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公开(公告)号：US09804504B2
公开(公告)日：2017-10-31
申请号：US15154456
申请日：2016-05-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Guangqing Chen , Eric Richard Kent , Jen-Shiang Wang , Omer Abubaker Omer Adam
CPC classification number: G03F7/706 , G03F7/70625 , G03F7/70633 , G03F7/70641 , G03F7/70683 , G06F17/5009 , G06F17/5068 , G06F2217/12 , G06F2217/14
Abstract: A method of metrology target design is described. The method includes determining a sensitivity of a parameter for a metrology target design to an optical aberration, determining the parameter for a product design exposed using an optical system of a lithographic apparatus, and determining an impact on the parameter of the metrology target design based on the parameter for the product design and the product of the sensitivity and one or more of the respective aberrations of the optical system.
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公开(公告)号：US09355200B2
公开(公告)日：2016-05-31
申请号：US14577820
申请日：2014-12-19
Applicant: ASML NETHERLANDS B.V.
Inventor： Guangqing Chen , Eric Richard Kent , Jen-Shiang Wang , Omer Abubaker Omer Adam
CPC classification number: G03F7/706 , G03F7/70625 , G03F7/70633 , G03F7/70641 , G03F7/70683 , G06F17/5009 , G06F17/5068 , G06F2217/12 , G06F2217/14
Abstract: A method of metrology target design is described. The method includes determining a sensitivity of a parameter for a metrology target design to an optical aberration, determining the parameter for a product design exposed using an optical system of a lithographic apparatus, and determining an impact on the parameter of the metrology target design based on the parameter for the product design and the product of the sensitivity and one or more of the respective aberrations of the optical system.
Abstract translation: 描述了一种计量目标设计方法。 该方法包括确定用于度量目标设计的参数对光学像差的灵敏度，确定使用光刻设备的光学系统暴露的产品设计的参数，以及基于以下方式确定对度量目标设计的参数的影响： 产品设计的参数和灵敏度的乘积以及光学系统的各个像差中的一个或多个。
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公开(公告)号：US20230185990A1
公开(公告)日：2023-06-15
申请号：US18095515
申请日：2023-01-10
Applicant: ASML NETHERLANDS B.V.
Inventor： Lotte Marloes Willems , Kaustuve Bhattacharyya , Panagiotis Pieter Bintevinos , Guangqing Chen , Martin Ebert , Pieter Jacob Mathias Hendrik Knelissen , Stephen Morgan , Maurits Van Der Schaar , Leonardus Henricus Marie Verstappen , Jen-Shiang Wang , Peter Hanzen Wardenier
CPC classification number: G06F30/20 , G03F7/705 , G03F7/70625 , G03F7/70683 , G03F7/70633 , G03F9/7046 , G06F2111/10
Abstract: A method including performing a simulation to evaluate a plurality of metrology targets and/or a plurality of metrology recipes used to measure a metrology target, identifying one or more metrology targets and/or metrology recipes from the evaluated plurality of metrology targets and/or metrology recipes, receiving measurement data of the one or more identified metrology targets and/or metrology recipes, and using the measurement data to tune a metrology target parameter or metrology recipe parameter.
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公开(公告)号：US11221560B2
公开(公告)日：2022-01-11
申请号：US14577966
申请日：2014-12-19
Applicant: ASML NETHERLANDS B.V.
Inventor： Guangqing Chen , Wei Liu , Maurits Van der Schaar
Abstract: A method of metrology target design is described. The method includes determining a sensitivity of a parameter of a metrology target design to a perturbation of a process parameter for forming, or measuring the formation of, the metrology target, and determining a robustness of the metrology target design based on the sum of the sensitivity multiplied by the perturbation of at least one of the process parameters.
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公开(公告)号：US12204826B2
公开(公告)日：2025-01-21
申请号：US18095515
申请日：2023-01-10
Applicant: ASML NETHERLANDS B.V.
Inventor： Lotte Marloes Willems , Kaustuve Bhattacharyya , Panagiotis Pieter Bintevinos , Guangqing Chen , Martin Ebert , Pieter Jacob Mathias Hendrik Knelissen , Stephen Morgan , Maurits Van Der Schaar , Leonardus Henricus Marie Verstappen , Jen-Shiang Wang , Peter Hanzen Wardenier
IPC: G03F7/00 , G03F9/00 , G06F30/20 , G06F111/10
Abstract: A method including performing a simulation to evaluate a plurality of metrology targets and/or a plurality of metrology recipes used to measure a metrology target, identifying one or more metrology targets and/or metrology recipes from the evaluated plurality of metrology targets and/or metrology recipes, receiving measurement data of the one or more identified metrology targets and/or metrology recipes, and using the measurement data to tune a metrology target parameter or metrology recipe parameter.
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Patent Agency Ranking
公开(公告)号：US11580274B2
公开(公告)日：2023-02-14
申请号：US15559759
申请日：2016-03-24
Applicant: ASML Netherlands B.V.
Inventor： Lotte Marloes Willems , Kaustuve Bhattacharyya , Panagiotis Pieter Bintevinos , Guangqing Chen , Martin Ebert , Pieter Jacob Mathias Hendrik Knelissen , Stephen Morgan , Maurits Van Der Schaar , Leonardus Henricus Marie Verstappen , Jen-Shiang Wang , Peter Hanzen Wardenier
IPC: G03F7/20 , G06F30/20 , G03F9/00 , G06F111/10
Abstract: A method including performing a simulation to evaluate a plurality of metrology targets and/or a plurality of metrology recipes used to measure a metrology target, identifying one or more metrology targets and/or metrology recipes from the evaluated plurality of metrology targets and/or metrology recipes, receiving measurement data of the one or more identified metrology targets and/or metrology recipes, and using the measurement data to tune a metrology target parameter or metrology recipe parameter.
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公开(公告)号：US09494874B2
公开(公告)日：2016-11-15
申请号：US14578036
申请日：2014-12-19
Applicant: ASML NETHERLANDS B.V.
Inventor： Guangqing Chen , Jen-Shiang Wang , Shufeng Bai
CPC classification number: G03F7/70633 , G03F7/705 , G03F7/70625 , G03F7/70641 , G03F7/70683
Abstract: A system to, and a method to, select a metrology target for use on a substrate including performing a lithographic simulation for a plurality of points on a process window region for each proposed target, identifying a catastrophic error for any of the plurality of points for each proposed target, eliminating each target having a catastrophic error at any of the plurality of points, performing a metrology simulation to determine a parameter over the process window for each target not having a catastrophic error at any of the plurality of points, and using the one or more resulting determined simulated parameters to evaluate target quality.
Abstract translation: 一种用于选择在基板上使用的测量目标的系统和方法，包括对于每个所提出的目标执行对于处理窗口区域上的多个点的光刻模拟，识别多个点中的任一点的灾难性误差 每个所提出的目标，消除每个目标在多个点中的任一点具有灾难性错误，执行度量仿真以确定在多个点中的任一点上没有灾难性错误的每个目标的处理窗口上的参数，并且使用 一个或多个产生的确定的模拟参数来评估目标质量。
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公开(公告)号：US20150186581A1
公开(公告)日：2015-07-02
申请号：US14577820
申请日：2014-12-19
Applicant: ASML NETHERLANDS B.V.
Inventor： Guangqing Chen , Eric Richard Kent , Jen-Shiang Wang , Omer Abubaker Omer Adam
IPC: G06F17/50
CPC classification number: G03F7/706 , G03F7/70625 , G03F7/70633 , G03F7/70641 , G03F7/70683 , G06F17/5009 , G06F17/5068 , G06F2217/12 , G06F2217/14
Abstract: A method of metrology target design is described. The method includes determining a sensitivity of a parameter for a metrology target design to an optical aberration, determining the parameter for a product design exposed using an optical system of a lithographic apparatus, and determining an impact on the parameter of the metrology target design based on the parameter for the product design and the product of the sensitivity and one or more of the respective aberrations of the optical system.
Abstract translation: 描述了一种计量目标设计方法。 该方法包括确定用于度量目标设计的参数对光学像差的灵敏度，确定使用光刻设备的光学系统暴露的产品设计的参数，以及基于以下方式确定对度量目标设计的参数的影响： 产品设计的参数和灵敏度的乘积以及光学系统的各个像差中的一个或多个。
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公开(公告)号：US20220113638A1
公开(公告)日：2022-04-14
申请号：US17559710
申请日：2021-12-22
Applicant: ASML NETHERLANDS B.V.
Inventor： Guangqing Chen , Wei Liu , Maurits Van Der Schaar
Abstract: A method of metrology target design is described. The method includes determining a sensitivity of a parameter of a metrology target design to a perturbation of a process parameter for forming, or measuring the formation of, the metrology target, and determining a robustness of the metrology target design based on the sum of the sensitivity multiplied by the perturbation of at least one of the process parameters.
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公开(公告)号：US10296692B2
公开(公告)日：2019-05-21
申请号：US14577901
申请日：2014-12-19
Applicant: ASML NETHERLANDS B.V.
Inventor： Guangqing Chen , Justin Ghan , David Harold Whysong
Abstract: A method of metrology target design is described. The method includes providing a range or a plurality of values for design parameter of a metrology target and by a processor, selecting, by solving for and/or sampling within the range or the plurality of values for the design parameters, a plurality of metrology target designs having one or more design parameters meeting a constraint for a design parameter of the metrology target.
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