公开(公告)号：US11629315B2

公开(公告)日：2023-04-18

申请号：US17050234

申请日：2019-04-25

申请人： MITSUBISHI GAS CHEMICAL COMPANY, INC.

发明人： Toshiyuki Oie ,  Takahiro Kikunaga ,  Akinobu Horita ,  Kenji Yamada

IPC分类号： C11D7/08 ,  C11D11/00 ,  C11D7/06 ,  C11D7/10 ,  C11D7/26

摘要： An aqueous composition includes (A) from 0.0001 to 10 mass % of one or more kinds of compounds selected from a C4-13 alkylphosphonic acid, a C4-13 alkylphosphonate ester, a C4-13 alkyl phosphate and a salt thereof, with respect to the total amount of the aqueous composition; and (B) from 0.0001 to 50 mass % of an acid other than the C4-13 alkylphosphonic acid, the C4-13 alkylphosphonate ester and the C4-13 alkyl phosphate or a salt thereof, with respect to the total amount of the aqueous composition.

公开(公告)号：US11572530B2

公开(公告)日：2023-02-07

申请号：US16853390

申请日：2020-04-20

申请人： Colorado Mesa University

发明人： Sara R. Clark ,  Ali Lange ,  Savanna J. Peake ,  Yasmin Shashova ,  Andrew R. Wolff

IPC分类号： C11D7/10 ,  C11D7/24 ,  C11D7/26 ,  C11D3/22 ,  C11D3/00 ,  C11D11/00 ,  C11D3/20 ,  C11D3/10 ,  C11D7/12

摘要： Compositions and methods of the invention are directed to the removal of solid films, and particularly paint layers, from substrates, and particularly smooth, porous, and/or mineralogically fragile substrates such as sandstone. The compositions include cooked aqueous solutions of starch. The compositions can advantageously remove paints and other unwanted solid films from these and other substrates without damaging the substrate itself.

公开(公告)号：US11560529B2

公开(公告)日：2023-01-24

申请号：US17006416

申请日：2020-08-28

申请人： ZestBio, Inc.

发明人： Ryan Protzko ,  Luke Latimer

IPC分类号： C11D7/04 ,  C11D7/06 ,  C11D7/12 ,  C11D7/26 ,  C11D1/08 ,  C11D3/00 ,  C11D3/395 ,  C11D3/04 ,  C11D3/14 ,  C11D7/10

摘要： A system and method for a metal sequestration composition comprising combining a galactaric salt or galactaric acid with a metalloid oxyanion, and an alkali compound. The system and method enable the production of a metal sequestration composition that either alone or in combination with other functional components (e.g. surfactants, solvents, pH modifiers) provide water treatment or cleaning compositions.

公开(公告)号：US11529657B2

公开(公告)日：2022-12-20

申请号：US17196075

申请日：2021-03-09

申请人： Covestro LLC

发明人： Jenna L. Caputo ,  Mark A. Christman, II ,  Charles D. Starkey ,  Daniel R. Wagner ,  Nigel Barksby

IPC分类号： B08B3/08 ,  B08B3/10 ,  B08B9/08 ,  C08G65/26 ,  C11D7/08 ,  C11D7/26 ,  C11D7/34 ,  C11D11/00

摘要： Methods of removing amine contaminants from equipment used in the production of polyether polyols. These methods include: (a) contacting the equipment with an aqueous solution of a first acid; (b) discharging the aqueous solution of the first acid from the equipment; (c) contacting the equipment with an aqueous solution of an acidic metal conditioner; (d) discharging the aqueous solution of the acidic metal conditioner from the equipment; (e) contacting the equipment with an aqueous solution of an alkali metal hydroxide; and (f) discharging the aqueous solution of the alkali metal hydroxide from the equipment.

公开(公告)号：US20220395865A1

公开(公告)日：2022-12-15

申请号：US17888305

申请日：2022-08-15

申请人： ENTEGRIS, INC.

发明人： Daniela White

IPC分类号： B08B1/00 ,  B08B3/08 ,  B08B1/02 ,  B24B37/34 ,  C11D3/30 ,  C11D3/37 ,  C11D3/20 ,  C11D7/34 ,  C11D7/32 ,  C11D7/26 ,  B08B3/04 ,  C11D11/00 ,  C11D7/10 ,  A46B13/00 ,  H01L21/67

摘要： Described are methods for removing abrasive particles from a polymeric surface, such as from a polymeric surface of a cleaning brush used in a post chemical-mechanical processing cleaning step, as well as related cleaning solutions.

公开(公告)号：US11453846B2

公开(公告)日：2022-09-27

申请号：US16771817

申请日：2018-12-06

申请人： Saban Ventures Pty Limited

发明人： Gavin Spargo ,  Ingeborg Kristina Palmer ,  Stefan Gebhardt ,  Brian Hingley

IPC分类号： B08B9/00 ,  C11D17/00 ,  A61B1/12 ,  B08B3/08 ,  B08B9/023 ,  B08B9/032 ,  C11D7/12 ,  C11D7/20 ,  C11D7/26 ,  C11D7/50 ,  C11D11/00

摘要： A method of cleaning a contaminated surface, such as cleaning the elongate interior lumen of an endoscope contaminated with flesh, bone, blood, mucous, faeces or biofilm, said method comprising the steps of: providing a suspension of solid particles in a liquid to said contaminated surface, and flowing said suspension along said surface thereby to remove contaminant from the surface. The suspension is preferably a paste, where the solid material may be e.g. crystals of a salt, silicon oxide or organic material. The paste preferably has a solid fraction between 5 and 55%. A rheology modifier may be present.

公开(公告)号：US11448966B2

公开(公告)日：2022-09-20

申请号：US16633159

申请日：2018-08-02

申请人： HUAYING RESEARCH CO., LTD

发明人： Sophia Z. Wen ,  Fucheng Sun ,  Zhikai Wang

IPC分类号： C11D7/50 ,  G03F7/42 ,  B08B3/08 ,  C11D7/04 ,  C11D7/26 ,  C11D7/32 ,  C11D11/00 ,  H01L21/027

摘要： The present invention discloses a photoresist-removing solution comprising of an N-containing compound and an organic substance in a mass ratio of 1:(0.5-150). The N-containing compound includes at least one of the followings: tetraalkylammonium hydroxide, ammonia, liquid ammonia, and a mixture of ammonia and water; wherein the tetraalkylammonium hydroxide has the general formula (I): wherein R1, R2, R3, R4 is an alkyl with 1 to 4 carbons, respectively. The organic substance is an organic substance having at least one electron-withdrawing functional group. The present invention mixes a specific kind of N-containing compound and a specific kind of organic substance in a certain ratio, and preferably adds a certain amount of water, so that the removal liquid in the present application has an extremely excellent photoresist-removing effect.

公开(公告)号：US11434095B2

公开(公告)日：2022-09-06

申请号：US16283613

申请日：2019-02-22

申请人： INTERNATIONAL TEST SOLUTIONS, INC.

发明人： Mark M. Stark ,  Alan E. Humphrey

IPC分类号： B65H18/10 ,  B08B1/02 ,  B65H20/06 ,  B65H20/02 ,  B32B27/08 ,  B32B27/28 ,  B32B27/32 ,  B32B27/36 ,  C11D7/22 ,  C11D7/24 ,  C11D7/26 ,  C11D7/32 ,  C11D11/00 ,  C11D17/04 ,  B08B7/00 ,  B08B1/04 ,  G03G21/00 ,  B41F23/00

摘要： Novel materials and devices can remove small defects from long rolls of flexible electronics material while they are in continuous motion. The cleaning materials are designed to remove small particles without transferring defects or damaging the flexible electronics. The device generally consists of variable speed, motor-driven cylinders mounted on moveable brackets. The cylinders are capable of matching the speed of the cleaning material such that the cleaning material is always in contact with the web roll to be cleaned. The brackets are capable of rotating so the same material can be used more than once. Another material is used to remove debris from the cleaning material. A similar device consisting of motor-driven cylinders and moveable is used to apply the debris removal film to the cleaning film, allowing the cleaning film to be used multiple times.

公开(公告)号：US20220259525A1

公开(公告)日：2022-08-18

申请号：US17533427

申请日：2021-11-23

申请人： SAFECHEM Europe GmbH

发明人： Christian Rösener

IPC分类号： C11D11/04 ,  C11D7/26 ,  C11D7/50 ,  B01J13/08 ,  C11D11/00

摘要： A process for processing an alcohol-containing solvent is described. The process according to the invention is used in particular for the treatment of alcohol-containing solvents which are used, for example, for cleaning metal parts. Further subject matter of the present invention are compositions which are suitable for the aforementioned intended use, as well as the use of certain compositions for the purification of alcohol-containing solvents.

公开(公告)号：US20220243150A1

公开(公告)日：2022-08-04

申请号：US17596199

申请日：2020-06-15

申请人： Versum Materials US, LLC

发明人： LILI WANG ,  AIPING WU ,  LAISHENG SUN ,  YI-CHIA LEE ,  YUANMEI CAO

IPC分类号： C11D11/00 ,  G03F7/42 ,  H01L21/02 ,  C11D7/32 ,  C11D7/26 ,  C11D7/50

摘要： Compositions and methods useful for removing residue and photoresist from a semiconductor substrate comprising: from about 5 to about 60% by wt. of water; from about 10 to about 90% by wt. of a water-miscible organic solvent; from about 5 to about 90% by wt. of at least one alkanolamine; from about 0.05 to about 20% by wt. of at least one polyfunctional organic acid; and from about 0.1 to about 10% by wt. of at least one phenol-type corrosion inhibitor, wherein the composition is substantially free of hydroxylamine.