公开(公告)号：US09983482B2

公开(公告)日：2018-05-29

申请号：US14775263

申请日：2014-02-26

Applicant: ASML Netherlands B.V. ,  Carl Zeiss SMT GmbH

Inventor： Erik Roelof Loopstra ,  Olav Waldemar Vladimir Frijns ,  Stig Bieling ,  Antonius Theodorus Wilhelmus Kempen ,  Ivo Vanderhallen ,  Nicolaas Ten Kate ,  Ruud Antonius Catharina Maria Beerens ,  Richard Henricus Adrianus Van Lieshout ,  Theodorus Petrus Maria Cadee ,  Sjoerd Nicolaas Lambertus Donders ,  Alexander Matthijs Struycken ,  Marcus Petrus Scheepers

IPC: G03B27/54 ,  G03F7/20 ,  G21K1/06 ,  G02B5/08 ,  G02B19/00 ,  H05G2/00

CPC classification number: G03F7/70033 ,  G02B5/0891 ,  G02B19/0095 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70916 ,  G03F7/70983 ,  G21K1/067 ,  H05G2/003 ,  H05G2/008

Abstract: A radiation collector comprising a first collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a first location at a distance from the radiation collector, a second collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a second location at said distance from the radiation collector, wherein the first location and the second location are separated from one another.

公开(公告)号：US20150296602A1

公开(公告)日：2015-10-15

申请号：US14440934

申请日：2013-10-10

Applicant: ASML NETHERLANDS B.V.

Inventor： Erik Roelof Loopstra ,  Andrei Mikhailovich Yakunin ,  Vadim Yevgenyevich Banine ,  Andrey Nikipelov ,  Edgar Alberto Osorio Oliveros ,  Alexander Matthijs Struycken ,  Bert Pieter Van Drieënhuizen ,  Jan Bernard Plechelmus Van Schoot

IPC: H05G2/00

CPC classification number: H05G2/006 ,  G03F7/70033 ,  G03F7/7085 ,  G21K1/062 ,  G21K2201/067 ,  H01S3/073 ,  H01S3/08059 ,  H01S3/0815 ,  H01S3/1307 ,  H01S3/2232 ,  H01S3/2383 ,  H05G2/008

Abstract: A method of generating radiation for a lithography apparatus. The method comprises providing a continuously renewing fuel target (50) at a plasma formation location (12) and directing a continuous-wave excitation beam (6) at the plasma formation location such that fuel within the continuously renewing fuel target is excited by the continuous-wave excitation beam to generate a radiation generating plasma.

Abstract translation: 一种为光刻设备产生辐射的方法。 该方法包括在等离子体形成位置（12）处提供连续更新的燃料靶（50）并且引导等离子体形成位置处的连续波激发束（6），使得连续更新的燃料靶内的燃料被连续的 波激发光束产生辐射产生等离子体。

公开(公告)号：US10222702B2

公开(公告)日：2019-03-05

申请号：US15550855

申请日：2016-01-21

Applicant: ASML Netherlands B.V.

Inventor： Arno Jan Bleeker ,  Ramon Mark Hofstra ,  Erik Petrus Buurman ,  Johannes Hubertus Josephina Moors ,  Alexander Matthijs Struycken ,  Harm-Jan Voorma ,  Sumant Sukdew Ramanujan Oemrawsingh ,  Markus Franciscus Antonius Eurlings ,  Peter Frans Maria Muys

IPC: G03F7/00 ,  G03F7/20 ,  H01S3/00 ,  G02B27/14 ,  H05G2/00 ,  H01S3/23

Abstract: A laser radiation source for a lithographic tool comprising a laser module to emit a first laser beam having a first wavelength and a second laser beam having a second wavelength, a beam separation device to separate the optical paths of the first and second laser beams and substantially recombine the optical paths, a beam delivery system to direct the first and second laser beams to a fuel target and an optical isolation apparatus to: adjust the polarization state of the first laser beam, adjust the polarization state of the second laser beam and to block radiation having the adjusted polarization states such that the reflection of the first laser beam and the reflection of the second laser beam are substantially blocked from propagating towards the laser module.

公开(公告)号：US09986628B2

公开(公告)日：2018-05-29

申请号：US14440934

申请日：2013-10-10

Applicant: ASML Netherlands B.V.

Inventor： Erik Roelof Loopstra ,  Andrei Mikhailovich Yakunin ,  Vadim Yevgenyevich Banine ,  Andrey Nikipelov ,  Edgar Alberto Osorio Oliveros ,  Alexander Matthijs Struycken ,  Bert Pieter Van Drieënhuizen ,  Jan Bernard Plechelmus Van Schoot

IPC: H05G2/00 ,  G03F7/20 ,  H01S3/08 ,  G21K1/06 ,  H01S3/23 ,  H01S3/07 ,  H01S3/081 ,  H01S3/13 ,  H01S3/223

CPC classification number: H05G2/006 ,  G03F7/70033 ,  G03F7/7085 ,  G21K1/062 ,  G21K2201/067 ,  H01S3/073 ,  H01S3/08059 ,  H01S3/0815 ,  H01S3/1307 ,  H01S3/2232 ,  H01S3/2383 ,  H05G2/008

Abstract: A method of generating radiation for a lithography apparatus. The method comprises providing a continuously renewing fuel target (50) at a plasma formation location (12) and directing a continuous-wave excitation beam (6) at the plasma formation location such that fuel within the continuously renewing fuel target is excited by the continuous-wave excitation beam to a radiation generating plasma.