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公开(公告)号：US12030156B2
公开(公告)日：2024-07-09
申请号：US17355024
申请日：2021-06-22
Applicant: Applied Materials, Inc.
Inventor： Brian J. Brown , Andrew J. Nagengast , Justin Ho Kuen Wong
Abstract: A carrier head for holding a substrate in a polishing system has a housing including a carrier plate, a first flexible membrane secured to the housing, and a plurality of independently operable piezoelectric actuators secured to the carrier plate. The first flexible membrane has an upper surface and having a lower surface that provides a substrate mounting surface. The piezoelectric actuators are positioned above the first flexible membrane so as to independently adjust compressive pressure on the upper surface of the first flexible membrane.
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公开(公告)号：US20240139900A1
公开(公告)日：2024-05-02
申请号：US18101025
申请日：2023-01-24
Applicant: Applied Materials, Inc.
Inventor： Jeonghoon Oh , Jianshe Tang , Steven M. Zuniga , Brian J. Brown , Andrew J. Nagengast , Derek R. Witty , Rushabhkumar Desai , Shih-Haur Shen , Haosheng Wu , Yufei Hu
IPC: B24B37/005 , B24B37/04
CPC classification number: B24B37/005 , B24B37/042
Abstract: A chemical mechanical polishing apparatus has a platen to support a polishing pad, a carrier head comprising a rigid housing and configured to hold a surface of a substrate against the polishing pad, a motor to generate relative motion between the platen and the carrier head so as to polish the substrate, an in-situ carrier head monitoring system including a sensor positioned to interact with the housing and to detect vibrational motion of the housing and generate signals based on the detected vibrational motion, and a controller. The controller is configured to generate a value for a carrier head status parameter based on received signals from the in-situ carrier head monitoring system, and change a polishing parameter or generate an alert based on the carrier head status parameter.
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公开(公告)号：US20210402549A1
公开(公告)日：2021-12-30
申请号：US17359419
申请日：2021-06-25
Applicant: Applied Materials, Inc.
Inventor： Steven M. Zuniga , Jay Gurusamy , Andrew J. Nagengast , Vladimir Galburt
IPC: B24B37/005 , B24B37/32
Abstract: A carrier head for a polishing system includes a housing, a flexible membrane, a first plurality of pressure supply lines, a second plurality of pressure supply lines, and a valve assembly. The flexible membrane defines a multiplicity of independently pressurizable chambers. The valve assembly has a multiplicity of valves with each respective valve of the multiplicity of valves coupled to a respective pressure chamber from the multiplicity of independently pressurizable chambers. Each respective valve is configured to selectively couple the respective pressure chamber to one pressure supply line from a pair of pressure supply lines that include a pressure supply line from the first plurality of pressure supply lines and a pressure supply line from the second plurality of pressure supply lines.
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公开(公告)号：US11056350B2
公开(公告)日：2021-07-06
申请号：US15018443
申请日：2016-02-08
Applicant: Applied Materials, Inc.
Inventor： Jeonghoon Oh , Steven M. Zuniga , Andrew J. Nagengast , Samuel Chu-Chiang Hsu , Gautam Shashank Dandavate
IPC: B24B37/32 , H01L21/321 , B24B37/04 , B24B41/06 , H01L21/306 , H01L21/304 , B24B37/10
Abstract: A retaining ring comprises a generally annular body. The body comprises a top surface, a bottom surface, an outer surface connected to the top surface at an outer top perimeter and the bottom surface at an outer bottom perimeter, and an inner surface connected to the top surface at an inner top perimeter and the bottom surface at an inner bottom perimeter. The inner surface comprises seven or more planar facets. Adjacent planar facets are connected at corners. The inner bottom perimeter comprises straight edges of the planar facets connected at the corners.
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公开(公告)号：US09368371B2
公开(公告)日：2016-06-14
申请号：US14259089
申请日：2014-04-22
Applicant: Applied Materials, Inc.
Inventor： Jeonghoon Oh , Steven M. Zuniga , Andrew J. Nagengast , Samuel Chu-Chiang Hsu , Gautam Shashank Dandavate
IPC: H01L21/465 , H01L21/306 , B24B1/00 , B24B41/06 , H01L21/321 , B24B37/04 , B24B37/32
CPC classification number: H01L21/3212 , B24B37/04 , B24B37/32 , B24B41/06
Abstract: A retaining ring comprises a generally annular body. The body comprises a top surface, a bottom surface, an outer surface connected to the top surface at an outer top perimeter and the bottom surface at an outer bottom perimeter, and an inner surface connected to the top surface at an inner top perimeter and the bottom surface at an inner bottom perimeter. The inner surface comprises seven or more planar facets. Adjacent planar facets are connected at corners. The inner bottom perimeter comprises straight edges of the planar facets connected at the corners.
Abstract translation: 保持环包括大致环形体。 主体包括顶表面，底表面，外表面和外表面，外表面在外顶部周边处连接到顶表面，底表面连接到外底边周边，内表面在内顶部周边连接到顶表面， 底部表面处于内底部周边。 内表面包括七个或更多个平面。 相邻的平面小平面连接在角落处。 内底部周边包括连接在拐角处的平面的平直边缘。
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Patent Agency Ranking
公开(公告)号：US20240316723A1
公开(公告)日：2024-09-26
申请号：US18736281
申请日：2024-06-06
Applicant: Applied Materials, Inc.
Inventor： Steven Mark Reedy , Simon Yavelberg , Jeonghoon Oh , Steven M. Zuniga , Andrew J. Nagengast , Samuel Chu-Chiang Hsu , Gautam Shashank Dandavate
IPC: B24B37/32 , H01L21/687
CPC classification number: B24B37/32 , H01L21/68721
Abstract: Some implementations of a retaining ring has an inner surface having a first portion formed of multiple planar facets and a second portion that adjoins the first portion along a boundary and includes a frustoconical surface that is sloped downwardly from outside in. Some implementations of the retaining ring have a crenellated or serpentine inner surface, and/or an inner surface with alternating region of different surface properties or different tilt angles.
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公开(公告)号：US12048981B2
公开(公告)日：2024-07-30
申请号：US17945932
申请日：2022-09-15
Applicant: Applied Materials, Inc.
Inventor： Steven Mark Reedy , Simon Yavelberg , Jeonghoon Oh , Steven M. Zuniga , Andrew J. Nagengast , Samuel Chu-Chiang Hsu , Gautam Shashank Dandavate
IPC: B24B37/32 , H01L21/687
CPC classification number: B24B37/32 , H01L21/68721
Abstract: Some implementations of a retaining ring has an inner surface having a first portion formed of multiple planar facets and a second portion that adjoins the first portion along a boundary and includes a frustoconical surface that is sloped downwardly from outside in. Some implementations of the retaining ring have a crenellated or serpentine inner surface, and/or an inner surface with alternating region of different surface properties or different tilt angles.
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公开(公告)号：US11931857B2
公开(公告)日：2024-03-19
申请号：US17350579
申请日：2021-06-17
Applicant: Applied Materials, Inc.
Inventor： Steven M. Zuniga , Jay Gurusamy , Andrew J. Nagengast
IPC: B24B37/30 , B24B37/04 , B24B49/12 , H01L21/3105 , H01L21/321 , H01L21/66 , H01L21/67 , H01L21/683
CPC classification number: B24B37/30 , B24B37/042 , B24B49/12 , H01L21/31053 , H01L21/3212 , H01L21/67253 , H01L21/6838 , H01L22/26
Abstract: A carrier head includes a housing, a support assembly having a support plate flexibly connected to the housing so as to be vertically movable, a plurality of fluid-impermeable barriers projecting from a bottom of the support plate to define a plurality of recesses that are open at bottom sides thereof, and pneumatic control lines. A volume between the support plate and the housing includes one or more independently pressurizable first chambers to apply pressure on a top surface of the support plate in one or more first zones. The barriers are positioned and configured such that when a planar substrate is loaded into the carrier head the barriers contact the substrate and divide a volume between the support plate and the substrate into a plurality of second chambers. The pneumatic control lines are coupled to the plurality of recesses to provide a plurality of independently pressurizable second zones.
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公开(公告)号：US11890715B2
公开(公告)日：2024-02-06
申请号：US17355038
申请日：2021-06-22
Applicant: Applied Materials, Inc.
Inventor： Brian J. Brown , Andrew J. Nagengast , Justin Ho Kuen Wong
Abstract: A carrier head for holding a substrate in a polishing system includes a housing, a first flexible membrane secured to the housing to form one or more pressurizable chambers to apply pressure through a central membrane portion of the first flexible membrane to a central portion of a substrate, and a plurality of independently operable piezoelectric actuators supported by the housing, the plurality of piezoelectric actuators positioned radially outward of the central membrane portion and at different angular positions so as to independently adjust pressure on a plurality of angular zones in an annular outer region of the substrate surrounding the central portion of the substrate.
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公开(公告)号：US20230381917A1
公开(公告)日：2023-11-30
申请号：US17968597
申请日：2022-10-18
Applicant: Applied Materials, Inc.
Inventor： Steven M. Zuniga , Jeonghoon Oh , Andrew J. Nagengast
IPC: B24B37/32
CPC classification number: B24B37/32
Abstract: A carrier head for chemical mechanical polishing includes a housing, a substrate mounting surface, and a retaining ring assembly. The retaining ring assembly includes an inner ring surrounding the substrate mounting surface and having an inner surface to retain the substrate below the substrate mounting surface, a first actuator to adjust a vertical load on the inner ring, an outer ring surrounding the inner ring, and a second actuator positioned between the inner ring and the outer ring. The inner ring has a plurality of slots that are formed in a lower surface and that extend from the inner surface to an outer surface of the inner ring to divide the inner ring into a plurality of arcuate segments suspended from an upper portion. The second actuator applies a radially inward pressure such that the plurality of arcuate segments flex inwardly relative to the upper portion.
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