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公开(公告)号：US20160334711A1
公开(公告)日：2016-11-17
申请号：US15112602
申请日：2014-12-19
发明人： Markus Franciscus Antonius EURLINGS , Niek Antonius Jacobus Maria KLEEMANS , Antonius Johannes Josephus VAN DIJSSELDONK , Ramon Mark HOFSTRA , Oscar Franciscus Jozephus NOORDMAN , Tien Nang PHAM , Jan Bernard Plechelmus VAN SCHOOT , Jiun-Cheng WANG , Kevin Weimin ZHANG
CPC分类号： G03F7/70091 , G02B19/0019 , G02B27/0905 , G02B27/0983 , G03F7/70033 , G03F7/70175 , H05G2/005 , H05G2/008
摘要： A faceted reflector (32, 32″) for receiving an incident radiation beam (2) and directing a reflected radiation beam at a target. The faceted reflector comprises a plurality of facets, each of the plurality of facets comprising a reflective surface. The reflective surfaces of each of a first subset of the plurality of facets define respective parts of a first continuous surface and are arranged to reflect respective first portions of the incident radiation beam in a first direction to provide a first portion of the reflected radiation beam. The reflective surfaces of each of a second subset of the plurality of facets define respective parts of a second continuous surface and are arranged to reflect respective second portions of the incident radiation beam in a second direction to provide a second portion of the reflected radiation beam.
摘要翻译： 用于接收入射辐射束（2）并将反射的辐射束引导到目标的小面反射器（32,32“）。 小面反射器包括多个小平面，多个小面中的每个小面包括反射表面。 多个小平面的第一子集中的每一个的反射表面限定第一连续表面的相应部分，并且被布置成在第一方向上反射入射辐射束的相应第一部分以提供反射辐射束的第一部分。 多个小平面的第二子集中的每一个的反射表面限定第二连续表面的相应部分，并且被布置成在第二方向上反射入射辐射束的相应第二部分以提供反射辐射束的第二部分。
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公开(公告)号：US20170363965A1
公开(公告)日：2017-12-21
申请号：US15525610
申请日：2015-11-16
发明人： Hans BUTLER , Raoul Maarten Simon KNOPS , Bob STREEFKERK , Christiaan Louis VALENTIN , Jan Bernard Plechelmus VAN SCHOOT , Wilhelmus Franciscus Johanne SIMONS , Leon Leonardus Franciscus MERKX , Robertus Johannes Marinus DE JONGH , Roel Johannes Elisabeth MERRY , Michael Frederik YPMA
IPC分类号： G03F7/20
CPC分类号： G03F7/70258 , G03F7/70266 , G03F7/705 , G03F7/706
摘要： A projection system (PS1) for a lithographic apparatus comprises: an optical path (100); a plurality of sensors (S1-S4); one or more actuators (A1-A4); and a controller (CN). The optical path is operable to receive an input radiation beam (Bin) and to project an output radiation beam (Bout) onto a substrate to form an image. The optical path comprises: a plurality of optical elements (M1-M4), the plurality of optical elements comprising: a first set of at least two optical elements (M1, M4) and a second set of at least one optical element (M2, M3). Each sensor is associated with one of the plurality of optical elements and is operable to determine a position of that optical element. Each actuator is associated with one of the second set of optical elements and is operable to adjust that optical element. The controller is operable to use the one or more actuators to adjust the second set of optical elements in dependence on the determined position of the first set of optical elements so as to at least partially compensate for optical aberrations and/or line-of-sight errors caused by the positions of the first set of optical elements.
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公开(公告)号：US20170176868A1
公开(公告)日：2017-06-22
申请号：US15120093
申请日：2015-02-10
IPC分类号： G03F7/20
摘要： A lithographic apparatus including a support structure constructed to support a mask having a patterned area which is capable of imparting an EUV radiation beam with a pattern in its cross-section to form a patterned radiation beam, wherein the support structure is movable in a scanning direction, a substrate table constructed to hold a substrate, wherein the substrate table is movable in the scanning direction, and a projection system configured to project the patterned radiation beam onto an exposure region of the substrate, wherein the projection system has a demagnification in the scanning direction which is greater than a demagnification in a second direction which is perpendicular to the scanning direction and wherein the demagnification in the second direction is greater than 4×.
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公开(公告)号：US20150334813A1
公开(公告)日：2015-11-19
申请号：US14648452
申请日：2013-11-26
发明人： Jan Bernard Plechelmus VAN SCHOOT , Markus Franciscus Antoniu EURLINGS , Hermanus Johannes Maria KREUWEL
CPC分类号： H05G2/006 , G02B19/0023 , G02B19/0047 , G02B27/0983 , G03F7/70025 , G03F7/70033 , G03F7/70041 , G03F7/70183 , G03F7/702 , H05G2/008
摘要： A beam delivery apparatus is used with a laser produced plasma source. The beam delivery apparatus comprises variable zoom optics (550) operable to condition a beam of radiation so as to output a conditioned beam having a configurable beam diameter (b) and a plurality of mirrors (530a, 530b) operable to direct the conditioned beam of radiation to a plasma generation site. The beam delivery apparatus enables control of the axial position of the beam where the beam has a particular diameter, with respect to the beam's focus position (570). Also, a method is used to control the axial position of the location at a plasma generation site where a beam has a particular diameter, with respect to the beam's focus position.
摘要翻译： 光束输送装置与激光产生的等离子体源一起使用。 光束传送装置包括可变焦距光学器件（550），其可操作以调节辐射束，以便输出具有可配置光束直径（b）的调节光束和多个反射镜（530a，530b），可操作以将经调节的光束 辐射到等离子体生成部位。 光束传送装置能够控制光束相对于光束的聚焦位置（570）具有特定直径的光束的轴向位置。 此外，使用一种方法来控制等离子体产生位置处的位置的轴向位置，其中光束相对于光束的聚焦位置具有特定的直径。
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公开(公告)号：US20150077729A1
公开(公告)日：2015-03-19
申请号：US14532897
申请日：2014-11-04
发明人： Tjarko Adriaan Rudolf VAN EMPEL , Vadim Yevgenyevich BANINE , Vladimir Vitalevich IVANOV , Erik Roelof LOOPSTRA , Johannes Hubertus Josephina MOORS , Jan Bernard Plechelmus VAN SCHOOT , Yuri Johannes Gabriël VAN DE VIJVER , Gerardus Hubertus Petrus Maria SWINKELS , Hendrikus Gijsbertus SCHIMMEL , Dzmitry LABETSKI
CPC分类号： H05G2/008 , G03F7/70175 , G03F7/70891 , G03F7/70916 , G03F7/70983 , H05G2/003 , H05G2/006 , H05K7/2039
摘要： A module for producing extreme ultraviolet radiation, including an extreme ultraviolet radiation-emitting source, the source being provided with a supply configured to supply a fluid of an ignition material to a predetermined target ignition position and a target-igniting mechanism constructed and arranged to produce a plasma from the ignition material at the target ignition position, the plasma emitting the extreme ultraviolet radiation; a collector mirror constructed and arranged to focus radiation emitted by the plasma at a focal point; and a heat sink having a thermal energy-diverting surface constructed and arranged to divert thermal energy away from the target ignition position, wherein the heat sink is located at a position proximate the target ignition position.
摘要翻译： 一种用于产生极紫外辐射源的模块，包括极紫外辐射发射源，该源提供有被配置为将点火材料的流体供应到预定的目标点火位置的供应，以及构造和布置以产生的点火机构 来自点火材料的等离子体在目标点火位置，等离子体发射极紫外线辐射; 收集器镜，构造和布置成将等离子体发射的辐射聚焦在焦点处; 以及散热器，其具有构造和布置成将热能转移离开目标点火位置的热能转向表面，其中散热器位于靠近目标点火位置的位置。
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公开(公告)号：US20170052456A1
公开(公告)日：2017-02-23
申请号：US15119100
申请日：2015-01-23
CPC分类号： G03F7/70433 , G03F7/70033 , G03F7/70066 , G03F7/70091 , G03F7/70241 , G03F7/7025 , G03F7/70425 , G03F7/70483 , H05G2/005 , H05G2/008
摘要： A lithographic system including a lithographic apparatus with an anamorphic projection system, and a radiation source configured to generate an EUV radiation emitting plasma at a plasma formation location, the EUV radiation emitting plasma having an elongate form in a plane substantially perpendicular to an optical axis of the radiation source.
摘要翻译： 一种光刻系统，包括具有变形投影系统的光刻设备和被配置为在等离子体形成位置处产生EUV辐射等离子体的辐射源，所述EUV辐射发射等离子体在基本垂直于等离子体形成位置的光轴的平面中具有细长形式 辐射源。
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公开(公告)号：US20140293248A1
公开(公告)日：2014-10-02
申请号：US14261208
申请日：2014-04-24
发明人： Bob STREEFKERK , Johannes Jacobus Matheus BASELMANS , Adrianus Franciscus Petrus ENGELEN , Jozef Maria FINDERS , Paul GRÄUPNER , Johannes Catharinus Hubertus MULKENS , Jan Bernard Plechelmus VAN SCHOOT
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/70333
摘要： In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.
摘要翻译： 在浸没光刻设备或设备制造方法中，在成像期间投影图像的焦点位置改变以增加焦点宽度。 在一个实施例中，焦点可以使用浸没式光刻设备的液体供应系统来改变。
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