公开(公告)号：EP2537011B1

公开(公告)日：2017-04-12

申请号：EP11719449.8

申请日：2011-02-15

Applicant: Bruker Elemental GmbH

Inventor： SIMONS, Rainer ,  SCHMIDT, Armin

IPC: G01J3/443 ,  G01N21/67 ,  G01J3/02 ,  G01J3/18 ,  G01J3/20

CPC classification number: G01J3/20 ,  G01J3/02 ,  G01J3/0286 ,  G01J3/443

公开(公告)号：EP3137881A1

公开(公告)日：2017-03-08

申请号：EP15725819.5

申请日：2015-04-28

Applicant: Horiba Jobin Yvon S.A.S.

Inventor： RICHARD, Simon ,  GASTON, Jean-Paul ,  ACHER, Olivier ,  CHAPON, Patrick

IPC: G01N21/67 ,  B23K26/36 ,  G01J3/443 ,  G01B11/22 ,  G01N21/68 ,  H01J37/32

CPC classification number: G01N21/67 ,  G01B11/22 ,  G01J3/443 ,  G01N21/68 ,  G01N2201/06113 ,  G01N2201/0612 ,  H01J37/32018 ,  H01J37/32963 ,  H01J37/32972 ,  H01J2237/334

Abstract: The present invention relates to a glow discharge spectroscopy system comprising a glow discharge lamp suitable for receiving a solid sample (10) and forming a glow discharge etching plasma (19). According to the invention, a system (100) for measuring
in situ the depth of the erosion crater generated by etching of the sample (10) comprises an optical separator (3), optical means (4) suitable for directing a first incident beam (21) toward a first zone (11) of the sample, which zone is exposed to the etching plasma, and a second incident beam (22) toward a second zone (12) of the same side of the sample, which zone is protected from the etching plasma, respectively, and an optical recombining device (3) suitable for forming an interferometric beam (30) so as to determine the depth (d) of the erosion crater.

Abstract translation: 辉光放电光谱测定系统包括适于接收固体样品（10）并形成辉光放电蚀刻等离子体（19）的辉光放电灯。 用于原位测量通过蚀刻样品（10）产生的侵蚀坑的深度的系统（100）包括光学分离器（3），适于将第一入射光束（21）引向第一入射光束（21）的光学元件（4） 区域（11），第一区域暴露于蚀刻等离子体，以及朝向样品相同侧的第二区域（12）的第二入射光束（22），第二区域被保护免受蚀刻等离子体 以及适于形成干涉光束（30）以便确定侵蚀坑的深度（d）的光学重组装置（3）。

公开(公告)号：EP1929257B1

公开(公告)日：2016-11-30

申请号：EP06813961.7

申请日：2006-08-30

Applicant: PerkinElmer, Inc.

Inventor： MORRISROE, Peter, J.

IPC: B23K10/00

CPC classification number: G01N21/73 ,  G01J3/443 ,  G01N21/68 ,  G01N2201/126 ,  H01J49/105

Abstract: A device for sustaining a plasma in a torch is provided. In certain examples, the device comprises a first electrode configured to couple to a power source and constructed and arranged to provide a loop current along a radial plane of the torch. In some examples, the radial plane of the torch is substantially perpendicular to a longitudinal axis of the torch.

Abstract translation: 提供了一种用于在割炬中维持等离子体的装置。 在某些示例中，该装置包括被配置为耦合到电源并被构造和布置为沿着割炬的径向平面提供回路电流的第一电极。 在一些示例中，焊炬的径向平面基本上垂直于焊炬的纵向轴线。

公开(公告)号：EP3092478A1

公开(公告)日：2016-11-16

申请号：EP14700162.2

申请日：2014-01-08

Applicant: Universidad Pública De Navarra

Inventor： AGUILERA ANDOAGA, José Antonio ,  ARAGÓN GARBIZU, Carlos

IPC: G01N21/71

CPC classification number: G01N21/718 ,  G01J3/443

Abstract: The quantitative analysis method for analyzing the composition of materials of the invention is based on a functional relationship (curve Cσ) between line intensity and the concentration of the element in the material. The method comprises: obtaining characteristic parameters, selecting the spectral lines of neutral atoms and ions of the elements of interest, obtaining their atomic data; calculating, for the selected lines, a line crosssection; measuring line intensities; determining the concentrations of the elements of interest by means of fitting two graphs Cσ, one for neutral atoms and another for ions with a unit charge, the fitting being performed by means of an iterative algorithm which compares the experimental graphs with the curves Cσ calculated with a plasma model; calculating, for the data of the graphs Cσ, the product of line optical depth by Lorentzian width; evaluating, for the data of the graphs Cσ, a condition on the validity limit of the model, the datum for which the mentioned product is greater being eliminated if the condition is not complied with; repeating the three preceding steps until all data comply with the mentioned condition. The invention has the advantage of not requiring prior calibrations.

公开(公告)号：EP2976620A1

公开(公告)日：2016-01-27

申请号：EP13711418.7

申请日：2013-03-22

Applicant: FOSS Analytical A/S

Inventor： ELSOEE, Maja Kirstine ,  JUHL, Henrik Vilstrup ,  NIKOLAJSEN, Thomas

IPC: G01N21/35 ,  G01N21/71 ,  G01J3/443 ,  G01N33/24

CPC classification number: G01N21/3563 ,  G01J3/28 ,  G01J3/443 ,  G01J2001/083 ,  G01N1/286 ,  G01N21/35 ,  G01N21/718 ,  G01N33/24 ,  G01N2201/129

Abstract: A system (102) for determining properties of a sample (114) comprises a LIBS detector (104,106) and an infra-red absorption detector (108,110) for interrogating a sample (114) to generate LIBS spectral data and infra-red absorption spectral data respectively; and a data processor (112) adapted to apply at least one chemometric prediction model, each constructed to link, preferably quantitatively link, features of both LIBS and absorption spectral data to a different specific property of the sample, to a combined dataset derived from at least portions of both the LIBS and the absorption data to generate therefrom a determination, preferably a quantitative determination, of the specific property linked by that model.

Abstract translation: 一种用于样品（114）的确定性采矿特性的系统（102）包括一个LIBS检测器（104,106）和红外线吸收检测器（108,110）用于询问的样品（114），以产生LIBS光谱数据和红外吸收光谱数据 分别; 和数据处理器（112）angepasst申请的至少一个化学度量预测模型中，每个构建链接，优选定量地链接，这两个LIBS和吸收光谱数据的功能，以所述样品的不同的特定属性，从在得到的组合的数据组 无论是LIBS和吸收数据的至少一部分以从判定生成有，优选定量测定，由模型链接的特定属性一样。

公开(公告)号：EP2921845A3

公开(公告)日：2015-12-02

申请号：EP15157032.2

申请日：2015-02-27

Applicant: ARKRAY, Inc.

Inventor： Tanaka, Takashige ,  Shiraki, Yasunori

IPC: G01N21/67 ,  H05H1/46 ,  G01N21/69 ,  G01N21/05

CPC classification number: B23K10/006 ,  G01J3/12 ,  G01J3/443 ,  G01N21/67 ,  G01N21/69 ,  G01N2021/054 ,  H05H1/46 ,  H05H1/48

Abstract: The present invention provides a chip for plasma generation, a plasma generator, and a plasma spectrometry method, having high reproducibility of plasma light emission. The chip for plasma generation of the present invention includes a channel, the channel has a first region, a narrow portion, and a second region, the narrow portion is in communication with the first region and the second region and has a cross-sectional area smaller than the first region and the second region, and the chip further includes an air bubble movement prevention unit the prevents air bubbles generated in the narrow portion from moving from the narrow portion toward the upstream side of the narrow portion. The chip for plasma generation of the present invention has the air bubble movement prevention unit. Therefore, formation of a gas-liquid interface in the narrow portion can be maintained. Thus, reproducibility of plasma light emission can be improved.

公开(公告)号：EP2612133B1

公开(公告)日：2015-11-25

申请号：EP11763610.0

申请日：2011-08-22

Applicant: Thermo Fisher Scientific (Ecublens) Sarl

Inventor： DORIER, Jean-Luc ,  DEMARCO, Fabio ,  HALASZ, Edmund

IPC: G01N21/67

CPC classification number: G01J3/10 ,  G01J3/443 ,  G01N21/05 ,  G01N21/67

公开(公告)号：EP2901138A1

公开(公告)日：2015-08-05

申请号：EP13779298.2

申请日：2013-09-25

Applicant: Université Claude Bernard Lyon I ,  Centre National de la Recherche Scientifique

Inventor： MOTTO-ROS, Vincent ,  YU, Jin

IPC: G01N21/71

CPC classification number: G01N21/718 ,  G01J3/0218 ,  G01J3/443 ,  G01N2201/0853

Abstract: The invention concerns a spectroscopic measurement device comprising: - a system (2) for focusing a laser beam (3) on a sample to be analysed (4), - a system for collecting and spectroscopically analysing (17) the light rays emitted by the plasma (15), the system for collecting and analysing (17) comprising, in particular, an optic fibre (18) for collecting light. According to the invention, the device comprises: - a motorised system (23) for moving the optic fibre (18), - an optical imaging system (25) for imaging the plasma, in image form, - and a processing and control unit (24) comprising: • means for analysing the image formed by the optical imaging system in order to select an area of interest, • means for controlling the motorised system (23) in order to position the optic fibre in a position enabling it to collect light coming from the selected area of interest of the plasma.

公开(公告)号：EP2769260A4

公开(公告)日：2015-07-29

申请号：EP12845835

申请日：2012-10-19

Applicant: ACEA BIOSCIENCES INC

Inventor： LI NAN ,  CHEN YE ,  WANG XIAOBO

IPC: G02B27/10

CPC classification number: G02B27/1006 ,  G01J3/14 ,  G01J3/36 ,  G01J3/443 ,  G02B5/04 ,  G02B5/285 ,  G02B27/141 ,  G02B27/142

Abstract: A prism including a substrate faceted to provide a plurality of flat surfaces, wherein at least two of the plurality of surfaces, each including a filter coating, form at least two filter surfaces, wherein each filter surface selectively permits passage of a predetermined wavelength and reflects remaining wavelengths along an optical path towards another of the plurality of surfaces, optionally another filter surface, wherein an angle of incidence of each of the plurality of surfaces along the optical path is equal or nearly equal. An apparatus incorporating the prism and its use for splitting a light spectrum into a plurality of wavelengths or wavelength ranges.

公开(公告)号：EP2821778A1

公开(公告)日：2015-01-07

申请号：EP13754054.8

申请日：2013-02-26

Applicant: Kyoto University

Inventor： YOSHIDA, Hiroyuki

IPC: G01N21/62

CPC classification number: G01J3/30 ,  G01J3/443 ,  G01N21/66 ,  G01N23/2251 ,  G01N2223/08 ,  H01J37/06

Abstract: Intensity of near-ultraviolet light or visible light of 180 to 700 nm emitted from a solid sample, such as an organic semiconductor, irradiated with an electron beam is measured, while kinetic energy (accelerating energy) of the electron beam is changed in a range of 0 to 5 eV so as to obtain a spectrum. Peaks are detected from the spectrum, and the energy thereof is defined as unoccupied-states energy of the sample. The onset energy of the first peak represents electronic affinity energy (electron affinity) of the sample. Since the energy of the electron beam irradiated onto the sample is 5 eV or less, almost no damage is exerted on the sample even when the sample is an organic semiconductor.

Abstract translation: 测量从用电子束照射的固体样品（例如有机半导体）发射的近紫外光或可见光的180至700nm的强度，同时电子束的动能（加速能）在一定范围内变化 为0〜5eV，得到光谱。 从光谱中检测峰，其能量被定义为样品的空闲状态能量。 第一峰的起始能量表示样品的电子亲和力（电子亲和力）。 由于照射到样品上的电子束的能量为5eV以下，所以即使在样品为有机半导体时也几乎不会对样品施加损伤。