公开(公告)号：EP1296352A4

公开(公告)日：2007-04-18

申请号：EP01945627

申请日：2001-06-27

申请人： EBARA CORP ,  TOSHIBA KK

发明人： NAKASUJI MAMORU ,  NOJI NOBUHARU ,  SATAKE TOHRU ,  HATAKEYAMA MASAHIRO ,  KIMBA TOSHIFUMI ,  SOBUKAWA HIROSI ,  YOSHIKAWA SHOJI ,  MURAKAMI TAKESHI ,  WATANABE KENJI ,  KARIMATA TSUTOMU ,  OOWADA SHIN ,  SAITO MUTSUMI ,  YAMAZAKI YUICHIRO ,  NAGAI TAKAMITSU ,  NAGAHAMA ICHIROTA

IPC分类号： G01N23/225 ,  H01J37/06 ,  H01J37/073 ,  H01J37/18 ,  H01J37/20 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28 ,  H01J37/29 ,  G01B15/00 ,  H01L21/66

CPC分类号： H01J29/70 ,  G01N23/225 ,  G01N23/2251 ,  G01N23/227 ,  H01J37/06 ,  H01J37/073 ,  H01J37/141 ,  H01J37/185 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/266 ,  H01J37/28 ,  H01J2237/082 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2816 ,  H01J2237/2817 ,  H01L21/6719 ,  H01L21/67213

摘要： An electron beam inspection apparatus comprising an electrooptical unit (70) comprising an electrooptical system for irradiating an object with a primary electron beam from an electron source and projecting the image of secondary electrons emitted from the object and a detector for detecting the image of secondary electrons projected from the electrooptical system, a stage unit (50) for moving the object relatively to the electrooptical system while holding it a mini-environment unit (20) for blocking adhesion of dust to the object by supplying cleaning gas thereto, a working chamber (31) containing the stage unit and controllable to vacuum atmosphere, at least two loading chambers (41, 42) disposed between the mini-environment unit and the working chamber and controllable independently to vacuum atmosphere, and a loader (60) for feeding the object to the stage unit through the loading chambers.

公开(公告)号：EP1261016A4

公开(公告)日：2007-06-27

申请号：EP01980965

申请日：2001-11-02

申请人： EBARA CORP

发明人： NAKASUJI MAMORU ,  NOJI NOBUHARU ,  SATAKE TOHRU ,  HAMASHIMA MUNEKI ,  HATAKEYAMA MASAHIRO ,  WATANABE KENJI ,  KATO TAKAO ,  SOBUKAWA HIROSI ,  KARIMATA TSUTOMU ,  YOSHIKAWA SHOJI ,  KIMBA TOSHIFUMI ,  OOWADA SHIN ,  SAITO MUTSUMI

IPC分类号： G01N23/225 ,  H01J37/06 ,  H01J37/063 ,  H01J37/073 ,  H01J37/18 ,  H01J37/20 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28 ,  H01J37/29 ,  H01L21/027 ,  H01L21/66

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G01N23/225 ,  H01J37/06 ,  H01J37/063 ,  H01J37/073 ,  H01J37/185 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J37/3174 ,  H01J2237/0435 ,  H01J2237/0635 ,  H01J2237/082 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/2446 ,  H01J2237/24485 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2816 ,  H01J2237/2817

摘要： An electron beam device for applying a primary electron beam onto a sample, and detecting a secondary electron beam produced from a sample surface by the irradiation to evaluate the sample surface, characterized in that the cathode of an electron gun for emitting primary electron beam have a plurality of emitters disposed at intervals on one circle centered on the optical axis of a primary electron optical system and emitting a primary electron beam, and the plurality of emitters are disposed so that points projected on a line parallel to the scanning direction of the primary electron beam are arranged at equal intervals.

公开(公告)号：EP1271605A4

公开(公告)日：2009-09-02

申请号：EP01980964

申请日：2001-11-02

申请人： EBARA CORP

发明人： NAKASUJI MAMORU ,  SATAKE TOHRU ,  WATANABE KENJI ,  MURAKAMI TAKESHI ,  NOJI NOBUHARU ,  SOBUKAWA HIROSI ,  KARIMATA TSUTOMU ,  YOSHIKAWA SHOJI ,  KIMBA TOSHIFUMI ,  OOWADA SHIN ,  SAITO MUTSUMI ,  HAMASHIMA MUNEKI ,  TAKAGI TORU ,  KIHARA NAOTO ,  NISHIMURA HIROSHI

IPC分类号： G01N23/225 ,  G01Q30/06 ,  H01J37/06 ,  H01J37/073 ,  H01J37/18 ,  H01J37/20 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28

CPC分类号： H01J37/185 ,  G01N23/225 ,  G01N23/2251 ,  H01J37/06 ,  H01J37/073 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/082 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2816 ,  H01J2237/2817

公开(公告)号：EP1304717A4

公开(公告)日：2009-12-09

申请号：EP01945626

申请日：2001-06-27

申请人： EBARA CORP

发明人： NAKASUJI MAMORU ,  NOJI NOBUHARU ,  SATAKE TOHRU ,  KIMBA TOSHIFUMI ,  SOBUKAWA HIROSI ,  KARIMATA TSUTOMU ,  OOWADA SHIN ,  YOSHIKAWA SHOJI ,  SAITO MUTSUMI

IPC分类号： G01N23/225 ,  G03F1/76 ,  G03F1/78 ,  H01J37/06 ,  H01J37/073 ,  H01J37/18 ,  H01J37/20 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28 ,  H01J37/29 ,  G01B15/00 ,  H01L21/30

CPC分类号： G01N23/225 ,  H01J37/06 ,  H01J37/073 ,  H01J37/185 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/082 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2816 ,  H01J2237/2817

公开(公告)号：EP1273907A4

公开(公告)日：2006-08-30

申请号：EP01980963

申请日：2001-11-02

申请人： EBARA CORP

发明人： NAKASUJI MAMORU ,  NOJI NOBUHARU ,  SATAKE TOHRU ,  HAMASHIMA MUNEKI ,  KIMBA TOSHIFUMI ,  HATAKEYAMA MASAHIRO ,  WATANABE KENJI ,  SOBUKAWA HIROSI ,  KARIMATA TSUTOMU ,  YOSHIKAWA SHOJI ,  OOWADA SHIN ,  SAITO MUTSUMI

IPC分类号： G01N23/225 ,  H01J37/06 ,  H01J37/073 ,  H01J37/18 ,  H01J37/20 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28

CPC分类号： G01N23/225 ,  H01J37/06 ,  H01J37/073 ,  H01J37/185 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/082 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2816 ,  H01J2237/2817

摘要： A wafer inspecting instrument for inspecting a pattern formed on a wafer by irradiating the wafer with a charged particle beams. The wafer inspecting instrument comprises a charged particle beam generating means, a primary optical system including a means for irradiating a multi-aperture plate having a plurality of apertures with a charged particle beam generated from the beam generating means and for focusing a plurality of charged particle beams having passed through the apertures in the wafer surface, a secondary optical system which secondary charged particle beams radiated from the wafer enter, an electron beam apparatus including a detection system for detecting the secondary charged particle beam to output an electric signal and a processing control system for processing and evaluating the electric signal, a stage apparatus for holding and moving the wafer, and a working chamber which can be controlled to a desired atmosphere.

公开(公告)号：EP2184770A4

公开(公告)日：2013-01-09

申请号：EP08765858

申请日：2008-06-24

申请人： EBARA CORP

发明人： KIMBA TOSHIFUMI ,  KUSA HIROAKI ,  FUJII MASAKI

IPC分类号： H01L21/304 ,  B24B9/00 ,  B24B9/06 ,  B24B37/005 ,  B24B49/12

CPC分类号： B24B49/12 ,  B24B9/065 ,  B24B37/005

公开(公告)号：EP1630862A4

公开(公告)日：2012-04-25

申请号：EP04745387

申请日：2004-05-28

申请人： EBARA CORP

发明人： KIMBA TOSHIFUMI ,  NAKASUJI MAMORU ,  SATAKE TOHRU

IPC分类号： H01L21/66 ,  G06T7/00 ,  H01J37/304

CPC分类号： G06T7/001 ,  G06T2207/30148 ,  H01J37/29 ,  H01J37/3045 ,  H01J2237/2817 ,  H01J2237/2826 ,  H01J2237/30438

公开(公告)号：EP1635374A4

公开(公告)日：2010-02-24

申请号：EP04729530

申请日：2004-04-26

申请人： EBARA CORP

发明人： NOJI NOBUHARU ,  SATAKE TOHRU ,  SOBUKAWA HIROSI ,  KIMBA TOSHIFUMI ,  HATAKEYAMA MASAHIRO ,  YOSHIKAWA SHOJI ,  MURAKAMI TAKESHI ,  WATANABE KENJI ,  KARIMATA TSUTOMU ,  SUEMATSU KENICHI ,  TABE YUTAKA ,  TAJIMA RYO ,  TOHYAMA KEIICHI

IPC分类号： G01B15/00 ,  G01N23/225 ,  G01N23/20 ,  H01J37/05 ,  H01J37/06 ,  H01J37/09 ,  H01J37/12 ,  H01J37/147 ,  H01J37/153 ,  H01J37/16 ,  H01J37/18 ,  H01J37/20 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28 ,  H01J37/29 ,  H01L21/66

CPC分类号： G01N23/225 ,  H01J37/05 ,  H01J37/28 ,  H01J2237/2441 ,  H01J2237/2446 ,  H01J2237/2817

摘要： A system for further enhancing speed, i.e. improving throughput in a SEM-type inspection apparatus is provided. An inspection apparatus for inspecting a surface of a substrate produces a crossover from electrons emitted from an electron beam source 25·1, then forms an image under a desired magnification in the direction of a sample W to produce a crossover. When the crossover is passed, electrons as noises are removed from the crossover with an aperture, an adjustment is made so that the crossover becomes a parallel electron beam to irradiate the substrate in a desired sectional form. The electron beam is produced such that the unevenness of illuminance is 10% or less. Electrons emitted from the sample W are detected by a detector 25·11.

公开(公告)号：EP1296351A4

公开(公告)日：2009-09-23

申请号：EP01943833

申请日：2001-06-27

申请人： EBARA CORP

发明人： NAKASUJI MAMORU ,  NOJI NOBUHARU ,  SATAKE TOHRU ,  KIMBA TOSHIFUMI ,  SOBUKAWA HIROSI ,  YOSHIKAWA SHOJI ,  KARIMATA TSUTOMU ,  OOWADA SHIN ,  SAITO MUTSUMI ,  HAMASHIMA MUNEKI ,  TAKAGI TORU

IPC分类号： G01N23/225 ,  H01J37/06 ,  H01J37/073 ,  H01J37/18 ,  H01J37/20 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28 ,  H01J37/29 ,  G01B15/00 ,  H01L21/66

CPC分类号： G03F7/70616 ,  G01N23/225 ,  H01J37/05 ,  H01J37/06 ,  H01J37/073 ,  H01J37/075 ,  H01J37/185 ,  H01J37/20 ,  H01J37/222 ,  H01J37/226 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/0435 ,  H01J2237/057 ,  H01J2237/06316 ,  H01J2237/082 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/2446 ,  H01J2237/24485 ,  H01J2237/24564 ,  H01J2237/248 ,  H01J2237/2482 ,  H01J2237/2806 ,  H01J2237/2816 ,  H01J2237/2817