Abstract:
PROBLEM TO BE SOLVED: To improve the adhesion of a conductive film to a base material in the conductive film formed by optically burning a coating made of copper fine particles.SOLUTION: A circuit board 1 includes a circuit having a conductive film 2 and a substrate 3. The circuit board 1 further includes a resin layer 4 between the substrate 3 and the conductive film 2. The substrate 3 is formed by a non-thermoplastic base material 31. The resin layer 4 includes a thermoplastic resin. The conductive film 2 is formed by optically burning a coating made of copper fine particles 21. This structure improves the adhesion of the conductive film 2 to the base material 31 through the resin layer 4.
Abstract:
PROBLEM TO BE SOLVED: To provide a composition for forming a silver-ion-diffusion inhibition layer, with which a silver-ion-diffusion inhibition layer can be formed that inhibits silver ion migration in silver-containing or silver alloy-containing metal wiring and that is capable of improving insulation reliability in the wiring.SOLUTION: A composition for forming a silver-ion-diffusion inhibition layer includes an insulating resin, and a compound having: a structure selected from the group consisting of a triazole structure, a thiadiazole structure, and a benzimidazole structure; a mercapto group; and at least one hydrocarbon group that may contain heteroatoms, the total number of carbon atoms in the hydrocarbon group (or in each hydrocarbon group in cases when a plurality of hydrocarbon groups are present) being at least 5.
Abstract:
PROBLEM TO BE SOLVED: To provide a wiring board which has excellent reflow resistance and aging resistance, and is high in mounting reliability, and a method for manufacturing the same.SOLUTION: The wiring board 1 includes: an electrode 12 composed of Cu or a Cu alloy; and a plating film 14 formed on the electrode 12, and the plating film 14 is composed of a laminate film in which an electroless nickel plating layer 18, an electroless palladium plating layer 20, and an electroless gold plating layer 22 are formed in order from the electrode 12 side. The electroless nickel plating layer 18 is formed by co-deposition of Ni, P, Bi and S, in which the content of P is 5 mass% or more but less than 10 mass%, the content of Bi is 1-1,000 ppm by mass, and the content of S is 1-2,000 ppm by mass, and the mass ratio (S/Bi) of the content of S to the content of Bi is more than 1.0.
Abstract:
PROBLEM TO BE SOLVED: To improve the visibility of a touch panel by reducing a difference between the hues of the front and back faces of a transparent electrode sheet.SOLUTION: In the transparent electrode sheet formed with electrodes whose patterning has been performed on a transparent support body, the absolute value of a difference between reflection chromaticity bof the electrode surface at a side far from the transparent support body and reflection chromaticity bof the electrode surface at a side near to the transparent support body is equal to or less than 2 (|▵b|=|b-b|≤2).