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    SUCTION APPARATUS, SEMICONDUCTOR DEVICE OBSERVATION DEVICE, AND SEMICONDUCTOR DEVICE OBSERVATION METHOD
    71.
    发明授权
    SUCTION APPARATUS, SEMICONDUCTOR DEVICE OBSERVATION DEVICE, AND SEMICONDUCTOR DEVICE OBSERVATION METHOD 有权
    吸附装置，半导体装置观察装置和半导体装置观察方法

    公开(公告)号：EP2587529B1

    公开(公告)日：2018-01-17

    申请号：EP11798145.6

    申请日：2011-06-21

    申请人： Hamamatsu Photonics K.K.

    发明人： TERADA Hirotoshi ,  MATSUURA Hiroyuki

    IPC分类号： G01N21/95 ,  H01L21/683 ,  H01L21/687 ,  H01L21/66

    CPC分类号： G01N21/9501 ,  G01N21/01 ,  H01L21/6838 ,  H01L21/68757 ,  H01L21/68785 ,  H01L22/12

    摘要： A suction unit 10 includes a main body portion having a first surface 13 on which a semiconductor wafer W formed with a semiconductor device D is arranged and a second surface 14 that is a surface opposite to the first surface 13, and in which a through-hole 15 that penetrates through the first surface 13 and the second surface 14 is formed and a light transmitting portion having a light incident surface 16 onto which light from the semiconductor device D is made incident and a light emitting surface 17 from which light made incident from the light incident surface 16 is emitted, and which is fitted to the through-hole 15. Further, in the first surface 13, a first suction groove 13a for vacuum sucking the semiconductor wafer W to fix the semiconductor device D to the light incident surface 16 is formed, and in the second surface 14, a second suction groove 14a for vacuum sucking the solid immersion lens S to fix the solid immersion lens S to the light emitting surface 17 is formed.

    SUBSTRATE HOLDER FOR VERTICAL GALVANIC METAL DEPOSITION
    76.
    发明公开
    SUBSTRATE HOLDER FOR VERTICAL GALVANIC METAL DEPOSITION 审中-公开
    SUBSTRATHALTER ZUR VERTIKALEN GALVANISCHEN METALLABLAGERUNG

    公开(公告)号：EP3034657A1

    公开(公告)日：2016-06-22

    申请号：EP14199449.1

    申请日：2014-12-19

    申请人： Atotech Deutschland GmbH

    发明人： Fendel, Arnulf ,  Rauenbusch, Ralph ,  Bussenius, Tobias

    IPC分类号： C25D17/00 ,  C25D17/06

    CPC分类号： C25D17/06 ,  C25D17/001 ,  C25D17/004 ,  C25D17/005 ,  H01L21/2885 ,  H01L21/67126 ,  H01L21/68721 ,  H01L21/68757 ,  H01L21/68764

    摘要： The present invention is related to a substrate holder for vertical galvanic metal, preferably copper, deposition on a substrate to be treated comprising a first substrate holder part and a second substrate holder part, wherein both substrate holder parts comprise an inner metal comprising part and an outer non-metallic part characterized in that the substrate holder further comprises
    i) At least one hanging element in each substrate holder part for mechanically connecting the substrate holder to a treatment container,
    ii) At least one first sealing element in each substrate holder part arranged between the substrate to be treated and the respective substrate holder part,
    iii) At least one single second sealing element for the entire substrate holder arranged between the inner metal comprising part of the substrate holder and the outer non-metallic part of the substrate holder,
    iv) At least one fastening system for detachably fastening both substrate holder parts to each other for holding the substrate to be treated,
    v) At least one first contact element in each substrate holder part for forwarding current from an outer source through the hanging element to the at least second contact element, and
    vi) At least one second contact element in each substrate holder part for forwarding current from the at least first contact element to the substrate to be treated.

    摘要翻译： 本发明涉及用于垂直电流金属的衬底保持器，优选铜，待处理衬底上的沉积，包括第一衬底保持器部分和第二衬底保持器部分，其中两个衬底保持器部件包括内部金属部分和 外部非金属部件，其特征在于，所述基板支架还包括i）每个基板保持器部分中的至少一个悬挂元件，用于将所述基板保持器机械连接到处理容器，ii）每个基板保持器部分中的至少一个第一密封元件布置 在待处理基板和相应的基板保持器部分之间，iii）至少一个用于整个基板保持器的单个第二密封元件，其布置在包括基板保持器的一部分的内部金属和基板保持器的外部非金属部分之间， iv）至少一个紧固系统，用于可拆卸地将两个基板保持器部分彼此固定以保持 处理待处理的衬底，v）每个衬底保持器部分中的至少一个第一接触元件，用于将电流从外部源通过悬挂元件转移到至少第二接触元件，以及vi）每个中至少一个第二接触元件 用于将电流从至少第一接触元件转移到待处理的衬底的衬底保持器部分。

    PLACEMENT MEMBER AND METHOD FOR MANUFACTURING SAME
    78.
    发明公开
    PLACEMENT MEMBER AND METHOD FOR MANUFACTURING SAME 审中-公开
    VERFAHREN ZUR HERSTELLUNG DAVON的PLATZIERUNGSELEMENT

    公开(公告)号：EP2927947A1

    公开(公告)日：2015-10-07

    申请号：EP13858965.0

    申请日：2013-11-14

    申请人： Kyocera Corporation

    发明人： HORIUCHI, Masahiko

    IPC分类号： H01L21/683 ,  G03F7/20 ,  H01L21/027

    CPC分类号： H01L21/68757 ,  B05D7/52 ,  G03F7/707 ,  H01L21/6875

    摘要： A placement member (1) in accordance with an embodiment of the present invention includes a base (4) having a placement section (3) on which an object (2) is placed, and a coating film (5) that coats at least a part of the placement section (3). The placement section (3) has a bottom face (8), a plurality of projections (9) projecting from the bottom face (8), and an annular protrusion (10) that protrudes from the bottom face (8) at the same height as the plurality of projections (9) and surrounds the plurality of projections (9). The coating film (5) has a first region (15) that coats top faces (11) of the projections (9) and a second region (16) that coats a top face (13) of the annular protrusion (10) and has a smaller thickness than that of the first region (15).

    摘要翻译： 根据本发明实施例的放置构件（1）包括：基座（4），其具有放置有物体（2）的放置部分（3）;以及涂膜（5），其涂覆至少一个 放置部分（3）的一部分。 放置部（3）具有底面（8），从底面（8）突出的多个突起（9）和从底面（8）以相同高度突出的环状突起（10） 作为多个突起（9）并且围绕多个突起（9）。 涂膜（5）具有涂覆突起（9）的顶面（11）的第一区域（15）和涂覆环形突起（10）的顶面（13）的第二区域（16） 比第一区域（15）的厚度小。