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公开(公告)号：WO2013176986A3
公开(公告)日：2013-11-28
申请号：PCT/US2013/041587
申请日：2013-05-17
发明人： KHOSLA, Mukul , GRIMES, Mike , KROTOV, Peter , EPSHTEYN, Genny
摘要： A vapor delivery apparatus for providing a precursor vapor for a vapor deposition process includes a precursor container for holding a liquid or solid precursor. A first temperature control assembly maintains the precursor container at a first temperature to generate a vapor precursor from the liquid or solid precursor. An isolation valve is coupled to the precursor container, and a specific quantity of the vapor precursor is accumulated in an expansion volume. A fill valve, which is coupled to each of the isolation valve and the expansion volume, controls the flow of the vapor precursor from the precursor container into the expansion volume. A second temperature control assembly maintains the isolation valve at a second temperature greater than the first temperature.
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2.发明申请CONTROLLED DEPOSITION OF SILICON-CONTAINING COATINGS ADHERED BY AN OXIDE LAYER 审中-公开由含氧层涂覆的含硅涂层的控制沉积
公开(公告)号：WO2005121396A3
公开(公告)日：2006-11-16
申请号：PCT/US2005013214
申请日：2005-04-20
发明人： KOBRIN BORIS , NOWAK ROMUALD , YI RICHARD C , CHINN JEFFREY D
CPC分类号： B82Y30/00 , C23C16/0227 , C23C16/402
摘要： We have developed an improved vapor-phase deposition method and apparatus for the application of films / coatings on substrates. The method provides for the addition of a precise amount of each of the reactants to be consumed in a single reaction step of the coating formation process. In addition to the control over the amount of reactants added to the process chamber, the present invention requires precise control over the total pressure (which is less than atmospheric pressure) in the process chamber, the partial vapor pressure of each vaporous component present in the process chamber, the substrate temperature, and typically the temperature of a major processing surface within said process chamber. Control over this combination of variables determines a number of the characteristics of a film/coating or multi-layered film/coating formed using the method. By varying these process parameters, the roughness and the thickness of the films/coatings produced can be controlled.
摘要翻译： 我们已经开发了一种改进的气相沉积方法和装置，用于在基底上施加膜/涂层。 该方法提供在涂层形成过程的单个反应步骤中添加精确量的每种待消耗的反应物。 除了控制添加到处理室中的反应物的量之外，本发明需要精确控制处理室中的总压力（其小于大气压），存在于处理室中的每种气态组分的部分蒸气压 处理室，衬底温度以及典型地在所述处理室内的主处理表面的温度。 对这种变量组合的控制决定了使用该方法形成的膜/涂层或多层膜/涂层的许多特性。 通过改变这些工艺参数，可以控制所生产的膜/涂层的粗糙度和厚度。
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公开(公告)号：WO2006020308A2
公开(公告)日：2006-02-23
申请号：PCT/US2005025676
申请日：2005-07-20
IPC分类号： C23C16/00
CPC分类号： C23C16/0272 , B05D1/185 , B05D1/60 , B05D3/142 , C23C16/45525 , C23C16/45544 , C23C16/56
摘要： We have developed an improved vapor-phase deposition method and apparatus for the application of organic films /coatings containing a variety of functional groups on substrates. Most substrates can be coated using the method of the invention. The substrate surface is halogenated using a vaporous halogen-containing compound, followed by a reaction with at least one organic molecule containing at least one nucleophilic functional group Capable of reacting with a halogenated substrate surface. The halogenation of the substrate surface and the subsequent reaction with the organic molecule nucleophilic functional group are carried out in the same process chamber in a manner such that the halogenated substrate surface does not lose its functionality prior to reaction with the nucleophilic functional group(s) on the organic molecule. Typically the process chamber is operated under a pressure ranging from about I nmTorr to about 10 Torr.
摘要翻译： 我们已经开发了一种改进的气相沉积方法和装置，用于在基底上应用含有各种官能团的有机膜/涂层。 可以使用本发明的方法涂覆大多数基底。 使用含卤素的化合物将底物表面卤化，然后与至少一种含有至少一个能够与卤化基质表面反应的亲核官能团的有机分子反应。 衬底表面的卤化和随后与有机分子亲核官能团的反应在相同的处理室中进行，使得卤化的衬底表面在与亲核官能团反应之前不失去其官能团， 在有机分子上。 通常，处理室在约1nmTorr至约10Torr的压力下操作。
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公开(公告)号：WO2008143837A1
公开(公告)日：2008-11-27
申请号：PCT/US2008/006098
申请日：2008-05-13
申请人： APPLIED MICROSTRUCTURES, INC. , KOBRIN, Boris , HIRJI, Dangaria, Nikunj , NOWAK, Romuald , GRIMES, Michael, T.
IPC分类号： H01L21/31
CPC分类号： H01L23/564 , B81B3/0075 , B81B2207/115 , B81C1/00206 , B81C1/0038 , H01L21/02126 , H01L21/02164 , H01L21/02214 , H01L21/02271 , H01L21/02304 , H01L21/3127 , H01L21/3141 , H01L21/31604 , H01L21/31612 , H01L21/3162 , H01L23/29 , H01L2924/0002 , H01L2924/12044 , H01L2924/00
摘要： A method of providing a durable protective coating structure which comprises at least three layers, and which is stable at temperatures in excess of 400 °C, where the method includes vapor depositing a first layer deposited on a substrate, wherein the first layer is a metal oxide adhesion layer selected from the group consisting of an oxide of a Group IIIA metal element, a Group IVB metal element, a Group VB metal element, and combinations thereof; vapor depositing a second layer upon said first layer, wherein said second layer includes a silicon-containing layer selected from the group consisting of silicon oxide, silicon nitride, and silicon oxynitride; and vapor depositing a third layer upon said second layer, wherein said third layer is a functional organic-comprising layer. Numerous articles useful in electronics, MEMS, nanoimprinting lithography, and biotechnology applications can be fabricated using the method.
摘要翻译： 一种提供耐久保护涂层结构的方法，其包括至少三层，并且其在超过400℃的温度下是稳定的，其中所述方法包括气相沉积沉积在基底上的第一层，其中所述第一层是金属 选自由IIIA族金属元素的氧化物，IVB族金属元素，VB族金属元素及其组合组成的组中的氧化物粘附层; 在所述第一层上气相沉积第二层，其中所述第二层包括选自氧化硅，氮化硅和氮氧化硅的含硅层; 并在所述第二层上气相沉积第三层，其中所述第三层是含功能的有机物层。 可以使用该方法制造在电子，MEMS，纳米压印光刻和生物技术应用中有用的许多制品。
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5.发明申请CONTROLLED VAPOR DEPOSITION OF BIOCOMPATIBLE COATINGS FOR MEDICAL DEVICES 审中-公开用于医疗器械的生物降解涂层的控制蒸发沉积
公开(公告)号：WO2006121573A1
公开(公告)日：2006-11-16
申请号：PCT/US2006/014071
申请日：2006-04-12
IPC分类号： C23C14/00
CPC分类号： B82Y30/00 , A61L27/34 , A61L29/085 , A61L31/10 , B82Y40/00 , Y10T428/261 , Y10T428/31667 , C08L71/02
摘要： We have developed an improved vapor-phase deposition method and apparatus for the application of layers and coatings on various substrates. The method and apparatus are useful in the fabrication of biofunctional devices, Bio-MEMS devices, and in the fabrication of microfluidic devices for biological applications. In one important embodiment, oxide / polyethylene glycol coatings provide increased hydrophilicity and improved biocompatibility for medical devices and implants.
摘要翻译： 我们已经开发了一种改进的气相沉积方法和装置，用于在各种基底上施加层和涂层。 该方法和装置可用于制造生物功能器件，生物MEMS装置以及用于生物应用的微流体装置的制造。 在一个重要的实施方案中，氧化物/聚乙二醇涂层为医疗装置和植入物提供增强的亲水性和改进的生物相容性。
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公开(公告)号：WO2006083600A1
公开(公告)日：2006-08-10
申请号：PCT/US2006/002264
申请日：2006-01-19
CPC分类号： C23C16/402 , B05D1/185 , B05D1/60 , B05D5/04 , B05D7/22 , B05D7/222 , B05D2254/04 , B82Y30/00 , C23C16/0227 , C23C16/045 , Y10T29/49432 , Y10T428/1383 , Y10T436/11
摘要： A vapor-phase deposition method and apparatus for the application of layers and coatings useful in the fabrication of biotechnologically functional devices, Bio-MEMS devices, and in the fabrication of micro fluidic devices for biological applications. Oxide coatings providing hydrophilicity or oxide / polyethylene glycol coatings providing hydrophilicity can be deposited by the present method, over the interior surfaces of small wells in a plastic micro-plate or within the interior of lumens or other conduits in order to increase the hydrophilicity on the coated surface.
摘要翻译： 用于应用可用于制造生物技术功能器件，Bio-MEMS器件以及用于制造用于生物应用的微流体装置的层和涂层的气相沉积方法和装置。 提供亲水性的氧化物涂层或提供亲水性的氧化物/聚乙二醇涂层可以通过本方法沉积在塑料微板中的小孔的内表面或内腔或其它管道的内部，以增加对亲水性的亲水性 涂层表面。
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7.发明申请VAPOR-DEPOSITED BIOCOMPATIBLE COATINGS WHICH ADHERE TO VARIOUS PLASTICS AND METAL 审中-公开蒸气生物降解涂料，适用于各种塑料和金属
公开(公告)号：WO2008156604A1
公开(公告)日：2008-12-24
申请号：PCT/US2008/007273
申请日：2008-06-10
CPC分类号： C23C14/12 , A61L27/34 , A61L27/50 , B05D1/60 , B05D3/142 , B05D2201/00 , B05D2202/00 , C08L71/02
摘要： A method of providing a biocompatible PEG-comprising coating on a substrate, without the use of an underlying adhesion layer. The coating is vapor deposited onto the substrate from a precursor which includes a PEG-derived moiety and an amino silane- containing functional group which reacts with the substrate. The substrate may be metal or plastic, where plastic excludes polyimide and polycarbonate. The substrate may be plasma treated prior to deposition of the PEG-comprising coating.
摘要翻译： 在基材上提供生物相容的含PEG涂层的方法，而不使用下面的粘附层。 涂层从包含PEG衍生部分的前体和与基底反应的含氨基硅烷的官能团气相沉积到基底上。 基材可以是金属或塑料，其中塑料不包括聚酰亚胺和聚碳酸酯。 可以在沉积包含PEG的涂层之前对衬底进行等离子体处理。
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8.发明申请CONTROLLED DEPOSITION OF SILICON-CONTAINING COATINGS ADHERED BY AN OXIDE LAYER 审中-公开由含氧层涂覆的含硅涂层的控制沉积
公开(公告)号：WO2005121396A2
公开(公告)日：2005-12-22
申请号：PCT/US2005/013214
申请日：2005-04-20
IPC分类号： C23C16/00
CPC分类号： B82Y30/00 , C23C16/0227 , C23C16/402
摘要： We have developed an improved vapor-phase deposition method and apparatus for the application of films / coatings on substrates. The method provides for the addition of a precise amount of each of the reactants to be consumed in a single reaction step of the coating formation process. In addition to the control over the amount of reactants added to the process chamber, the present invention requires precise control over the total pressure (which is less than atmospheric pressure) in the process chamber, the partial vapor pressure of each vaporous component present in the process chamber, the substrate temperature, and typically the temperature of a major processing surface within said process chamber. Control over this combination of variables determines a number of the characteristics of a film/coating or multi-layered film/coating formed using the method. By varying these process parameters, the roughness and the thickness of the films/coatings produced can be controlled.
摘要翻译： 我们已经开发了一种改进的气相沉积方法和装置，用于在基底上施加膜/涂层。 该方法提供在涂层形成过程的单个反应步骤中添加精确量的每种待消耗的反应物。 除了控制添加到处理室中的反应物的量之外，本发明需要精确控制处理室中的总压力（其小于大气压），存在于处理室中的每种气态组分的部分蒸气压 处理室，衬底温度以及典型地在所述处理室内的主处理表面的温度。 对这种变量组合的控制决定了使用该方法形成的膜/涂层或多层膜/涂层的许多特性。 通过改变这些工艺参数，可以控制所生产的膜/涂层的粗糙度和厚度。
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公开(公告)号：WO2013176986A2
公开(公告)日：2013-11-28
申请号：PCT/US2013041587
申请日：2013-05-17
发明人： KHOSLA MUKUL , GRIMES MIKE , KROTOV PETER , EPSHTEYN GENNY
CPC分类号： C23C16/52 , C23C16/4485 , C23C16/45561 , F17D3/00 , Y10T137/0379 , Y10T137/6416
摘要： A vapor delivery apparatus for providing a precursor vapor for a vapor deposition process includes a precursor container for holding a liquid or solid precursor. A first temperature control assembly maintains the precursor container at a first temperature to generate a vapor precursor from the liquid or solid precursor. An isolation valve is coupled to the precursor container, and a specific quantity of the vapor precursor is accumulated in an expansion volume. A fill valve, which is coupled to each of the isolation valve and the expansion volume, controls the flow of the vapor precursor from the precursor container into the expansion volume. A second temperature control assembly maintains the isolation valve at a second temperature greater than the first temperature.
摘要翻译： 用于提供用于气相沉积工艺的前体蒸气的蒸气输送装置包括用于保持液体或固体前体的前体容器。 第一温度控制组件将前体容器保持在第一温度以从液体或固体前体产生蒸气前体。 隔离阀联接到前体容器，并且特定量的蒸气前体在膨胀体积中积聚。 连接到每个隔离阀和膨胀体积的填充阀控制蒸气前体从前体容器进入膨胀体积的流动。 第二温度控制组件将隔离阀保持在大于第一温度的第二温度。
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10.发明申请METHOD OF CREATING SUPER-HYDROPHOBIC AND-OR SUPER HYDROPHILIC SURGFACES ON SUBSTRATES, AND ARTICLES CREATED THEREBY 审中-公开在底物上形成超级疏水性和超级疏水性表面活性剂的方法及其制备方法
公开(公告)号：WO2008123961A1
公开(公告)日：2008-10-16
申请号：PCT/US2008/004192
申请日：2008-03-31
发明人： KOBRIN, Boris
IPC分类号： H01L21/302
CPC分类号： C23C16/403 , C08J7/16 , C23C16/45514 , Y10T428/24802
摘要： The present invention is related to a chemical vapor deposition method of depositing layers of materials to provide super-hydrophilic surface properties, or super- hydrophobic surface properties, or combinations of such properties at various locations on a given surface. The invention also relates to various product applications which make use of super-hydrophobic surface properties, such as electronic devices, biological analytical and diagnostic tools, and optical devices, for example.
摘要翻译： 本发明涉及一种沉积材料层以提供超亲水表面性质或超疏水性表面性质的化学气相沉积方法或在给定表面上的各种位置上的这些性质的组合。 本发明还涉及使用超疏水表面性质的各种产品应用，例如电子设备，生物分析和诊断工具以及光学装置。
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