利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

216 条记录 (耗时 0.018 秒)

    METHOD FOR MANUFACTURING MEMS TORSIONAL ELECTROSTATIC ACTUATOR
    3.
    发明公开
    METHOD FOR MANUFACTURING MEMS TORSIONAL ELECTROSTATIC ACTUATOR 审中-公开

    公开(公告)号：EP3228584A4

    公开(公告)日：2018-07-04

    申请号：EP15865926

    申请日：2015-07-31

    申请人： CSMC TECHNOLOGIES FAB1 CO LTD

    发明人： JING ERRONG

    IPC分类号： B81C1/00

    CPC分类号： B81C1/00182 ,  B81B3/0021 ,  B81B2203/0118 ,  B81B2203/0315 ,  B81B2203/04 ,  B81B2203/058 ,  B81C1/00603 ,  B81C2201/0109 ,  B81C2201/0111

    摘要： A method for manufacturing an MEMS torsional electrostatic actuator comprises: providing a substrate (10), wherein the substrate (10) comprises a first silicon layer (100), a buried oxide layer (200) and a second silicon layer (300) that are laminated sequentially; patterning the first silicon layer (100) and exposing the buried oxide layer (200) to form a rectangular upper electrode plate (120) separated from a peripheral region (140), wherein the upper electrode plate (120) and the peripheral region (140) are connected by only using a cantilever beam (130), and forming, on the peripheral region (140), a recessed portion (110) exposing the buried oxide layer (200); patterning the second silicon layer (300) and exposing the buried oxide layer (200) to form a back cavity (310), wherein the back cavity (310) is located in a region of the second silicon layer (300) corresponding to the upper electrode plate (120), covers 40% to 60% of the area of the region corresponding to the upper electrode plate (120), and is close to one end of the cantilever beam (130); exposing the second silicon layer (300), and suspending the upper electrode plate (120) and the cantilever beam (130); and respectively forming an upper contact electrode (400) and a lower contact electrode (500) on the second silicon layer (300).

    Sacrificial layers made from aerogel for manufacturing MEMS devices
    8.
    发明公开
    Sacrificial layers made from aerogel for manufacturing MEMS devices 有权
    气凝胶的牺牲层用于制造MEMS器件

    公开(公告)号：EP2450309A3

    公开(公告)日：2014-04-30

    申请号：EP11187357.6

    申请日：2011-10-31

    申请人： Honeywell International Inc.

    发明人： Detry, James F.

    IPC分类号： B81C1/00

    CPC分类号： B81C1/00047 ,  B81B2203/0118 ,  B81B2203/0315 ,  B81C2201/0109

    摘要： Systems and methods for processing sacrificial layers in MEMS device fabrication are provided. In one embodiment, a method comprises: applying a patterned layer of Aerogel material onto a substrate to form an Aerogel sacrificial layer; applying at least one non-sacrificial silicon layer over the Aerogel sacrificial layer, wherein the non-sacrificial silicon layer is coupled to the substrate through one or more gaps provided in the patterned layer of Aerogel material; and removing the Aerogel sacrificial layer by exposing the Aerogel sacrificial layer to a removal liquid.

    METHODS OF MANUFACTURING A CAPACITIVE ELECTROMECHANICAL TRANSDUCER
    10.
    发明授权
    METHODS OF MANUFACTURING A CAPACITIVE ELECTROMECHANICAL TRANSDUCER 有权
    用于生产电容型机电变换器

    公开(公告)号：EP2274108B1

    公开(公告)日：2013-12-25

    申请号：EP09738898.7

    申请日：2009-04-28

    申请人： Canon Kabushiki Kaisha

    发明人： CHANG, Chienliu

    IPC分类号： B06B1/02 ,  B81B3/00 ,  B81C1/00

    CPC分类号： B06B1/0292 ,  B81B2201/038 ,  B81B2203/0127 ,  B81B2203/0315 ,  B81B2203/04 ,  B81C1/00476 ,  B81C2201/0114

    摘要： In a method of manufacturing a capacitive electromechanical transducer, a first electrode (8) is formed on a substrate (4), an insulating layer (9) which has an opening (6) leading to the first electrode is formed on the first electrode (8), and a sacrificial layer is formed on the insulating layer. A membrane (3) having a second electrode (1) is formed on the sacrificial layer, and an aperture is provided as an etchant inlet in the membrane. The sacrificial layer is etched to form a cavity (10), and then the aperture serving as an etchant inlet is sealed. The etching is executed by electrolytic etching in which a current is caused to flow between the first electrode (8) and an externally placed counter electrode through the opening (6) and the aperture of the membrane.