-
公开(公告)号：US10191396B2
公开(公告)日：2019-01-29
申请号：US15316526
申请日：2015-05-21
Applicant: ASML NETHERLANDS B.V.
Inventor： Paul Corné Henri De Wit , Stijn Willem Boere , Youssef Karel Maria De Vos , Peter Paul Hempenius , Nicolaas Rudolf Kemper , Robertus Mathijs Gerardus Rijs , Frits Van Der Meulen
Abstract: A temperature conditioning system for a lithographic apparatus. Temperature variations in an object cause object deformation which prevents the object being accurately positioned. Temperature condition systems use conduit systems, provided with fluid, in or on the object to control the temperature of the object to reduce object deformation. In this way, parts of the object can be more accurately positioned. However, acceleration of the object and the temperature conditioning system induces variation in pressure within the fluid inside the conduit system on or in the object, which may also cause object deformation. To provide an improved conduit system, the lithographic apparatus further includes a control system which is used to control the movement of the object based on measurements indicating pressure variation in the conduit.
-
公开(公告)号：US11609503B2
公开(公告)日：2023-03-21
申请号：US17218420
申请日：2021-03-31
Applicant: ASML NETHERLANDS B.V.
Abstract: A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.
-
公开(公告)号：US10394140B2
公开(公告)日：2019-08-27
申请号：US16326410
申请日：2017-07-28
Applicant: ASML Netherlands B.V.
Inventor： Hendrikus Herman Marie Cox , Paul Corné Henri De Wit , Arie Jeffrey Den Boef , Adrianus Hendrik Koevoets , Jim Vincent Overkamp , Frits Van Der Meulen , Jacobus Cornelis Gerardus Van Der Sanden
IPC: G03F7/20
Abstract: A lithographic apparatus comprises a projection system which is configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table. The lithographic apparatus further comprises a heating apparatus comprises one or more radiation sources configured to provide additional radiation beams which illuminate and heat part of the substrate during the exposure.
-
公开(公告)号：US09946172B2
公开(公告)日：2018-04-17
申请号：US15039795
申请日：2014-11-14
Applicant: ASML Netherlands B.V.
Inventor： Peter Paul Hempenius , Martijn Houben , Nicolaas Rudolf Kemper , Robertus Mathijs Gerardus Rijs , Paul Corné Henri De Wit , Stijn Willem Boere , Youssef Karel Maria De Vos , Frits Van Der Meulen
CPC classification number: G03F7/70875 , G03F7/70775 , G03F7/709
Abstract: A lithographic apparatus includes: an object that is moveable in at least one direction; a control system to move the object in the at least one direction, wherein the control system is arranged to control movement of the object in the at least one direction in a frequency range of interest; and a conduit provided with a fluid, wherein the conduit is arranged on or in the object in a pattern, and wherein the pattern is such that an acceleration of the object in the at least one direction causes an acceleration pressure profile in the fluid along the conduit, the acceleration pressure profile not matching with a resonance pressure profile that corresponds to a standing wave mode in the fluid with a resonance frequency in the frequency range of interest.
-
公开(公告)号：US10571815B2
公开(公告)日：2020-02-25
申请号：US16547933
申请日：2019-08-22
Applicant: ASML NETHERLANDS B.V.
Abstract: A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.
-
Patent Agency Ranking
公开(公告)号：US10466599B2
公开(公告)日：2019-11-05
申请号：US16099733
申请日：2017-04-20
Applicant: ASML NETHERLANDS B.V.
Abstract: A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.
-
公开(公告)号：US12147167B2
公开(公告)日：2024-11-19
申请号：US15775602
申请日：2016-09-30
Applicant: ASML Netherlands B.V.
Inventor： Junichi Kanehara , Hans Butler , Paul Corné Henri De Wit , Engelbertus Antonius Fransiscus Van Der Pasch
Abstract: A method of operating a lithographic apparatus that comprises: a projection system configured to provide exposure radiation for patterning a substrate underneath the projection system; a first stage configured to support a first substrate; a second stage configured to support a second substrate; and a third stage accommodating a component that includes at least one of a sensor and a cleaning device; wherein the method comprises starting a pre-exposure scrum sweep operation after starting a substrate exchange operation; wherein during the pre-exposure scrum sweep operation, the third stage moves away from underneath the projection system while the second stage moves to underneath the projection system; wherein during the substrate exchange operation, the first substrate is unloaded from the first stage.
-
公开(公告)号：US12140873B2
公开(公告)日：2024-11-12
申请号：US17793525
申请日：2021-01-14
Applicant: ASML NETHERLANDS B.V.
IPC: G03F7/00
Abstract: A positioning device, including: a first positioning module arranged to support and position a first substrate, a second positioning module arranged to support and position a second substrate, a first positioning field in which the first and second positioning modules can be alternatingly positioned to carry out a first processing sequence, a second positioning field in which the first and second positioning modules can be alternatingly positioned to carry out a second processing sequence, wherein when one of the first and second positioning modules is carrying out or finishing the first processing sequence, the other of the first and second positioning modules has finished the second processing sequence and is positioned closer to the one of the first and second positioning modules.
-
公开(公告)号：US11914308B2
公开(公告)日：2024-02-27
申请号：US18123620
申请日：2023-03-20
Applicant: ASML NETHERLANDS B.V.
CPC classification number: G03F7/7085 , G03F7/70716 , G03F7/70725 , G03F7/70775 , G03F7/70808 , G03F9/70 , G03F9/7015 , G03F9/7019 , G03F9/7049 , G03F9/7084 , G03F9/7088 , G03F7/70633
Abstract: A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.
-
公开(公告)号：US10976675B2
公开(公告)日：2021-04-13
申请号：US16774035
申请日：2020-01-28
Applicant: ASML NETHERLANDS B.V.
Abstract: A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.
-
-
-
-
-
-
-
-
-
Search Results
10
records
(took 0.109 seconds)
