ULTRAVIOLET-CURABLE RESIN COMPOSITION
    32.
    发明公开
    ULTRAVIOLET-CURABLE RESIN COMPOSITION 审中-公开
    紫外线固化型树脂组合物

    公开(公告)号:EP1219680A4

    公开(公告)日:2005-03-30

    申请号:EP00961194

    申请日:2000-09-22

    CPC分类号: H01J9/142 C09D4/00 G03F7/027

    摘要: An ultraviolet-curable resin composition which contains a photopolymerizable compound containing a phosphorus atom and a photopolymerizable compound having a carboxyl group and has a surface tension at 25 DEG C of 30 to 50 mN/m. Preferably, it comprises (a) a compound having one or more (meth)acryloyl groups per molecule and a phosphorus atom, (b) a compound having one carboxyl group and one (meth)acryloyl group per molecule, (c) a compound having one or more (meth)acryloyl groups per molecule, (d) a leveling agent, and (e) a photoinitiator. The ultraviolet-curable resin composition is useful as a protective material for etching, especially as a back-coating material in shadow mask production.

    PHOTOCURABLE/THERMOSETTING COMPOSITION FOR FORMING MATTE FILM
    33.
    发明公开
    PHOTOCURABLE/THERMOSETTING COMPOSITION FOR FORMING MATTE FILM 有权
    PHOT0-ODERWÄRMEHÄRTENDEZUSAMMENSETZUNGEN ZUR HERSTELLUNG MATTER FILME

    公开(公告)号:EP1266922A4

    公开(公告)日:2004-04-21

    申请号:EP00902949

    申请日:2000-02-14

    摘要: A photocurable/thermosetting composition which is useful for forming a matte film and is developable with an aqueous alkali solution. The composition comprises (A) a photosensitive prepolymer obtained by reacting an (un)saturated polybasic acid anhydride with hydroxyl groups of an ester of a novolak epoxy compound with an unsaturated monocarboxylic acid, (B) a carboxylated copolymer resin, (C) a photopolymerization initiator, (D) a diluent, and (E) a polyfunctional epoxy compound having at least two epoxy groups per molecule and optionally contains (F) an inorganic filler. The composition can further contain (G) a hardener for epoxy resins. This composition is suitable for use in forming a solder resist for printed circuit boards.

    摘要翻译: 用于形成消光膜并可用碱​​水溶液显影的光固化/热固性组合物。 该组合物包含(A)通过(不)饱和多元酸酐与酚醛清漆环氧化合物的酯与不饱和一元羧酸的羟基反应而得到的光敏预聚物,(B)羧化共聚物树脂,(C)光聚合 (D)稀释剂和(E)每分子具有至少两个环氧基团的多官能环氧化合物,并且任选地含有(F)无机填料。 该组合物可以进一步含有(G)用于环氧树脂的硬化剂。 该组合物适用于形成用于印刷电路板的阻焊剂。

    CURABLE RESIN COMPOSITION, DRY FILM, CURED PRODUCT THEREOF, AND PRINTED CIRCUIT BOARD

    公开(公告)号:EP3742871A1

    公开(公告)日:2020-11-25

    申请号:EP19741873.4

    申请日:2019-01-15

    摘要: Provided is a curable resin composition in which cracks and peeling do not easily occur in a cured coating film while maintaining adhesiveness with a base material (insulating portion) or a circuit (conductive portion), even in the case of forming a cured coating film having an area where the coating film of the curable resin composition is overlapping on the circuit board. The curable resin composition according to the present invention is a curable resin composition comprising a curable resin, characterized in that, when a cured coating film α comprising a cured product of the curable resin composition is formed on the surface of the base material, the shear strength between the insulating portion and the cured coating film α is referred to as A (MPa); when a cured coating film α comprising a cured product of the curable resin composition is formed on the surface of the conductive portion of the base material, the shear strength between the conductive portion and the cured coating film α is referred to as B (MPa); and when a cured coating film α comprising a cured product of the curable resin composition is formed on the surface of a cured coating film β comprising the cured product of the curable resin composition, the shear strength between the cured coating film α and the cured coating film β is referred to as C (MPa); then A, B and C are all 1 MPa or more and 15 MPa or less; and A and B are 0.5 times or more and 5 times or less than C.

    COMPOSITION FOR FORMING CURED FILM PATTERN, AND METHOD FOR PRODUCING CURED FILM PATTERN BY USING THE SAME
    39.
    发明公开
    COMPOSITION FOR FORMING CURED FILM PATTERN, AND METHOD FOR PRODUCING CURED FILM PATTERN BY USING THE SAME 审中-公开
    组合物技术形成固化膜的结构及方法的固化膜结构进行了本

    公开(公告)号:EP2116902A1

    公开(公告)日:2009-11-11

    申请号:EP08710841.1

    申请日:2008-02-06

    摘要: A composition for forming a cured film pattern comprises a combination of: an alkaline developable photocurable and thermosetting composition containing no thermal curing catalyst; and a developing solution comprising an aqueous solution of a basic curing catalyst of a nitrogen-containing heterocyclic compound for promoting a thermosetting reaction so that it has a long pot-life (useful life) after mixing of a main agent and a hardener or has excellent storage stability as a one-package composition. Preferably, the basic curing catalyst is a heterocyclic compound having an amidine structure. A film of the photocurable and thermosetting composition is selectively exposed to an actinic energy ray and then developed with the developing solution to remove an unexposed area of the film. At this time, the basic curing catalyst penetrates into the photocured film to effect doping. As a result, the film becomes excellent in thermosetting properties besides the patterning properties by development.

    摘要翻译: 一种用于形成固化膜图案组合物包含以下的组合:一个碱显影的光固化和不含热固化催化剂的热固性组合物; 以及用于宣传婷含氮杂环化合物的热固性反应,从而做到了具有主剂的混合后一个长的适用期(使用寿命)和硬化剂或具有优异的碱性固化催化剂的wässrige溶液的显影溶液,其包含 储存稳定性作为单组分组合物。 优选地,所述碱性固化催化剂为具有脒在结构的杂环化合物。 电影的光固化和热固性组合物的暴露,以选择性地对光化能量射线,然后用显影溶液显影在胶片的未曝光区域除去。 此时,碱性固化催化剂渗透到光固化膜,以实现掺杂。 其结果是,该薄膜变得优异在除了通过显影图案化特性热固性性质。