公开(公告)号：US07137354B2

公开(公告)日：2006-11-21

申请号：US10646458

申请日：2003-08-22

申请人： Kenneth S. Collins ,  Hiroji Hanawa ,  Kartik Ramaswamy ,  Andrew Nguyen ,  Amir Al-Bayati ,  Biagio Gallo ,  Gonzalo Antonio Monroy

发明人： Kenneth S. Collins ,  Hiroji Hanawa ,  Kartik Ramaswamy ,  Andrew Nguyen ,  Amir Al-Bayati ,  Biagio Gallo ,  Gonzalo Antonio Monroy

IPC分类号： G23C16/00 ,  C23F1/00

CPC分类号： H01J37/32082 ,  H01J37/321

摘要： A plasma immersion ion implantation reactor for ion implanting a species into a surface layer of a workpiece includes an enclosure which has a side wall and a ceiling defining a chamber and a workpiece support pedestal within the chamber having a workpiece support surface facing the ceiling and defining a process region extending generally across the wafer support pedestal and confined laterally by the side wall and axially between the workpiece support pedestal and the ceiling. The enclosure has at least a first pair of openings at generally opposite sides of the process region and a first hollow conduit outside of the chamber having first and second ends connected to respective ones of the first pair of openings, so as to provide a first reentrant path extending through the conduit and across said process region. A gas distribution apparatus is provided on or near an interior surface of the reactor for introducing a process gas containing the species to be ion implanted and a first RE plasma source power applicator for generating a plasma in the chamber.

摘要翻译： 用于将物质离子注入到工件的表面层中的等离子体浸没离子注入反应器包括具有侧壁和限定腔室的天花板的壳体，以及腔室内的工件支撑基座，其具有面向天花板的工件支撑表面并且限定 大致横跨晶片支撑基座延伸并由侧壁横向限制并且在工件支撑基座和天花板之间轴向延伸的过程区域。 外壳在工艺区域的大致相对侧具有至少第一对开口，在腔室外部具有第一和第二端，第一和第二端连接到第一对开口中的相应开口，以便提供第一凹槽 路径延伸穿过导管并穿过所述过程区域。 气体分配装置设置在反应器的内表面上或附近，用于引入含有要离子注入的物质的处理气体和用于在室中产生等离子体的第一RE等离子体源功率施加器。

公开(公告)号：US06838646B2

公开(公告)日：2005-01-04

申请号：US10644292

申请日：2003-08-20

申请人： Hiroshi Inazumachi ,  Mamoru Kosakai

发明人： Hiroshi Inazumachi ,  Mamoru Kosakai

IPC分类号： H01L21/00 ,  H01L21/687 ,  H05B3/68 ,  G23C16/00

CPC分类号： H01L21/67109 ,  H01J37/32724 ,  H01J2237/2001 ,  H01L21/67103 ,  H01L21/68785

摘要： A susceptor device comprises a susceptor base body, a temperature controlling section, an adhesive layer which attaches the susceptor base body and the temperature controlling section unitarily, an O-ring which is disposed near a peripheral section of the adhesive layer, a circular O-ring which is disposed on a bottom surface of the temperature controlling section, an O-ring supporting section which surrounds the temperature controlling section and compresses the O-rings on the temperature controlling section, and pushup screws which push up and fix the O-ring supporting section toward the temperature controlling section. By doing this, it is possible to protect the adhesive layer from an external environment. Also, it is possible to provide a susceptor device having a superior temperature controlling characteristics for the plate sample, operational stability, and durability.

摘要翻译： 感受器装置包括基座主体，温度控制部，将基座主体和温度控制部一体地安装的粘合层，设置在粘合剂层的周边部附近的O形环，圆形O形环， 环，设置在温度控制部的底面上，O形环支撑部，其围绕温度控制部并压缩温度控制部上的O形环;以及推压螺钉，其向上并固定O形环 支撑部分朝向温度控制部分。 通过这样做，可以保护粘合剂层免受外部环境的影响。 此外，可以提供一种具有优异的板样品温度控制特性的基座装置，操作稳定性和耐久性。

公开(公告)号：US5652021A

公开(公告)日：1997-07-29

申请号：US416435

申请日：1995-04-03

申请人： Andrew T. Hunt ,  Joe K. Cochran ,  William Brent Carter

发明人： Andrew T. Hunt ,  Joe K. Cochran ,  William Brent Carter

IPC分类号： C23C16/30 ,  C23C16/40 ,  C23C16/44 ,  C23C16/448 ,  C23C16/453 ,  C23C16/513 ,  C30B25/10 ,  G23C16/00

CPC分类号： C30B25/105 ,  C23C16/30 ,  C23C16/40 ,  C23C16/405 ,  C23C16/408 ,  C23C16/409 ,  C23C16/448 ,  C23C16/453 ,  C23C16/513 ,  C30B25/10 ,  C30B29/22 ,  C30B29/225 ,  Y02T50/67

摘要： A method for applying coatings to substrates using combustion chemical vapor deposition by mixing together a reagent and a carrier solution to form a reagent mixture, igniting the reagent mixture to create a flame, or flowing the reagent mixture through a plasma torch, in which the reagent is at least partially vaporized into a vapor phase, and contacting the vapor phase of the reagent to a substrate resulting in the deposition, at least in part from the vapor phase, of a coating of the reagent which can be controlled so as to have a preferred orientation on the substrate, and an apparatus to accomplish this method.

摘要翻译： 一种通过将试剂和载体溶液混合在一起以形成试剂混合物，点燃试剂混合物以产生火焰或使试剂混合物流过等离子体焰炬的方式，使用燃烧化学气相沉积法将涂层施加到基底上，其中试剂 至少部分蒸发成气相，并将试剂的气相与基底接触，导致至少部分地从气相沉积试剂的涂层，所述涂层的涂层可以被控制以具有 基板上的优选取向，以及完成该方法的装置。