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    Indolesulfonyl protecting groups for protection of guanidyl and amino groups
    97.
    发明专利
    Indolesulfonyl protecting groups for protection of guanidyl and amino groups 有权
    保护组织和氨基酸组合的保护基团

    公开(公告)号：JP2014193872A

    公开(公告)日：2014-10-09

    申请号：JP2014092764

    申请日：2014-04-28

    申请人： Lonza Ag ,  ロンザ リミテッドLonza Limited

    发明人： MATTHIEU GIRAUD ,  FERNANDO ALBERICIO ,  ALBERT ISIDRO LLOBET ,  MERCEDES ALVAREZ DOMINGO

    IPC分类号： C07D209/30 ,  C07K17/02

    CPC分类号： C07D209/30 ,  Y02P20/55

    摘要： PROBLEM TO BE SOLVED: To provide compounds which are useful for the protection of organic compounds comprising at least one guanidino moiety and/or amino group, as protecting reagents in production of compounds; and processes for their preparation and their use as protecting reagents.SOLUTION: The invention relates to indolesulfonyl halogenides of the figure II; preparation processes based on side chain introduction; and introduction to a guanidino group in a peptide side chain.

    摘要翻译： 要解决的问题：提供可用于保护包含至少一个胍基部分和/或氨基的有机化合物的化合物作为化合物生产中的保护试剂; 以及它们的制备及其用作保护试剂的方法。解决方案：本发明涉及图II的吲哚磺酰卤; 基于侧链引进的制备工艺; 并引入肽侧链中的胍基。

    Resist composition and method for forming resist pattern
    99.
    发明专利
    Resist composition and method for forming resist pattern 有权
    用于形成电阻图案的耐蚀组合物和方法

    公开(公告)号：JP2014191061A

    公开(公告)日：2014-10-06

    申请号：JP2013064408

    申请日：2013-03-26

    申请人： Tokyo Ohka Kogyo Co Ltd ,  東京応化工業株式会社

    发明人： NAKAMURA TAKESHI ,  TANNO KAZUISHI ,  MOTOIKE NAOTO ,  HIRANO TOMOYUKI ,  UTSUMI YOSHIYUKI

    IPC分类号： G03F7/004 ,  C07C309/12 ,  C07C309/17 ,  C07C381/12 ,  G03F7/039

    CPC分类号： Y02P20/55

    摘要： PROBLEM TO BE SOLVED: To provide a resist composition from which a resist pattern with decreased roughness can be formed.SOLUTION: The resist composition comprises: a polymeric compound (A1) having a structural unit (a0) derived from an acrylate in which a hydrogen atom bonded to a carbon atom at an α-position can be replaced by a substituent, the structural unit having a lactone-containing cyclic group including an electron withdrawing group at a side chain terminal; an acid generator component (B) that generates an acid by exposure; and a photo-disintegrating base (D1) that is decomposed by exposure to lose acid diffusion controllability.

    摘要翻译： 要解决的问题：提供可以形成具有降低的粗糙度的抗蚀剂图案的抗蚀剂组合物。解决方案：抗蚀剂组合物包含：具有衍生自丙烯酸酯的结构单元（a0）的聚合化合物（A1），其中氢 与α-位上的碳原子键合的原子可以被取代基取代，所述结构单元在侧链末端具有含有含有内酯的环状基团，具有吸电子基团; 通过暴露产生酸的酸发生剂组分（B）; 和通过曝光分解的光分解碱（D1），失去酸扩散控制性。