VORRICHTUNG UND VERFAHREN ZUR GALVANISCHEN BESCHICHTUNG

    公开(公告)号:EP2010699A2

    公开(公告)日:2009-01-07

    申请号:EP07728172.3

    申请日:2007-04-17

    Applicant: BASF SE

    Abstract: The invention relates to a device for electroplating at least one electrically conductive substrate (8), or an electrically conductive structure situated on a non-conductive substrate (8). Said device comprises at least one bath, an anode and a cathode (2). The bath contains an electrolyte solution, which comprises at least one metal salt and from which metal ions are deposited on electrically conductive surfaces of the substrate, as the cathode is brought into contact with the surface of the substrate to be coated and said substrate is conveyed through the bath. The cathode comprises at least one strip (2) with at least one electrically conductive segment (12) and is guided around at least two rotating shafts (3). The invention also relates to a method for electroplating at least one substrate that is carried out in a device according to the invention. According to said method, to produce the coating, the strip lies on the substrate and circulates at a speed corresponding to the speed at which the substrate is conveyed through the bath. The invention further relates to the use of said device for electroplating electrically conductive structures situated on an electrically non-conductive support.

    Abstract translation: 本发明涉及用于电镀至少一个导电衬底(8)或位于不导电衬底(8)上的导电结构的装置。 所述装置包括至少一个浴,阳极和阴极(2)。 该浴含有电解质溶液,该电解质溶液包含至少一种金属盐,并且当阴极与待涂覆的基底的表面接触并且所述基底被传送时,电解质溶液从其中沉积金属离子在基底的导电表面上 通过洗澡。 阴极包括具有至少一个导电段(12)的至少一个带(2),并围绕至少两个旋转轴(3)被引导。 本发明还涉及一种用于电镀至少一个在根据本发明的装置中执行的基板的方法。 根据所述方法,为了产生涂层,条带位于基底上并以与基底通过浴槽的速度相对应的速度循环。 本发明进一步涉及所述装置用于电镀位于不导电支撑件上的导电结构的用途。

    VERFAHREN ZUR HERSTELLUNG VON STRUKTURIERTEN, ELEKTRISCH LEITFÄHIGEN OBERFLÄCHEN
    8.
    发明公开
    VERFAHREN ZUR HERSTELLUNG VON STRUKTURIERTEN, ELEKTRISCH LEITFÄHIGEN OBERFLÄCHEN 审中-公开
    用于生产结构化的,导电表面

    公开(公告)号:EP2050321A1

    公开(公告)日:2009-04-22

    申请号:EP07788054.0

    申请日:2007-07-31

    Applicant: BASF SE

    Abstract: The invention relates to a method for producing structured, and/or the entire surface spanning, electrically conductive surfaces (3, 11) on an electrically nonconductive carrier 5 (1), wherein in a first step the surfaces (3) of a first level are applied to the carrier (1), in a second step the insulating layer (9) is applied at those positions, at which structured, and/or the entire surface spanning, electrically conductive surfaces (11) of a second level cross the structured, and/or the entire surface spanning, electrically conductive surfaces (3) of the first level, and no electrical contact is to occur between the structured, and/or the entire surface spanning, electrically conductive surfaces of the first level (3) and of the second level (11), in a third step the structured, and/or the entire surface spanning, electrically conductive surfaces (11) of the second level are applied according the first step, and the second and third steps are repeated, if necessary.

    VORRICHTUNG UND VERFAHREN ZUR GALVANISCHEN BESCHICHTUNG

    公开(公告)号:EP2010700A2

    公开(公告)日:2009-01-07

    申请号:EP07727869.5

    申请日:2007-04-05

    Applicant: BASF SE

    CPC classification number: C25D17/12 C25D7/0657 C25D17/005 C25D17/06 C25D17/28

    Abstract: The invention relates to a device for electroplating at least one electrically conductive substrate or a structured or electrically conductive surface covering the whole area of a non-conductive substrate. Said device comprises at least one bath, an anode and a cathode. The bath contains an electrolyte solution, which comprises at least one metal salt and from which metal ions are deposited on electrically conductive surfaces of the substrate to form a metal layer, as the cathode is brought into contact with the surface of the substrate to be coated and said substrate is conveyed through the bath. The cathode comprises at least two discs (2, 4, 10) that are rotatably mounted on a respective shaft (1, 5, 14), said discs (2, 4, 10) intermeshing. The invention also relates to a method for electroplating at least one substrate, said method being carried out in a device according to the invention. The invention further relates to the use of said device for electroplating electrically conductive structures situated on an electrically non-conductive support.

    Abstract translation: 本发明涉及一种用于电镀至少一个导电衬底或覆盖非导电衬底的整个区域的结构化或导电表面的装置。 所述装置包括至少一个浴,阳极和阴极。 该浴包含电解质溶液,该电解质溶液包含至少一种金属盐,并且当该阴极与待涂覆的基底的表面接触时,该电解质溶液包含至少一种金属盐并且金属离子从该金属盐沉积在该基底的导电表面上以形成金属层 并且所述衬底被传送通过浴。 阴极包括至少两个可旋转地安装在相应的轴(1,5,14)上的盘(2,4,10),所述盘(2,4,10)互相啮合。 本发明还涉及用于电镀至少一个衬底的方法,所述方法在根据本发明的装置中执行。 本发明进一步涉及所述装置用于电镀位于不导电支撑件上的导电结构的用途。

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