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    Thin film deposition apparatus and thin film deposition method using the same
    2.
    发明授权
    Thin film deposition apparatus and thin film deposition method using the same 有权
    薄膜沉积装置和使用其的薄膜沉积方法

    公开(公告)号：US09045826B2

    公开(公告)日：2015-06-02

    申请号：US13613804

    申请日：2012-09-13

    申请人： Sang-Joon Seo ,  Myung-Soo Huh ,  Seung-Hun Kim ,  Jin-Kwang Kim ,  Cheol-Rae Jo ,  Choel-Min Jang ,  Jeong-Ho Yi

    发明人： Sang-Joon Seo ,  Myung-Soo Huh ,  Seung-Hun Kim ,  Jin-Kwang Kim ,  Cheol-Rae Jo ,  Choel-Min Jang ,  Jeong-Ho Yi

    IPC分类号： C23C16/455

    CPC分类号： C23C16/45551

    摘要： In a thin film deposition apparatus and a thin film deposition method using the same, a first spraying unit and a second spraying unit which are separately driven are prepared, the first spraying unit is driven to sequentially spray a first deposition source and an inert gas onto a substrate, a chamber is exhausted to remove, from the chamber, excess first deposition sources that are not adsorbed onto the substrate from the chamber, a second spraying unit is driven to sequentially spray a second deposition source and an inert gas onto the substrate, and the chamber is exhausted to remove, from the chamber, excess second deposition sources that are not adsorbed onto the substrate. When the thin film deposition method is used, the unintended generation of microparticles during deposition is sufficiently suppressed.

    摘要翻译： 在使用其的薄膜沉积装置和薄膜沉积方法中，制备分别驱动的第一喷射单元和第二喷射单元，驱动第一喷射单元以顺序地将第一沉积源和惰性气体喷射到 衬底，腔室被排出以从腔室中除去未从腔室吸附到衬底上的过量的第一沉积源，驱动第二喷射单元以顺序地将第二沉积源和惰性气体喷射到衬底上， 并且室被排出以从腔室中除去未吸附到基底上的多余的第二沉积源。 当使用薄膜沉积方法时，在沉积期间非常期望的微粒的产生被充分地抑制。

    Apparatus for atomic layer deposition with sloped purge injection nozzle structure
    4.
    发明授权
    Apparatus for atomic layer deposition with sloped purge injection nozzle structure 有权
    用于原子层沉积的设备，具有倾斜的吹扫喷嘴结构

    公开(公告)号：US08735188B2

    公开(公告)日：2014-05-27

    申请号：US13347439

    申请日：2012-01-10

    申请人： Seung-Hun Kim ,  Sang-Joon Seo ,  Jin-Kwang Kim ,  Jun-Hyuk Cheon

    发明人： Seung-Hun Kim ,  Sang-Joon Seo ,  Jin-Kwang Kim ,  Jun-Hyuk Cheon

    IPC分类号： H01L33/52

    CPC分类号： C23C16/4412 ,  C23C16/45551 ,  C23C16/45563 ,  H01L51/5253

    摘要： An atomic layer deposition apparatus and a sealing method of an organic light emitting device using the same are disclosed. In one embodiment, the atomic layer deposition apparatus improves a structure of the purge gas injection nozzle so as to increase the exhaust efficiency of the purge gas in an atomic layer deposition process, which increases a speed of a purge process. As a result, it is possible to improve a deposition speed and a quality of a sealing film when a sealing process for sealing the organic light emitting device is implemented by using the atomic layer deposition.

    摘要翻译： 公开了一种使用其的有机发光器件的原子层沉积设备和密封方法。 在一个实施例中，原子层沉积装置改进了吹扫气体注入喷嘴的结构，从而提高了原子层沉积工艺中净化气体的排气效率，从而提高了吹扫过程的速度。 结果，当通过使用原子层沉积实现用于密封有机发光器件的密封过程时，可以提高密封膜的沉积速度和质量。

    Anti-aging cosmetic composition
    6.
    发明申请
    Anti-aging cosmetic composition 有权
    抗衰老化妆品组合物

    公开(公告)号：US20100119628A1

    公开(公告)日：2010-05-13

    申请号：US12654635

    申请日：2009-12-28

    申请人： Chan Koo Kang ,  Young Jin Lee ,  Sang Hoon Han ,  Seung Hun Kim

    发明人： Chan Koo Kang ,  Young Jin Lee ,  Sang Hoon Han ,  Seung Hun Kim

    IPC分类号： A61K36/185 ,  A61Q19/08

    CPC分类号： A61Q19/08 ,  A61K8/63 ,  A61K8/671 ,  A61K8/97

    摘要： The present invention relates to an anti-aging cosmetic composition, and more particularly, the present invention relates to an anti-aging cosmetic composition containing Hibiscus esculentus extracts and at least one selected from the group consisting of oleanolic acid, ursolic acid, glycyrhetinic acid and retinol, showing high safety to skin and wrinkle-improvement effect.

    摘要翻译： 本发明涉及一种抗衰老化妆品组合物，更具体地说，本发明涉及一种含有芙蓉提取物和至少一种选自齐墩果酸，熊果酸，甘草次酸和 视黄醇，对皮肤表现出高安全性和皱纹改善作用。

    Organic light emitting diode display and method for manufacturing the same
    9.
    发明授权
    Organic light emitting diode display and method for manufacturing the same 有权
    有机发光二极管显示器及其制造方法

    公开(公告)号：US08975660B2

    公开(公告)日：2015-03-10

    申请号：US13438574

    申请日：2012-04-03

    申请人： Jin-Kwang Kim ,  Sang-Joon Seo ,  Seung-Hun Kim

    发明人： Jin-Kwang Kim ,  Sang-Joon Seo ,  Seung-Hun Kim

    IPC分类号： H01L33/00 ,  H01L51/52 ,  H01L27/32

    CPC分类号： H01L51/5256 ,  H01L27/3246

    摘要： An organic light emitting diode (OLED) display includes: a substrate; an organic light emitting diode formed on the substrate; a first inorganic layer formed on the substrate and covering the organic light emitting diode; an intermediate layer formed on the first inorganic layer and covering an area relatively smaller than the first inorganic layer; and a second inorganic layer formed on the first inorganic layer and the intermediate layer, and contacting the first inorganic layer at an edge thereof while covering a relatively larger area than the intermediate layer. A third inorganic layer may be formed on the second inorganic layer so as to contact the second inorganic layer at an edge thereof. At least one of the first, second and third inorganic layers is formed by an atomic layer deposition (ALD) method.

    摘要翻译： 有机发光二极管（OLED）显示器包括：基板; 形成在所述基板上的有机发光二极管; 形成在所述基板上并覆盖所述有机发光二极管的第一无机层; 形成在所述第一无机层上并覆盖比所述第一无机层相对小的区域的中间层; 以及形成在所述第一无机层和所述中间层上的第二无机层，并且在覆盖比所述中间层相对较大的区域的边缘处与所述第一无机层接触。 可以在第二无机层上形成第三无机层，以便在其边缘与第二无机层接触。 第一，第二和第三无机层中的至少一个由原子层沉积（ALD）方法形成。

    Vapor deposition method
    10.
    发明授权
    Vapor deposition method 有权
    气相沉积法

    公开(公告)号：US08828490B2

    公开(公告)日：2014-09-09

    申请号：US13352191

    申请日：2012-01-17

    申请人： Sang-Joon Seo ,  Seung-Yong Song ,  Seung-Hun Kim ,  Jin-Kwang Kim

    发明人： Sang-Joon Seo ,  Seung-Yong Song ,  Seung-Hun Kim ,  Jin-Kwang Kim

    IPC分类号： B05D5/12 ,  C23C16/00

    CPC分类号： C23C16/042 ,  C23C16/45551 ,  C23C16/45589 ,  C23C16/4587 ,  H01L27/3244 ,  H01L51/001 ,  H05B33/10

    摘要： A vapor deposition apparatus, which is capable of performing a thin film deposition process and improving characteristics of a formed thin film, includes: a chamber having an exhaust opening; a stage disposed in the chamber, and comprising a mounting surface on which the substrate may be mounted; an injection unit having at least one injection opening for injecting a gas into the chamber in a direction parallel with a surface of the substrate, on which the thin film is to be formed; a guide member facing the substrate to provide a set or predetermined space between the substrate and the guide member; and a driving unit conveying the stage and the guide member.

    摘要翻译： 能够进行薄膜沉积工艺和改善所形成的薄膜特性的气相沉积设备包括：具有排气口的室; 设置在所述室中的台，并且包括其上可以安装所述基板的安装表面; 注射单元，其具有至少一个注射开口，用于在平行于要形成所述薄膜的所述基底的表面的方向上将气体注入所述腔室; 面向所述基板的引导构件，以在所述基板和所述引导构件之间提供设定的或预定的空间; 以及传送台和引导构件的驱动单元。