公开(公告)号：EP3363270B1

公开(公告)日：2019-12-25

申请号：EP15781620.8

申请日：2015-10-12

申请人： Trumpf Laser- und Systemtechnik GmbH

发明人： SCHULZ, Robert ,  BECK, Torsten

IPC分类号： H05H1/46 ,  H01S3/134 ,  H01S3/10

公开(公告)号：EP1741168B1

公开(公告)日：2011-05-04

申请号：EP05724578.9

申请日：2005-03-03

申请人： Cymer, Inc.

发明人： STEIGER, Thomas, D. ,  HOLTAWAY, Edward, P. ,  MOOSMAN, Bryan, G. ,  RAO, Rajasekhar, M.

IPC分类号： H01S3/225 ,  H01S3/134 ,  H01S3/097 ,  H01S3/038 ,  H01S3/104 ,  H01S3/07 ,  H01S3/23

CPC分类号： H01S3/038 ,  H01S3/0057 ,  H01S3/07 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/104 ,  H01S3/1305 ,  H01S3/2333

摘要： A method and apparatus for producing a very high repetition rate gas discharge laser system in a MOPA configuration is disclosed which may comprise a master oscillator gas discharge layer system producing a beam of oscillator laser output light pulses at a very light pulse repetition rate; at least two power amplification gas discharge laser systems receiving laser output light pulses from (he master oscillator gas d ischarge laser system and each of the at least two power amplification gas discharge laser systems amplifying some of the received laser output light pulses at a pulse repetition that is a fraction of the very high pulse repetition rate equal to one over the number of the at least two power amplification gas discharge laser systems to form an amplified output laser light pulse beam at the very high pulse repetition rate, which may be positioned in series with respect to the oscillator laser output light pulse beam. The apparatus and method may further comprise a beam delivery unit connected to the laser light output of the power amplification laser system The apparatus and method may be a very high repetition rate gas discharge laser system in a MOPO configuration.

公开(公告)号：EP1870971B1

公开(公告)日：2011-03-02

申请号：EP07010181.1

申请日：2007-05-22

申请人： FANUC CORPORATION

发明人： Egawa, Akira ,  Kobayashi, Eiji ,  Watanabe, Takeshi

IPC分类号： H01S3/036 ,  H01S3/134 ,  H01S3/041 ,  H01S3/097

CPC分类号： H01S3/036 ,  H01S3/0407 ,  H01S3/041 ,  H01S3/073 ,  H01S3/097 ,  H01S3/10069 ,  H01S3/134 ,  H01S3/2232

公开(公告)号：EP1834388A1

公开(公告)日：2007-09-19

申请号：EP04790983.3

申请日：2004-10-28

申请人： Hastings, Stephen

发明人：

IPC分类号： H01S3/134 ,  B23K26/03 ,  G05B19/408 ,  B23K26/08 ,  B23K26/06

CPC分类号： B23K26/08 ,  B23K26/03 ,  B23K26/032 ,  B23K26/0344 ,  B23K26/06

摘要： The invention discloses a method and an apparatus for precise control of laser processing specifically for, but not limited to non-metallic substrate materials, said method comprising the steps of reading a constant and unbroken laser beam (4) energy power level from a laser cavity (3), and adjusting and modifying its input control signal to produce a significant improvement in power stability; ensuring thermal stability within an optical pulse modulation means (11), by either or a combination of maintaining the constant and unbroken laser beam energy from said laser cavity (3) into said optical pulse modulation means (11), by providing a stand-by modulation signal (12) to said pulse modulation means (11), by flowing cooling gas across the optical surfaces and, by maintaining a tight cooling control through the cooling medium; pre-calculating or Real-Time calculating the predictable changes in spot size, shape and area in combination with the required processing path direction movements and velocities at the target (22) via targeting means, and target material thresholds, and making the corresponding adjustments to the input modulation signal/s (12) to the optical pulse modulation means (11).

公开(公告)号：EP1412182A4

公开(公告)日：2006-06-28

申请号：EP02752300

申请日：2002-07-11

申请人： CYMER INC

发明人： SPANGLER RONALD L ,  LIPCON JACOB P ,  RULE JOHN A ,  JACQUES ROBERT N ,  KROYAN ARMEN ,  LALOVIC IVAN ,  FOMENKOV IGOR V ,  ALGOTS JOHN M

IPC分类号： B41C20060101 ,  B41C1/00 ,  G03F7/20 ,  H01L21/027 ,  H01S3/036 ,  H01S3/038 ,  H01S3/04 ,  H01S3/041 ,  H01S3/08 ,  H01S3/081 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/10 ,  H01S3/102 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/11 ,  H01S3/13 ,  H01S3/134 ,  H01S3/137 ,  H01S3/139 ,  H01S3/22 ,  H01S3/223 ,  H01S3/225

CPC分类号： G03F7/70575 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70333 ,  G03F7/70933 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/0812 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/1024 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/13 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258

摘要： An integrated circuit lithography technique called (spectral engineering for bandwidth control of an electric discharge laser. A computer models lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism (104) adjusts the center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment (106) is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond. A wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second in phase with the repetition rate of the laser.

摘要翻译： 一种集成电路光刻技术被称为（用于放电激光器的带宽控制的光谱工程）计算机模拟光刻参数以确定产生期望光刻结果所需的期望激光光谱快速响应调谐机构（104）调节中心波长 激光脉冲以脉冲突发的形式获得用于接近期望的激光光谱的脉冲突发的集成光谱。控制激光光束带宽以产生具有至少两个光谱峰值的有效光束光谱，以便在照片中产生改善的图案分辨率 提供线变窄设备（106），其具有至少一个压电驱动器和具有小于约2.0毫秒的时间响应的快速带宽检测控制系统;波长调谐镜以大于每分钟500次的抖动 与激光的重复频率同相。

公开(公告)号：EP1339519A4

公开(公告)日：2006-06-28

申请号：EP01975156

申请日：2001-05-23

申请人： CYMER INC

发明人： NEWMAN PETER C ,  DUFFEY THOMAS P ,  PARTLO WILLIAM N ,  SANDSTROM RICHARD L ,  MECHER PAUL C ,  JOHNS DAVID M ,  SAETHRE ROBERT B ,  FLEUROV VLADIMIR B ,  NESS RICHARD M ,  RETTIG CURTIS L ,  SHANNON ROBERT A ,  UJAZDOWSKI RICHARD C ,  ROKNI SHAHRYAR ,  PAN XIAOJIANG J ,  KULGEYKO VLADIMIR ,  SMITH SCOTT T ,  ANDERSON STUART L ,  ALGOTS JOHN M ,  SPANGLER RONALD L ,  FOMENKOV IGOR V

IPC分类号： H01S3/134 ,  H01S3/225 ,  G01J1/42 ,  G01J9/00 ,  G03F7/20 ,  H01S3/036 ,  H01S3/038 ,  H01S3/04 ,  H01S3/041 ,  H01S3/08 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/102 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/11 ,  H01S3/13 ,  H01S3/131 ,  H01S3/137 ,  H01S3/139 ,  H01S3/22 ,  H01S3/223

CPC分类号： H01S3/225 ,  G01J1/4257 ,  G01J3/027 ,  G01J9/0246 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70333 ,  G03F7/70483 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/02 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0387 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/1024 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/137 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2308

摘要： The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5mJ or greater. A preferred embodiments is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.

公开(公告)号：EP1438772A4

公开(公告)日：2006-03-29

申请号：EP02773221

申请日：2002-08-19

申请人： CYMER INC

发明人： KNOWLES DAVID S ,  BROWN DANIEL J W ,  SANDSTROM RICHARD L ,  RYLOV GERMAN E ,  ONKELS ECKEHARD D ,  BESAUCELE HERVE A ,  MYERS DAVID W ,  ERSHOV ALEXANDER I ,  PARTLO WILLIAM N ,  FOMENKOV IGOR V ,  UJAZDOWSKI RICHARD C ,  NESS RICHARD M ,  SMITH SCOT T ,  HULBURD WILLIAM G

IPC分类号： H01L21/027 ,  G01J9/00 ,  G03F7/20 ,  H01S3/00 ,  H01S3/03 ,  H01S3/034 ,  H01S3/036 ,  H01S3/038 ,  H01S3/04 ,  H01S3/041 ,  H01S3/08 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/102 ,  H01S3/104 ,  H01S3/105 ,  H01S3/11 ,  H01S3/13 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/223 ,  H01S3/225 ,  H01S3/23

CPC分类号： H01S3/2366 ,  G01J9/00 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/0057 ,  H01S3/0071 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0387 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333

摘要： An injection seeded modular gas discharge laser system (2) capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator (10) producing a very narrow band seed beam, which is amplified (12) in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in the ArF excimer laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan (10A) providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The masters oscillator is equipped with a line narrowing package having a very fast tuning mirror capable of controlling centerline wavelength an a pulse to pulse basis at repetition rates of 4,000 Hz or greater to precision of less that 0.2 pm.

摘要翻译： 一种非常窄的两室高重复率F 2气体放电激光系统。 A）第一激光单元，包括：1）第一放电室， a）第一激光气体b）限定第一放电区域的第一对细长间隔开的电极，2）第一风扇，其在所述第一放电区域中产生所述第一激光气体充分的气体运动，以从所述第一放电区域清除， 每次气体放电时，​​在以4,000次气体放电/秒或更大的范围内的重复率运行时，在下一次气体放电之前基本上全部放电产生离子，3）从第一激光气体B去除热能的第一热交换器系统 ）线选择单元，使单个所选线谱外的能量最小化; C）第二激光单元，包括：1）第二放电室，包含：a）第二激光气体，b）第二对细长间隔开的电极， 第二排出区域2）第二风扇，用于在所述第二排放区域产生所述第二激光气体的足够的气体运动，以便在每个气体排放之后从所述第二排放区域清除 在以每秒或更多的4,000次气体放电的范围内的重复频率操作时，在下一个气体放电之前，所有放电产生离子，3）从第二激光气体去除热能的第二热交换器系统，D）脉冲功率 系统，被配置为向所述第一对电极和所述第二对电极提供电脉冲，足以以每秒约4,000个激光输出脉冲的速率产生激光输出脉冲，其精确控制的激光输出脉冲能量超过约5mJ，E ）激光束测量和控制系统，用于测量由所述两腔激光器系统产生的激光输出脉冲的激光输出脉冲能量，并且在反馈控制装置中控制所述激光输出脉冲，并且其中利用来自所述第一激光单元的输出激光束 作为用于播种所述第二激光单元的种子束。

公开(公告)号：EP1258059A4

公开(公告)日：2006-01-25

申请号：EP01912666

申请日：2001-01-18

申请人： CYMER INC

发明人： FOMENKOV IGOR V ,  KROYAN ARMEN ,  BUCK JESSE D ,  DAS PALASH P ,  SANDSTROM RICHARD L ,  ERIE FREDERICK G ,  ALGOTS JOHN M ,  PADMABANDU GAMARALALAGE G

IPC分类号： H01S3/139 ,  G03F7/20 ,  H01S3/036 ,  H01S3/038 ,  H01S3/04 ,  H01S3/041 ,  H01S3/097 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/134 ,  H01S3/22 ,  H01S3/225

CPC分类号： G03F7/70041 ,  G03F7/70575 ,  H01S3/105 ,  H01S3/1055

摘要： A technique for bandwidth control of an electric discharge laser (2A). Line narrowing equipment is provided having at least one piezoelectric drive (14B1 - 14B5) and a fast bandwidth detection means and a bandwidth control having a time response of less than about 1.0 millisecond. In a preferred embodiment wavelength tuning mirrors (14C1 - 14C5) are dithered at dither rates of more than 500 dithers per second within a very narrow range of pivot angles to cause a dither in the wavelength values to produce a desired effective bandwidth of series of laser pulses.

公开(公告)号：EP1330859A4

公开(公告)日：2005-04-13

申请号：EP01273238

申请日：2001-10-05

申请人： CYMER INC

发明人： FOMENKOV IGOR V ,  ERIE FREDERICK G ,  BUCK JESSE D ,  DAS PALASH P

IPC分类号： H01S3/225 ,  G02B5/18 ,  G02B27/44 ,  G03F7/20 ,  H01S3/03 ,  H01S3/034 ,  H01S3/08 ,  H01S3/081 ,  H01S3/086 ,  H01S3/13 ,  H01S3/134 ,  H01S3/137 ,  H01S3/139 ,  H01S3/10

CPC分类号： H01S3/13 ,  G03F7/70025 ,  G03F7/70575 ,  H01S3/02 ,  H01S3/03 ,  H01S3/0401 ,  H01S3/08059 ,  H01S3/0812 ,  H01S3/086 ,  H01S3/1055 ,  H01S3/134 ,  H01S3/139 ,  H01S3/1392 ,  H01S3/225 ,  H01S3/2256

摘要： A smart laser having automatic computer control of pulse energy, wavelength and bandwidth using feedback signals from a wavemeter. Pulse energy is controlled by controlling discharge voltage, wavelength by controlling the position of an RMAX mirror and bandwidth is controlled by adjusting the curvature of a grating (82) to shapes more complicated than simple convex or simple concave. A preferred embodiment provides seven piezoelectric driven pressure-tension locations(84) on the back side of the grating(82) at 5 horizontal locations to produce shapes such as S shapes, W shapes and twisted shapes. Preferred embodiment include automatic feedback control of horizontal and vertical beam profile by automatic adjustment of a prism plate on which beam expander prisms are located and automatic adjustment of the RMAX tilt.

摘要翻译： 智能激光器具有脉冲能量，波长和带宽的自动计算机控制，使用来自波形计的反馈信号。 通过控制RMAX镜的位置来控制放电电压，波长来控制脉冲能量，带宽是控制器，通过调整光栅的曲率来形成比简单的凸形或简单凹形更复杂的形状。 优选实施例在5个水平位置提供在光栅背面上的七个压电驱动压力 - 张力位置，以产生诸如S形，W形和扭曲形状的形状。 优选实施例包括通过自动调节光束扩展器棱镜所在的棱镜板和自动调整RMAX倾斜来自动反馈控制水平和垂直光束轮廓。

公开(公告)号：EP0995243A4

公开(公告)日：2005-04-06

申请号：EP98926368

申请日：1998-06-04

申请人： CYMER INC

发明人： DAS PALASH P ,  SANDSTROM RICHARD L ,  FOMENKOV IGOR

IPC分类号： G01M11/00 ,  G01J3/02 ,  G01J3/06 ,  G01J9/00 ,  G03F7/20 ,  H01S3/00 ,  H01S3/03 ,  H01S3/034 ,  H01S3/13 ,  H01S3/134 ,  H01S3/137 ,  H01S3/139 ,  H01S3/225

CPC分类号： H01S3/1303 ,  G01J9/00 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70558 ,  G03F7/70575 ,  H01S3/03 ,  H01S3/134 ,  H01S3/1392 ,  H01S3/225

摘要： The invention uses known atomic or molecular absorptions as absolute wavelength standards for calibrating wavelength measurement instruments (105) used in tunable lasers (103). Examples of atomic and molecular absorptions are carbon and molecular oxygen that have absorptions including 193.0905 nm and 193.2728 nm, respectively, for use with a tunable Argon Fluoride excimer laser (103) at approximately 193 nm. A wavelength measuring device (e.g. a wavemeter (111)), is equipped with a gas cell (116) containing the absorption gas. During a calibration procedure, the wavelength measured by the wavemeter (111) is compared to the atomic or molecular absorption. The wavemeter's calibration constants are then adjusted accordingly to match the wavemeter's output to the atomic or molecular absorption wavelength. The use of multiple absorptions during calibration procedure enhances the precision of the procedure. After calibration, the laser (103) is tuned to the final wavelength of interest using the calibrated wavemeter (111).

摘要翻译： 本发明包括使用已知参考转变来表征辐射束的波长的系统和方法。 本发明包括一种蒸汽，其包括具有吸收已知波长的辐射的过渡物质，该蒸气被包含在容器中。 容器包括一个光路，辐射束沿着该光路传播通过蒸汽。 色散光学元件沿光路对准。 在色散元件之后沿着光路对准检测器。 关于辐射束的波长信息根据与已知参考转变相关的检测器信号中的倾角的位置来确定。 当激光带宽基本上超过转换带宽时，该方法是最有用的。