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    Illumination System for a Lithographic or Inspection Apparatus
    3.
    发明申请
    Illumination System for a Lithographic or Inspection Apparatus 审中-公开

    公开(公告)号：US20180004095A1

    公开(公告)日：2018-01-04

    申请号：US15639467

    申请日：2017-06-30

    Applicant: ASML Netherlands B.V.

    Inventor： Teunis Willem TUKKER ,  Nitesh Pandey ,  Coen Adrianus Verschuren

    IPC: G03F7/20 ,  F21V9/16 ,  F21V14/08 ,  F21Y2115/10

    CPC classification number: G03F7/70191 ,  F21V9/30 ,  F21V14/08 ,  F21Y2115/10 ,  G03F7/7005 ,  G03F7/70575 ,  G03F7/70625 ,  G03F7/70633

    Abstract: An illumination system has a microLED array 502. The microLED array 502 is imaged or placed very close to a phosphor coated glass disc 504 which upconverts the light from the microLED array into a narrow band emission. The plate has at least two different photoluminescent materials arranged to be illuminated by the microLED array and to thereby emit output light. The different photoluminescent materials have different emission spectral properties of the output light, e.g. different center wavelength and optionally different bandwidth. Illumination of different photoluminescent materials by the illumination sources is selectable, by selective activation of the microLEDs or by movement of the photoluminescent materials relative to the illumination sources, to provide different illumination of the different photoluminescent materials. This provides tunable spectral properties of the output light. Selectively configurable filters 506 are arranged to filter the output light in accordance with the selected illumination of the different photoluminescent materials.

    METROLOGY METHOD AND DEVICE
    4.
    发明申请
    METROLOGY METHOD AND DEVICE 有权

    公开(公告)号：US20250138436A1

    公开(公告)日：2025-05-01

    申请号：US18690961

    申请日：2022-08-16

    Applicant: ASML Netherlands B.V.

    Inventor： Armand Eugene Albert KOOLEN ,  Willem Marie Julia Marcel COENE ,  Alexander Prasetya KONIJNENBERG ,  Teunis Willem TUKKER ,  Arie Jeffrey DEN BOEF

    IPC: G03F7/00 ,  G06T5/10

    Abstract: Disclosed is a metrology method and associated devices. The method comprises obtaining a first image, said first image being subject to one or more non-isoplanatic aberrations of an optical system used to capture said image; and non-iteratively correcting said first image for the effect of said one or more non-isoplanatic aberrations by performing one or both of: a field non-isoplanatic correction operation in field space for said first image, said field space corresponding to a field plane of the optical system; and a pupil non-isoplanatic correction operation in pupil space for said first image, said pupil space corresponding to a pupil plane of the optical system. Said one or more non-isoplanatic aberrations comprise a class of non-isoplanatic aberrations describable as a convolution combined with an object distortion and/or a pupil distortion.

    METROLOGY METHOD AND METROLOGY DEVICE
    5.
    发明公开
    METROLOGY METHOD AND METROLOGY DEVICE 审中-公开

    公开(公告)号：US20240345489A1

    公开(公告)日：2024-10-17

    申请号：US18291534

    申请日：2022-06-08

    Applicant: ASML Netherlands B.V.

    Inventor： Vasco Tomas TENNER ,  Hugo Augustinus Joseph CRAMER ,  Teunis Willem TUKKER ,  Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN

    IPC: G03F7/00

    CPC classification number: G03F7/706851 ,  G03F7/7065 ,  G03F7/706849

    Abstract: Disclosed is a metrology device operable to measure a sample with measurement radiation and associated method. The metrology device comprises: an illumination branch operable to propagate measurement radiation to a sample, a detection branch operable to propagate one or more components of scattered radiation, scattered from said sample as a result of illumination of the sample by said measurement radiation; and a dispersive arrangement in either of said illumination branch or said detection branch. The dispersive arrangement is arranged to maintain one or more components of said scattered radiation at substantially a same respective location in a detection pupil plane over a range of wavelength values for said measurement radiation.

    Method of Inspecting a Substrate, Metrology Apparatus, and Lithographic System
    10.
    发明申请
    Method of Inspecting a Substrate, Metrology Apparatus, and Lithographic System 审中-公开

    公开(公告)号：US20180107124A1

    公开(公告)日：2018-04-19

    申请号：US15723820

    申请日：2017-10-03

    Applicant: ASML Netherlands B.V.

    Inventor： Teunis Willem TUKKER ,  Amandev Singh ,  Gerbrand Van Der Zouw

    IPC: G03F7/20 ,  G01B11/27 ,  G01N21/956

    Abstract: Metrology apparatus and methods are disclosed. In one arrangement, a substrate is inspected. A source beam of radiation emitted by a radiation source is split into a measurement beam and a reference beam. A first target is illuminated with the measurement beam, the first target being on the substrate. A second target is illuminated with the reference beam, the second target being separated from the substrate. First scattered radiation is collected from the first target and delivered to a detector. Second scattered radiation is collected from the second target and delivered to the detector. The first scattered radiation interferes with the second scattered radiation at the detector. The first target comprises a first pattern. The second target comprises a second pattern, or a pupil plane image of the second pattern. The first pattern is geometrically identical to the second pattern, the first pattern and the second pattern are periodic and a pitch of the first pattern is identical to a pitch of the second pattern, or both.

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