公开(公告)号：EP2739764A2

公开(公告)日：2014-06-11

申请号：EP12819519.5

申请日：2012-08-03

申请人： Institute Of Geological And Nuclear Sciences Limited

发明人： FUTTER, Richard John ,  MARKWITZ, Andreas

IPC分类号： C23C14/48 ,  C23C14/00 ,  H01J1/88

CPC分类号： H01J37/08 ,  C23C14/046 ,  C23C14/48 ,  C23C14/562 ,  H01J3/04 ,  H01J27/14 ,  H01J37/3171 ,  H01J2237/002 ,  H01J2237/061

摘要： The invention provides an ion source comprising first and second cathode pole pieces spaced apart from one another to form a cavity therebetween, an edge of the first cathode pole piece being spaced apart from an edge of the second cathode pole piece to define an elongate cathode gap between the respective edges of the pole pieces, the elongate cathode gap having a longitudinal axis; at least one magnet arranged for magnetising the first and second cathode pole pieces with opposite magnetic polarities; an elongate anode located in the cavity, the anode being spaced apart from the first and second cathode pole pieces and having a longitudinal axis, the longitudinal axis of the elongate anode and the longitudinal axis of the elongate cathode gap substantially coplanar; a first electrical connection which extends from outside the cavity to the anode; and a gas feed conduit which extends from outside the cavity to inside the cavity for introducing a gas into the cavity.

公开(公告)号：EP1662848B1

公开(公告)日：2012-01-11

申请号：EP05026005.8

申请日：2005-11-29

申请人： Samsung Electronics Co., Ltd.

发明人： Park, Won-taek ,  Volynets, Vladimir Dormitory of Samsung.. ,  Kim, Young-eal Dormitory of Samsung..

IPC分类号： H05H1/54 ,  F03H1/00 ,  H01J37/32

CPC分类号： H05H1/54 ,  H01J27/14

公开(公告)号：EP1390964B1

公开(公告)日：2011-12-07

申请号：EP02723835.1

申请日：2002-04-10

申请人： General Plasma, Inc.

发明人： MADOCKS, John, E.

IPC分类号： H01J27/00 ,  H01J37/32 ,  H01J49/42 ,  C23C16/50 ,  C23C16/505 ,  C23C16/54

CPC分类号： H01J27/14 ,  C23C16/50 ,  C23C16/505 ,  C23C16/545 ,  H01J37/32623 ,  H01J37/3266 ,  H01J37/3277 ,  H05H1/14

摘要： A dipole ion source (Figure 1) includes two cathode surfaces, a substrate (1) and a pole (3); wherein a gap is defined between the substrate and the pole; an unsymmetrical mirror magnetic field including a compressed end, wherein the substrate is positioned in the less compressed end of the magnetic field; and an anode (4) creating an electric field penetrating the magnetic field and confining electrons in a continuous Hall current loop, wherein the unsymmetrical magnetic field serves an ion beam on the substrate.

摘要翻译： 偶极子离子源（图1）包括两个阴极表面，一个衬底（1）和一个极（3）; 其中在所述基板和所述极之间限定间隙; 包括压缩端的非对称镜像磁场，其中所述衬底位于所述磁场的较小压缩端中; 和产生穿透磁场并将电子限制在连续霍尔电流回路中的电场的阳极（4），其中非对称磁场用于衬底上的离子束。

公开(公告)号：EP1662848A2

公开(公告)日：2006-05-31

申请号：EP05026005.8

申请日：2005-11-29

申请人： Samsung Electronics Co., Ltd.

发明人： Park, Won-taek ,  Volynets, Vladimir Dormitory of Samsung.. ,  Kim, Young-eal Dormitory of Samsung..

IPC分类号： H05H1/54

CPC分类号： H05H1/54 ,  H01J27/14

摘要： An electromagnetic induced accelerator based on coil-turn modulation, including inner and outer cylinders with different diameters, the cylinders being coaxially disposed to form a channel which is a spatial portion therebetween; a discharging coil wound spirally inward along the upper surface of the channel for generating plasma by inducing a magnetic field and secondary current in the channel; and inner and outer coils wound helically around along the inner surface of the inner cylinder and the outer surface of the outer cylinder in parallel with each other for accelerating plasma in the direction of a common axis of the inner and outer cylinders by offsetting the magnetic field induced in the direction of the axis.

摘要翻译： 一种基于线圈匝调制的电磁感应加速器，包括具有不同直径的内圆柱体和外圆柱体，该圆柱体同轴地设置以形成在其间的空间部分的通道; 沿着通道的上表面螺旋地向内缠绕的放电线圈，用于通过在通道中引起磁场和次级电流来产生等离子体; 并且内圈和外圈线圈沿着内筒的内表面和外筒的外表面螺旋地缠绕，彼此平行，以通过偏移磁场来促进等离子体在内外缸的公共轴线的方向上 在轴的方向上引起。

公开(公告)号：EP1390558A1

公开(公告)日：2004-02-25

申请号：EP02764187.7

申请日：2002-04-10

申请人： Applied Process Technologies

发明人： MADOCKS, John, E.

IPC分类号： C23C14/35 ,  C23C16/00 ,  C23F1/02

CPC分类号： H01J27/14 ,  C23C16/50 ,  C23C16/505 ,  C23C16/545 ,  H01J37/32623 ,  H01J37/3266 ,  H01J37/3277 ,  H05H1/14

摘要： The preferred embodiments described herein provide a Penning discharge plasma source. The magnetic and electric field arrangement, similar to a Penning discharge, effectively traps the electron Hall current in a region between two surfaces. When a substrate (10) is positioned proximal to at least one of the electrodes (11, 12) and is moved relative to the plasma, the substrate (10) is plasma treated, coated or otherwise modified depending upon the process gas used and the process pressure. This confinement arrangement produces dramatic results not resembling known prior art. Using this new source, many applications for PECVD, plasma etching, plasma treating, sputtering or other plasma processes will be substantial improved or made possible. In particular, applications using flexible webs (10) are benefited.

公开(公告)号：EP0880798A1

公开(公告)日：1998-12-02

申请号：EP97908672.0

申请日：1997-02-14

申请人： Eaton Corporation

发明人： BRAILOVE, Adam, A. ,  ROSE, Peter, H. ,  BLAKE, Julian, G. ,  YANG, Zhongmin ,  PURSER, Kenneth, H.

IPC分类号： H01J27 ,  H01J37 ,  H01L21

CPC分类号： H01L21/67109 ,  H01J27/14 ,  H01J37/08 ,  H01J37/18 ,  H01J37/3002 ,  H01J37/3007 ,  H01J37/304 ,  H01J37/3171 ,  H01J2237/022 ,  H01J2237/083 ,  H01J2237/184 ,  H01J2237/2001 ,  H01J2237/2007 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/31701 ,  H01J2237/31705 ,  H01L21/67069 ,  H01L21/67748 ,  H01L21/67751 ,  H01L21/67778 ,  H01L21/6838

摘要： A system and method for conductively and/or convectively transferring heat away from a workpiece that has been processed by a processing system, such as an ion implantation system. The conductive transfer of heat from the workpiece is effectuated by disposing the workpiece in relatively close proximity with a floor of a load lock, which is maintained at a relatively cool temperature. The chamber pressure is disposed at a selected pressure by a pressure regulator and a vacuum pressure is applied to the backside of the workpiece closest to draw the workpiece into contact with the chamber floor, thereby effecting heat transfer from the workpiece to the cooling surface.

公开(公告)号：EP0217361B1

公开(公告)日：1993-12-01

申请号：EP86113440.1

申请日：1986-09-30

申请人： HITACHI, LTD.

发明人： Ohno, Yasunori ,  Kurosawa, Tomoe ,  Sato, Tadashi ,  Kurosawa, Yukio ,  Hakamata, Yoshimi

IPC分类号： H01J37/08 ,  H01J27/14

CPC分类号： H01J27/14 ,  H01J27/18 ,  H01J37/08

公开(公告)号：EP0249658B1

公开(公告)日：1993-10-27

申请号：EP86117505.7

申请日：1986-12-16

申请人： HITACHI, LTD.

发明人： Sato, Tadashi ,  Ohno, Yasunori ,  Kurosawa, Tomoe ,  Sekimoto, Nobuya ,  Hakamata, Yoshimi ,  Kurosawa, Yukio ,  Hirasawa, Kunio

IPC分类号： H01J27/14 ,  H01J27/02

CPC分类号： H01J27/14

公开(公告)号：EP0135366B1

公开(公告)日：1990-11-07

申请号：EP84305544.3

申请日：1984-08-15

申请人： APPLIED MATERIALS, INC.

发明人： Aitken, Derek

IPC分类号： H01J37/04 ,  H01J37/317

CPC分类号： H01J49/30 ,  H01J27/022 ,  H01J27/028 ,  H01J27/14 ,  H01J37/05 ,  H01J37/08 ,  H01J37/3171

公开(公告)号：EP0282677A1

公开(公告)日：1988-09-21

申请号：EP87310850.0

申请日：1987-12-10

申请人： Brown, Ian Gordon ,  Macgill, Robert Allan

发明人： Brown, Ian Gordon ,  Macgill, Robert Allan

IPC分类号： H01J27/02

CPC分类号： H01J27/14 ,  H01J27/08

摘要： An ion generating apparatus utilizing a vacuum chamber, a plurality of cathode (250) located on a movable portion of a support member and an anode in the chamber. A source of electrical power produces an arc or discharge between the cathode and anode. The arc is sufficient to vaporize a portion of the cathode to form a plasma. The plasma is directed to an extractor which separates the electrons from the plasma, and accelerates the ions to produce an ion beam.

摘要翻译： 一种使用真空室的离子产生装置，位于支撑件的可移动部分上的多个阴极（250）和腔室中的阳极。 电源产生阴极和阳极之间的电弧或放电。 电弧足以蒸发阴极的一部分以形成等离子体。 等离子体被引导到分离电子与等离子体的提取器，并加速离子以产生离子束。