Abstract:
One example discloses a chip, comprising: a substrate (102, 202, 302, 602, 802); a first side of a passivation layer (206, 604, 804) coupled to the substrate (102, 202, 302, 602, 802); a device, having a device height and a cavity, wherein a first device surface is coupled to a second side of the passivation layer (206, 604, 804) which is opposite to the first side of the passivation layer (206, 604, 804); and a set of structures (108, 110, 214, 306, 410, 502, 504, 612, 614, 702, 812) coupled to the second side of the passivation layer (206, 604, 804) and configured to have a structure height greater than or equal to the device height.
Abstract:
In a connection panel for electronic components (1) comprising a plurality of insulating layers (8, 9, 2, 11, 12) and conductive layers (13, 14, 15) and further comprising an electronic sensor (4), the sensor (4) is comprised of at least one flexure member (4') formed by a flexure layer (2), the flexure member (4') protruding from the flexure layer (2) and into a clearance (3) within the flexure layer (2) and carrying at least a part of a flexure sensing device (6).
Abstract:
The present invention relates to a micro-electromechanical transducer comprising one or more moveable members, and a viscoelastic substance having a predetermined viscoelasticity, the viscoelastic substance being adapted to influence the response of the transducer in a predetermined manner. The micro-electromechanical transducer of the present invention may include a MEMS transducer, such as a MEMS microphone, a MEMS vibration sensor, a MEMS acceleration sensor, a MEMS receiver.
Abstract:
A configuration for a capacitive pressure sensor uses a silicon on insulator wafer to create an electrically isolated sensing node across a gap from a pressure sensing wafer. The electrical isolation, small area of the gap, and silicon material throughout the capacitive pressure sensor allow for minimal parasitic capacitance and avoid problems associated with thermal mismatch.
Abstract:
A process for manufacturing an integrated semiconductor device (55), envisages: forming a MEMS structure (26); forming an ASIC electronic circuit (36); and electrically coupling the MEMS structure to the ASIC electronic circuit (36). The MEMS structure and the ASIC electronic circuit are integrated starting from a same substrate (20) including semiconductor material; wherein the MEMS structure (26) is formed at a first surface (20a) of the substrate, and the ASIC electronic circuit is formed at a second surface (20b') of the substrate (20), vertically opposite to the first surface (20a) in a direction transverse to a horizontal plane of extension of the first surface (20a) and of the second surface (20b').
Abstract:
Sensor packages and methods of assembling a sensor in a sensor package are provided. A preferred embodiment comprises: a base including a sensor coupled to the base wherein the base has at least one electrical connection location and a first mechanical mating interface in the shape of an arc; an electronics package with at least one electrical connection location; and a ring coupled between the base and the electronics package wherein the ring electrically connects the at least one electrical connection location on the base and the at least one electrical connection location on the electronics package and wherein the base has a second mechanical mating interface in the shape of an arc that is reciprocal to the first mating interface.
Abstract:
Stress relief structures and methods that can be applied to MEMS sensors requiring a hermetic seal and that can be simply manufactured are disclosed. The system includes a sensor having a first surface and a second surface, the second surface being disposed away from the first surface, the second surface also being disposed away from a package surface and located between the first surface and the package surface, a number of support members, each support member extending from the second surface to the package surface, the support members being disposed on and operatively connected to only a portion of the second surface. The support member are configured to reduce stress produced by package-sensor interaction.
Abstract:
L'invention concerne une membrane en carbone amorphe pour un microsystème électromécanique, la membrane en carbone amorphe présentant une épaisseur comprise enre 1 nm et 50 nm, et de préférence comprise entre 3 nm et 20 nm, dans laquelle la membrane en carbone amorphe présente un taux d'hybridation de type sp 3 compris entre 20% et 40%.