Abstract:
An exemplary actuator includes a motor, a transmission, and a support structure. The motor includes two torque sources that apply respective input torques to a rotor, which rotates about a rotation axis in response to a net input torque. The torque sources are arranged such that the input torques are additive, resulting in a vector-summated torque output. The torque sources also generate corresponding reactive torques that are applied to the first stator and the second stator. The transmission couples and constrains the first stator and the second stator such that rotational motion of one stator causes counter rotation of the other stator. Thus, the reactive torques are subtractive resulting a differential torque output. In some applications, the differential torque output is used to actuate a suspension of a vehicle. The actuator is also coupled to the vehicle via the support structure, which also reflects a reaction force or torque to actuate other subsystems (e.g., anti-dive, anti-squat).
Abstract:
An active wheel damper. An active suspension damps vertical displacement of an unsprung mass in a frequency range and reduces vertical displacement of a sprung mass in another frequency range.
Abstract:
A vehicle suspension and wheel damper using anti-causal filtering. Information from in front of a wheel or information about an operating condition of a vehicle is used to anti-causally determine a response of an active suspension associated with the wheel.
Abstract:
An apparatus comprises a linear electromagnetic actuator (200) which has a series of ferromagnetic poles (206), coils (302), and a series of permanent magnets (204) to interact with the poles to induce movement of the actuator along a path. The poles have non-uniform configurations.
Abstract:
At least one controller configured to control an actuator of an active suspension system. The at least one controller includes circuitry configured to determine an actuator state, and apply the actuator state and a commanded state to an inverse model of the actuator to produce an actuator command. The circuitry is configured to produce the actuator command by a process that includes performing low pass filtering and phase compensation to correct a phase introduced by the low pass filtering.
Abstract:
An actuator assembly includes a first motor having a first transmission mechanism, a second motor having a second transmission mechanism, and a drive shaft operatively coupled to the first transmission mechanism of the first motor and the second transmission mechanism of the second motor. The actuator assembly includes a torque application system disposed in operative communication with the first motor and the second motor, the torque application system configured to direct an application of a translation torque and a preload torque between the first motor and the first transmission mechanism and between the second motor and the second transmission mechanism.
Abstract:
Various systems and methods are disclosed for providing a broad range of tools for selecting a route based on road information, vehicle information, and vehicle occupant information. Also disclosed are costs and tradeoffs which may be associated with various choices including wear and tear on vehicle components, occupant discomfort, increased trip duration and efficiency losses.
Abstract:
The present invention provides a modular high repetition rate ultraviolet gas discharge laser light source (Fig. 1) with a beam delivery to a production line machine (2). The system includes an enclosed (4) and purged beam path (14C) with a beam pointing control (40A) (40B) (6) for delivery of the laser beam to a desired location such as the entrance port of the production line machine (2). In preferred embodiments, the production line machine is a lithography machine (2) and two separate discharge chambers (8)(10) are provided, one of which is a part of a master oscillator (8) producing a very narrow band seed beam (14A), which is amplified in the second discharge chamber (10). This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality.
Abstract:
The present invention provides a modular high repetition rate ultraviolet gas discharge laser light source (Fig. 1) with a beam delivery to a production line machine (2). The system includes an enclosed (4) and purged beam path (14C) with a beam pointing control (40A) (40B) (6) for delivery of the laser beam to a desired location such as the entrance port of the production line machine (2). In preferred embodiments, the production line machine is a lithography machine (2) and two separate discharge chambers (8)(10) are provided, one of which is a part of a master oscillator (8) producing a very narrow band seed beam (14A), which is amplified in the second discharge chamber (10). This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality.
Abstract:
The present invention provides a modular high repetition rate ultraviolet gas discharge laser light source with a beam delivery to a production line machine. The system includes an enclosed and purged beam path with beam pointing control for delivery the laser beam to a desired location such as the entrance port of the production line machine. Preferred embodiments include equipment for beam attenuation, equipment for automatic feedback beam alignment and equipment for accurate optics module positioning at installation and during maintenance. In preferred embodiments, the production line machine is a lithography machine and two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality. A pulse stretcher more than doubles the output pulse length resulting in a reduction in pulse power (mJ/ns) as compared to prior art laser systems. This preferred embodiment is capable of providing illumination at a lithography system wafer plane which is approximately constant throughout the operating life of the lithography system, despite substantial degradation of optical components.