公开(公告)号：WO2008130474A1

公开(公告)日：2008-10-30

申请号：PCT/US2008/003890

申请日：2008-03-25

Applicant: CYMER, INC. (a Nevada Corporation) ,  SANDSTROM, Richard, L. ,  CHUNG, Tae, H. ,  UJAZDOWSKI, Richard, C.

Inventor： SANDSTROM, Richard, L. ,  CHUNG, Tae, H. ,  UJAZDOWSKI, Richard, C.

IPC: H01S3/097

CPC classification number: H01S3/038 ,  H01S3/0381 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/225 ,  H01S3/2366

Abstract: Disclosed herein are systems and methods for extending one or both of the discharge electrodes in a transverse discharge gas laser chamber in which one or both the electrodes are subject to a dimensional change due to erosion. Electrode extension can be performed to increase the chamber life, increase laser performance over the life of the chamber, or both. Operationally, the inter-electrode spacing may be adjusted to maintain a specific target gap distance between the electrodes or to optimize a specific parameter of the laser output beam such as bandwidth, pulse-to-pulse energy stability, beam size, etc.

Abstract translation: 本文公开了用于在横向放电气体激光室中延伸一个或两个放电电极的系统和方法，其中一个或两个电极由于侵蚀而经受尺寸变化。 可以执行电极延伸以增加室的寿命，在室的寿命或两者都增加激光器性能。 可操作地，可以调整电极间间隔以维持电极之间的特定目标间隙距离或者优化激光输出光束的特定参数，例如带宽，脉冲到脉冲能量稳定性，光束尺寸等。

公开(公告)号：WO2007005512A3

公开(公告)日：2007-11-22

申请号：PCT/US2006025350

申请日：2006-06-28

Applicant: CYMER INC ,  CYBULSKI RAYMOND F ,  BERGSTEDT ROBERT A ,  PARTLO WILLIAM N ,  SANDSTROM RICHARD L ,  WANG GON

Inventor： CYBULSKI RAYMOND F ,  BERGSTEDT ROBERT A ,  PARTLO WILLIAM N ,  SANDSTROM RICHARD L ,  WANG GON

IPC: H01S3/22 ,  H01S3/03

CPC classification number: H01S3/03 ,  H01S3/034 ,  H01S3/036 ,  H01S3/1055 ,  H01S3/225

Abstract: A line narrowed gas discharge laser system and method of operating same is disclosed which may comprise a dispersive center wavelength selective element; a beam expander comprising a plurality of refractive elements; a refractive element positioning mechanism positioning at least one of the refractive elements to modify an angle of incidence of a laser light beam on the dispersive center wavelength selection element; each of the dispersive center wavelength selection element and the beam expander being aligned with each other and with a housing containing at least the dispersive center wavelength selection element; a housing positioning mechanism positioning the housing with respect to an optical axis of the gas discharge laser system. The dispersive element may comprise a grating and the beam expander may comprise a plurality of prisms. The housing may contain the dispersive center wavelength selective element and the beam expander. The housing positioning element may comprise a position locking mechanism.

Abstract translation: 公开了一种窄气体放电激光系统及其操作方法，其可以包括分散中心波长选择元件; 包括多个折射元件的光束扩展器; 折射元件定位机构，其定位折射元件中的至少一个，以改变激光束在分散中心波长选择元件上的入射角; 分散中心波长选择元件和扩束器中的每一个彼此对准并且至少包含分散中心波长选择元件的壳体; 壳体定位机构相对于气体放电激光系统的光轴定位壳体。 色散元件可以包括光栅，并且光束扩展器可以包括多个棱镜。 壳体可以包含分散中心波长选择元件和扩束器。 壳体定位元件可以包括位置锁定机构。

公开(公告)号：WO2007005512A2

公开(公告)日：2007-01-11

申请号：PCT/US2006/025350

申请日：2006-06-28

Applicant: CYMER, INC. ,  CYBULSKI, Raymond, F. ,  BERGSTEDT, Robert, A. ,  PARTLO, William, N. ,  SANDSTROM, Richard, L. ,  WANG, Gon

Inventor： CYBULSKI, Raymond, F. ,  BERGSTEDT, Robert, A. ,  PARTLO, William, N. ,  SANDSTROM, Richard, L. ,  WANG, Gon

IPC: H01S3/22 ,  H01S3/03

CPC classification number: H01S3/03 ,  H01S3/034 ,  H01S3/036 ,  H01S3/1055 ,  H01S3/225

Abstract: A line narrowed gas discharge laser system and method of operating same is disclosed which may comprise a dispersive center wavelength selective element; a beam expander comprising a plurality of refractive elements; a refractive element positioning mechanism positioning at least one of the refractive elements to modify an angle of incidence of a laser light beam on the dispersive center wavelength selection element; each of the dispersive center wavelength selection element and the beam expander being aligned with each other and with a housing containing at least the dispersive center wavelength selection element; a housing positioning mechanism positioning the housing with respect to an optical axis of the gas discharge laser system. The dispersive element may comprise a grating and the beam expander may comprise a plurality of prisms. The housing may contain the dispersive center wavelength selective element and the beam expander. The housing positioning element may comprise a position locking mechanism.

Abstract translation: 公开了一种线变窄的气体放电激光系统及其操作方法，其可以包括色散中心波长选择元件; 包括多个折射元件的扩束器; 折射元件定位机构，所述折射元件定位机构定位所述折射元件中的至少一个，以改变所述色散中心波长选择元件上的激光束的入射角; 色散中心波长选择元件和扩束器中的每一个彼此对齐并且与至少包含色散中心波长选择元件的外壳对齐; 壳体定位机构，其相对于气体放电激光系统的光轴定位壳体。 色散元件可以包括光栅，并且扩束器可以包括多个棱镜。 外壳可以包含色散中心波长选择元件和扩束器。 外壳定位元件可以包括位置锁定机构。

公开(公告)号：WO2006127886A2

公开(公告)日：2006-11-30

申请号：PCT/US2006/020215

申请日：2006-05-25

Applicant: CYMER, INC. ,  CARL ZEISS INDUSTRIELLE MESSTECHNIK GMBH ,  DAS, Palash, P. ,  HOFFMANN, Thomas ,  SANDSTROM, Richard, L. ,  BOUCKY, Otto ,  STUMPP, Ernst ,  MATZKOVITS, Berthold ,  HOELL, Michael ,  WALTHER, Joerg ,  BRENNER, Kurt ,  GRUPP, Guenter

Inventor： DAS, Palash, P. ,  HOFFMANN, Thomas ,  SANDSTROM, Richard, L. ,  BOUCKY, Otto ,  STUMPP, Ernst ,  MATZKOVITS, Berthold ,  HOELL, Michael ,  WALTHER, Joerg ,  BRENNER, Kurt ,  GRUPP, Guenter

IPC: G01B11/00

CPC classification number: B23K26/03 ,  B23K26/0006 ,  B23K26/0066 ,  B23K26/032 ,  B23K26/04 ,  B23K26/043 ,  B23K26/0622 ,  B23K26/0665 ,  B23K26/0738 ,  B23K26/083 ,  B23K37/0408 ,  B23K37/047 ,  B23K2201/18 ,  B23K2201/38 ,  B23K2203/56 ,  C30B13/22 ,  C30B29/06 ,  G01B21/00 ,  G03F7/70383 ,  G03F7/70583 ,  H01L27/1296

Abstract: Systems and methods are disclosed for focusing a beam for an interaction with a film deposited on a substrate wherein the focused beam defines a short axis and a long axis. In one aspect, the system may include a detecting system to analyze light reflected from the film on an image plane to determine whether the beam is focused in the short axis at the film. In still another aspect, a system may be provided for positioning a film (having an imperfect, non-planar surface) for interaction with a shaped line beam.

Abstract translation: 公开的系统和方法用于聚焦用于与沉积在基板上的膜相互作用的光束，其中聚焦光束限定短轴和长轴。 在一个方面，系统可以包括检测系统，以分析在图像平面上从胶片反射的光，以确定光束是否在胶片的短轴中聚焦。 在另一方面，可以提供一种用于定位用于与成形线束相互作用的胶片（具有不完美的非平面表面）的系统。

公开(公告)号：WO2006060360A3

公开(公告)日：2006-10-26

申请号：PCT/US2005043056

申请日：2005-11-28

Applicant: CYMER INC ,  ALGOTS MARTIN J ,  BERGSTEDT ROBERT A ,  GILLESPIE WALTER D ,  KULGEYKO VLADIMIR A ,  PARTLO WILLIAM N ,  RYLOV GERMAN E ,  SANDSTROM RICHARD L ,  STRATE BRIAN D ,  DYER TIMOTHY S

Inventor： ALGOTS MARTIN J ,  BERGSTEDT ROBERT A ,  GILLESPIE WALTER D ,  KULGEYKO VLADIMIR A ,  PARTLO WILLIAM N ,  RYLOV GERMAN E ,  SANDSTROM RICHARD L ,  STRATE BRIAN D ,  DYER TIMOTHY S

IPC: H01S3/22

CPC classification number: H01S3/1055 ,  G03F7/70025 ,  G03F7/70041 ,  H01S3/005 ,  H01S3/036 ,  H01S3/08 ,  H01S3/08004 ,  H01S3/08059 ,  H01S3/097 ,  H01S3/106 ,  H01S3/2251

Abstract: A line narrowing method and module for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses, the module having a nominal optical path are disclosed which may comprise: a dispersive center wavelength selection optic moveably mounted within an optical path of the line narrowing module, selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a first tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic, by selecting an angle of transmission of the laser light pulse beam containing the pulse toward the dispersive center wavelength selection optic; a second tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse by changing the position of the dispersive center wavelength selection optic relative to the nominal optical path of the line narrowing module; wherein the second tuning mechanism coarsely selects a value for the center wavelength and the first tuning mechanism more finely selects the value for the center wavelength.

Abstract translation: 一种用于窄带DUV大功率高重复率气体放电激光器的线窄化方法和模块，其产生具有标称光路的脉冲串中的输出激光束脉冲束脉冲，其可以包括：分散中心波长选择光学器件 可移动地安装在线路窄化模块的光路内，为至少部分地由分散波长选择光学器件上包含相应脉冲的激光束的入射角确定的每个脉冲选择至少一个中心波长; 第一调谐机构部分地通过选择包含脉冲朝向分散中心的激光束的透射角度来选择包含分散中心波长选择光学器件上的各个脉冲的激光束的入射角 波长选择光学; 第二调谐机构部分地通过改变色散中心波长选择光学器件相对于线条变窄模块的标称光路的位置来选择包含相应脉冲的激光束的入射角; 其中第二调谐机构粗略地选择中心波长的值，并且第一调谐机构更精细地选择中心波长的值。

公开(公告)号：WO2005089130A2

公开(公告)日：2005-09-29

申请号：PCT/US2005007056

申请日：2005-03-03

Applicant: CYMER INC ,  AKINS ROBERT P ,  SANDSTROM RICHARD L ,  PARTLO WILLIAM N ,  FOMENKOV IGOR V ,  STEIGER THOMAS D ,  ALGOTS MARTIN J ,  BOWERING NORBERT R ,  JACQUES ROBERT N ,  PALENSCHAT FREDERICK A ,  SONG JUN

Inventor： AKINS ROBERT P ,  SANDSTROM RICHARD L ,  PARTLO WILLIAM N ,  FOMENKOV IGOR V ,  STEIGER THOMAS D ,  ALGOTS MARTIN J ,  BOWERING NORBERT R ,  JACQUES ROBERT N ,  PALENSCHAT FREDERICK A ,  SONG JUN

IPC: G01J1/00 ,  G03F7/20 ,  H01J65/04 ,  H05G2/00

CPC classification number: B82Y10/00 ,  G03F7/70033 ,  H05G2/003 ,  H05G2/008

Abstract: An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interval coordinated with the laser pulse repetition rate; a target steering system intermediate the target formation system and the desired target ignition site; and a target tracking system providing information about the movement of target between the target formation system and the target steering system, enabling the target steering system to direct the target to the desired target ignition site. The target tracking system may provide information enabling the creation of a laser firing control signal, and may comprise a droplet detector comprising a collimated light source directed to intersect a point on a projected delivery path of the target, having a respective oppositely disposed light detector detecting the passage of the target through the respective point, or a detector comprising a linear array of a plurality of photo-sensitive elements aligned to a coordinate axis, the light from the light source intersecting a projected delivery path of the target, at least one of the which may comprise a plane-intercept detection device. The droplet detectors may comprise a plurality of droplet detectors each operating at a different light frequency, or a camera having a field of view and a two dimensional array of pixels imaging the field of view. The apparatus and method may comprise an electrostatic plasma containment apparatus providing an electric plasma confinement field at or near a target ignition site at the time of ignition, with the target tracking system providing a signal enabling control of the electrostatic plasma containment apparatus. The apparatus and method may comprise a vessel having and intermediate wall with a low pressure trap allowing passage of EUV light and maintaining a differential pressure across the low pressure trap. The apparatus and method may comprise a magnetic plasma confinement mechanism creating a magnetic field in the vicinity of the target ignition site to confine the plasma to the target ignition site, which may be pulsed and may be controlled using outputs from the target tracking system.

Abstract translation: 公开了一种EUV光源装置和方法，其可以包括脉冲激光，其以所选择的脉冲重复频率提供激光脉冲，聚焦在期望的目标点火部位; 目标形成系统，以与激光脉冲重复率配合的选定间隔提供离散目标; 目标转向系统在目标地层系统和期望的目标点火站点之间; 以及目标跟踪系统，其提供关于目标形成系统和目标转向系统之间的目标移动的信息，使得目标转向系统能够将目标定向到期望的目标点火点。 目标跟踪系统可以提供能够创建激光点火控制信号的信息，并且可以包括液滴检测器，该液滴检测器包括指向与靶的投影传送路径上的点相交的准直光源，具有相应的相对设置的光检测器检测 目标通过相应点的通道，或包括与坐标轴对准的多个光敏元件的线性阵列的检测器，来自光源的光与目标的投影传送路径相交，至少一个 其可以包括平面截距检测装置。 液滴检测器可以包括以不同光频率操作的多个液滴检测器，或者具有视场的摄像机和成像视场的二维像素阵列。 该装置和方法可以包括静电等离子体容纳装置，其在点火时在目标点火点处或附近提供等离子体限制场，目标跟踪系统提供能够控制静电等离子体容纳装置的信号。 该装置和方法可以包括具有中间壁的容器和具有低压阱的容器，其允许EUV光通过并且保持横跨低压阱的压差。 该装置和方法可以包括磁性等离子体限制机构，其在目标点火点附近产生磁场，以将等离子体限制在目标点火位置，该目标点火点可以是脉冲的并且可以使用来自目标跟踪系统的输出进行控制。

公开(公告)号：WO2004012308A2

公开(公告)日：2004-02-05

申请号：PCT/US2003/024146

申请日：2003-07-30

Applicant: CYMER, INC. ,  FALLON, John, P. ,  RULE, John, A. ,  JACQUES, Robert, N. ,  LIPCON, Jacob, P. ,  SANDSTROM, Richard, L. ,  PARTLO, William, N. ,  ERSHOV, Alexander I. ,  ISHIHARA, Toshihiko ,  MEISNER, John ,  NESS, Richard, M. ,  MELCHER, Paul, C.

Inventor： FALLON, John, P. ,  RULE, John, A. ,  JACQUES, Robert, N. ,  LIPCON, Jacob, P. ,  SANDSTROM, Richard, L. ,  PARTLO, William, N. ,  ERSHOV, Alexander I. ,  ISHIHARA, Toshihiko ,  MEISNER, John ,  NESS, Richard, M. ,  MELCHER, Paul, C.

IPC: H01S

CPC classification number: H01S3/2333 ,  H01S3/036 ,  H01S3/134 ,  H01S3/225 ,  H01S3/2366

Abstract: The present invention provides a control system for a modular high repetition rate two discharge chamber ultra violet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include: (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F 2 injection controls with novel learning algorithm.

Abstract translation: 本发明提供了一种用于模块化高重复率两放电室紫外线气体放电激光器的控制系统。 在优选实施例中，激光器是具有主振荡器的生产线机器，该主振荡器产生在第二放电室中放大的非常窄的带状晶体束。 特别适用于双室气体放电激光系统的新型控制功能包括：（1）脉冲能量控制，具有纳秒定时精度（2）精确脉冲到脉冲波长控制，具有高速和极速波长调谐（3）快速响应气体 温度控制和（4）F2注入控制与新的学习算法。

公开(公告)号：WO2003021728A3

公开(公告)日：2003-03-13

申请号：PCT/US2002/027925

申请日：2002-08-28

Applicant: CYMER, INC. ,  KNOWLES, David, S. ,  BROWN, Daniel, J., W. ,  BESAUCELE, Herve, A. ,  MYERS, David, W. ,  ERSHOV, Alexander, I. ,  PARTLO, William, N. ,  SANDSTROM, Richard, L. ,  DAS, Plash, P. ,  ANDERSON, Stuart, L. ,  FOMENKOV, Igor, V. ,  UJAZDOWSKI, Richard, C. ,  ONKELS, Eckehard, D. ,  NESS, Richard, M. ,  SMITH, Scott, T. ,  HULBURD, William, G. ,  OICLES, Jeffrey

Inventor： KNOWLES, David, S. ,  BROWN, Daniel, J., W. ,  BESAUCELE, Herve, A. ,  MYERS, David, W. ,  ERSHOV, Alexander, I. ,  PARTLO, William, N. ,  SANDSTROM, Richard, L. ,  DAS, Plash, P. ,  ANDERSON, Stuart, L. ,  FOMENKOV, Igor, V. ,  UJAZDOWSKI, Richard, C. ,  ONKELS, Eckehard, D. ,  NESS, Richard, M. ,  SMITH, Scott, T. ,  HULBURD, William, G. ,  OICLES, Jeffrey

IPC: H01S3/11

Abstract: An injection seeded modular gas discharge laser system (2) capable of producing high quality pulsed beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator (10) producing a very narrow band seed beam, which is amplified (12) in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in the ArF excimer laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan (10A) providing sufficient gas flow to permit operation at pulse rates of 4,000 Hz or greater by cleaning debris from the discharge region in less time that the approximately 0.25 milliseconds between pulses. The masters oscillation is equipped with a line narrowing package having a very fast tuning mirror capable of controlling centerline wavelength on a pulse-to-pulse basis at repetition rates of 4000 Hz or greater to a precision of less than 0.2 pm.

公开(公告)号：WO2002061388A3

公开(公告)日：2002-08-08

申请号：PCT/US2002/002453

申请日：2002-01-28

Applicant: CYMER, INC. ,  SANDSTROM, Richard, L. ,  ERSHOV, Alexander, I. ,  FOMENKOV, Igor, V. ,  BROWN, Daniel, J., W. ,  SMITH, Scott, T.

Inventor： SANDSTROM, Richard, L. ,  ERSHOV, Alexander, I. ,  FOMENKOV, Igor, V. ,  BROWN, Daniel, J., W. ,  SMITH, Scott, T.

IPC: G01B9/02

Abstract: A high resolution etalon-grating spectrometer or monochromator. A preferred embodiment presents as extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser (D) and the diffused light exiting the diffuser illuminates an etalon (ET). A portion of its light exiting the etalon is collected and directed into a slit positioned at a fringe pattern of the etalon. Light passing through the slit is collimated (L3) and the collimated light illuminates a grating (GR1) positioned in an approximately Littrow configuration which disperses the light according to wavelength. A portion of the dispersed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit (2) and monitored by a light detector (PMT). When the etalon and the grating are tuned to the same precise wavelength a slit function is defined which is extremely narrow as about 0.034pm "FWHM" and about 0.091pm "95 percent integral". The etalon and the grating are placed in a leak-tight containment (50) filled with a gas, such a nitrogen or helium.

公开(公告)号：WO0199246A3

公开(公告)日：2002-02-28

申请号：PCT/US0113863

申请日：2001-04-30

Applicant: CYMER INC ,  SPANGLER RONALD L ,  JACQUES ROBERT N ,  EVERAGE GEORGE J ,  ANDERSON STUART L ,  PALENSCHAT FREDERICK A ,  FOMENKOV IGOR V ,  SANDSTROM RICHARD L ,  PARTLO WILLIAM N ,  ALGOTS JOHN M ,  BROWN DANIEL J W

Inventor： SPANGLER RONALD L ,  JACQUES ROBERT N ,  EVERAGE GEORGE J ,  ANDERSON STUART L ,  PALENSCHAT FREDERICK A ,  FOMENKOV IGOR V ,  SANDSTROM RICHARD L ,  PARTLO WILLIAM N ,  ALGOTS JOHN M ,  BROWN DANIEL J W

IPC: H01S3/137 ,  G03F7/20 ,  H01S3/036 ,  H01S3/038 ,  H01S3/04 ,  H01S3/041 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/11 ,  H01S3/13 ,  H01S3/131 ,  H01S3/134 ,  H01S3/22 ,  H01S3/225

CPC classification number: G03F7/70025 ,  G03F7/70041 ,  G03F7/70333 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/02 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08036 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/1312 ,  H01S3/134 ,  H01S3/137 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/225

Abstract: Fast wavelenght correction equipment for an electric discharge laser includes at least one piezoelectic drive (80) and a fast wavelength measurement system and a fast feedback response time. In a preferred embodiment equipment is provided to control wavelength on a slow, intermediate amd fast time scales, which vary in range from several milliseconds to a few microseconds respectively. Techniques include a combination of a relatively slow stepper motor (82) and a very fast piezoelectric drive (80) for tuning the laser wavelength using a tuning mirror (14).

Abstract translation: 用于放电激光器的快速波长校正设备包括至少一个压电驱动器（80）和快速波长测量系统以及快速反馈响应时间。 在优选实施例中，提供了设备来控制在缓慢的，中间的快速时间尺度上的波长，其分别在几毫秒至几微秒的范围内变化。 技术包括相对较慢的步进电机（82）和非常快的压电驱动器（80）的组合，用于使用调谐镜（14）来调谐激光波长。