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    Catalyst system for multi-block copolymer formation
    2.
    发明授权
    Catalyst system for multi-block copolymer formation 有权

    公开(公告)号：US11459409B2

    公开(公告)日：2022-10-04

    申请号：US16494085

    申请日：2018-03-14

    Applicant: Dow Global Technologies LLC

    Inventor： Andrew J. Young ,  Hien Q. Do ,  Brad C. Bailey ,  Matthew D. Christianson ,  Jeffrey C. Munro ,  Edmund M. Carnahan

    IPC: C08F297/08 ,  C08F4/64

    Abstract: The present disclosure relates to a catalyst system for use in forming a multi-block copolymer, said copolymer containing therein two or more segments or blocks differing in chemical or physical properties, a polymerization process using the same, and the resulting polymers, wherein the composition comprises the admixture or reaction product resulting from combining: (A) a first olefin polymerization procatalyst, (B) a second olefin polymerization procatalyst capable of preparing polymers differing in chemical or physical properties from the polymer prepared by procatalyst (A) under equivalent polymerization conditions, (C) an activator, and (D) a chain shuttling agent.

    OLEFIN POLYMERIZATION CATALYST SYSTEMS AND METHODS OF USE THEREOF
    4.
    发明申请
    OLEFIN POLYMERIZATION CATALYST SYSTEMS AND METHODS OF USE THEREOF 审中-公开

    公开(公告)号：US20200277411A1

    公开(公告)日：2020-09-03

    申请号：US16089008

    申请日：2017-03-30

    Applicant: Dow Global Technologies LLC

    Inventor： Brad C. Bailey ,  Matthew D. Christianson ,  Anna V. Davis ,  Jasson T. Patton ,  Tomas D. Paine

    IPC: C08F4/64 ,  C08F2/38 ,  C08F210/16

    Abstract: Olefin polymerization catalyst systems are provided that include a procatalyst component having a metal-ligand complex of Formula (I): [formula] (I) where each X is a neutral, monoanionic, or dianionic, monodentate or polydentate ligand such that the complex of Formula (I) is neutral; each R1 and R10 is a (C6-C40)aryl, substituted (C6-C40)aryl, (C3-C40)heteroaryl, or substituted (C3-C40)heteroaryl; each R2, R3, R4, R7, R8, and R9 is a hydrogen; (C1-C40)hydrocarbyl; substituted (C1-C40)hydrocarbyl; (C1-C40)heterohydrocarbyl; substituted (C1-C40)heterohydrocarbyl; halogen; or nitro (NO2) group; and each R5 and R6 is a (C1-C)alkyl; substituted (C1-C40)alkyl; or [(Si)1—(C+Si)40] substituted organosilyl. Additionally, olefin-based polymers and processes for polymerizing one or more olefin-based polymers in the presence of the olefin polymerization catalyst systems are also provided.

    Calixarene and photoresist composition comprising same
    7.
    发明授权
    Calixarene and photoresist composition comprising same 有权
    杯芳烃和包含其的光致抗蚀剂组合物

    公开(公告)号：US08936900B2

    公开(公告)日：2015-01-20

    申请号：US13624579

    申请日：2012-09-21

    Applicant: Rohm and Haas Electronic Materials LLC ,  Dow Global Technologies LLC

    Inventor： Vipul Jain ,  D. Patrick Green ,  James W. Thackeray ,  Brad C. Bailey ,  Su Jin Kang

    IPC: G03F7/004 ,  C07C43/02 ,  C07C309/00

    CPC classification number: C07C67/29 ,  C07C69/76 ,  G03F7/0392

    Abstract: A molecular glass compound comprises a vinyl ether adduct of an aromatic vinyl ether of formula C(R1)2═C(R2)—O-(L)n-Ar1, and a calix[4]arene, wherein R1 and R2 are each independently a single bond, H, C1-20 alkyl, C1-20 haloalkyl, C6-20 aryl, C6-20 haloaryl, C7-20 aralkyl, or C7-20 haloaralkyl, L is a C1-20 linking group, n is 0 or 1, and Ar1 is a halo-containing monocyclic, or substituted or unsubstituted polycyclic or fused polycyclic C6-20 aromatic-containing moiety, wherein R1 and R2 are connected to Ar1 when either or both of R1 and R2 is a single bond and n is 0. A photoresist, comprising the molecular glass compound, a solvent, and a photoacid generator, a coated substrate, comprising (a) a substrate having one or more layers to be patterned on a surface thereof; and (b) a layer of a photoresist composition over the one or more layers to be patterned, and a method of forming the molecular glass compound, are also disclosed.

    Abstract translation: 分子玻璃化合物包括式C（R 1）2 = C（R 2）-O-（L）n -Ar 1的芳族乙烯基醚和杯[4]芳烃的乙烯基醚加合物，其中R 1和R 2各自 独立地单键，H，C 1-20烷基，C 1-20卤代烷基，C 6-20芳基，C 6-20卤代芳基，C 7-20芳烷基或C 7-20卤代烷基，L是C 1-20连接基团，n是0 或1，并且Ar 1是含卤素的单环或取代或未取代的多环或稠合多环C 6-20芳族部分，其中当R 1和R 2中的任一个或两个为单键时，R 1和R 2连接到Ar 1，n 包括分子玻璃化合物，溶剂和光致酸产生剂的涂覆基材，包括（a）在其表面上具有待图案化的一层或多层的基材; 和（b）一层或多层待图案化的光致抗蚀剂组合物层，以及形成分子玻璃化合物的方法。

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