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公开(公告)号：WO2019101517A1
公开(公告)日：2019-05-31
申请号：PCT/EP2018/080415
申请日：2018-11-07
Applicant: ASML NETHERLANDS B.V.
Inventor： NASALEVICH, Maxim, Aleksandrovich , KURGANOVA, Evgenia , NOTENBOOM, Arnoud, Willem , PÉTER, Mária , VAN ZWOL, Pieter-Jan , VLES, David, Ferdinand
IPC: G03F7/20
Abstract: A method of manufacturing a pellicle for a lithographic apparatus, said method comprising growing the pellicle in a three-dimensional template and pellicles manufactured according to this method. Also disclosed is the use of a pellicle manufactured according to the method in an EUV lithography apparatus as well as the use of a three-dimensional template in the manufacture of a pellicle.
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公开(公告)号：WO2018224251A1
公开(公告)日：2018-12-13
申请号：PCT/EP2018/062557
申请日：2018-05-15
Applicant: STICHTING VU , STICHTING NEDERLANDSE WETENSCHAPPELIJK ONDERZOEK INSTITUTEN , UNIVERSITEIT VAN AMSTERDAM , ASML NETHERLANDS B.V.
Inventor： WITTE, Stefan, Michiel , ANTONCECCHI, Alessandro , ZHANG, Hao , EDWARD, Stephen , PLANKEN, Paulus, Clemens, Maria , GOORDEN, Sebastianus, Adrianus , HUISMAN, Simon, Reinald , SETIJA, Irwan, Dani , VLES, David, Ferdinand
IPC: G03F9/00
Abstract: A method for determining a characteristic of a feature in an object, the feature being disposed below a surface of the object is disclosed. The surface of the object is irradiated with a pulsed pump radiation beam so as to produce an acoustic wave in the object. The surface of the object is then irradiated with a measurement radiation beam. A portion of the measurement radiation beam scattered from the surface is received and a characteristic of the feature in the object is determined from at least a portion of the measurement radiation beam scattered from the surface within a measurement time period. A temporal intensity distribution of the pulsed pump radiation beam is selected such that in the measurement time period a signal to background ratio is greater than a signal to background ratio achieved using a single pulse of the pulsed pump radiation beam. The signal to background ratio is a ratio of: (a) signals generated at the surface by reflections of acoustic waves from the feature to (b) background signals generated at the surface by reflections of acoustic waves which have not reflected from the feature.
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公开(公告)号：WO2017102378A1
公开(公告)日：2017-06-22
申请号：PCT/EP2016/079584
申请日：2016-12-02
Applicant: ASML NETHERLANDS B.V.
Inventor： BROUNS, Derk, Servatius, Gertruda , JANSSEN, Paul , KAMALI, Mohammad, Reza , PÉTER, Mária , VAN DER ZANDE, Willem, Joan , VAN ZWOL, Pieter-Jan , VLES, David, Ferdinand , VOORTHUIJZEN, Willem-Pieter
CPC classification number: G03F1/64 , G03F1/66 , G03F7/70741 , G03F7/70983
Abstract: A membrane assembly (80) for EUV lithography, the membrane assembly comprising: a planar membrane (40); a border (81) configured to hold the membrane; and a frame assembly (50) connected to the border and configured to attach to a patterning device (MA) for EUV lithography; wherein the frame assembly is connected to the border in a direction perpendicular to the plane of the membrane such that in use the frame assembly is between the border and the patterning device.
Abstract translation: 一种用于EUV光刻的薄膜组件（80），所述薄膜组件包括：平面薄膜（40）; 边界（81），配置为保持膜; 和框架组件（50），所述框架组件（50）连接到所述边界并且被配置成附接到用于EUV光刻的图案形成装置（MA）; 其中所述框架组件在垂直于所述膜平面的方向上连接到所述边界，使得在使用中所述框架组件位于所述边界和所述图案形成装置之间。
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公开(公告)号：WO2021037662A1
公开(公告)日：2021-03-04
申请号：PCT/EP2020/073323
申请日：2020-08-20
Applicant: ASML NETHERLANDS B.V.
Inventor： NIKIPELOV, Andrey , BALTUSSEN, Sander , BANINE, Vadim, Yevgenyevich , DOLGOV, Alexandr , DONMEZ NOYAN, Inci , HOUWELING, Zomer, Silvester , NOTENBOOM, Arnoud, Willem , VAN DE KERKHOF, Marcus, Adrianus , VAN DER WOORD, Ties, Wouter , VERMEULEN, Paul, Alexander , VLES, David, Ferdinand , VORONINA, Victoria , YEGEN, Halil, Gökay
IPC: G03F1/62 , G03F7/20 , C01B32/158 , D01F9/12 , D01F11/12
Abstract: A pellicle membrane for a lithographic apparatus, said membrane comprising uncapped carbon nanotubes is provided. Also provided is a method of regenerating a pellicle membrane, said method comprising decomposing a precursor compound and depositing at least some of the products of decomposition onto the pellicle membrane. Also described is a method of reducing the etch rate of a pellicle membrane, said method comprising providing an electric field in the region of the pellicle membrane to redirect ions from the pellicle, or heating elements to desorb radicals from the pellicle, preferably wherein the pellicle membrane is a carbon nanotube pellicle membrane as well as an assembly for a lithographic apparatus, said assembly including a biased electrode near or including the pellicle membrane or heating means for pellicle membrane.
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Patent Agency Ranking15.发明申请
公开(公告)号：WO2019025082A1
公开(公告)日：2019-02-07
申请号：PCT/EP2018/067052
申请日：2018-06-26
Applicant: ASML NETHERLANDS B.V.
Inventor： KURGANOVA, Evgenia , GIESBERS, Adrianus, Johannes, Maria , NASALEVICH, Maxim, Aleksandrovich , NOTENBOOM, Arnoud, Willem , PÉTER, Mária , VAN ZWOL, Pieter-Jan , VLES, David, Ferdinand , VOORTHUIJZEN, Willem-Pieter
Abstract: A method of manufacturing a pellicle for a lithographic apparatus, said method comprising: locally heating the pellicle (4) using radiative heating (3), and depositing coating material simultaneously on both sides of the pellicle. Also disclosed are pellicles manufactured according to this method. Further disclosed is the use of a multilayer graphene pellicle with double-sided hexagonal boron nitride coating in a lithographic apparatus.
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公开(公告)号：WO2018228933A3
公开(公告)日：2018-12-20
申请号：PCT/EP2018/065127
申请日：2018-06-08
Applicant: ASML NETHERLANDS B.V.
Inventor： VLES, David, Ferdinand , ANDE, Chaitanya Krishna , DE GROOT, Antonius, Franciscus, Johannes , GIESBERS, Adrianus, Johannes, Maria , JANSSEN, Johannes, Joseph , JANSSEN, Paul , KLOOTWIJK, Johan, Hendrik , KNAPEN, Peter, Simon, Antonius , KURGANOVA, Evgenia , MEIJER, Marcel, Peter , MEIJERINK, Wouter, Rogier , NASALEVICH, Maxim, Aleksandrovich , NOTENBOOM, Arnoud, Willem , OLSMAN, Raymond , PATEL, Hrishikesh , PÉTER, Mária , VAN DEN BOSCH, Gerrit , VAN DEN EINDEN, Wilhelmus, Theodorus, Anthonius, Johannes , VAN DER ZANDE, Willem, Joan , VAN ZWOL, Pieter-Jan , VERMEULEN, Johannes, Petrus, Martinus, Bernardus , VOORTHUIJZEN, Willem-Pieter , WONDERGEM, Hendrikus, Jan , ZDRAVKOV, Alexandar, Nikolov
Abstract: The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.
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公开(公告)号：WO2018228933A2
公开(公告)日：2018-12-20
申请号：PCT/EP2018/065127
申请日：2018-06-08
Applicant: ASML NETHERLANDS B.V.
Inventor： VLES, David, Ferdinand , ANDE, Chaitanya Krishna , DE GROOT, Antonius, Franciscus, Johannes , GIESBERS, Adrianus, Johannes, Maria , JANSSEN, Johannes, Joseph , JANSSEN, Paul , KLOOTWIJK, Johan, Hendrik , KNAPEN, Peter, Simon, Antonius , KURGANOVA, Evgenia , MEIJER, Marcel, Peter , MEIJERINK, Wouter, Rogier , NASALEVICH, Maxim, Aleksandrovich , NOTENBOOM, Arnoud, Willem , OLSMAN, Raymond , PATEL, Hrishikesh , PÉTER, Mária , VAN DEN BOSCH, Gerrit , VAN DEN EINDEN, Wilhelmus, Theodorus, Anthonius, Johannes , VAN DER ZANDE, Willem, Joan , VAN ZWOL, Pieter-Jan , VERMEULEN, Johannes, Petrus, Martinus, Bernardus , VOORTHUIJZEN, Willem-Pieter , WONDERGEM, Hendrikus, Jan , ZDRAVKOV, Alexandar, Nikolov
Abstract: The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.
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公开(公告)号：WO2018166738A1
公开(公告)日：2018-09-20
申请号：PCT/EP2018/053761
申请日：2018-02-15
Applicant: ASML NETHERLANDS B.V.
Inventor： KLUGKIST, Joost, André , BANINE, Vadim, Yevgenyevich , BECKERS, Johan, Franciscus, Maria , JAMBUNATHAN, Madhusudhanan , NASALEVICH, Maxim, Aleksandrovich , NIKIPELOV, Andrey , STAS, Roland, Johannes, Wilhelmus , VLES, David, Ferdinand , WELTERS, Wilhelmus, Jacobus, Johannes , WRICKE, Sandro
Abstract: A sensor mark (17) comprising: a substrate (200) having: a first deep ultra violet (DUV) absorbing layer (310, 320, 330) comprising a first material which substantially absorbs DUV radiation; a first protecting layer (600) comprising a second material; wherein: the first DUV absorbing layer has a first through hole (500) in it; the first protecting layer is positioned, in plan, in the first through hole (500) and the first protecting layer in the first through hole has a patterned region comprising a plurality of through holes (700); and the second material is more noble than the first material.
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公开(公告)号：WO2017102380A1
公开(公告)日：2017-06-22
申请号：PCT/EP2016/079599
申请日：2016-12-02
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： VLES, David, Ferdinand , ABEGG, Erik, Achilles , BENDIKSEN, Aage , BROUNS, Derk, Servatius, Gertruda , GOVIL, Pradeep K. , JANSSEN, Paul , NASALEVICH, Maxim, Aleksandrovich , NOTENBOOM, Arnoud, Willem , PÉTER, Mária , VAN DE KERKHOF, Marcus, Adrianus , VAN DER ZANDE, Willem, Joan , VAN ZWOL, Pieter-Jan , VERMEULEN, Johannes, Petrus, Martinus, Bernardus , VOORTHUIJZEN, Willem-Pieter , WILEY, James, Norman
CPC classification number: G03F7/70916 , G03F1/22 , G03F1/62 , G03F7/7085 , G03F7/70983
Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.
Abstract translation: 适用于光刻设备的图案形成装置的薄膜。 所述薄膜包括至少一个破损区域，所述破坏区域被配置为在光刻设备的正常使用期间优先破坏所述薄膜的其余区域之前破裂。 至少一个破裂区域包括薄膜的与周围薄膜区域相比厚度减小的区域。
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