公开(公告)号：WO2015030947A1

公开(公告)日：2015-03-05

申请号：PCT/US2014/047126

申请日：2014-07-18

Applicant: APPLIED MATERIALS, INC.

Inventor： HUSTON, Joel M. ,  CUVALCI, Olkan ,  KARAZIM, Michael P. ,  YUDOVSKY, Joseph

IPC: H01L21/02 ,  H01L21/324 ,  H01L21/683

CPC classification number: H01J37/32477 ,  C23C16/4401 ,  C23C16/4408 ,  C23C16/4409 ,  C23C16/45519 ,  C23C16/45521 ,  C23C16/46 ,  H01J37/32513 ,  H01J37/32522 ,  H01J37/32724

Abstract: Methods and apparatus for processing substrates are provided herein. In some embodiments, an apparatus for processing substrates includes a chamber body enclosing a processing volume, the chamber body comprising a chamber floor, a chamber wall coupled to the chamber floor, and a chamber lid removably coupled to the chamber wall, wherein at least one of the chamber floor, the chamber wall, and the chamber lid comprise passages for a flow of a thermal control media; a heater plate disposed adjacent to and spaced apart from the chamber floor; a sleeve disposed adjacent to and spaced apart from the chamber wall, the sleeve supported by the heater plate; and a first sealing element disposed at a first interface between the chamber wall and the chamber lid.

Abstract translation: 本文提供了处理基板的方法和装置。 在一些实施例中，用于处理衬底的设备包括包围处理容积的室主体，室主体包括室底板，耦合到室底板的室壁，以及可移除地联接到室壁的室盖，其中至少一个 室壁和腔室盖包括用于热控制介质流动的通道; 设置在与室底板相邻并间隔开的加热板; 套筒邻近并与室壁间隔开设置，套筒由加热板支撑; 以及设置在所述室壁和所述室盖之间的第一界面处的第一密封元件。

公开(公告)号：WO2020251696A1

公开(公告)日：2020-12-17

申请号：PCT/US2020/030744

申请日：2020-04-30

Applicant: APPLIED MATERIALS, INC.

Inventor： LERNER, Alexander N. ,  SHAVIV, Roey ,  KARAZIM, Michael P. ,  MORAES, Kevin Vincent ,  SANSONI, Steven V. ,  CONSTANT, Andrew J. ,  BRODINE, Jeffrey Allen ,  VELLORE, Kim Ramkumar ,  SADE, Amikam ,  KUMAR, Niranjan

IPC: C23C16/54 ,  C23C16/02 ,  C23C16/04 ,  C23C16/40 ,  C23C14/56 ,  C23C14/12 ,  C23C28/00 ,  H01L21/67 ,  H01L31/0256

Abstract: Embodiments of the present disclosure generally relate to a processing system for forming one or more layers of a photodiode. In one embodiment, the processing system includes a transfer chamber, a plurality of processing chambers, and a controller configured to cause a process to be performed in the processing system. The process includes performing a pre-clean process on a substrate, aligning and placing a first mask on the substrate, depositing a first layer on the substrate, and depositing a second layer on the substrate. The processing system can form layers of a photodiode in a low defect, cost effective, and high utilization manner.

公开(公告)号：WO2020242610A1

公开(公告)日：2020-12-03

申请号：PCT/US2020/028042

申请日：2020-04-14

Applicant: APPLIED MATERIALS, INC.

Inventor： LERNER, Alexander N. ,  KARAZIM, Michael P. ,  CONSTANT, Andrew J. ,  BRODINE, Jeffrey A. ,  VELLORE, Kim Ramkumar ,  MORAES, Kevin ,  SHAVIV, Roey

IPC: H01L21/68 ,  H01L21/673 ,  H01L21/67 ,  H01L21/677 ,  C23C16/04

Abstract: An alignment module for housing and cleaning masks. The alignment module comprises a mask stocker, a cleaning chamber, an alignment chamber, an alignment stage a transfer robot. The mask stocker is configured to house a mask cassette configured to store a plurality of masks. The cleaning chamber is configured to clean the plurality of masks by providing one or more cleaning gases into a chamber after a mask is inserted into the cleaning chamber. The alignment stage is configured to support a carrier and a substrate. The transfer robot is configured to transfer a mask from one or more of the alignment stage and the mask stocker to the cleaning chamber.

公开(公告)号：WO2012003177A2

公开(公告)日：2012-01-05

申请号：PCT/US2011/042125

申请日：2011-06-28

Applicant: APPLIED MATERIALS, INC. ,  TZU, Gwo-Chuan ,  YUAN, Xiaoxiong ,  KHANDELWAL, Amit ,  WANG, Benjamin Cheng ,  GELATOS, Avgerinos V. ,  WU, Kai ,  KARAZIM, Michael P. ,  LIN, Jing ,  CUVALCI, Olkan

Inventor： TZU, Gwo-Chuan ,  YUAN, Xiaoxiong ,  KHANDELWAL, Amit ,  WANG, Benjamin Cheng ,  GELATOS, Avgerinos V. ,  WU, Kai ,  KARAZIM, Michael P. ,  LIN, Jing ,  CUVALCI, Olkan

IPC: H01L21/205

CPC classification number: C23C16/4412 ,  C23C16/45565 ,  C23C16/45587 ,  C23C16/4585 ,  C23C16/46 ,  C23C16/52

Abstract: A substrate support may include a body; an inner ring disposed about the body; an outer ring disposed about the inner ring forming a first opening therebetween; a first seal ring disposed above the first opening; a shadow ring disposed above the inner ring, extending inward from the outer ring and forming a second opening between the shadow and outer rings; a second seal ring disposed above the second opening; a space at least partially defined by the body and the inner, outer, first, second, and shadow rings; a first gap defined between a processing surface of a substrate when present and the shadow ring; and a plurality of second gaps fluidly coupled to the space; wherein the first gap and the plurality of second gaps are configured such that, when a substrate is present, a gas provided to the space flows out of the space through the first gap.

Abstract translation: 衬底支撑件可以包括主体; 围绕身体设置的内圈; 围绕所述内圈设置的外圈，在其间形成第一开口; 设置在所述第一开口上方的第一密封环; 设置在所述内圈上方的从所述外圈向内延伸并在所述阴影和外圈之间形成第二开口的阴影环; 设置在所述第二开口上方的第二密封环; 至少部分地由身体和内，外，第一，第二和第二和阴影环限定的空间; 限定在衬底的处理表面和阴影环之间的第一间隙; 以及流体耦合到所述空间的多个第二间隙; 其中所述第一间隙和所述多个第二间隙被配置为使得当存在基板时，设置到所述空间的气体通过所述第一间隙流出所述空间。

公开(公告)号：WO2020242611A1

公开(公告)日：2020-12-03

申请号：PCT/US2020/028046

申请日：2020-04-14

Applicant: APPLIED MATERIALS, INC.

Inventor： LERNER, Alexander N. ,  KARAZIM, Michael P. ,  CONSTANT, Andrew J. ,  BRODINE, Jeffrey A. ,  VELLORE, Kim Ramkumar ,  MORAES, Kevin ,  SHAVIV, Roey

IPC: H01L21/68 ,  H01L21/673 ,  H01L21/677 ,  H01L21/67 ,  C23C16/04

Abstract: An alignment module for positioning a mask on a substrate comprises a mask stocker, an alignment stage, and a transfer robot. The mask stocker houses a mask cassette that stores a plurality of masks. The alignment stage is configured to support a carrier and a substrate. The transfer robot is configured to transfer one of the one or more masks from the mask stocker to the alignment stage and position the mask over the substrate. The alignment module may be part of an integrated platform having one or more transfer chambers, a factory interface having a substrate carrier chamber and one or more processing chambers. A carrier may be coupled to a substrate within the substrate carrier chamber and moved between the processing chambers to generate a semiconductor device.

公开(公告)号：WO2020180412A1

公开(公告)日：2020-09-10

申请号：PCT/US2020/015085

申请日：2020-01-24

Applicant: APPLIED MATERIALS, INC.

Inventor： SHANTHAVEERASWAMY, Shreyas Patil ,  GAUTAM, Ribhu ,  NAGARAJAN, Kumaresan ,  SINGH, Vijay ,  CONSTANT, Andrew J. ,  KARAZIM, Michael P. ,  VELLORE, Kim Ramkumar

IPC: H01L21/677 ,  H01L21/67

Abstract: Embodiments of the present disclosure relate to a substrate transfer device having a contactless latch and contactless coupling providing the ability to lock and unlock the substrate transfer device at atmospheric and vacuum pressure with without particle generation at a base of the substrate transfer device, the contactless latch, and the contactless coupling. The substrate transfer device includes a lid having one or more lid grooves, a base having one or more base grooves, and a rotation member rotatably coupled to the lid. Each flange of one or more flanges of the substrate transfer device is rotatable in aligned lid grooves and base grooves, and each flange of the one or more flanges has an arm with a ferromagnetic material coupled thereto. The base is coupled to the lid when the ferromagnetic material of the arm is aligned and spaced from a magnetic material of a slot of the one or more base grooves.

公开(公告)号：WO2014204610A1

公开(公告)日：2014-12-24

申请号：PCT/US2014/038971

申请日：2014-05-21

Applicant: APPLIED MATERIALS, INC.

Inventor： KARAZIM, Michael P.

IPC: H01L21/324 ,  H01L21/02

CPC classification number: H05B3/0047 ,  F16C19/14 ,  F16C32/0618 ,  F16C32/0696 ,  H01L21/67115 ,  H01L21/68785 ,  H01L21/68792

Abstract: Embodiments of the present invention generally relate to a rotation device in an RTP chamber. The rotation device includes a cylindrical inner race, a plurality of thrust bearings and a plurality of radial bearings. During operation, the bearings create a gas cushion preventing the rotating parts from contacting the stationary parts.

Abstract translation: 本发明的实施例一般涉及RTP室中的旋转装置。 旋转装置包括圆柱形内圈，多个推力轴承和多个径向轴承。 在运行过程中，轴承产生气垫，防止旋转部件与固定部件接触。