FILM FOR MANUFACTURING SEMICONDUCTOR PARTS
    18.
    发明公开
    FILM FOR MANUFACTURING SEMICONDUCTOR PARTS 审中-公开
    用于制造半导体部件的电影

    公开(公告)号:EP3316280A1

    公开(公告)日:2018-05-02

    申请号:EP16817719.4

    申请日:2016-06-14

    Abstract: The present invention provides a film for manufacturing a semiconductor part in which an evaluation step accompanied with a temperature change, a segmenting step, and a pickup step can be commonly performed, a method for manufacturing a semiconductor part, a semiconductor part, and an evaluation method. That is, a film 1 for manufacturing a semiconductor part includes a base layer 11, and an adhesive layer 12 disposed on one surface side of the base layer 11, wherein the ratio R E (= E'(160)/E'(-40)) of the elastic modulus of E'(160) of the base layer 11 at 160°C to the elastic modulus of E'(-40) of the base layer 11 at -40°C is such that R E ≥ 0.01, and the elastic modulus E'(-40) is 10 MPa or more and less than 1000 MPa. The present method includes a step of bonding the adhesive layer 12 to a back surface of the semiconductor wafer having circuits formed thereon, a step of separating the semiconductor wafer into segments to obtain semiconductor parts, and a pickup step of separating the semiconductor parts from the adhesive layer 12, and includes a step of evaluating the semiconductor wafer or the semiconductor parts prior to the pickup step.

    Abstract translation: 本发明提供一种用于制造半导体部件的膜,其中可以共同执行伴随着温度变化的评估步骤,分段步骤和拾取步骤,用于制造半导体部件的方法,半导体部件以及评估 方法。 即,用于制造半导体部件的膜1包括基底层11和设置在基底层11的一个表面侧上的粘合剂层12,其中比率RE(= E'(160)/ E'( - 40 ))为160℃时的基材层11的E'(160)的弹性模量与-40℃下的基材层11的E'( - 40)的弹性模量的关系,RE≥0.01, 弹性模量E'( - 40)为10MPa以上且小于1000MPa。 本方法包括以下步骤:将粘合剂层12粘合到其上形成有电路的半导体晶片的背面;将半导体晶片分割成段以获得半导体部件的步骤;以及拾取步骤,将半导体部件从 并且包括在拾取步骤之前评估半导体晶片或半导体部件的步骤。

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