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公开(公告)号:EP4111483A1
公开(公告)日:2023-01-04
申请号:EP21705210.9
申请日:2021-02-18
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公开(公告)号:EP4350733A1
公开(公告)日:2024-04-10
申请号:EP22200380.8
申请日:2022-10-07
发明人: DE LANGEN, Johannes, Cornelis, Jacobus , KONING, Johan, Joost , DEL TIN, Laura , DOESBURG, Olivier, Jacob , ZIJL, Gomaar
摘要: A charged particle-optical module 41 for directing charged particles along a path towards a sample location, the charged particle-optical module comprises: a plurality of planar elements or electrodes 61-64 arranged across the path and configured to operate on the charged particles; a thermal conditioning channel 80 spaced from the planar elements in a direction through the plurality of elements; and a thermally conductive plate 61-64;240;75 connected to the thermal conditioning channel for transferring heat towards the thermal conditioning channel; wherein the thermally conductive plate extends between the planar elements and the thermal conditioning channel in a direction parallel to one or more of the planar elements.
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公开(公告)号:EP3971938A1
公开(公告)日:2022-03-23
申请号:EP20197510.9
申请日:2020-09-22
发明人: OTTEN, Christiaan , CRANS, Peter-Paul , SMITS, Marc , DEL TIN, Laura , TEUNISSEN, Christan , HUANG, Yang-Shan , STEENBRINK, Stijn, Wilem, Herman, Karel , HU, Xuerang , XI, Qingpo , LUO, Xinan , LIU, Xuedong
摘要: Disclosed herein is a module for supporting a device configured to manipulate charged particle paths in a charged particle apparatus, the module comprising: a support arrangement configured to support the device, wherein the device is configured to manipulate a charged particle path within the charged particle apparatus; and a support positioning system configured to move the support arrangement within the module; wherein the module is arranged to be field replaceable in the charged particle apparatus.
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公开(公告)号:EP4354486A1
公开(公告)日:2024-04-17
申请号:EP22201402.9
申请日:2022-10-13
IPC分类号: H01J37/24 , H01J37/244
CPC分类号: H01J37/24 , H01J2237/150420130101 , H01J2237/120220130101 , H01J37/244 , H01J2237/043720130101
摘要: A charged particle-optical element for a charged particle-optical module configured to direct charged particles along at least one beam path, the charged particle-optical element comprising: a substrate comprising at least one aperture for passage therethrough of the at least one beam path; at least one electronic component so as to provide a component surface of the substrate; and an electrical connector electrically connected to the at least one electronic component and extending through the substrate; wherein the substrate comprises a thicker portion and a thinner portion that is thinner than the thicker portion, and the electrical connector extends through the thinner portion.
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公开(公告)号:EP4354483A1
公开(公告)日:2024-04-17
申请号:EP22200582.9
申请日:2022-10-10
发明人: DE LANGEN, Johannes, Cornelis, Jacobus , KONING, Johan, Joost , SCHEFFERS, Paul, IJmert , DEL TIN, Laura , STEUNEBRINK, Martin
CPC分类号: H01J37/04 , H01J37/09 , H01J2237/045320130101
摘要: A stack of planar elements for a charged particle-optical module configured to project charged particles along a beam path, the stack comprising: a pair of adjoining planar elements arranged across the beam path, wherein one of the planar elements comprises an alignment fiducial and the other of the planar elements comprises a monitoring aperture; wherein the pair of planar elements are positioned relative to each other such that the alignment fiducial and the monitoring aperture are aligned with each other in a direction substantially perpendicular to a plane of the planar elements.
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公开(公告)号:EP3872836A1
公开(公告)日:2021-09-01
申请号:EP20160282.8
申请日:2020-02-28
发明人: DEL TIN, Laura , STEGEMANN, Almut, Johanna , AKSENOV, German , MARTINEZ NEGRETE GASQUE, Diego , BRANDT, Pieter, Lucas
摘要: Disclosed herein is a manipulator lensing device for focusing a beam of charged particles, wherein the manipulator lensing device comprises a first structure 401 through which is formed an opening, wherein the path of the beam is substantially along a longitudinal axis of the opening, a second structure 402 with a surface 406 surrounding the opening, a support 403 that connects the second structure to the first structure and surrounds the second structure, and an electrode arrangement 407 provided on the surface 406 of the second structure,
wherein a first surface 404 of the first structure 401 surrounds the opening, a second surface 405 of the first structure 401 surrounds the opening, the surface 406 of the second structure 402 is arranged along the longitudinal axis between the first and second surfaces of the first structure, the electrode arrangement 407 and each of the first 404 and second 405 surfaces of the first structure 401 are separated from each other by a respective gap in a direction parallel to the longitudinal axis.
Further disclosed is a multi-array lens configured focus a plurality of beamlets of charged particles along a multi-beam path, wherein each lens in the array comprises said manipulator lensing device.-
公开(公告)号:EP4418302A1
公开(公告)日:2024-08-21
申请号:EP23156956.7
申请日:2023-02-16
发明人: RODRIGUES MANSANO, Andre, Luis , WIELAND, Marco, Jan-Jaco , DEL TIN, Laura , SLOT, Erwin , MA, Yue , VAN DEN BROM, Alrik
IPC分类号: H01J37/04 , H01J37/24 , H01J37/244
CPC分类号: H01J37/04 , H01J37/244 , H01J2237/281720130101 , H01J2237/00220130101 , H01J37/24 , H01J2237/248720130101 , H01J2209/1820130101
摘要: A charged particle-optical element is disclosed. The element is for a charged particle-optical module configured to direct charged particles along at least one beam path towards a sample. In one arrangement, the element comprises a chip comprising an integrated circuit 64 formed in a semiconductor substrate 61. The substrate defines at least one aperture 63 for passage therethrough of the at least one beam path. A size of the substrate exceeds a die-size of a lithographic imaging system used during manufacturing of the integrated circuit.
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公开(公告)号:EP4376048A1
公开(公告)日:2024-05-29
申请号:EP22209068.0
申请日:2022-11-23
发明人: URBANUS, Willem, Henk , DE LANGEN, Johannes, Cornelis, Jacobus , WIELAND, Marco, Jan-Jaco , DEL TIN, Laura , KONING, Johan, Joost
CPC分类号: H01J37/18 , H01J37/26 , H01J37/04 , H01J2237/043520130101 , H01J2237/045320130101 , H01J2237/049220130101 , H01J2237/18820130101
摘要: The present disclosure relates to charged particle devices for projecting charged particles towards a sample and methods of assessing a sample using charged particles. A charged particle optical element directs beams of charged particles towards a sample. The charged particle optical element comprising a plate in which is defined beam apertures and a plurality of vent apertures. A beam tube defines an inner tube volume comprising paths up-beam of the plate of charged particles of the beams, and an outer tube region that is outside of the beam tube. The beam apertures are for passage towards the sample of charged particles of the beams, from the inner tube volume to a down-beam volume on an opposite side of the plate to the inner tube volume. Vent apertures fluidically connect the down-beam volume to the outer tube region.
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公开(公告)号:EP4165675A1
公开(公告)日:2023-04-19
申请号:EP21729576.5
申请日:2021-06-03
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