Abstract:
The disclosure provides LED display panel and manufacturing method thereof. LED display panel includes: substrate; LED on substrate; pixel defining layer defining pixel opening on substrate, the LED being within pixel opening; and first encapsulation layer on light emitting side of LED. Portion of first encapsulation layer within pixel opening includes sidewall inclined with respect to substrate, surface of sidewall close to LED includes first portions and second portions alternately arranged in direction away from LED and connected to each other, and inclination angles of first portions with respect to substrate are smaller than those of second portions with respect to substrate. Refractive index of material of first encapsulation layer is greater than refractive index of material of each of layer structures directly on both sides of first encapsulation layer in direction perpendicular to substrate.
Abstract:
A method for fabricating a one glass solution touch panel is provided. The method includes forming a protective layer on a first surface of a substrate, and forming a black matrix, a plurality of first electrodes, a plurality of second electrodes, a first over coat layer, and a plurality of conductive bridges on a second surface of the substrate, wherein the second surface includes a visual area in which the first electrodes and the second electrodes are arranged in an alternating pattern, and a non-visual area where the black matrix is provided, wherein the second electrode includes a plurality of conductive lumps, wherein each of the conductive lumps is located between adjacent first electrodes, wherein the first over coat layer separates the conductive lumps from the first electrodes, and wherein each conductive bridge connects the conductive lumps belonging to the same second electrode.
Abstract:
The present invention provides a display substrate comprising a plurality of pixel regions and a thin film transistor provided in each of the pixel regions. Each of the pixel regions comprises a transmissive region and a reflective region, and a protection layer is provided on the thin film transistor. A portion of the protection layer corresponding to the reflective region is a protrusion portion, and a portion of the protection layer corresponding to the thin film transistor is provided with a via therein.
Abstract:
Embodiments of the invention provide an array substrate, a manufacturing method thereof and a display device. The array substrate comprises: a base substrate; a gate line and a gate electrode formed on the base substrate; a gate insulating layer formed on the gate line and the gate electrode; a source electrode, a drain electrode and a pixel electrode formed on the gate insulating layer, wherein the pixel electrode is directly connected to the drain electrode; and an active layer formed on the gate insulating layer, the source electrode and the drain electrode.
Abstract:
The present disclosure provides an array substrate, a fabrication method thereof and a display device. The array substrate includes an insulating layer provided with a first via therein. The array substrate further includes a detection structure including a first conductive structure, a second conductive structure and an insulating structure therebetween. The insulating structure is a portion of the insulating layer. The second conductive structure includes a first portion and a second portion which are separated from each other, and the first portion and the second portion partially overlap with the first conductive structure in a thickness direction of the array substrate, respectively. A second via is provided in the insulating structure between overlapping portions of the first portion and the first conductive structure, and a third via is provided in the insulating structure between overlapping portions of the second portion and the first conductive structure.
Abstract:
A thin film transistor, comprising a substrate, an active layer disposed on the substrate, and a source and drain that make electrical contact with the active layer, wherein the source and drain each comprise a first sub-electrode and a second sub-electrode that are stacked along a thickness of the active layer, and the first sub-electrode is closer to the active layer relative to the second sub-electrode. An area of an overlapping region between an orthographic projection of the second sub-electrode of at least one of the source and drain on the substrate and an overlapping region between an orthographic projection of the first sub-electrode of the at least one of the source and the drain on the substrate and the orthographic projection of the active layer on the substrate.
Abstract:
This disclosure provides a transparent conductive thin film, a substrate, a touch screen and a manufacturing method thereof, and a display device. The transparent conductive thin film comprises a first metal oxide layer, a metal layer and a second metal oxide layer arranged in a stacking manner.
Abstract:
The present disclosure provides an array substrate and manufacturing method thereof, and a display device. Moreover, it relates to the technical field of display apparatus and can solve the problem that the organic insulating layer in an existing array substrate easily causes deficiencies in other structures. The array substrate of the present disclosure comprises an insulating layer. The insulating layer is provided with an opening and comprises: a first insulating layer; a second insulating layer arranged on the first insulating layer. A slope angle of the second insulating layer at the opening is smaller than a slope angle of the first insulating layer.
Abstract:
An oxide thin film transistor array substrate, a manufacturing method thereof and a display panel are provided. The oxide TFT array substrate includes a base substrate and an oxide TFT, a gate line, a data line and a pixel electrode provided on the base substrate, the drain electrode of the oxide TFT being connected with the pixel electrode, wherein a connection structure is provided between the source electrode of the oxide TFT and the data line, by which the source electrode of the oxide TFT and the data line are electrically connected, and the resistivity of the connection structure is larger than the resistivity of the source electrode.
Abstract:
The present disclosure relates to a manufacturing method for an array substrate, including: forming a first electrode material layer, a conductive enhancement material layer and a protective material layer in sequence, oxidation resistance of the protective material layer being stronger than that of the conductive enhancement material layer; forming a mask pattern on a side of the protective material layer away from the first electrode material layer, the mask pattern including a first portion and a second portion, and a thickness of the first portion being greater than that of the second portion; performing ashing on the mask pattern to remove the second portion to expose the protective material layer covered by the second portion; patterning the first electrode material layer to form a first electrode; and patterning the protective material layer and the conductive enhancement material layer to form a protective layer and a conductive enhancement layer.