METHOD AND APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE
    2.
    发明申请
    METHOD AND APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE 审中-公开
    制造半导体器件的方法和装置

    公开(公告)号:US20100087033A1

    公开(公告)日:2010-04-08

    申请号:US12570590

    申请日:2009-09-30

    IPC分类号: H01L21/50 H01L21/67

    摘要: A resin layer is formed on a support substrate. An intermediate structure body is formed on the resin layer. The support substrate is fixed to a first unit configured to fix and heat. The intermediate structure body is fixed to a second unit configured to fix and heat. The support substrate and the intermediate structure body are heated by the first unit or the second unit, so as to soften the resin layer. The second unit is moved with respect to the first unit along each of a plurality of line segments or a curve, so as to enlarge a distance between a center of the support substrate and a center of the intermediate structure body as the second unit moves, while the support substrate and the intermediate structure body being kept in the horizontal state, and until the support substrate and the intermediate structure body are separated.

    摘要翻译: 树脂层形成在支撑基板上。 在树脂层上形成中间结构体。 支撑基板被固定到构造成固定和加热的第一单元。 中间结构体固定到构造成固定和加热的第二单元。 支撑基板和中间结构体被第一单元或第二单元加热,从而软化树脂层。 第二单元沿着多个线段或曲线中的每一个相对于第一单元移动,以便随着第二单元移动而扩大支撑基板的中心与中间结构体的中心之间的距离, 同时支撑基板和中间结构体保持在水平状态,直到支撑基板和中间结构体分离为止。