公开(公告)号：WO2021256772A1

公开(公告)日：2021-12-23

申请号：PCT/KR2021/007237

申请日：2021-06-10

Applicant: 씰링크 주식회사

Inventor： 이희장

IPC: H01L21/67 ,  C23C16/44 ,  C23C14/505 ,  C23C14/566 ,  C23C16/4408 ,  C23C16/4409 ,  C23C16/4584 ,  H01L21/68792

Abstract: 회전축 밀폐장치가 개시된다. 본 발명의 일 실시예에 따른, 반도체 기판을 수용하는 반도체 적재 유닛을 회전시키면서 상기 반도체 기판을 처리하는 반도체 기판처리장치에 장착되는 회전축 밀폐장치는, 상기 반도체 기판처리장치에 장착되는 중공의 하우징; 상기 하우징 내에 수용되고, 상기 반도체 적재 유닛에 연결되어 상기 반도체 적재 유닛에 회전력을 전달하는 회전축; 상기 회전축을 상기 하우징 내에 회전가능하게 지지하는 베어링; 상기 하우징과 상기 회전축 사이의 간극을 밀봉하는 복수의 씰을 구비하는 씰링부; 및 상기 회전축의 일단에 장착되어 상기 회전축에 회전력을 전달하는 동력전달부;를 포함한다.

公开(公告)号：WO2021127123A1

公开(公告)日：2021-06-24

申请号：PCT/US2020/065521

申请日：2020-12-17

Applicant: APPLIED MATERIALS, INC.

Inventor： SHEK, Mei-Yee ,  CITLA, Bhargav S. ,  RUBNITZ, Joshua ,  TANNOS, Jethro ,  YING, Chentsau Chris ,  NEMANI, Srinivas D. ,  YIEH, Ellie Y.

IPC: C23C16/36 ,  C23C16/04 ,  C23C16/505 ,  C01B21/0828 ,  C09D1/00 ,  C23C16/4408 ,  C23C16/50

Abstract: Methods for plasma enhanced chemical vapor deposition (PECVD) of silicon carbonitride films are described. A flowable silicon carbonitride film is formed on a substrate surface by exposing the substrate surface to a precursor and a reactant, the precursor having a structure of general formula (I) or general formula (II) wherein R1, R2, R3, R4, R5, R6, R7, R8, R9, R10, R11, and R12 are independently selected from hydrogen (H), substituted or unsubstituted alkyl, substituted or unsubstituted alkoxy, substituted or unsubstituted vinyl, silane, substituted or unsubstituted amine, or halide; purging the processing chamber of the silicon precursor, and then exposing the substrate to an ammonia plasma.

公开(公告)号：WO2021146708A1

公开(公告)日：2021-07-22

申请号：PCT/US2021/013952

申请日：2021-01-19

Applicant: HUNT ENERGY ENTERPRISES, L.L.C.

Inventor： LIM, Jin-Myoung ,  KONG, Fantai ,  GRIFFIN, Mark

IPC: H01M4/36 ,  H01M4/62 ,  H01M4/525 ,  H01M4/505 ,  H01M4/38 ,  H01M4/587 ,  C23C16/40 ,  C23C16/455 ,  C23C16/403 ,  C23C16/405 ,  C23C16/407 ,  C23C16/4408 ,  C23C16/4417 ,  C23C16/45529 ,  C23C16/45531 ,  C23C16/45555 ,  H01M10/0525 ,  H01M10/54 ,  H01M4/131 ,  H01M4/133 ,  H01M4/134 ,  H01M4/1391 ,  H01M4/1393 ,  H01M4/1395 ,  H01M4/364 ,  H01M4/366 ,  H01M4/386 ,  H01M4/624

Abstract: Batteries, methods for recycling batteries, and methods of forming one or more electrodes for batteries are disclosed. The battery includes at least one of (i) a cathode including a nickel-rich material and a first sub-nanoscale metal oxide coating on the nickel-rich material; and (ii) an anode including an anode material and a second sub-nanoscale metal oxide coating disposed on the anode material.

公开(公告)号：WO2021173979A1

公开(公告)日：2021-09-02

申请号：PCT/US2021/019883

申请日：2021-02-26

Applicant: APPLIED MATERIALS, INC.

Inventor： RASHEED, Muhammad M. ,  SRIRAM, Mandyam ,  CUI, Anqing ,  BALUJA, Sanjeev ,  GRIFFIN, Kevin ,  AUBUCHON, Joseph

IPC: C23C16/448 ,  C23C16/44 ,  C23C16/455 ,  C23C16/4408 ,  C23C16/45512 ,  C23C16/45519 ,  C23C16/45525 ,  C23C16/45527 ,  C23C16/45544 ,  C23C16/45557 ,  C23C16/45561

Abstract: Gas delivery systems and methods of delivering a process gas are described. The gas delivery system includes an inert gas line and a first reactive gas line connected to a gas line with a purge gas flow. The flows of inert gas and first reactive gas are controlled so that the pressure at the end of the gas line remains substantially constant.

公开(公告)号：WO2021146623A1

公开(公告)日：2021-07-22

申请号：PCT/US2021/013731

申请日：2021-01-15

Applicant: ENTEGRIS, INC.

Inventor： WRIGHT, Robert L., Jr. ,  BAUM, Thomas H. ,  ERMERT, David M.

IPC: H01L21/311 ,  H01L21/3213 ,  H01L21/285 ,  C23C16/455 ,  C23C16/06 ,  C23C16/448 ,  C23C16/0236 ,  C23C16/08 ,  C23C16/4408 ,  C23C16/45525

Abstract: Provided is methodology for (a) the etching of films of Al2O3, HfO2, ZrO2, W, Mo, Co, Ru, SiN, or TiN, or (b) the deposition of tungsten onto the surface of a film chosen from Al2O3, HfO2, ZrO2, W, Mo, Co, Ru, Ir, SiN, TiN, TaN, WN, and SiO2, or (c) the selective deposition of tungsten onto metallic substrates, such as W, Mo, Co, Ru, Ir and Cu, but not metal nitrides or dielectric oxide films, which comprises exposing said films to WOCl4 in the presence of a reducing gas under process conditions.

公开(公告)号：WO2023018547A2

公开(公告)日：2023-02-16

申请号：PCT/US2022/038363

申请日：2022-07-26

Applicant: PHILLIPS 66 COMPANY

Inventor： HUANG, Kan ,  ZHANG, Liang ,  WILBEE, Alexander, Z. ,  WORFOLK, Brian, J.

IPC: C23C16/26 ,  C23C16/52 ,  H01M4/02 ,  H01M4/133 ,  C23C16/00 ,  C08K3/04 ,  C01B32/05 ,  C01B32/15 ,  C01P2004/03 ,  C01P2004/61 ,  C01P2004/84 ,  C01P2006/16 ,  C01P2006/40 ,  C23C16/4408 ,  C23C18/1204 ,  C23C18/1245 ,  C23C18/127 ,  H01M10/0525 ,  H01M2004/021 ,  H01M2004/027 ,  H01M4/366 ,  H01M4/587

Abstract: Embodiments of the present disclosure generally relate to carbon materials for battery electrodes and methods for preparing such carbon materials. More specifically, embodiments relate to methods for coating a carbon film onto nano-ordered carbon particles to produce carbon-coated particles which can be used as an anode material within a battery, such as a lithium-ion battery, a sodium-ion battery, other types of batteries. In one or more embodiments, a method for producing carbon-coated particles is provided and includes positioning nano-ordered carbon particles within a processing region of a processing chamber, purging the processing region containing the nano- ordered carbon particles with an inert gas, heating the nano-ordered carbon particles to a temperature of about 700°C or greater during an annealing process, and depositing a carbon film on the nano-ordered carbon particles to produce carbon-coated particles during a vapor deposition process.