Abstract:
An apparatus, including a scanning probe microscope base (112) that includes a frame (130) configured to be secured to an end of an insert in a cryostat; a top (134) configured to be connected to a base of a scanning probe microscope head that is configured to be disposed inside the insert; and a damping system disposed between the frame and the top and comprising a bellows (150) that seals the end of the insert. This sealing separates an ultra-high vacuum (UHV) environment in the insert from a high vacuum (HV) environment surrounding the end of the insert and also positions an upper surface of the top in the UHV environment.
Abstract:
An ion source (230) of a focusing ion beam system (200) includes a dielectric bushing (308) for supporting metallic optical elements (316, 320) and forming an ion gun vacuum chamber (304) in which are contained an emitter assembly (312) and other optical elements (314, 316).
Abstract:
An ultra-high precision stage (200) incorporating a novel, legged design suitable for applications requiring high voltage and vacuum is disclosed herein. The stage comprises; a base (220); a frame attached to the base; a platform (240) with a bottom platform surface (250); at least three adjustable limbs coupled to the base and the bottom platform surface (250), each limb comprising a raising member (285) attached to the base, a first attachment member attached to the raising member, a leg (270), a bottom end of the leg attached to the raising member, a second attachment member attached to a top end of the leg and the second attachment member attached to the bottom platform surface; and platform movement members coupled to the platform and the frame, providing precise positioning and movement of the platform. The attachment members can be flexure joints; further, they can be flexural thrust joints. The platform can have six degrees of freedom of movement and accommodate wafers with diameters of 300 mm. The stage can weigh less than 100 lbs.
Abstract:
Die Erfindung betrifft eine Vorrichtung zum Transferieren eines Probenhalters von einer Transportvorrichtung zu einer Scanvorrichtung, bei der an der Transportvorrichtung und/oder am Probenhalter wenigstens ein erster Magnet vorgesehen ist, um den Probenhalter mittels des wenigstens einen ersten Magneten an der Transportvorrichtung zu halten, und bei der an der Scanvorrichtung und/oder am Probenhalter wenigstens ein zweiter Magnet vorgesehen ist, um den Probenhalter mittels des wenigstens einen zweiten Magneten an der Scanvorrichtung zu halten.
Abstract:
In an electron microscope it is sometimes important that specimens can be studied at a very low temperature (for example, that of liquid helium). In the case of known specimen holders the specimen is cooled by supplying the cooling medium via a bore in the specimen holder; this causes thermal drift of the removed specimen holder each time when a specimen is exchanged, and also an acoustic coupling (i.e. transfer of vibrations) exists with the dewar vessel connected to the specimen holder. In accordance with the invention, the specimen is arranged on the end ( 20 ) of the specimen holder (7) by means of a separate transport unit (13, 36) so that it is not necessary to remove the specimen holder (7) in order to exchange a specimen, with the result that the specimen holder is not heated. Moreover, the coupling to the cold source (22, 28) can take place via a flexible cooling conduit ( 30 ) which extends directly to the end ( 20 ) to be cooled and may be permanently connected thereto, thus avoiding the transfer of vibrations. 00000
Abstract:
A system for transporting in a vacuum chamber sample holders and samples between a holder tray and a location for use with a surface analytical instrument is disclosed. Also provided is a system including a microwave coaxial cable connecting the tip terminal of a scanning tunneling microscope to a microwave signal source and a system for clamping a heater to a sample holder in order to heat the sample.
Abstract:
A time-of-flight mass spectrometer (TOF-MS) array instrument is provided. Each TOF-MS of the array instrument includes (1) a gridless, focusing ionization extraction device allowing for the use of very high extraction energies in a maintenance-free design, (2) a fiberglass-clad flexible circuit-board reflector using rolled flexible circuit-board material, and (3) a low-noise, center-hole microchannel plate detector assembly that significantly reduces the noise (or "ringing") inherent in the coaxial design. The miniature TOF-MS array allows for the bundling of a plurality of mass analyzers, e.g., a plurality of TOF-MSs, into a single array working in parallel fashion to greatly enhance the throughput of each TOF-MS in the array by multiplexing the data collection process. A preferred embodiment of the TOF-MS array instrument incorporates 16 TOF-MS units that are arranged in mirror-image clusters of eight units.
Abstract:
Individual hydrogen atoms are desorbed from a hydrogen termination layer on a silicon substrate, using an STM tip, to form a pattern of exposed regions. A single donor-bearing molecule (such as phosphine) is adsorbed onto each exposed region, to form an array of donor atoms (such as phosphorous atoms). The spins of the donor atoms may be used as qubits in a solid state quantum computer.
Abstract:
A system for the measurement, analysis, removal, addition or imaging of material uses nanostructures in conjunction with mechanical, electromagnetic (optical) and electrical means. Such nanostructures and techniques are combined in a system that can modify bulk or large area objects such as silicone waffers and masks for lithography. An SPM system (100) for making modifications to an object (102) comprises an SPM probe for making the modifications to the object, a positioning system (103) for positioning the SPM probe with respect to the object, and a controller for controlling the positioning system such that the modifications of the object are made with the SPM probe particulate matter is removed from the object by the modifications, and the SPM probe makes sweeping motions over the object to sweep away the removed particulate material.g these elements in a system which can modify bulk or large area objects such as silicon wafers, and masks for lithography.