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1.发明授权Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method 有权检测方法和装置，光刻设备，光刻处理单元和器件制造方法公开(公告)号：US08885150B2
公开(公告)日：2014-11-11
申请号：US12867416
申请日：2009-02-18
CPC分类号： G01B11/24 , G03F7/70191 , G03F7/70633 , G03F7/7085
摘要： A scatterometer, configured to measure a property of a substrate, includes a radiation source which produces a radiation spot on a target formed on the surface of the substrate, the size of the radiation spot being smaller than the target in one direction along the target, the position of the radiation spot being moved along the surface in a series of discrete steps. A detector detects a spectrum of the radiation beam reflected from the target and produces measurement signals representative of the spectrum corresponding to each position of the radiation spot. A processor processes the measurement signals produced by the detector corresponding to each position of the radiation spot and derives a single value for the property.
摘要翻译： 被配置为测量衬底性质的散射仪包括辐射源，其在形成在衬底表面上的靶上产生辐射点，辐射点的尺寸小于目标沿目标的一个方向的尺寸， 辐射光斑在一系列离散步骤中沿着表面移动的位置。 检测器检测从目标反射的辐射束的光谱，并产生表示与辐射光斑的每个位置对应的光谱的测量信号。 处理器处理由检测器产生的与辐射点的每个位置相对应的测量信号，并为该属性导出单个值。
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2.发明授权Method and apparatus for angular-resolved spectroscopic lithography characterization 有权用于角分辨光谱光刻特征的方法和装置公开(公告)号：US08553230B2
公开(公告)日：2013-10-08
申请号：US13249566
申请日：2011-09-30
申请人： Arie Jeffrey Maria Den Boef , Arno Jan Bleeker , Youri Johannes Laurentius Maria Van Dommelen , Mircea Dusa , Antoine Gaston Marie Kiers , Paul Frank Luehrmann , Henricus Petrus Maria Pellemans , Maurits Van Der Schaar , Cedric Desire Grouwstra , Markus Gerardus Martinus Van Kraaij
发明人： Arie Jeffrey Maria Den Boef , Arno Jan Bleeker , Youri Johannes Laurentius Maria Van Dommelen , Mircea Dusa , Antoine Gaston Marie Kiers , Paul Frank Luehrmann , Henricus Petrus Maria Pellemans , Maurits Van Der Schaar , Cedric Desire Grouwstra , Markus Gerardus Martinus Van Kraaij
IPC分类号： G01B9/02
CPC分类号： G01N21/8806 , G03F7/70341 , G03F7/70633 , G03F7/7065 , G03F9/7034
摘要： An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.
摘要翻译： 通过在高数值孔径透镜的光瞳平面中测量作为辐射的结果的角度分辨光谱从衬底反射来确定衬底的性质的装置和方法。 该属性可以是角度和波长相关的，并且可以包括TM和TE偏振辐射的强度及其相对相位差。
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3.发明申请Inspection method and apparatus lithographic apparatus, lithographic processing cell, device manufacturing method and distance measuring system 有权检测方法和设备光刻设备，光刻处理单元，器件制造方法和距离测量系统公开(公告)号：US20090021708A1
公开(公告)日：2009-01-22
申请号：US11826830
申请日：2007-07-18
CPC分类号： G03F7/70641 , G02B7/28
摘要： A scatterometer has a focus sensor arranged to detect whether the target being measured is in a correct focal plane. A modulation is applied to a component of the focus sensor or the scatterometer such that a defocus as measured by the focus sensor varies according to a certain function. From knowledge of the modulation, the gain of the sensor can be calibrated.
摘要翻译： 散射仪具有焦点传感器，其布置成检测被测量的目标是否在正确的焦平面中。 对焦点传感器或散射仪的分量施加调制，使得由聚焦传感器测量的散焦根据某种功能而变化。 根据调制知识，可以校准传感器的增益。
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4.发明授权Method of assessing a model of a substrate, an inspection apparatus and a lithographic apparatus 有权评估基板，检查装置和光刻装置的模型的方法公开(公告)号：US08830472B2
公开(公告)日：2014-09-09
申请号：US12920984
申请日：2009-03-30
申请人： Arie Jeffrey Den Boef , Hugo Augustinus Joseph Cramer , Marcus Adrianus Van De Kerkhof , Henricus Petrus Maria Pellemans , Martin Ebert
发明人： Arie Jeffrey Den Boef , Hugo Augustinus Joseph Cramer , Marcus Adrianus Van De Kerkhof , Henricus Petrus Maria Pellemans , Martin Ebert
CPC分类号： G01N21/9501 , G01N21/47 , G01N21/95607 , G01N2021/8845 , G03F7/70625
摘要： A method of assessing a model of a substrate is presented. A scatterometry measurement is taken using radiation at a first wavelength. The wavelength of the radiation is then changed and a further scatterometry measurement taken. If the scatterometry measurements are consistent across a range of wavelengths then the model is sufficiently accurate. However, if the scatterometry measurements change as the wavelength changes then the model of the substrate is not sufficiently accurate.
摘要翻译： 提出了一种评估底物模型的方法。 使用第一波长的辐射进行散射测量。 然后改变辐射的波长，并进行进一步的散射测量。 如果散射测量在波长范围内是一致的，则模型是足够准确的。 然而，如果散射测量值随着波长的变化而变化，则衬底的模型不够准确。
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5.发明授权Method and apparatus for angular-resolved spectroscopic lithography characterization 有权用于角分辨光谱光刻特征的方法和装置公开(公告)号：US08054467B2
公开(公告)日：2011-11-08
申请号：US12805852
申请日：2010-08-20
申请人： Arie Jeffrey Maria Den Boef , Arno Jan Bleeker , Youri Johannes Laurentius Maria Van Dommelen , Mircea Dusa , Antoine Gaston Marie Kiers , Paul Frank Luehrmann , Henricus Petrus Maria Pellemans , Maurits Van Der Schaar , Cedric Desire Grouwstra , Markus Gerardus Martinus Van Kraaij
发明人： Arie Jeffrey Maria Den Boef , Arno Jan Bleeker , Youri Johannes Laurentius Maria Van Dommelen , Mircea Dusa , Antoine Gaston Marie Kiers , Paul Frank Luehrmann , Henricus Petrus Maria Pellemans , Maurits Van Der Schaar , Cedric Desire Grouwstra , Markus Gerardus Martinus Van Kraaij
IPC分类号： G01J3/45
CPC分类号： G01N21/8806 , G03F7/70341 , G03F7/70633 , G03F7/7065 , G03F9/7034
摘要： An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.
摘要翻译： 通过在高数值孔径透镜的光瞳平面中测量作为辐射的结果的角度分辨光谱从衬底反射来确定衬底的性质的装置和方法。 该属性可以是角度和波长相关的，并且可以包括TM和TE偏振辐射的强度及其相对相位差。
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6.发明授权Lithographic apparatus with alignment subsystem, device manufacturing method, using alignment, and alignment structure 有权具有对准子系统的光刻设备，器件制造方法，使用对准和对准结构公开(公告)号：US06995831B2
公开(公告)日：2006-02-07
申请号：US11068895
申请日：2005-03-02
申请人： Leon Martin Levasier , Arie Jeffrey Den Boef , Ingo Dirnstorfer , Andre Bernardus Jeunink , Stefan Geerte Kruijswijk , Henricus Petrus Maria Pellemans , Irwan Dani Setija , Hoite Pieter Theodoor Tolsma
发明人： Leon Martin Levasier , Arie Jeffrey Den Boef , Ingo Dirnstorfer , Andre Bernardus Jeunink , Stefan Geerte Kruijswijk , Henricus Petrus Maria Pellemans , Irwan Dani Setija , Hoite Pieter Theodoor Tolsma
CPC分类号： G03F9/7003 , G03F9/7049 , G03F9/7076
摘要： A lithographic apparatus according to one embodiment of the invention includes an alignment subsystem configured to align the substrate on the substrate table relative to the patterning structure. The alignment structure comprises a non-periodic feature which may be detectable as e.g. a capture position or a check position using a reference grating in the alignment subsystem. The non-periodic feature may cause a phase effect in the detected signal of the alignment subsystem or an amplitude effect.
摘要翻译： 根据本发明的一个实施例的光刻设备包括对准子系统，该对准子系统被配置为相对于图案化结构对准衬底台上的衬底。 对准结构包括非周期性特征，其可以被检测为例如。 在对准子系统中使用参考光栅的捕获位置或检查位置。 非周期性特征可能导致对准子系统的检测信号中的相位效应或幅度效应。
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7.发明授权Inspection apparatus, lithographic apparatus, lithographic processing cell and inspection method 有权检验仪器，光刻设备，平版印刷加工电池及检验方法公开(公告)号：US08705007B2
公开(公告)日：2014-04-22
申请号：US12690221
申请日：2010-01-20
CPC分类号： G01N21/956 , G01J3/18 , G01J3/2803 , G01J3/4412 , G01N21/4788 , G01N21/9501 , G03F7/70191 , G03F7/70633 , G03F9/7049 , G03F9/7065 , G03F9/7088 , G03F9/7092
摘要： For angular resolved spectrometry a radiation beam is used having an illumination profile having four quadrants is used. The first and third quadrants are illuminated whereas the second and fourth quadrants aren't illuminated. The resulting pupil plane is thus also divided into four quadrants with only the zeroth order diffraction pattern appearing in the first and third quadrants and only the first order diffraction pattern appearing in the second and third quadrants.
摘要翻译： 对于角度分辨光谱法，使用具有具有四个象限的照明轮廓的辐射束。 第一和第三象限被照亮，而第二和第四象限不被照亮。 因此，所得到的光瞳面也被分成四个象限，仅在第一和第三象限中出现零级衍射图案，并且仅在第二和第三象限中出现一级衍射图案。
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8.发明申请Inspection Method and Apparatus, Lithographic Apparatus, Lithographic Processing Cell and Device Manufacturing Method 有权检验方法和装置，平版印刷设备，平版印刷加工单元和器件制造方法公开(公告)号：US20110128512A1
公开(公告)日：2011-06-02
申请号：US12867416
申请日：2009-02-18
CPC分类号： G01B11/24 , G03F7/70191 , G03F7/70633 , G03F7/7085
摘要： A scatterometer, configured to measure a property of a substrate, includes a radiation source which produces a radiation spot on a target formed on the surface of the substrate, the size of the radiation spot being smaller than the target in one direction along the target, the position of the radiation spot being moved along the surface in a series of discrete steps. A detector detects a spectrum of the radiation beam reflected from the target and produces measurement signals representative of the spectrum corresponding to each position of the radiation spot. A processor processes the measurement signals produced by the detector corresponding to each position of the radiation spot and derives a single value for the property.
摘要翻译： 被配置为测量衬底性质的散射仪包括辐射源，其在形成在衬底表面上的靶上产生辐射点，辐射点的尺寸小于目标沿目标的一个方向的尺寸， 辐射光斑在一系列离散步骤中沿着表面移动的位置。 检测器检测从目标反射的辐射束的光谱，并产生表示与辐射光斑的每个位置对应的光谱的测量信号。 处理器处理由检测器产生的与辐射点的每个位置相对应的测量信号，并为该属性导出单个值。
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公开(公告)号：US20110007314A1
公开(公告)日：2011-01-13
申请号：US12805852
申请日：2010-08-20
申请人： Arie Jeffrey Maria Den Boef , Arno Jan Bleeker , Youri Johannes Laurentius Maria Van Dommelen , Mircea Dusa , Antoine Gaston Marie Kiers , Paul Frank Luehrmann , Henricus Petrus Maria Pellemans , Maurits Van der Schaar , Cedric Desire Grouwstra , Markus Gerardus Martinus Van Kraaij
发明人： Arie Jeffrey Maria Den Boef , Arno Jan Bleeker , Youri Johannes Laurentius Maria Van Dommelen , Mircea Dusa , Antoine Gaston Marie Kiers , Paul Frank Luehrmann , Henricus Petrus Maria Pellemans , Maurits Van der Schaar , Cedric Desire Grouwstra , Markus Gerardus Martinus Van Kraaij
IPC分类号： G01J3/28
CPC分类号： G01N21/8806 , G03F7/70341 , G03F7/70633 , G03F7/7065 , G03F9/7034
摘要： An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.
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10.发明申请Inspection Apparatus, Lithographic Apparatus, Lithographic Processing Cell and Inspection Method 有权检验仪器，平版印刷设备，平版印刷加工单元及检验方法公开(公告)号：US20100201963A1
公开(公告)日：2010-08-12
申请号：US12690221
申请日：2010-01-20
CPC分类号： G01N21/956 , G01J3/18 , G01J3/2803 , G01J3/4412 , G01N21/4788 , G01N21/9501 , G03F7/70191 , G03F7/70633 , G03F9/7049 , G03F9/7065 , G03F9/7088 , G03F9/7092
摘要： For angular resolved spectrometry a radiation beam is used having an illumination profile having four quadrants is used. The first and third quadrants are illuminated whereas the second and fourth quadrants aren't illuminated. The resulting pupil plane is thus also divided into four quadrants with only the zeroth order diffraction pattern appearing in the first and third quadrants and only the first order diffraction pattern appearing in the second and third quadrants.
摘要翻译： 对于角度分辨光谱法，使用具有具有四个象限的照明轮廓的辐射束。 第一和第三象限被照亮，而第二和第四象限不被照亮。 因此，所得到的光瞳面也被分成四个象限，仅在第一和第三象限中出现零级衍射图案，并且仅在第二和第三象限中出现一级衍射图案。
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