公开(公告)号：WO0198012A3

公开(公告)日：2002-05-16

申请号：PCT/US0116985

申请日：2001-05-23

Applicant: CYMER INC ,  NEWMAN PETER C ,  DUFFEY THOMAS P ,  PARTLO WILLIAM N ,  SANDSTROM RICHARD L ,  MECHER PAUL C ,  JOHNS DAVID M ,  SAETHRE ROBERT B ,  FLEUROV VLADIMIR B ,  NESS RICHARD M ,  RETTIG CURTIS L ,  SHANNON ROBERT A ,  UJAZDOWSKI RICHARD C ,  ROKNI SHAHRYAR ,  PAN XIAOJIANG J ,  KULGEYKO VLADIMIR ,  SMITH SCOTT T ,  ANDERSON STUART L ,  ALGOTS JOHN M ,  SPANGLER RONALD L ,  FOMENKOV IGOR V

Inventor： NEWMAN PETER C ,  DUFFEY THOMAS P ,  PARTLO WILLIAM N ,  SANDSTROM RICHARD L ,  MECHER PAUL C ,  JOHNS DAVID M ,  SAETHRE ROBERT B ,  FLEUROV VLADIMIR B ,  NESS RICHARD M ,  RETTIG CURTIS L ,  SHANNON ROBERT A ,  UJAZDOWSKI RICHARD C ,  ROKNI SHAHRYAR ,  PAN XIAOJIANG J ,  KULGEYKO VLADIMIR ,  SMITH SCOTT T ,  ANDERSON STUART L ,  ALGOTS JOHN M ,  SPANGLER RONALD L ,  FOMENKOV IGOR V

IPC: H01S3/134 ,  G01J1/42 ,  G01J9/00 ,  G03F7/20 ,  H01S3/036 ,  H01S3/038 ,  H01S3/04 ,  H01S3/041 ,  H01S3/08 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/102 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/11 ,  H01S3/13 ,  H01S3/131 ,  H01S3/137 ,  H01S3/139 ,  H01S3/22 ,  H01S3/223 ,  H01S3/225

CPC classification number: H01S3/225 ,  G01J1/4257 ,  G01J3/027 ,  G01J9/0246 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70333 ,  G03F7/70483 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/02 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0387 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/1024 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/137 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2308

Abstract: The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5mJ or greater. A preferred embodiments is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.

Abstract translation: 本发明提供一种准分子激光器，其能够在约5mJ或更大的脉冲能量下以约4,000Hz的脉冲速率产生高质量的脉冲激光束。 优选的实施方案是专门设计为用于集成电路光刻的光源的ArF准分子激光器。 具有特殊软件的改进型波长测量仪监测输出光束参数，并控制非常快的PZT驱动调光镜和脉冲功率充电电压，以将波长和脉冲能量保持在所需的限度内。 在优选实施例中，两个风扇马达驱动单个切向风扇，其提供足够的气流以在脉冲之间的大约0.25毫秒期间从放电区域清除放电碎片。

公开(公告)号：WO2002093702A1

公开(公告)日：2002-11-21

申请号：PCT/US2002/012200

申请日：2002-04-17

Applicant: CYMER, INC. ,  PARTLO, William, N. ,  SANDSTROM, Richard, L. ,  GLATZEL, Holger, K. ,  CYBULSKI, Ray, F. ,  NEWMAN, Peter, C. ,  HOWEY, James, K. ,  HULBURD, William ,  MELCHIOR, John, T. ,  IVASCHENKO, Alex, P.

Inventor： PARTLO, William, N. ,  SANDSTROM, Richard, L. ,  GLATZEL, Holger, K. ,  CYBULSKI, Ray, F. ,  NEWMAN, Peter, C. ,  HOWEY, James, K. ,  HULBURD, William ,  MELCHIOR, John, T. ,  IVASCHENKO, Alex, P.

IPC: H01S3/22

CPC classification number: G03F7/70025 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/0057 ,  H01S3/02 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0401 ,  H01S3/041 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/1024 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2366

Abstract: An excimer laser with a purged beam path capable of producing a high quality pulsed laser beam at pulse rates in excess of 2,000 Hz at pulse energies of about 5mJ or greater. The entire purged beam path through the laser system is sealed to minimize contamination of the beam path. A preferred embodiment comprises a thermally decoupled LNP aperture element (70A) to minimize thermal distortions in the LNP (54). This preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. A wavemeter (7) is provided with a special purge of a compartment exposed to the output laser beam.

Abstract translation: 具有清除光束路径的准分子激光器，其能够以大约5mJ或更大的脉冲能量产生超过2000Hz的脉冲速率的高质量脉冲激光束。 通过激光系统的整个清除的光束路径被密封以最小化光束路径的污染。 优选实施例包括热去耦LNP孔元件（70A），以最小化LNP（54）中的热失真。 该优选实施例是专门设计为用于集成电路光刻的光源的ArF准分子激光器。 波导计（7）具有暴露于输出激光束的隔室的特殊吹扫。

公开(公告)号：WO2002061897A1

公开(公告)日：2002-08-08

申请号：PCT/US2002/000958

申请日：2002-01-14

Applicant: CYMER, INC. ,  NEWMAN, Peter, C. ,  VAN DOORN, John ,  FULLEN, Darrell, W. ,  CLOPTON, William, H. ,  ROKNI, Shahryar

Inventor： NEWMAN, Peter, C. ,  VAN DOORN, John ,  FULLEN, Darrell, W. ,  CLOPTON, William, H. ,  ROKNI, Shahryar

IPC: H01S3/22

CPC classification number: G03F7/70025 ,  G03F7/70041 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/225

Abstract: A laser component purge system for discharge lasers. The LNP (2), the output coupler and the wavemeter (14) are contained in sealed chambers each having a purge inlet port and a purge outlet port. Purge gas such as N 2 is directed to each of the inlet ports. A purge monitoring system (17) is provided which monitors the purge flow and provides one or more signals to a processor which is programmed to minimize laser timeouts attributable to purge conditions without endangering the purged optical components. In a preferred embodiment, gas exiting the outlet ports are directed to flow monitors which provide the one or more signals to the processor. Purge gas may be exhausted or recirculated.

Abstract translation: 用于放电激光器的激光元件清除系统。 LNP（2），输出耦合器和波形计（14）包含在各自具有净化入口和净化出口的密封室中。 吹扫气体如N 2被引导到每个入口端口。 提供清洗监测系统（17），其监测吹扫流量并向处理器提供一个或多个信号，该处理器被编程为使归因于吹扫条件的激光器超时最小化，而不危及清洗的光学部件。 在优选实施例中，离开出口的气体被引导到向处理器提供一个或多个信号的流量监视器。 吹扫气体可能被排出或再循环。

公开(公告)号：WO0198012A9

公开(公告)日：2002-06-13

申请号：PCT/US0116985

申请日：2001-05-23

Applicant: CYMER INC ,  NEWMAN PETER C ,  DUFFEY THOMAS P ,  PARTLO WILLIAM N ,  SANDSTROM RICHARD L ,  MECHER PAUL C ,  JOHNS DAVID M ,  SAETHRE ROBERT B ,  FLEUROV VLADIMIR B ,  NESS RICHARD M ,  RETTIG CURTIS L ,  SHANNON ROBERT A ,  UJAZDOWSKI RICHARD C ,  ROKNI SHAHRYAR ,  PAN XIAOJIANG J ,  KULGEYKO VLADIMIR ,  SMITH SCOTT T ,  ANDERSON STUART L ,  ALGOTS JOHN M ,  SPANGLER RONALD L ,  FOMENKOV IGOR V

Inventor： NEWMAN PETER C ,  DUFFEY THOMAS P ,  PARTLO WILLIAM N ,  SANDSTROM RICHARD L ,  MECHER PAUL C ,  JOHNS DAVID M ,  SAETHRE ROBERT B ,  FLEUROV VLADIMIR B ,  NESS RICHARD M ,  RETTIG CURTIS L ,  SHANNON ROBERT A ,  UJAZDOWSKI RICHARD C ,  ROKNI SHAHRYAR ,  PAN XIAOJIANG J ,  KULGEYKO VLADIMIR ,  SMITH SCOTT T ,  ANDERSON STUART L ,  ALGOTS JOHN M ,  SPANGLER RONALD L ,  FOMENKOV IGOR V

IPC: H01S3/134 ,  G01J1/42 ,  G01J9/00 ,  G03F7/20 ,  H01S3/036 ,  H01S3/038 ,  H01S3/04 ,  H01S3/041 ,  H01S3/08 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/102 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/11 ,  H01S3/13 ,  H01S3/131 ,  H01S3/137 ,  H01S3/139 ,  H01S3/22 ,  H01S3/223 ,  H01S3/225

CPC classification number: H01S3/225 ,  G01J1/4257 ,  G01J3/027 ,  G01J9/0246 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70333 ,  G03F7/70483 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/02 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0387 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/1024 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/137 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2308

Abstract: The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5mJ or greater. A preferred embodiments is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.

Abstract translation: 本发明提供了一种准分子激光器，其能够在约5mJ或更大的脉冲能量下以大约4,000Hz的脉冲速率产生高质量脉冲激光束。 一个优选的实施方案是专门设计为用于集成电路光刻的光源的ArF准分子激光器。 改进的波长计配有专用软件，可监测输出光束参数，并控制非常快速的PZT驱动调谐镜和脉冲功率充电电压，以将波长和脉冲能量保持在期望的限制范围内。 在一个优选实施例中，两个风扇马达驱动单个切向风扇，其提供足够的气流以在脉冲之间的大约0.25毫秒期间清除来自放电区域的放电碎片。