in a vacuum after an electron beam irradiation, and a second dissolution inhibiting group which decreases the sensitivity under the same condition. In this invention, the ratio of the first dissolution inhibiting group to the second dissolution inhibiting group is so adjusted that the size of an alkali-soluble portion, which is made soluble in an alkali solution by an electron beam irradiation, is substantially held constant independently of the standing time in a vacuum.

Abstract translation: 本发明提供一种电子束光刻用图案形成材料，其含有碱溶性树脂，光致酸发生剂和溶解抑制基团，并且还提供了使用该材料的图案形成方法和曝光掩模制造方法。 作为溶解抑制基团，本发明使用第一溶解抑制基团，其在电子束照射后在真空中放置材料时增加图案形成材料的灵敏度，以及降低灵敏度的第二溶解抑制基团 同样的条件。 在本发明中，第一溶解抑制基团与第二溶解抑制基团的比例被调整为使得通过电子束照射可溶于碱溶液的碱溶性部分的尺寸基本上保持恒定不变 的时间在真空中。

公开(公告)号：US20010021480A1

公开(公告)日：2001-09-13

申请号：US09247279

申请日：1999-02-09

Applicant: Kazuki Yamazaki

Inventor： KAZUKI YAMAZAKI

IPC: G03C001/494 ,  G03C001/06

CPC classification number: G03C1/49845 ,  G03C1/005 ,  G03C1/04 ,  G03C1/061 ,  G03C1/49863 ,  G03C2001/0854

Abstract: A photothermographic image recording element has on a support a photosensitive layer containing a non-photosensitive organic silver salt, a photosensitive silver halide, and a binder, wherein the organic silver salt has been formed in the presence of a tertiary alcohol. The photosensitive layer and/or a layer disposed adjacent thereto contains a nucleating agent. Alternatively, the photosensitive layer contains the silver halide which has been formed independent from the organic silver salt and added during preparation of a coating solution, and the main binder is a polymer latex having a Tg of null30null C. to 40null C. The element shows low fog, high contrast, and high sensitivity.

Abstract translation: 光热敏成像图像记录元件在载体上具有含有非感光性有机银盐，光敏卤化银和粘合剂的感光层，其中有机银盐在叔醇存在下形成。 感光层和/或邻近设置的层含有成核剂。 或者，光敏层含有与有机银盐无关并在制备涂料溶液时添加的卤化银，主要粘合剂是Tg为-30℃至40℃的聚合物胶乳。 该元素显示雾度低，对比度高，灵敏度高。

公开(公告)号：US20040209470A1

公开(公告)日：2004-10-21

申请号：US10659006

申请日：2003-09-09

Inventor： Christopher H. Bajorek

IPC: G03C001/76 ,  G03C001/494 ,  G03C001/492

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/094 ,  G11B5/855

Abstract: An isothermal imprinting method is described. A resist film may be imprinted with a stamper at a temperature at least that of the transition temperature of the resist film. The stamper may then be separated from the resist film prior to cooling.

Abstract translation: 描述了等温压印方法。 抗蚀剂膜可以在至少抗蚀剂膜的转变温度的温度下用压模压印。 然后可以在冷却之前将压模与抗蚀剂膜分离。

公开(公告)号：US20040191778A1

公开(公告)日：2004-09-30

申请号：US10401419

申请日：2003-03-28

Inventor： Seiji Inaoka

IPC: C12Q001/68 ,  G01N033/53 ,  G01N033/537 ,  G01N033/543 ,  G03C001/005 ,  G03C001/494

CPC classification number: G01N33/538 ,  G01N33/84

Abstract: The present invention provides a simple one pot method for preparing colloidal silver-biomolecule complexes. The complexes are formed in solution by mixing a biomolecule with appropriate amounts of a silver salt and a source of halide ions. The mixture is subsequently irradiated with light having a wavelength in the visible region. Silver colloid formation and complex formation occur simultaneously and interdependently. The present invention also provides solutions that include the inventive complexes, kits for preparing these, and methods of using the inventive complexes.

Abstract translation: 本发明提供了一种制备胶体银 - 生物分子复合物的简单的一种方法。 通过将生物分子与适量的银盐和卤离子源混合，在溶液中形成络合物。 随后用可见光区域的波长的光照射该混合物。 银胶体形成和复合物形成同时发生并相互依赖。 本发明还提供了包括本发明复合物，用于制备它们的试剂盒和使用本发明复合物的方法的溶液。

公开(公告)号：US20040170921A1

公开(公告)日：2004-09-02

申请号：US10787407

申请日：2004-02-27

Applicant: PIONEER CORPORATION

Inventor： Masahiko Katsumura

IPC: G03C001/492 ,  G03C001/494 ,  G03C001/76 ,  G03C005/00

CPC classification number: G11B7/261 ,  G03F7/09 ,  H01J2237/31793

Abstract: An electron beam recording substrate which holds a resist film where electron beam information recording is carried out and which has a surface layer area made of a material that suppresses enlargement of a scattering distribution diameter of electrons spread inside by irradiation of an electron beam from a resist film side.

Abstract translation: 一种电子束记录基板，其保持进行电子束信息记录的抗蚀剂膜，并且具有由抑制来自抗蚀剂的电子束的照射而扩散在内部的电子的散射分布直径扩大的材料制成的表面层区域 电影方面。