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公开(公告)号：US11681227B2
公开(公告)日：2023-06-20
申请号：US16284069
申请日：2019-02-25
申请人： Alex P. G. Robinson , Carmen Popescu , John Roth , Andreas Frommhold , Edward Jackson , Alexandra McClelland , Tom Lada , Greg O'Callahan
发明人： Alex P. G. Robinson , Carmen Popescu , John Roth , Andreas Frommhold , Edward Jackson , Alexandra McClelland , Tom Lada , Greg O'Callahan
CPC分类号： G03F7/40 , G03F7/0045 , G03F7/0212 , G03F7/0233 , G03F7/038 , G03F7/0382 , G03F7/70033
摘要： The present disclosure relates to novel negative-type photoresist composition and methods of their use. The disclosure further relates to multiple trigger photoresist processes which allow for the improvement in contrast, resolution, and/or line edges roughness in some systems without giving up sensitivity. The photoresist compositions and the methods of the current disclosure are ideal for fine patent processing using, for example, ultraviolet radiation, extreme ultraviolet radiation, beyond extreme ultraviolet radiation, X-rays and changed particle. The disclosure further relates to sensitivity enhancing materials useful in the disclosed compositions and methods.
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公开(公告)号：US09256126B2
公开(公告)日：2016-02-09
申请号：US14068254
申请日：2013-10-31
申请人： Alex Philip Graham Robinson , Jon Andrew Preece , Richard Edward Palmer , Andreas Frommhold , Dongxu Yang , Alexandra McClelland , Drew Athens , Xiang Xu
发明人： Alex Philip Graham Robinson , Jon Andrew Preece , Richard Edward Palmer , Andreas Frommhold , Dongxu Yang , Alexandra McClelland , Drew Athens , Xiang Xu
CPC分类号： G03F7/027 , C07C69/753 , C07C69/96 , C07C2604/00 , G03F7/0046 , G03F7/0226 , G03F7/0233 , G03F7/038 , G03F7/0382 , G03F7/20 , G03F7/325 , G03F7/38 , H01L51/0047
摘要： The present disclosure relates to novel methanofullerene derivatives, negative-type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.
摘要翻译： 本公开内容涉及新型甲基富勒烯衍生物，由其制备的负型光致抗蚀剂组合物及其使用方法。 衍生物，它们的光致抗蚀剂组合物和方法对于使用例如紫外线辐射，超出极紫外辐射，极紫外辐射，X射线和带电粒子射线的精细图案处理是理想的。
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公开(公告)号：US20140255849A1
公开(公告)日：2014-09-11
申请号：US14187649
申请日：2014-02-24
申请人： Alex Philip Graham Robinson , Jon Andrew Preece , Richard Edward Palmer , Andreas Frommhold , Dongxu Yang , Alexandra McClelland , Drew Athans , Xiang Xue
发明人： Alex Philip Graham Robinson , Jon Andrew Preece , Richard Edward Palmer , Andreas Frommhold , Dongxu Yang , Alexandra McClelland , Drew Athans , Xiang Xue
IPC分类号： G03F7/038
CPC分类号： G03F7/0384 , A61B5/042 , A61B5/065 , A61B5/6852 , A61B5/7221 , A61B34/20 , A61B2505/03 , A61B2505/05 , G03F7/038 , G03F7/0382 , G03F7/2024 , G03F7/38 , Y02P70/521
摘要： The present disclosure relates to novel methanofullerene derivatives, negative-type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays. Negative photosensitive compositions are also disclosed.
摘要翻译： 本公开内容涉及新型甲基富勒烯衍生物，由其制备的负型光致抗蚀剂组合物及其使用方法。 衍生物，它们的光致抗蚀剂组合物和方法对于使用例如紫外线辐射，超出极紫外辐射，极紫外辐射，X射线和带电粒子射线的精细图案处理是理想的。 还公开了负光敏组合物。
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公开(公告)号：US20190137876A1
公开(公告)日：2019-05-09
申请号：US15687449
申请日：2017-08-26
申请人： Alex Philip Graham Robinson , Alexandra McClelland , Andreas Frommhold , Dongxu Yang , John Roth , David Ure
发明人： Alex Philip Graham Robinson , Alexandra McClelland , Andreas Frommhold , Dongxu Yang , John Roth , David Ure
摘要： The present disclosure relates to novel multiple trigger monomer containing negative working photoresist compositions and processes. The processes involve removing acid-labile protecting groups from crosslinking functionalities in a first step and crosslinking the crosslinking functionality with an acid sensitive crosslinker in a second step. The incorporation of a multiple trigger pathway in the resist catalytic chain increases the chemical gradient in areas receiving a low dose of irradiation, effectively acting as a built in dose depend quencher-analog and thus enhancing chemical gradient and thus resolution, resolution blur and exposure latitude. The photoresist compositions utilize novel monomers and mixtures of novel monomers. The methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.
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公开(公告)号：US10095112B2
公开(公告)日：2018-10-09
申请号：US15441919
申请日：2017-02-24
申请人： Alex Phillip Graham Robinson , Alexandra McClelland , Andreas Frommhold , Dongxu Yang , John Roth
发明人： Alex Phillip Graham Robinson , Alexandra McClelland , Andreas Frommhold , Dongxu Yang , John Roth
摘要： The present disclosure relates to novel multiple trigger negative working photoresist compositions and processes. The processes involve removing acid-labile protecting groups from crosslinking functionalities in a first step and crosslinking the crosslinking functionality with an acid sensitive crosslinker in a second step. The incorporation of a multiple trigger pathway in the resist catalytic chain increases the chemical gradient in areas receiving a low dose of irradiation, effectively acting as a built in dose depend quencher-analog and thus enhancing chemical gradient and thus resolution, resolution blur and exposure latitude. The photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.
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公开(公告)号：US09323149B2
公开(公告)日：2016-04-26
申请号：US14187649
申请日：2014-02-24
申请人： Alex Philip Graham Robinson , Jon Andrew Preece , Richard Edward Palmer , Andreas Frommhold , Dongxu Yang , Alexandra McClelland , Drew Athans , Xiang Xue
发明人： Alex Philip Graham Robinson , Jon Andrew Preece , Richard Edward Palmer , Andreas Frommhold , Dongxu Yang , Alexandra McClelland , Drew Athans , Xiang Xue
CPC分类号： G03F7/0384 , A61B5/042 , A61B5/065 , A61B5/6852 , A61B5/7221 , A61B34/20 , A61B2505/03 , A61B2505/05 , G03F7/038 , G03F7/0382 , G03F7/2024 , G03F7/38 , Y02P70/521
摘要： The present disclosure relates to novel methanofullerene derivatives, negative-type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays. Negative photosensitive compositions are also disclosed.
摘要翻译： 本公开内容涉及新型甲基富勒烯衍生物，由其制备的负型光致抗蚀剂组合物及其使用方法。 衍生物，它们的光致抗蚀剂组合物和方法对于使用例如紫外线辐射，超出极紫外辐射，极紫外辐射，X射线和带电粒子射线的精细图案处理是理想的。 还公开了负光敏组合物。
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公开(公告)号：US20140134843A1
公开(公告)日：2014-05-15
申请号：US14068254
申请日：2013-10-31
申请人： Alex Philip Graham Robinson , Jon Andrew Preece , Richard Edward Palmer , Andreas Frommhold , Dongxu Yang , Alexandra McClelland , Drew Athens , Xiang Xu
发明人： Alex Philip Graham Robinson , Jon Andrew Preece , Richard Edward Palmer , Andreas Frommhold , Dongxu Yang , Alexandra McClelland , Drew Athens , Xiang Xu
CPC分类号： G03F7/027 , C07C69/753 , C07C69/96 , C07C2604/00 , G03F7/0046 , G03F7/0226 , G03F7/0233 , G03F7/038 , G03F7/0382 , G03F7/20 , G03F7/325 , G03F7/38 , H01L51/0047
摘要： The present disclosure relates to novel methanofullerene derivatives, negative-type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.
摘要翻译： 本公开内容涉及新型甲基富勒烯衍生物，由其制备的负型光致抗蚀剂组合物及其使用方法。 衍生物，它们的光致抗蚀剂组合物和方法对于使用例如紫外线辐射，超出极紫外辐射，极紫外辐射，X射线和带电粒子射线的精细图案处理是理想的。
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公开(公告)号：US20200272050A1
公开(公告)日：2020-08-27
申请号：US16284069
申请日：2019-02-25
申请人： Alex P. G. Robinson , Carmen Popescu , John Roth , Andreas Frommhold , Edward Jackson , Alexandra McClelland , Tom Lada , Greg O'Callahan
发明人： Alex P. G. Robinson , Carmen Popescu , John Roth , Andreas Frommhold , Edward Jackson , Alexandra McClelland , Tom Lada , Greg O'Callahan
摘要： The present disclosure relates to novel negative-type photoresist composition and methods of their use. The disclosure further relates to multiple trigger photoresist processes which allow for the improvement in contrast, resolution, and/or line edges roughness in some systems without giving up sensitivity. The photoresist compositions and the methods of the current disclosure are ideal for fine patent processing using, for example, ultraviolet radiation, extreme ultraviolet radiation, beyond extreme ultraviolet radiation, X-rays and changed particle. The disclosure further relates to sensitivity enhancing materials useful in the disclosed compositions and methods.
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公开(公告)号：US11474430B2
公开(公告)日：2022-10-18
申请号：US15687449
申请日：2017-08-26
申请人： Alex Philip Graham Robinson , Alexandra McClelland , Andreas Frommhold , Dongxu Yang , John Roth , David Ure
发明人： Alex Philip Graham Robinson , Alexandra McClelland , Andreas Frommhold , Dongxu Yang , John Roth , David Ure
摘要： The present disclosure relates to novel multiple trigger monomer containing negative working photoresist compositions and processes. The processes involve removing acid-labile protecting groups from crosslinking functionalities in a first step and crosslinking the crosslinking functionality with an acid sensitive crosslinker in a second step. The incorporation of a multiple trigger pathway in the resist catalytic chain increases the chemical gradient in areas receiving a low dose of irradiation, effectively acting as a built in dose depend quencher-analog and thus enhancing chemical gradient and thus resolution, resolution blur and exposure latitude. The photoresist compositions utilize novel monomers and mixtures of novel monomers. The methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.
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公开(公告)号：US20180246408A1
公开(公告)日：2018-08-30
申请号：US15441919
申请日：2017-02-24
申请人： Alex Phillip Graham Robinson , Alexandra McClelland , Andreas Frommhold , Dongxu Yang , John Roth
发明人： Alex Phillip Graham Robinson , Alexandra McClelland , Andreas Frommhold , Dongxu Yang , John Roth
CPC分类号： G03F7/0382 , C07C2604/00 , C08G83/008 , G03F7/0045 , G03F7/0046 , G03F7/162 , G03F7/168 , G03F7/2004 , G03F7/2037 , G03F7/325 , G03F7/38 , H01L21/0274
摘要： The present disclosure relates to novel multiple trigger negative working photoresist compositions and processes. The processes involve removing acid-labile protecting groups from crosslinking functionalities in a first step and crosslinking the crosslinking functionality with an acid sensitive crosslinker in a second step. The incorporation of a multiple trigger pathway in the resist catalytic chain increases the chemical gradient in areas receiving a low dose of irradiation, effectively acting as a built in dose depend quencher-analog and thus enhancing chemical gradient and thus resolution, resolution blur and exposure latitude. The photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.
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