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    A HIGH REPETITION RATE LASER PRODUCED PLASMA EUV LIGHT SOURCE
    4.
    发明申请
    A HIGH REPETITION RATE LASER PRODUCED PLASMA EUV LIGHT SOURCE 审中-公开
    高重复率激光器生产等离子体光源

    公开(公告)号：WO2005089130A2

    公开(公告)日：2005-09-29

    申请号：PCT/US2005007056

    申请日：2005-03-03

    Applicant: CYMER INC ,  AKINS ROBERT P ,  SANDSTROM RICHARD L ,  PARTLO WILLIAM N ,  FOMENKOV IGOR V ,  STEIGER THOMAS D ,  ALGOTS MARTIN J ,  BOWERING NORBERT R ,  JACQUES ROBERT N ,  PALENSCHAT FREDERICK A ,  SONG JUN

    Inventor： AKINS ROBERT P ,  SANDSTROM RICHARD L ,  PARTLO WILLIAM N ,  FOMENKOV IGOR V ,  STEIGER THOMAS D ,  ALGOTS MARTIN J ,  BOWERING NORBERT R ,  JACQUES ROBERT N ,  PALENSCHAT FREDERICK A ,  SONG JUN

    IPC: G01J1/00 ,  G03F7/20 ,  H01J65/04 ,  H05G2/00

    CPC classification number: B82Y10/00 ,  G03F7/70033 ,  H05G2/003 ,  H05G2/008

    Abstract: An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interval coordinated with the laser pulse repetition rate; a target steering system intermediate the target formation system and the desired target ignition site; and a target tracking system providing information about the movement of target between the target formation system and the target steering system, enabling the target steering system to direct the target to the desired target ignition site. The target tracking system may provide information enabling the creation of a laser firing control signal, and may comprise a droplet detector comprising a collimated light source directed to intersect a point on a projected delivery path of the target, having a respective oppositely disposed light detector detecting the passage of the target through the respective point, or a detector comprising a linear array of a plurality of photo-sensitive elements aligned to a coordinate axis, the light from the light source intersecting a projected delivery path of the target, at least one of the which may comprise a plane-intercept detection device. The droplet detectors may comprise a plurality of droplet detectors each operating at a different light frequency, or a camera having a field of view and a two dimensional array of pixels imaging the field of view. The apparatus and method may comprise an electrostatic plasma containment apparatus providing an electric plasma confinement field at or near a target ignition site at the time of ignition, with the target tracking system providing a signal enabling control of the electrostatic plasma containment apparatus. The apparatus and method may comprise a vessel having and intermediate wall with a low pressure trap allowing passage of EUV light and maintaining a differential pressure across the low pressure trap. The apparatus and method may comprise a magnetic plasma confinement mechanism creating a magnetic field in the vicinity of the target ignition site to confine the plasma to the target ignition site, which may be pulsed and may be controlled using outputs from the target tracking system.

    Abstract translation: 公开了一种EUV光源装置和方法，其可以包括脉冲激光，其以所选择的脉冲重复频率提供激光脉冲，聚焦在期望的目标点火部位; 目标形成系统，以与激光脉冲重复率配合的选定间隔提供离散目标; 目标转向系统在目标地层系统和期望的目标点火站点之间; 以及目标跟踪系统，其提供关于目标形成系统和目标转向系统之间的目标移动的信息，使得目标转向系统能够将目标定向到期望的目标点火点。 目标跟踪系统可以提供能够创建激光点火控制信号的信息，并且可以包括液滴检测器，该液滴检测器包括指向与靶的投影传送路径上的点相交的准直光源，具有相应的相对设置的光检测器检测 目标通过相应点的通道，或包括与坐标轴对准的多个光敏元件的线性阵列的检测器，来自光源的光与目标的投影传送路径相交，至少一个 其可以包括平面截距检测装置。 液滴检测器可以包括以不同光频率操作的多个液滴检测器，或者具有视场的摄像机和成像视场的二维像素阵列。 该装置和方法可以包括静电等离子体容纳装置，其在点火时在目标点火点处或附近提供等离子体限制场，目标跟踪系统提供能够控制静电等离子体容纳装置的信号。 该装置和方法可以包括具有中间壁的容器和具有低压阱的容器，其允许EUV光通过并且保持横跨低压阱的压差。 该装置和方法可以包括磁性等离子体限制机构，其在目标点火点附近产生磁场，以将等离子体限制在目标点火位置，该目标点火点可以是脉冲的并且可以使用来自目标跟踪系统的输出进行控制。

    DISCHARGE PRODUCED PLASMA EUV LIGHT SOURCE
    8.
    发明申请
    DISCHARGE PRODUCED PLASMA EUV LIGHT SOURCE 审中-公开
    排放生产等离子体光源

    公开(公告)号：WO2004081503A2

    公开(公告)日：2004-09-23

    申请号：PCT/US2004/006551

    申请日：2004-03-03

    Applicant: CYMER, INC. ,  PARTLO, William, N. ,  BLUMENSTOCK, Gerry, M. ,  BOWERING, Norbert ,  BRUZZONE, Kent, A. ,  COBB, Dennis, W. ,  DYER, Timothy, S. ,  DUNLOP, John ,  FOMENKOV, Igor, V. ,  HYSHAM, James, Christopher ,  OLIVER, Roger, I. ,  PALENSCHAT, Frederick, A. ,  PAN, Xiaojiang, J. ,  RETTIG, Curtis, L. ,  SIMMONS, Rodney, S. ,  WALKER, John ,  WEBB, Kyle, R. ,  HOFMANN, Thomas

    Inventor： PARTLO, William, N. ,  BLUMENSTOCK, Gerry, M. ,  BOWERING, Norbert ,  BRUZZONE, Kent, A. ,  COBB, Dennis, W. ,  DYER, Timothy, S. ,  DUNLOP, John ,  FOMENKOV, Igor, V. ,  HYSHAM, James, Christopher ,  OLIVER, Roger, I. ,  PALENSCHAT, Frederick, A. ,  PAN, Xiaojiang, J. ,  RETTIG, Curtis, L. ,  SIMMONS, Rodney, S. ,  WALKER, John ,  WEBB, Kyle, R. ,  HOFMANN, Thomas

    IPC: G01J

    CPC classification number: H01S3/005 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70908 ,  G03F7/70916 ,  H01S3/225 ,  H05G2/003 ,  H05G2/005 ,  H05H1/06

    Abstract: An DPP EUV source is disclosed which may comprise a debris mitigation apparatus employing a metal halogen gas producing a metal halide from debris exiting the plasma. The EUV source may have a debris shield that may comprise a plurality of curvilinear shield members having inner and outer surfaces connected by light passages aligned to a focal point, which shield members may be alternated with open spaces between them and may have surfaces that form a circle in one axis of rotation and an ellipse in another. The electrodes may be supplied with a discharge pulse shaped to produce a modest current during the axial run out phase of the discharge and a peak occurring during the radial compression phase of the discharge. The light source may comprise a turbomolecular pump having an inlet connected to the generation chamber and operable to preferentially pump more of the source gas than the buffer gas from the chamber. The source may comprise a tuned electrically conductive electrode comprising: a differentially doped ceramic material doped in a first region to at least select electrical conductivity and in a second region at least to select thermal conductivity. The first region may be at or near the outer surface of the electrode structure and the ceramic material may be SiC or alumina and the dopant is BN or a metal oxide, including SiO or TiO 2 . The source may comprise a moveable electrode assembly mount operative to move the electrode assembly mount from a replacement position to an operating position, with the moveable mount on a bellows. The source may have a temperature control mechanism operatively connected to the collector and operative to regulate the temperature of the respective shell members to maintain a temperature related geometry optimizing the glancing angle of incidence reflections from the respective shell members, or a mechanical positioner to position the shell members. The shells may be biased with a voltage. The debris shield may be fabricated using off focus laser radiation. The anode may be cooled with a hollow interior defining two coolant passages or porous metal defining the passages. The debris shield may be formed of pluralities of large, intermediate and small fins attached either to a mounting ring or hub or to each other with interlocking tabs that provide uniform separation and strengthening and do not block any significant amount of light.

    Abstract translation: 公开了一种DPP EUV源，其可以包括使用从离开等离子体的碎片产生金属卤化物的金属卤素气体的碎片减缓装置。 EUV源可以具有碎片屏蔽，其可以包括多个曲线屏蔽构件，其具有通过与焦点对准的光通道连接的内表面和外表面，该屏蔽构件可以与它们之间的开放空间交替，并且可以具有形成 在一个旋转轴上的圆圈和另一个轴上的椭圆。 电极可以被供给放电脉冲，该放电脉冲在放电的轴向耗尽阶段期间产生适度的电流，并且在放电的径向压缩阶段期间发生峰值。 光源可以包括涡轮分子泵，其具有连接到发电室的入口，并且可操作以比来自该室的缓冲气体优先地泵送更多的源气体。 源可以包括调谐的导电电极，包括：掺杂在第一区域中以至少选择电导率的差分掺杂陶瓷材料，并且在第二区域中至少选择导热性。 第一区域可以在电极结构的外表面处或附近，并且陶瓷材料可以是SiC或氧化铝，并且掺杂剂是BN或包括SiO或TiO 2的金属氧化物。 源可以包括可移动电极组件安装件，其可操作以将电极组件安装座从更换位置移动到操作位置，可移动安装件在波纹管上。 源可以具有可操作地连接到收集器的温度控制机构，并且可操作地调节相应壳体部件的温度，以保持温度相关几何形状优化来自相应外壳部件的入射反射的扫掠角，或机械定位器 壳成员。 壳可能会被电压偏置。 可以使用离焦激光辐射来制造碎片屏蔽。 阳极可以用限定两个冷却剂通道或限定通道的多孔金属的中空内部冷却。 碎片屏蔽可以由连接到安装环或轮毂的多个大的，中间的和小的翅片形成，或者彼此具有提供均匀分离和强化并且不阻挡任何显着量的光的互锁突起。

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