POLISHING CARRIER HEAD WITH MULTIPLE ANGULAR PRESSURIZABLE ZONES

    公开(公告)号:US20210402549A1

    公开(公告)日:2021-12-30

    申请号:US17359419

    申请日:2021-06-25

    Abstract: A carrier head for a polishing system includes a housing, a flexible membrane, a first plurality of pressure supply lines, a second plurality of pressure supply lines, and a valve assembly. The flexible membrane defines a multiplicity of independently pressurizable chambers. The valve assembly has a multiplicity of valves with each respective valve of the multiplicity of valves coupled to a respective pressure chamber from the multiplicity of independently pressurizable chambers. Each respective valve is configured to selectively couple the respective pressure chamber to one pressure supply line from a pair of pressure supply lines that include a pressure supply line from the first plurality of pressure supply lines and a pressure supply line from the second plurality of pressure supply lines.

    Retaining ring having inner surfaces with facets
    5.
    发明授权
    Retaining ring having inner surfaces with facets 有权
    具有小面的内表面的保持环

    公开(公告)号:US09368371B2

    公开(公告)日:2016-06-14

    申请号:US14259089

    申请日:2014-04-22

    CPC classification number: H01L21/3212 B24B37/04 B24B37/32 B24B41/06

    Abstract: A retaining ring comprises a generally annular body. The body comprises a top surface, a bottom surface, an outer surface connected to the top surface at an outer top perimeter and the bottom surface at an outer bottom perimeter, and an inner surface connected to the top surface at an inner top perimeter and the bottom surface at an inner bottom perimeter. The inner surface comprises seven or more planar facets. Adjacent planar facets are connected at corners. The inner bottom perimeter comprises straight edges of the planar facets connected at the corners.

    Abstract translation: 保持环包括大致环形体。 主体包括顶表面,底表面,外表面和外表面,外表面在外顶部周边处连接到顶表面,底表面连接到外底边周边,内表面在内顶部周边连接到顶表面, 底部表面处于内底部周边。 内表面包括七个或更多个平面。 相邻的平面小平面连接在角落处。 内底部周边包括连接在拐角处的平面的平直边缘。

    CLAMPING RETAINER FOR CHEMICAL MECHANICAL POLISHING

    公开(公告)号:US20230381917A1

    公开(公告)日:2023-11-30

    申请号:US17968597

    申请日:2022-10-18

    CPC classification number: B24B37/32

    Abstract: A carrier head for chemical mechanical polishing includes a housing, a substrate mounting surface, and a retaining ring assembly. The retaining ring assembly includes an inner ring surrounding the substrate mounting surface and having an inner surface to retain the substrate below the substrate mounting surface, a first actuator to adjust a vertical load on the inner ring, an outer ring surrounding the inner ring, and a second actuator positioned between the inner ring and the outer ring. The inner ring has a plurality of slots that are formed in a lower surface and that extend from the inner surface to an outer surface of the inner ring to divide the inner ring into a plurality of arcuate segments suspended from an upper portion. The second actuator applies a radially inward pressure such that the plurality of arcuate segments flex inwardly relative to the upper portion.

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