DISPOSITIF D'ANALYSE DE MATERIAUX PAR SPECTROSCOPIE DE PLASMA
    23.
    发明公开
    DISPOSITIF D'ANALYSE DE MATERIAUX PAR SPECTROSCOPIE DE PLASMA 有权
    EINRICHTUNG ZUM ANALYSIEREN VON MATERIALIEN DURCH PLASMASPEKTROSKOPIE

    公开(公告)号:EP2359110A1

    公开(公告)日:2011-08-24

    申请号:EP09759753.8

    申请日:2009-11-03

    Inventor: SENAC Stéphane

    Abstract: The invention relates to a device for analysing materials by plasma spectroscopy, of the type that is portable and self-contained and including a housing (10) containing a laser generator (18) generating laser pulses that are focalised onto the surface of a material to be analysed by a parabolic mirror (32) capable of translation in the housing so as to carry out a series of point measurements along a scanning line at the surface of the material to be analysed and a measurement on a calibration sample (50) mounted in the measurement endpiece (22) of the housing (10).

    Abstract translation: 用于通过等离子体光谱法分析材料的装置是便携式和独立型的装置,包括一个包含激光发生器(18)的壳体(10),该激光发生器(18)发射激光脉冲,该激光脉冲通过抛物面方式聚焦在待分析材料的表面上 反射镜(32),其可在壳体内平移地移动,以便沿着要分析的材料的表面上的扫描线执行一系列点测量,并且从安装在所述待校准样品中的校准样品(50)进行测量 壳体(10)的测量端部件(22)。

    APPARATUS AND METHOD FOR DETECTION OF VACUUM ULTRAVIOLET RADIATION
    28.
    发明公开
    APPARATUS AND METHOD FOR DETECTION OF VACUUM ULTRAVIOLET RADIATION 有权
    DEVICE AND METHOD FOR DETECTION真空紫外线辐射的

    公开(公告)号:EP1664691A1

    公开(公告)日:2006-06-07

    申请号:EP04786908.6

    申请日:2004-09-03

    CPC classification number: G01J1/429 G01J3/443

    Abstract: Vacuum ultraviolet radiation detection apparatus (10) comprises a radiation detector (30) in a chamber (12). The detector (30) receives ultraviolet radiation from a radiation source (36). The chamber is evacuated using a dry vacuum pump (18) to a relatively poor vacuum of no less than 5 Pa. UV transparent gas is supplied from a gas supply (26), into the chamber (12) at a relatively low flow rate (around 0.1 litres/minute) so as to provide an overall pressure in the chamber (12) of between 100 and 1,000 Pa. The use of a relatively inexpensive pump coupled with a lower gas flow rate provides significant cost savings.

    METHOD AND APPARATUS FOR MONITORING PLASMA PROCESSING OPERATIONS
    29.
    发明公开
    METHOD AND APPARATUS FOR MONITORING PLASMA PROCESSING OPERATIONS 审中-公开
    方法和装置等离子处理操作注视着董先生

    公开(公告)号:EP1105703A4

    公开(公告)日:2005-08-03

    申请号:EP99918803

    申请日:1999-04-23

    Applicant: SANDIA CORP

    CPC classification number: G01J3/443 G01J3/28 G01J2003/2866

    Abstract: The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in some manner to calibrating or initializing a plasma monitoring assembly (174). This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window (124) through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber (74).

    VERFAHREN UND VORRICHTUNG ZUR DURCHFÜHRUNG DER EMISSIONSSPEKTROMETRIE
    30.
    发明公开
    VERFAHREN UND VORRICHTUNG ZUR DURCHFÜHRUNG DER EMISSIONSSPEKTROMETRIE 有权
    方法和设备实现发射光谱法

    公开(公告)号:EP1520165A2

    公开(公告)日:2005-04-06

    申请号:EP03761506.9

    申请日:2003-06-25

    CPC classification number: G01J3/443 G01N21/718

    Abstract: The invention relates to a method and a device for carrying out emission spectroscopy, in particular laser emission spectroscopy. According to said method, a pulsed laser beam is automatically focussed on a workpiece to generate a laser-induced plasma, the radiation emitted from the plasma is detected and an elemental analysis is performed using the captured radiation spectrum. The invention is characterised in that a laser beam impingement is carried out with a variable pulse interval ΔT, that prior to the plasma generation, additional geometric parameters P 1, P 2 .. PN of a potential measurement location on the workpiece surface, in addition to the distance d of the autofocus lens from said workpiece surface are determined and in that an elemental analysis is only performed for the potential measurement locations, at which at least one of the additional geometric parameters lies within a predefined tolerance range [T1..T2].

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