公开(公告)号：WO2008042137A2

公开(公告)日：2008-04-10

申请号：PCT/US2007/020575

申请日：2007-09-24

Applicant: MICRON TECHNOLOGY, INC ,  BAKIN, Dmitry ,  SMITH, Scott, T. ,  VENKATARAMAN, Kartik

Inventor： BAKIN, Dmitry ,  SMITH, Scott, T. ,  VENKATARAMAN, Kartik

IPC: H01L27/146 ,  H04N5/217

CPC classification number: H04N5/217 ,  G06T1/0007 ,  H01L27/14618 ,  H01L27/14625 ,  H01L27/14627 ,  H01L2924/0002 ,  H04N5/2254 ,  H04N5/3415 ,  H01L2924/00

Abstract: Various exemplary embodiments of the invention provide an extended depth of field. One embodiment provides an image restoration procedure, comprising determining sample point pixels from a pixel array based upon a distance of an object being imaged to the pixel array, and reading intensities of the sample point pixels into a memory. Another embodiment provides an image capture procedure comprising capturing light rays on a pixel array of an imaging sensor, wherein specific sampling point pixels are selected to be evaluated based on spread of an image spot across a based on spread of an image spot across the plurality of pixels of the pixel array plurality of pixels of the pixel array.

Abstract translation: 本发明的各种示例性实施例提供了扩展的景深。 一个实施例提供了一种图像恢复过程，包括基于成像到像素阵列的对象的距离来确定来自像素阵列的采样点像素，并且将采样点像素的强度读取到存储器中。 另一个实施例提供了一种图像捕获过程，包括捕获成像传感器的像素阵列上的光线，其中选择特定的采样点像素以基于图像点跨越多个像素 像素阵列的像素阵列多个像素的像素。

公开(公告)号：WO2003078940A2

公开(公告)日：2003-09-25

申请号：PCT/US2003/002052

申请日：2003-01-15

Applicant: CYMER, INC. ,  SANDSTROM, Richard, L. ,  ERSHOV, Alexander, I. ,  PARTLO, William, N. ,  FOMENKOV, Igor, V. ,  SMITH, Scott, T. ,  BROWN, Daniel, J., W.

Inventor： SANDSTROM, Richard, L. ,  ERSHOV, Alexander, I. ,  PARTLO, William, N. ,  FOMENKOV, Igor, V. ,  SMITH, Scott, T. ,  BROWN, Daniel, J., W.

IPC: G01J

CPC classification number: G01J3/26 ,  G01J1/4257 ,  G01J3/02 ,  G01J3/0205 ,  G01J3/12 ,  G01J3/1804 ,  G01J3/22 ,  G01J9/02

Abstract: A high resolution spectral measurement device. A preferred embodiment presents an extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow-band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser and the diffused light exiting the diffuser illuminates an etalon. A portion of its light exiting the etalon is collected and directed into a slit positioned at a fringe pattern of the etalon. Light passing through the slit is collimated and the collimated light illuminates a grating positioned in an approximately Littrow configuration which disburses the light according to wavelength. A portion of the dispursed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit and monitored by a light detector. When the etalon and the grating are tuned to the same precise wavelength a slit function is defined which is extremely narrow such as about 0.034pm (FWHM) and about 0.091pm (95 percent integral). The bandwidth of a laser beam can be measured very accurately by a directing portion of the laser beam into the insulator and scanning the laser wavelength over a range which includes the monochromator slit wavelength. In a second embodiment the second slit and the light detector is replaced by a photodiode array and the bandwidth of a laser beam is determined by analyzing a set of scan data from the photodiode array. Alternately, the laser wavelength can be fixed near the middle of the spectrum range of the grating spectrometer, and the etalon can be scanned.

Abstract translation: 高分辨率光谱测量装置。 优选的实施例在紫外线范围内呈现非常窄的狭缝功能，并且对于测量用于集成电路光刻的窄带准分子激光器的带宽是非常有用的。 来自激光器的光聚焦成漫射器，离散扩散器的散射光照射标准具。 将其从标准具出射的光的一部分收集并引导到位于标准具的边缘图案处的狭缝中。 通过狭缝的光线被准直，并且准直光照射位于大约Littrow配置中的光栅，其根据波长散发光。 表示对应于所选择的标准具条纹的波长的调度光​​的一部分通过第二狭缝并由光检测器监视。 当标准具和光栅调谐到相同的精确波长时，定义了狭缝功能，其极窄，例如约0.034pm（FWHM）和约0.091μm（95％积分）。 通过激光束的引导部分进入绝缘体并且在包括单色器狭缝波长的范围内扫描激光波长，可以非常精确地测量激光束的带宽。 在第二实施例中，第二狭缝和光检测器被光电二极管阵列代替，并且通过分析来自光电二极管阵列的一组扫描数据来确定激光束的带宽。 或者，激光波长可以固定在光栅光谱仪的光谱范围附近，可以扫描标准具。

公开(公告)号：WO2003021732A1

公开(公告)日：2003-03-13

申请号：PCT/US2002/026400

申请日：2002-08-19

Applicant: CYMER, INC. ,  KLENE, Brian, C. ,  DAS, Palash, P. ,  GROVE, Steven, L. ,  ERSHOV, Alexander, I. ,  SMITH, Scott, T. ,  PAN, Xiaojiang, J. ,  SANDSTROM, Richard, L.

Inventor： KLENE, Brian, C. ,  DAS, Palash, P. ,  GROVE, Steven, L. ,  ERSHOV, Alexander, I. ,  SMITH, Scott, T. ,  PAN, Xiaojiang, J. ,  SANDSTROM, Richard, L.

IPC: H01S3/22

CPC classification number: G03F7/70933 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70575 ,  H01S3/0057 ,  H01S3/0071 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/11 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333 ,  H01S3/2366

Abstract: The present invention provides a modular high repetition rate ultraviolet gas discharge laser (4) light source for a production line machine. The system includes an enclosed and purged beam path for delivery the laser beam to a desired location such as the entrance port of the production line machine. In preferred embodiments, the production line machine is a lithography machine (2) and two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band send beam which is amplified in the second discharge chamber. The MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality. A pulse stretcher more than doubles the output pulse length resulting in a reduction in pulse power (mJ/ns) as compared to prior art laser systems. This preferred embodiment is capable throughout the operating life of the lithography system, despite substantially degradation of optical components.

Abstract translation: 本发明提供一种用于生产线机器的模块化高重复率紫外线气体放电激光（4）光源。 该系统包括用于将激光束传送到期望位置（例如生产线机器的入口）的封闭和清除的光束路径。 在优选实施例中，生产线机器是光刻机（2），并且提供两个单独的放电室，其中之一是主振荡器的一部分，其产生在第二放电室中被放大的非常窄的带发射光束。 MOPA系统能够以大大提高的光束质量将相当的单室激光器系统的输出脉冲能量大约翻倍。 与现有技术的激光系统相比，脉冲放大器使输出脉冲长度加倍，导致脉冲功率（mJ / ns）的降低。 尽管光学部件基本上已经衰减，但是该优选实施例能够在光刻系统的整个工作寿命期间。

公开(公告)号：WO0198012A9

公开(公告)日：2002-06-13

申请号：PCT/US0116985

申请日：2001-05-23

Applicant: CYMER INC ,  NEWMAN PETER C ,  DUFFEY THOMAS P ,  PARTLO WILLIAM N ,  SANDSTROM RICHARD L ,  MECHER PAUL C ,  JOHNS DAVID M ,  SAETHRE ROBERT B ,  FLEUROV VLADIMIR B ,  NESS RICHARD M ,  RETTIG CURTIS L ,  SHANNON ROBERT A ,  UJAZDOWSKI RICHARD C ,  ROKNI SHAHRYAR ,  PAN XIAOJIANG J ,  KULGEYKO VLADIMIR ,  SMITH SCOTT T ,  ANDERSON STUART L ,  ALGOTS JOHN M ,  SPANGLER RONALD L ,  FOMENKOV IGOR V

Inventor： NEWMAN PETER C ,  DUFFEY THOMAS P ,  PARTLO WILLIAM N ,  SANDSTROM RICHARD L ,  MECHER PAUL C ,  JOHNS DAVID M ,  SAETHRE ROBERT B ,  FLEUROV VLADIMIR B ,  NESS RICHARD M ,  RETTIG CURTIS L ,  SHANNON ROBERT A ,  UJAZDOWSKI RICHARD C ,  ROKNI SHAHRYAR ,  PAN XIAOJIANG J ,  KULGEYKO VLADIMIR ,  SMITH SCOTT T ,  ANDERSON STUART L ,  ALGOTS JOHN M ,  SPANGLER RONALD L ,  FOMENKOV IGOR V

IPC: H01S3/134 ,  G01J1/42 ,  G01J9/00 ,  G03F7/20 ,  H01S3/036 ,  H01S3/038 ,  H01S3/04 ,  H01S3/041 ,  H01S3/08 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/102 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/11 ,  H01S3/13 ,  H01S3/131 ,  H01S3/137 ,  H01S3/139 ,  H01S3/22 ,  H01S3/223 ,  H01S3/225

CPC classification number: H01S3/225 ,  G01J1/4257 ,  G01J3/027 ,  G01J9/0246 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70333 ,  G03F7/70483 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/02 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0387 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/1024 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/137 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2308

Abstract: The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5mJ or greater. A preferred embodiments is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.

Abstract translation: 本发明提供了一种准分子激光器，其能够在约5mJ或更大的脉冲能量下以大约4,000Hz的脉冲速率产生高质量脉冲激光束。 一个优选的实施方案是专门设计为用于集成电路光刻的光源的ArF准分子激光器。 改进的波长计配有专用软件，可监测输出光束参数，并控制非常快速的PZT驱动调谐镜和脉冲功率充电电压，以将波长和脉冲能量保持在期望的限制范围内。 在一个优选实施例中，两个风扇马达驱动单个切向风扇，其提供足够的气流以在脉冲之间的大约0.25毫秒期间清除来自放电区域的放电碎片。

公开(公告)号：WO2007103212A1

公开(公告)日：2007-09-13

申请号：PCT/US2007/005439

申请日：2007-03-02

Applicant: MICRON TECHNOLOGY, INC. ,  SMITH, Scott, T. ,  BAKIN, Dmitry

Inventor： SMITH, Scott, T. ,  BAKIN, Dmitry

IPC: H04N9/093 ,  H04N3/15

CPC classification number: H04N9/093 ,  H01L27/14621 ,  H01L27/14623 ,  H04N5/3415

Abstract: The invention, in various exemplary embodiments, incorporates multiple image sensor arrays, with separate respective color filters, on the same imager die. One exemplary embodiment is an image sensor comprising a plurality of arrays of pixel cells at a surface of a substrate, wherein each pixel cell comprises a photo-conversion device. The arrays are configured to commonly capture an image. An image processor circuit is connected to said plurality of arrays and configured to combine the captured images, captured by the plurality of arrays, and output a color image.

Abstract translation: 在各种示例性实施例中，本发明在相同的成像器模具上并入多个图像传感器阵列以及单独的各自的滤色器。 一个示例性实施例是包括在衬底的表面处的多个像素单元阵列的图像传感器，其中每个像素单元包括光转换器件。 阵列被配置为通常捕获图像。 图像处理器电路连接到所述多个阵列并且被配置为组合由多个阵列捕获的所捕获的图像，并输出彩色图像。

公开(公告)号：WO2003078940A3

公开(公告)日：2003-09-25

申请号：PCT/US2003/002052

申请日：2003-01-15

Applicant: CYMER, INC. ,  SANDSTROM, Richard, L. ,  ERSHOV, Alexander, I. ,  PARTLO, William, N. ,  FOMENKOV, Igor, V. ,  SMITH, Scott, T. ,  BROWN, Daniel, J., W.

Inventor： SANDSTROM, Richard, L. ,  ERSHOV, Alexander, I. ,  PARTLO, William, N. ,  FOMENKOV, Igor, V. ,  SMITH, Scott, T. ,  BROWN, Daniel, J., W.

IPC: G01J3/18

Abstract: A high resolution spectral measurement device. A preferred embodiment presents an extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow-band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser (D) and the diffused light exiting the diffuser (D) illuminates an etalon (ET). A portion of its light exiting the etalon (ET) is collected and directed into a slit (S1) positioned at a fringe pattern of the etalon (ET). Light passing through the slit (S1) is collimated and the collimated light illuminates a grating (GR1) positioned in an approximately Littrow configuration which disperses the light according to wavelength. A portion of the dispersed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit and monitored by a light detector. When the etalon (ET) and the grating (GR1) are tuned to the same precise wavelength a slit function is defined which is extremely narrow such as about 0.034pm (FWHM) and about 0.091pm (95 percent integral). The bandwidth of a laser beam can be measured very accurately by a directing portion of the laser beam into the insulator and scanning the laser wavelength over a range which includes the monochromator slit wavelength. In a second embodiment the second slit and the light detector is replaced by a photodiode array (PDA) and the bandwidth of a laser beam is determined by analyzing a set of scan data from the photodiode array (PDA). Alternately, the laser wavelength can be fixed near the middle of the spectrum range of the grating spectrometer (50), and the etalon (ET) can be scanned.

公开(公告)号：WO2001039337A1

公开(公告)日：2001-05-31

申请号：PCT/US2000/031323

申请日：2000-11-15

Applicant: CYMER, INC. ,  SMITH, Scott, T.

Inventor： SMITH, Scott, T.

IPC: H01S3/08

CPC classification number: G02B17/0856 ,  G02B17/0892 ,  G02B19/0028 ,  G02B19/0033 ,  G02B19/0095 ,  G02B27/0911 ,  G03F7/70575 ,  H01S3/005

Abstract: A catadioptric anamorphic beam expanding telescope (2A, 2B) expands a beam in a first axis substantially perpendicular to the beam propagation axis, and deflects it in a plane substantially perpendicular to the first axis. The beam expanding telescope (2A, 2B) can include reflective, refractive, and combined reflective/refractive elements. An embodiment includes an off axis convex spheric reflector (205) and off axis combined reflective/refractive optical element, commonly known as a Mangin mirror (206), incorporating a refractive first surface and a reflective rear surface, which compensate for aberrations introduced by the off axis deflection of the beam. The telescope is particularly useful for deep ultraviolet (DUV) applications at wavelengths shorter than about 250 nm.

Abstract translation: 反射折射变形光束扩展望远镜（2A，2B）在基本上垂直于光束传播轴线的第一轴线上扩展光束，并使其在基本上垂直于第一轴线的平面中偏转。 扩束望远镜（2A，2B）可以包括反射，折射和组合的反射/折射元件。 一个实施例包括离轴凸球面反射器（205）和离轴组合的反射/折射光学元件，通常称为Mangin镜（206），其包括折射第一表面和反射后表面，其补偿由 梁的偏轴偏转。 望远镜特别适用于波长短于约250 nm的深紫外（DUV）应用。

公开(公告)号：WO2008042137A3

公开(公告)日：2008-06-19

申请号：PCT/US2007020575

申请日：2007-09-24

Applicant: MICRON TECHNOLOGY INC ,  BAKIN DMITRY ,  SMITH SCOTT T ,  VENKATARAMAN KARTIK

Inventor： BAKIN DMITRY ,  SMITH SCOTT T ,  VENKATARAMAN KARTIK

IPC: H01L27/146 ,  G06T1/00 ,  H01L27/14 ,  H04N5/335

CPC classification number: H04N5/217 ,  G06T1/0007 ,  H01L27/14618 ,  H01L27/14625 ,  H01L27/14627 ,  H01L2924/0002 ,  H04N5/2254 ,  H01L2924/00

Abstract: Various exemplary embodiments of the invention provide an extended depth of field. One embodiment provides an image restoration procedure, comprising determining sample point pixels from a pixel array based upon a distance of an object being imaged to the pixel array, and reading intensities of the sample point pixels into a memory. Another embodiment provides an image capture procedure comprising capturing light rays on a pixel array of an imaging sensor, wherein specific sampling point pixels are selected to be evaluated based on spread of an image spot across a based on spread of an image spot across the plurality of pixels of the pixel array plurality of pixels of the pixel array.

Abstract translation: 本发明的各种示例性实施例提供了扩展的景深。 一个实施例提供一种图像恢复过程，其包括基于被成像对象到像素阵列的距离，以及将采​​样点像素的强度读取到存储器中，从像素阵列确定采样点像素。 另一个实施例提供了一种图像捕获程序，其包括在成像传感器的像素阵列上捕获光线，其中，基于图像点跨越多个图像点的扩展，基于图像点的扩展来选择特定采样点像素 像素阵列的像素阵列的像素阵列的多个像素。

公开(公告)号：WO2003021728A2

公开(公告)日：2003-03-13

申请号：PCT/US2002/027925

申请日：2002-08-28

Applicant: CYMER, INC. (a Nevada corporation) ,  KNOWLES, David, S. ,  BROWN, Daniel, J., W. ,  BESAUCELE, Herve, A. ,  MYERS, David, W. ,  ERSHOV, Alexander, I. ,  PARTLO, William, N. ,  SANDSTROM, Richard, L. ,  DAS, Plash, P. ,  ANDERSON, Stuart, L. ,  FOMENKOV, Igor, V. ,  UJAZDOWSKI, Richard, C. ,  ONKELS, Eckehard, D. ,  NESS, Richard, M. ,  SMITH, Scott, T. ,  HULBURD, William, G. ,  OICLES, Jeffrey

Inventor： KNOWLES, David, S. ,  BROWN, Daniel, J., W. ,  BESAUCELE, Herve, A. ,  MYERS, David, W. ,  ERSHOV, Alexander, I. ,  PARTLO, William, N. ,  SANDSTROM, Richard, L. ,  DAS, Plash, P. ,  ANDERSON, Stuart, L. ,  FOMENKOV, Igor, V. ,  UJAZDOWSKI, Richard, C. ,  ONKELS, Eckehard, D. ,  NESS, Richard, M. ,  SMITH, Scott, T. ,  HULBURD, William, G. ,  OICLES, Jeffrey

IPC: H01S

CPC classification number: G01J1/4257 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70333 ,  G03F7/70483 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0387 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/137 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333 ,  H01S3/2366

Abstract: An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in an ArF excimer laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator is equipped with a line narrowing package having a very fast tuning mirror capable of controlling centerline wavelength on a pulse-to-pulse basis at repetition rates of 4000 Hz or greater to a precision of less than 0.2 pm.

Abstract translation: 一种注射种子模块化气体放电激光系统，其能够以约4,000Hz或更大的脉冲速率和约5mJ或更大的脉冲能量产生高质量的脉冲激光束。 提供两个单独的放电室，其中之一是主振荡器的一部分，其产生在第二放电室中放大的非常窄的带状晶体束。 可以单独控制室，允许主振荡器中的波长参数的单独优化和放大室中的脉冲能量参数的优化。 配置为MOPA并被专门用于集成电路光刻的光源的ArF准分子激光系统中的优选实施例。 在优选的MOPA实施例中，每个腔室包括单个切向风扇，其通过在比脉冲之间的大约0.25毫秒更短的时间内清除来自放电区域的碎屑来提供足够的气流以允许以4000Hz或更高的脉冲速率操作。 主振荡器配备有具有非常快的调谐镜的线窄化封装，能够以4000Hz或更高的重复频率在脉冲到脉冲的基础上控制中心线波长，精度低于0.2μm。

公开(公告)号：WO2006076699A1

公开(公告)日：2006-07-20

申请号：PCT/US2006/001458

申请日：2006-01-13

Applicant: VEIN RX, INC. ,  SLATER, Charles, R. ,  NAGLREITER, Brett, E. ,  KRATSCH, Peter, K. ,  ESPINOSA, Alejandro ,  SMITH, Scott, T. ,  JAHRMARKT, Scott, L.

Inventor： SLATER, Charles, R. ,  NAGLREITER, Brett, E. ,  KRATSCH, Peter, K. ,  ESPINOSA, Alejandro ,  SMITH, Scott, T. ,  JAHRMARKT, Scott, L.

IPC: A61M29/00

CPC classification number: A61M39/223 ,  A61M25/0097 ,  A61M25/10

Abstract: Methods and apparatus for treating the interior of a blood vessel include a variety of improved catheter designs, methods and apparatus for accessing and occluding a blood vessel.

Abstract translation: 用于治疗血管内部的方法和装置包括各种改进的导管设计，用于进入和闭塞血管的方法和装置。