公开(公告)号：WO2017099870A1

公开(公告)日：2017-06-15

申请号：PCT/US2016/054758

申请日：2016-09-30

Applicant: KLA-TENCOR CORPORATION

Inventor： DZIURA, Thaddeus Gerard ,  GELLINEAU, Antonio Arion ,  SHCHEGROV, Andrei V.

IPC: H01L21/66 ,  G03F7/20 ,  G01N23/083

CPC classification number: G01B15/02 ,  G01B2210/56 ,  G01N23/201 ,  G01N23/2055

Abstract: Methods and systems for characterizing dimensions and material properties of high aspect ratio, vertically manufactured devices using transmission, small-angle x-ray scattering (T-SAXS) techniques are described herein. Exemplary structures include spin transfer torque random access memory (STT-RAM), vertical NAND memory (V-NAND), dynamic random access memory (DRAM), three dimensional FLASH memory (3D-FLASH), resistive random access memory (Re-RAM), and PC-RAM. In one aspect, T-SAXS measurements are performed at a number of different orientations that are more densely concentrated near the normal incidence angle and less densely concentrated at orientations that are further from the normal incidence angle. In a further aspect, T-SAXS measurement data is used to generate an image of a measured structure based on the measured intensities of the detected diffraction orders. In another further aspect, a metrology system is configured to generate models for combined x-ray and optical measurement analysis.

Abstract translation: 本文描述了用于表征高纵横比的尺寸和材料属性的方法和系统，使用透射的垂直制造的设备，小角度X射线散射（T-SAXS）技术。 示例性的结构包括自旋转移力矩随机存取存储器STT-RAM，垂直NAND存储器V-NAND，动态随机存取存储器DRAM，三维FLASH存储器3D-FLASH，电阻随机存取存储器Re-RAM ）和PC-RAM。 在一个方面，T-SAXS测量在靠近法线入射角更浓集中的多个不同取向上执行，并且在距法线入射角更远的取向上集中较少密集。 在另一方面，基于测得的衍射级次的强度，使用T-SAXS测量数据来产生测量结构的图像。 在另一方面，计量系统被配置为生成用于组合的X射线和光学测量分析的模型。

公开(公告)号：WO2017099843A1

公开(公告)日：2017-06-15

申请号：PCT/US2016/035190

申请日：2016-06-01

Applicant: KLA-TENCOR CORPORATION

Inventor： LEVINSKI, Vladimir

IPC: G01B11/02 ,  G01B9/02

CPC classification number: G01N21/47 ,  G01B11/24 ,  G01B11/2513 ,  G01B11/2536 ,  G01B2210/56 ,  G01N21/00 ,  G01N21/4788 ,  G01N2021/4792 ,  G03F7/70633 ,  G03F7/70683

Abstract: Metrology scatterometry targets, optical systems and corresponding metrology tools and measurement methods are provided. Targets and/or optical systems are designed to enhance first order diffraction signals with respect to a zeroth order diffraction signal from the scatterometry target by creating a phase shift of 180° between zeroth order diffraction signals upon illumination of the scatterometry targets. For example, the targets may be designed to respond to polarized illumination by producing a first phase shift between zeroth order diffraction signals upon illumination thereof and optical systems may be designed to illuminate the target by polarized illumination and to analyze a resulting diffraction signal to yield a second phase shift between zeroth order diffraction signals upon illumination thereof. The phase shifts add up to 180° to cancel out the zeroth order diffraction signals, with either phase shift being between 0 and 180°.

Abstract translation: 提供计量散射测量目标，光学系统和相应的度量工具和测量方法。 目标和/或光学系统被设计成通过产生180°的相移来相对于来自散射测量目标的零阶衍射信号增强一阶衍射信号。 在照射散射测量目标时的零阶衍射信号之间。 例如，目标可以被设计为通过在照射零级衍射信号之后产生第一相移来响应于偏振照明，并且光学系统可以被设计成通过偏振照明照射目标并且分析得到的衍射信号以产生 在其照射之后的第二阶衍射信号之间的第二相移。 相移加起来高达180°; 以消除零级衍射信号，其中相移在0和180°之间。

公开(公告)号：WO2017087283A3

公开(公告)日：2017-05-26

申请号：PCT/US2016/061675

申请日：2016-11-11

Applicant: KLA-TENCOR CORPORATION

Inventor： KURITSYN, Alexey ,  LIU, Ye ,  KHODYKIN, Oleg

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/02

Abstract: The present disclosure is directed to laser produced plasma light sources having a target material, such as Xenon, that is coated on the outer surface of a cyiindrically-symmetric element (e.g., drum). Embodiments include a pre-pulsing arrangement which can be optimized to reduce irradiation damage to the drum and a pulse trimming unit which can be employed to reduce irradiation damage to the drum. In addition, an embodiment is disclosed wherein the surface of a cyiindrically-symmetric element is formed with a plurality of grooves having a groove depth greater than 1 mm and a focusing unit focusing a laser beam and establishing an irradiation site to produce plasma from the target material, with the irradiation site distanced from a groove surface portion to protect the surface portion from irradiation damage.

公开(公告)号：WO2017058790A1

公开(公告)日：2017-04-06

申请号：PCT/US2016/053952

申请日：2016-09-27

Applicant: KLA-TENCOR CORPORATION

Inventor： CHIMMALGI, Anant ,  OH, Sebaek ,  WITTENBURG, Joshua ,  WILSON, Lauren ,  YADAV, Rahul ,  BEZEL, Ilya ,  NAVONE, Mike ,  SHCHEMELININ, Anatoly

IPC: H05G2/00 ,  G03F7/20

CPC classification number: H05G2/008 ,  G01N23/04 ,  G02B6/0005 ,  G02B6/0006 ,  G02B6/0008 ,  G02B6/02042 ,  G02B6/028 ,  G02B6/4215 ,  G02B27/141

Abstract: An illumination pump source is disclosed. The illumination pump source includes a set of power sources configured to generate a set of laser beams, with at least some of the set of laser beams configured to include illumination having different wavelengths. The illumination pump source also includes an optical fiber. The illumination pump source also includes one or more optical elements, the one or more optical elements configured to couple the illumination from at least some of the laser beams to one or more regions of the optical fiber.

Abstract translation: 公开了一种照明泵浦源。 照明泵浦源包括被配置为产生一组激光束的一组电源，其中该组激光束中的至少一些被配置为包括具有不同波长的照明。 照明泵浦源还包括光纤。 照明泵浦源还包括一个或多个光学元件，所述一个或多个光学元件被配置为将来自至少一些激光束的照明耦合到光纤的一个或多个区域。

公开(公告)号：WO2017053150A1

公开(公告)日：2017-03-30

申请号：PCT/US2016/051743

申请日：2016-09-14

Applicant: KLA-TENCOR CORPORATION

Inventor： DEMIRER, Onur ,  VOLKOVICH, Roie ,  PIERSON, William ,  WAGNER, Mark ,  KLEIN, Dana

IPC: H01L21/66 ,  H01L21/027

CPC classification number: G03F7/70616 ,  H01L22/12 ,  H01L22/20

Abstract: The generation of flexible sparse metrology sample plans includes receiving a full set of metrology signals from one or more wafers from a metrology tool, determining a set of wafer properties based on the full set of metrology signals and calculating a wafer property metric associated with the set of wafer properties, calculating one or more independent characterization metrics based on the full set of metrology signals, and generating a flexible sparse sample plan based on the set of wafer properties, the wafer property metric, and the one or more independent characterization metrics. The one or more independent characterization metrics of the one or more properties calculated with metrology signals from the flexible sparse sampling plan is within a selected threshold from one or more independent characterization metrics of the one or more properties calculated with the full set of metrology signals.

Abstract translation: 柔性稀疏测量样本计划的生成包括从计量工具接收来自一个或多个晶片的全套测量信号，基于全套度量信号确定一组晶片特性，并计算与该组相关联的晶片特性度量 的晶片属性，基于整套测量信号计算一个或多个独立表征度量，以及基于所述晶片属性集合，所述晶片属性度量以及所述一个或多个独立表征度量来生成柔性稀疏样本计划。 使用来自灵活稀疏采样计划的度量信号计算出的一个或多个属性的一个或多个独立特性度量值在由所述整套度量信号计算的一个或多个属性的一个或多个独立特性度量值的选定阈值内。

公开(公告)号：WO2017035142A1

公开(公告)日：2017-03-02

申请号：PCT/US2016/048199

申请日：2016-08-23

Applicant: KLA-TENCOR CORPORATION

Inventor： LENNEK, Michael ,  PARK, Allen ,  DUFFY, Brian ,  KULKARNI, Ashok

IPC: H01L21/66

CPC classification number: G01N21/956 ,  G01N21/9501 ,  G05B19/41875 ,  H01L22/12 ,  H01L22/20

Abstract: Methods and systems for determining characteristic(s) of patterns of interest (POIs) are provided. One system is configured to acquire output of an inspection system generated at the POI instances without detecting defects at the POI instances. The output is then used to generate a selection of the POI instances. The system then acquires output from an output acquisition subsystem for the selected POI instances. The system also determines characteristic(s) of the POI using the output acquired from the output acquisition subsystem.

Abstract translation: 提供了用于确定感兴趣模式（POI）特征的方法和系统。 一个系统被配置为获取在POI实例处生成的检查系统的输出，而不检测POI实例的缺陷。 然后，输出用于生成POI实例的选择。 然后，系统从所选POI实例的输出采集子系统获取输出。 该系统还使用从输出采集子系统获得的输出来确定POI的特性。

公开(公告)号：WO2017024158A1

公开(公告)日：2017-02-09

申请号：PCT/US2016/045594

申请日：2016-08-04

Applicant: KLA-TENCOR CORPORATION

Inventor： GUTMAN, Nadav ,  FELER, Yoel ,  LEVINSKI, Vladimir ,  KAMINSKY, Oded

IPC: H01L21/66 ,  H01L21/027

CPC classification number: G03F7/70641

Abstract: Focus metrology methods and modules are provided, which use aerial-images-based transformations to share measurement information derived from multiple targets and/or to design additional targets to specified compliant targets, which enable simple adjustment of focus targets to changing production conditions. Methods comprise positioning two or more focus targets in each wafer field, conducting focus measurements of the targets, transforming the focus measurements into a single set of results for each field, using a transformation between the targets that is based on the aerial images thereof, and deriving focus results from the single sets of results; and possibly designing the focus targets from specified targets using aerial image parameters of the specified targets.

Abstract translation: 提供了重点测量方法和模块，其使用基于空中图像的变换来共享从多个目标导出的测量信息和/或针对指定的兼容目标设计附加目标，这使得能够简单地调整焦点目标以改变生产条件。 方法包括在每个晶片领域中定位两个或更多个聚焦目标，使用基于其基于其空间图像的目标之间的变换，进行目标的聚焦测量，将焦点测量值转换为每个场的单个结果集合，以及 从单一结果中得出重点结果; 并且可能使用指定目标的空中图像参数来设计来自指定目标的焦点目标。

公开(公告)号：WO2017019341A1

公开(公告)日：2017-02-02

申请号：PCT/US2016/042629

申请日：2016-07-15

Applicant: KLA-TENCOR CORPORATION

Inventor： CAO, Meng ,  LEE, Lie-Quan ,  ZHAO, Qiang ,  LI, Heyin ,  YE, Mengmeng

IPC: G02B21/00 ,  G01N21/17 ,  G01N21/01

CPC classification number: G01N21/9501 ,  G01B21/04 ,  G01B2210/56 ,  G01N21/211 ,  G01N2021/213 ,  G03F7/705 ,  G03F7/70625 ,  G03F7/70633

Abstract: Methods and systems for evaluating and ranking the measurement efficacy of multiple sets of measurement system combinations and recipes for a particular metrology application are presented herein. Measurement efficacy is based on estimates of measurement precision, measurement accuracy, correlation to a reference measurement, measurement time, or any combination thereof. The automated the selection of measurement system, combinations and recipes reduces time to measurement and improves measurement results. Measurement efficacy is quantified by a set of measurement performance metrics associated with each measurement system, and recipe. In one example, the sets of measurement system combinations and recipes most capable of measuring the desired parameter of interest are presented to the user in rank order based on corresponding values of one or more measurement performance metrics. A user is able to select the appropriate measurement system combination in an objective, quantitative manner.

Abstract translation: 本文介绍了用于评估和评估特定测量应用的多组测量系统组合和配方的测量功能的方法和系统。 测量功效基于测量精度，测量精度，与参考测量的相关性，测量时间或其任何组合的估计。 自动选择测量系统，组合和配方可减少测量时间并提高测量结果。 通过与每个测量系统和配方相关联的一组测量性能指标量化测量功效。 在一个示例中，基于一个或多个测量性能度量的相应值，以等级顺序向用户呈现最能够测量所需感兴趣参数的测量系统组合和配方的集合。 用户能够以客观，定量的方式选择合适的测量系统组合。

公开(公告)号：WO2017004528A1

公开(公告)日：2017-01-05

申请号：PCT/US2016/040712

申请日：2016-07-01

Applicant: KLA-TENCOR CORPORATION

Inventor： WOLL, Dirk

IPC: H01S3/08 ,  H01S3/108 ,  G01N21/88

CPC classification number: G02F1/353 ,  G02B27/09 ,  G02F1/3501 ,  G02F1/3551 ,  G02F2001/3503 ,  G02F2001/3505 ,  H01S3/005 ,  H01S3/0092

Abstract: A system includes a nonlinear crystal positioned such that a focus of a laser beam is outside the nonlinear crystal in at least one plane perpendicular to a beam propagation direction of the laser beam. The nonlinear crystal is disposed in a crystal mount assembly. A laser beam may be directed at the nonlinear crystal for wavelength conversion. The system may be used as a deep-UV wavelength converter.

Abstract translation: 一种系统包括非线性晶体，其被定位成使得激光束的焦点在垂直于激光束的光束传播方向的至少一个平面中在非线性晶体之外。 非晶体晶体设置在晶体安装组件中。 激光束可以被引导到用于波长转换的非线性晶体。 该系统可用作深UV波长转换器。

公开(公告)号：WO2016209600A1

公开(公告)日：2016-12-29

申请号：PCT/US2016/036052

申请日：2016-06-06

Applicant: KLA-TENCOR CORPORATION

Inventor： GUPTA, Ajay ,  HA, Thanh ,  MOREAU, Olivier ,  RAJA, Kumar

IPC: H01L21/027 ,  H01L21/66 ,  H01L27/06

CPC classification number: H01J37/222 ,  G03F7/70633 ,  H01J2237/221 ,  H01J2237/24578 ,  H01J2237/31798

Abstract: Methods and systems for determining overlay error between different patterned features of a design printed on a wafer in a multi-patterning step process are provided. For multi-patterning step designs, the design for a first patterning step is used as a reference and designs for each of the remaining patterning steps are synthetically shifted until the synthetically shifted designs have the best global alignment with the entire image based on global image-to-design alignment. The final synthetic shift of each design for each patterning step relative to the design for the first patterning step provides a measurement of relative overlay error between any two features printed on the wafer using multi-patterning technology.

Abstract translation: 提供了用于在多图案化步骤过程中确定印刷在晶片上的设计的不同图案特征之间确定覆盖误差的方法和系统。 对于多图案化步骤设计，将第一图案化步骤的设计用作参考，并且对于每个剩余的图案化步骤的设计被合成移位，直到合成移位的设计基于全局图像步骤与整个图像具有最佳的全局对准， 设计对齐。 相对于第一图案化步骤的设计，每个图案化步骤的每个设计的最终合成位移提供了使用多图案化技术印刷在晶片上的任何两个特征之间的相对重叠误差的测量。