Wet clean process for recovery of anodized chamber part
    57.
    发明专利
    Wet clean process for recovery of anodized chamber part 有权
    湿式清洁室清洁干净工艺

    公开(公告)号:JP2009052142A

    公开(公告)日:2009-03-12

    申请号:JP2008212533

    申请日:2008-08-21

    IPC分类号: C25D11/18 C23F3/00 C25D11/24

    摘要: PROBLEM TO BE SOLVED: To provide a cleaning process for recovering an anodized aluminum part particularly useful when the part has been exposed to a fluorine-containing plasma in etch reactor.
    SOLUTION: The part is bathed (86) in an agitated solution of a fluoride acid, such as ammonium fluoride, which converts aluminum fluoride to a soluble fluoride. The part is rinsed (88) in water. The pores of the cleaned anodization may be resealed (90) by submerging the part in hot agitated deionized water.
    COPYRIGHT: (C)2009,JPO&INPIT

    摘要翻译: 要解决的问题:提供一种用于回收阳极氧化铝部件的清洁工艺,该部件在蚀刻反应器中暴露于含氟等离子体时特别有用。

    解决方案:将部件在氟化物酸如氟化铵的搅拌溶液中洗涤(86),将氟化铝转化为可溶性氟化物。 将部件在水中漂洗(88)。 清洁的阳极氧化的孔可以通过将部件浸没在热的搅拌的去离子水中来重新密封(90)。 版权所有(C)2009,JPO&INPIT