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51.发明申请
公开(公告)号：WO2005082800A1
公开(公告)日：2005-09-09
申请号：PCT/US2005/005709
申请日：2005-02-23
申请人： CORNING INCORPORATED , BOOKBINDER, Dana C , FIACCO, Richard M , HRDINA, Kenneth E , MOORE, Lisa A , SCHIEFELBEIN, Susan L
发明人： BOOKBINDER, Dana C , FIACCO, Richard M , HRDINA, Kenneth E , MOORE, Lisa A , SCHIEFELBEIN, Susan L
IPC分类号： C03C3/06
CPC分类号： C03C3/06 , C03B19/1453 , C03B32/00 , C03B2201/075 , C03B2201/21 , C03B2201/23 , C03B2207/32 , C03C2201/21 , C03C2201/23
摘要： Disclosed is a synthetic silica glass optical material having high resistance to optical damage by ultraviolet radiation in the ultraviolet wavelength range, particularly in the wavelength less than about 250 nm and particularly, exhibiting a low laser induced wavefront distortion; specifically a laser induced wavefront distortion, measured at 633nm, of between about -1.0 and 1.0 nm/cm when subjected to 10 billion pulses of a laser operating at approximately 193 nm and at a fluence of approximately 70µJ/cm 2 . The synthetic silica glass optical material of the present invention comprises OH concentration levels less than about 600ppm, preferably less than 200ppm, and H 2 concentration levels less than about 5.0x10 17 molecules/cm 3 , and preferably less than about 2.0x10 17 molecules/cm 3 . A method of producing a synthetic silica glass optical material is also claimed.
摘要翻译： 公开了一种合成石英玻璃光学材料，其特征在于波长小于约250nm，特别是具有低激光诱导波前失真的紫外线波长范围内具有高抗紫外线辐射的光学损伤。 具体地，当经受在约193nm的操作的激光器和约70μJ/ cm 2的通量时，在633nm处测量的激光诱导波前失真在约-1.0和1.0nm / cm之间。 本发明的合成二氧化硅玻璃光学材料包括OH浓度水平低于约600ppm，优选小于200ppm，H 2浓度水平低于约5.0×10 17分子/ cm 3，优选小于约2.0×10 3 17分子/ cm 3。 还要求生产合成石英玻璃光学材料的方法。
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公开(公告)号：WO2005059972A3
公开(公告)日：2005-08-04
申请号：PCT/JP2004019443
申请日：2004-12-17
发明人： IKUTA YOSHIAKI , AGATA NORIYUKI
CPC分类号： C03C3/06 , C03B19/1453 , C03B2201/03 , C03B2201/04 , C03B2201/07 , C03B2201/075 , C03B2201/12 , C03B2201/21 , C03B2201/23 , C03B2207/36 , Y02P40/57
摘要： A synthetic quartz glass for an optical member which is free from compaction and rarefaction is obtained. A synthetic quartz glass for an optical member to be used for an optical device employing a light having a wavelength of at most 400 nm and at least 170 nm as a light source, which contains substantially no oxygen excess defects, dissolved oxygen molecules nor reduction type defects, which has a chlorine concentration of at most 50 ppm and a OH group concentration of at most 100 ppm, and which contains oxygen deficient defects within a concentration range of at most 5x10(14) defects/cm(3) and at least 1x10(13) defects/cm(3). The fluorine concentration is preferably at most 100 ppm. A process for producing the synthetic quartz glass is also claimed.
摘要翻译： 得到不含压实和稀释的用于光学构件的合成石英玻璃。 用于光学构件的合成石英玻璃，其用于使用波长最多为400nm且至少170nm的光作为光源的光学元件，其基本上不含氧过剩缺陷，溶解的氧分子或还原型 缺陷，其氯浓度最多为50ppm，OH基浓度为至多100ppm，并且在至少5×10（14）个缺陷/ cm 3（3）的浓度范围内含有缺氧缺陷，并且至少1×10 （13）缺陷/ cm（3）。 氟浓度优选为100ppm以下。 保护合成石英玻璃的方法。
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公开(公告)号：WO2005059972A2
公开(公告)日：2005-06-30
申请号：PCT/JP2004/019443
申请日：2004-12-17
发明人： IKUTA, Yoshiaki , AGATA, Noriyuki
IPC分类号： H01L21/00
CPC分类号： C03C3/06 , C03B19/1453 , C03B2201/03 , C03B2201/04 , C03B2201/07 , C03B2201/075 , C03B2201/12 , C03B2201/21 , C03B2201/23 , C03B2207/36 , Y02P40/57
摘要： A synthetic quartz glass for an optical member which is free from compaction and rarefaction is obtained. A synthetic quartz glass for an optical member to be used for an optical device employing a light having a wavelength of at most 400 nm and at least 170 nm as a light source, which contains substantially no oxygen excess defects, dissolved oxygen molecules nor reduction type defects, which has a chlorine concentration of at most 50 ppm and a OH group concentration of at most 100 ppm, and which contains oxygen deficient defects within a concentration range of at most 5 ~10¿14? defects/cm¿3? and at least 1 ~10¿13? defects/cm¿3?. The fluorine concentration is preferably at most 100 ppm.
摘要翻译： 得到不含压实和稀释的用于光学构件的合成石英玻璃。 用于光学构件的合成石英玻璃，其用于使用波长最多为400nm且至少170nm的光作为光源的光学元件，其基本上不含氧过剩缺陷，溶解的氧分子或还原型 缺陷，其氯浓度最多为50ppm，OH基浓度为至多100ppm，并且在氧浓度范围内至多为5〜10×14×缺陷/ cm 3的含氧缺陷。 至少1〜10〜13？ 缺陷/cm¿3?. 氟浓度优选为100ppm以下。
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公开(公告)号：WO2004078663A3
公开(公告)日：2005-06-30
申请号：PCT/EP2004002190
申请日：2004-03-03
发明人： NISHIMURA HIROYUKI , FUJINOKI AKIRA
CPC分类号： C03B32/00 , C03B19/1453 , C03B2201/075 , C03B2201/12 , C03B2201/21 , C03B2201/23 , C03C3/06 , C03C4/0071 , C03C2201/12 , C03C2201/23 , C03C2203/40 , C03C2203/42 , Y02P40/57
摘要： The present invention provides an optical synthetic quartz glass material which substantially does not cause changes in transmitted wave surface (TWS) by solarization, compaction (TWS delayed), rarefaction (TWS progressed) and photorefractive effect when ArF excimer laser irradiation is applied at a low energy density, e.g. at energy density per pulse of 0.3 mJ/cm or less. The present invention further provides a method for manufacturing the same. In order to solve the above-mentioned problems, the optical synthetic quartz glass material of the present invention is characterized in that, in a synthetic quartz glass prepared by a flame hydrolysis method using a silicon compound as a material, the followings are satisfied that the amount of SiOH is within a range of more than 10 ppm by weight to 400 ppm by weight, content of fluorine is 30 to 1000 ppm by weight, content of hydrogen is 0.1 x 10 to 10 x 10 molecules/cm and, when the amounts of SiOH and fluorine are A and B, respectively, total amount of A and B is 100 ppm by weight or more and B/A is 0.25 to 25.
摘要翻译： 本发明提供了一种光学合成石英玻璃材料，其在低温下施加ArF准分子激光照射时，通过太阳化，压实（TWS延迟），稀释（TWS进行）和光折射效应基本上不会引起透射波表面（TWS）的变化 能量密度，例如 每个脉冲的能量密度为0.3mJ / cm 2以下。 本发明还提供一种制造该方法的方法。 为了解决上述问题，本发明的光学合成石英玻璃材料的特征在于，在使用硅化合物作为材料的火焰水解法制备的合成石英玻璃中，满足以下条件： SiOH的量在大于10重量ppm至400重量ppm的范围内，氟含量为30至1000重量ppm，氢含量为0.1×10 17至10×10 17分子/ cm 3，并且当SiOH和氟的量分别为A和B时，A和B的总量为100重量ppm以上，B / A为0.25〜25。
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公开(公告)号：WO2004078663A2
公开(公告)日：2004-09-16
申请号：PCT/EP2004/002190
申请日：2004-03-03
申请人： HERAEUS QUARZGLAS GMBH & CO. KG , SHIN-ETSU QUARTZ PRODUCTS CO. LTD. , NISHIMURA, Hiroyuki , FUJINOKI, Akira
IPC分类号： C03B
CPC分类号： C03B32/00 , C03B19/1453 , C03B2201/075 , C03B2201/12 , C03B2201/21 , C03B2201/23 , C03C3/06 , C03C4/0071 , C03C2201/12 , C03C2201/23 , C03C2203/40 , C03C2203/42 , Y02P40/57
摘要： The present invention provides an optical synthetic quartz glass material which substantially does not cause changes in transmitted wave surface (TWS) by solarization, compaction (TWS delayed), rarefaction (TWS progressed) and photorefractive effect when ArF excimer laser irradiation is applied at a low energy density, e.g. at energy density per pulse of 0.3 mJ/cm 2 or less. The present invention further provides a method for manufacturing the same. In order to solve the above-mentioned problems, the optical synthetic quartz glass material of the present invention is characterized in that, in a synthetic quartz glass prepared by a flame hydrolysis method using a silicon compound as a material, the followings are satisfied that the amount of SiOH is within a range of more than 10 ppm by weight to 400 ppm by weight, content of fluorine is 30 to 1000 ppm by weight, content of hydrogen is 0.1 x 10 17 to 10 x 10 17 molecules/cm 3 and, when the amounts of SiOH and fluorine are A and B, respectively, total amount of A and B is 100 ppm by weight or more and B/A is 0.25 to 25.
摘要翻译： 本发明提供了一种光学合成石英玻璃材料，其在低温下施加ArF准分子激光照射时，通过太阳化，压实（TWS延迟），稀释（TWS进行）和光折射效应基本上不会引起透射波面（TWS）的变化 能量密度，例如 每个脉冲的能量密度为0.3mJ / cm 2以下。 本发明还提供一种制造该方法的方法。 为了解决上述问题，本发明的光学合成石英玻璃材料的特征在于，在使用硅化合物作为材料的火焰水解法制备的合成石英玻璃中，满足以下条件： SiOH的量在大于10重量ppm至400重量ppm的范围内，氟含量为30至1000重量ppm，氢含量为0.1×10 17至10×10 17分子/ cm 3，并且当SiOH和氟的量分别为A和B时，A和B的总量为100重量ppm以上，B / A为0.25〜25。
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公开(公告)号：WO2003080526A1
公开(公告)日：2003-10-02
申请号：PCT/JP2003/003759
申请日：2003-03-26
IPC分类号： C03C3/06
CPC分类号： G03F7/70958 , C03B19/1453 , C03B2201/04 , C03B2201/075 , C03B2201/21 , C03C3/06 , C03C23/0025 , C03C2201/21 , C03C2203/40 , C03C2203/50 , G02B1/02 , Y02P40/57
摘要： 波長１５０～１９０ｎｍの紫外線を光源とする装置に用いられ、波長１５０～１９０ｎｍの紫外光に対する耐紫外線性に優れた合成石英ガラスの提供を目的とする。 波長１５０～２００ｎｍの光に使用される合成石英ガラスにおいて、合成石英ガラス中のＯＨ基濃度が１ｐｐｍ未満であり、酸素過剰型欠陥濃度が１×１０ 16 個／ｃｍ 3 以下、水素分子濃度が１×１０ 17 分子／ｃｍ 3 未満、かつキセノンエキシマランプ光を照度１０ｍＷ／ｃｍ 2 で３ｋＪ／ｃｍ 2 照射した後、またはＦ 2 レーザ光をエネルギー密度１０ｍＪ／ｃｍ 2 ／パルスで１０ 7 パルス照射した後の非架橋酸素ラジカルの濃度が１×１０ 16 個／ｃｍ 3 以下であることを特徴とする合成石英ガラス。
摘要翻译： 用于使用150〜190nm波长的紫外线作为光源的单位的合成石英玻璃，其对紫外线的耐紫外线性优异，为150〜190nm。 用于150〜200nm波长的合成石英玻璃，其特征在于，在合成石英玻璃中，OH基浓度小于1ppm，氧过剩型缺陷的浓度为1×10 16个缺陷/ cm 3以下，氢分子的浓度小于1×10 17分子/ cm 3，非交联氧自由基的浓度在用氙准分子灯3kJ / cm 2照射后表现出 在10mW / cm 2的照射强度下，或以10mJ / cm 2 /脉冲的能量密度用F 2激光束进行10 <7>脉冲照射后的光为1×10 16 自由基/ cm 3以下。
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公开(公告)号：WO2003080525A1
公开(公告)日：2003-10-02
申请号：PCT/JP2003/003618
申请日：2003-03-25
IPC分类号： C03C3/06
CPC分类号： C03C3/06 , C03B19/1469 , C03B2201/12 , C03B2201/21 , C03B2201/23 , C03C23/002 , C03C23/0025 , C03C2201/12 , C03C2201/21 , C03C2201/23 , Y02P40/57
摘要： A process for producing a quartz glass member, wherein a sample from a quartz glass base material is exposed to F2 laser under given conditions and whether or not the peak intensity of H2 Raman scattering radiation is decreased by 80% or more from the peak intensity of H2 Raman scattering radiation with respect to a sample not exposed to F2 laser is judged. When the decrease of the peak intensity of H2 Raman scattering radiation is less than 80%, the laser resistance of the quartz glass base material is judged as being satisfactory, and a synthetic quartz glass member is worked from the base material. The compaction of the sample is also measured.
摘要翻译： 一种用于制造石英玻璃构件的方法，其中来自石英玻璃基材的样品在给定条件下暴露于F2激光，并且H2拉曼散射辐射的峰值强度是否从峰值强度降低80％以上 判断相对于未暴露于F2激光的样品的H2拉曼散射辐射。 当H2拉曼散射辐射的峰值强度的降低小于80％时，石英玻璃基材的激光电阻被认为是令人满意的，并且从基材加工合成石英玻璃部件。 也测量样品的压实度。
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公开(公告)号：WO02029492A1
公开(公告)日：2002-04-11
申请号：PCT/US2001/042292
申请日：2001-09-25
IPC分类号： G03F7/00 , C03B19/14 , C03C3/06 , C03C4/00 , C03C23/00 , G02B1/00 , G03F7/20 , H01L21/027 , C03B19/09 , C03C3/04 , G02B13/14
CPC分类号： G03F7/70041 , C03B19/1423 , C03B19/1453 , C03B2201/07 , C03B2201/075 , C03B2201/21 , C03B2201/23 , C03B2207/36 , C03C3/06 , C03C4/0085 , C03C23/002 , C03C2201/21 , C03C2201/23 , G03F7/70058 , G03F7/70941 , G03F7/70958 , G03F7/70966
摘要： Lithographic methods are disclosed. In one such method, a pulsed ultraviolet radiation source for producing ultraviolet lithography radiation having a wavelength shorter than about 300 nm at a fluence of less than 10 mJ/cm /pulse and a high purity fused silica lithography glass having a concentration of molecular hydrogen of between about 0.02 x 1018 molecules/cm3 and about 0.18 x 1018 molecules/cm are provided. A lithography pattern is formed with the ultraviolet lithography radiation; the lithography pattern is reduced to produce a reduced lithography pattern; and the reduced lithography pattern is projected onto a ultraviolet radiation sensitive lithography medium to form a printed lithography pattern. At least one of the forming, reducing, and projecting steps includes transmitting the ultraviolet lithography radiation through the high purity fused silica lithography glass. Lithography systems and high purity fused silica lithography glass are also described.
摘要翻译： 公开了平版印刷方法。 在一种这样的方法中，用于产生波长短于约300nm的波长小于10mJ / cm 2 /脉冲的紫外光刻辐射的脉冲紫外线辐射源，以及浓度高于10mJ / cm 2的高纯度熔融石英光刻玻璃 提供约0.02×10 18分子/ cm 3和约0.18×10 18分子/ cm 3之间的分子氢。 用紫外光刻法形成光刻图案; 光刻图案被减少以产生减小的光刻图案; 并且将减小的光刻图案投影到紫外线照射敏感光刻介质上以形成印刷光刻图案。 形成，还原和突出步骤中的至少一个步骤包括通过高纯度熔融石英光刻玻璃传输紫外光刻辐射。 还描述了平版印刷系统和高纯度熔融石英光刻玻璃。
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公开(公告)号：WO02022513A1
公开(公告)日：2002-03-21
申请号：PCT/US2001/028482
申请日：2001-09-12
CPC分类号： C03B19/1423 , C03B19/1415 , C03B2201/03 , C03B2201/07 , C03B2201/21 , C03B2201/23 , C03B2207/06 , C03B2207/12 , C03B2207/20 , C03B2207/22 , C03B2207/32 , C03B2207/36
摘要： A method for preparing high-purity, bulk fused silica includes supplying silane gas (11), a gaseous fuel (8), and oxygen gas (10B) to a combustion burner (14). A fuel and oxygen mixture (13) is produces when fuel (8) and oxygen gas (10A) in a premixing chamber (12). Nitrogen gas (17A) may also be supplied to the burner (14) which is located in the crown (16) of a furnace (15). Silica particles are formed by passing the silane gas into a flame formed by the combustion reaction of the gaseous fuel with the oxygen gas while maintaining the ratio of the flow rate of the gaseous fuel to the flow rate of the silane gas no less than twelve and the ratio of the flow rate of the gaseous fuel to the flow rate of the oxygen gas no less than three. Silane flow rates are controlled with a mass flow controller (51) and the flow of other gasses is monitored with flow meters (49). The silica particles formed are immediately deposited onto a hot bait (18) inside a containment vessel (21) to form a boule (19).
摘要翻译： 制备高纯度体积熔融二氧化硅的方法包括向燃烧器（14）供给硅烷气体（11），气态燃料（8）和氧气（10B）。 当预混合室（12）中的燃料（8）和氧气（10A）时，产生燃料和氧气混合物（13）。 也可以将氮气（17A）供应到位于炉（15）的冠部（16）中的燃烧器（14）。 通过使硅烷气体通过气体燃料与氧气的燃烧反应形成的火焰中，同时保持气体燃料的流量与硅烷气体的流量的比率不小于12而形成二氧化硅颗粒， 气体燃料的流量与氧气的流量的比率不小于3。 用质量流量控制器（51）控制硅烷流量，并用流量计（49）监测其他气体的流量。 形成的二氧化硅颗粒立即沉积在容纳容器（21）内部的热诱饵（18）上以形成一个（19）。
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公开(公告)号：WO01092176A1
公开(公告)日：2001-12-06
申请号：PCT/US2001/010768
申请日：2001-04-03
CPC分类号： G03F7/70958 , C03B19/1407 , C03B19/1423 , C03B2201/21 , C03B2207/06 , C03B2207/20 , C03B2207/22 , C03B2207/32 , C03B2207/36 , C03B2207/50 , C03C3/06 , C03C2201/21 , C03C2203/40
摘要： An optical member includes a fused silica glass having a concentration of SiH moiety below detection limit as measured by Raman spectroscopy and a concentration of molecular hydrogen of at least 1 x 10 molecules/cm . The fused silica glass exhibits an induced absorption level which quickly attains an initial peak upon exposure to irradiation and rapidly decays to a low value. The induced absorption level after decaying to the low value remains substantially unchanged by further irradiation.
摘要翻译： 光学构件包括通过拉曼光谱测量的浓度为SiH部分低于检测限的熔融石英玻璃，并且分子氢浓度至少为1×10 17分子/ cm 3。 熔融石英玻璃表现出诱导吸收水平，其在暴露于照射时快速达到初始峰值并迅速衰变至低值。 衰减至低值后的诱导吸收水平通过进一步照射基本上保持不变。
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