公开(公告)号：US20240210826A1

公开(公告)日：2024-06-27

申请号：US18586593

申请日：2024-02-26

Applicant: FUJIFILM Corporation

Inventor： Taro MIYOSHI ,  Shuhei YAMAGUCHI ,  Tomoaki YOSHIOKA ,  Eiji FUKUZAKI ,  Yuka KAMINO

IPC: G03F7/004

CPC classification number: G03F7/0045

Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition including: a resin (A) that is decomposed by the action of an acid and thereby increased in polarity; and a compound (C) that generates an acid upon irradiation with actinic rays or radiation and that is represented by a specific formula. The resin (A) includes a specific repeating unit represented by specific general formula (AI).

公开(公告)号：US20230393472A1

公开(公告)日：2023-12-07

申请号：US18446045

申请日：2023-08-08

Applicant: FUJIFILM Corporation

Inventor： Shuhei YAMAGUCHI ,  Taro MIYOSHI

IPC: G03F7/039 ,  G03F7/004 ,  C08F212/14 ,  C08F232/08 ,  C08F220/18 ,  C08F220/58 ,  C08F220/38 ,  C08F220/28 ,  C08F220/36

CPC classification number: G03F7/039 ,  G03F7/0045 ,  C08F212/24 ,  C08F232/08 ,  C08F220/1806 ,  C08F220/1811 ,  C08F220/585 ,  C08F220/1809 ,  C08F220/1818 ,  C08F220/382 ,  C08F220/1808 ,  C08F220/282 ,  C08F220/365 ,  C08F220/283 ,  C08F220/281 ,  C08F212/30

Abstract: Provided are an actinic ray-sensitive or radiation-sensitive resin composition having excellent temporal stability and excellent LWR suppression property of a pattern to be formed; a resist film; a positive tone pattern forming method; and a method for manufacturing an electronic device, which relate to the actinic ray-sensitive or radiation-sensitive resin composition.
The actinic ray-sensitive or radiation-sensitive resin composition contains a resin (A) having a repeating unit (a) and a basic compound, a pKa of a conjugate acid of which is 13.00 or less, in which the repeating unit (a) has a non-ionic group which generates an acid in a case where a leaving group is eliminated by irradiation with an actinic ray or a radiation, in which a repeating unit obtained by replacing the leaving group with a hydrogen atom has a molecular weight of 300 or less, and the repeating unit (a) is a predetermined amount with respect to a total solid content of the actinic ray-sensitive or radiation-sensitive resin composition.

公开(公告)号：US20210165325A1

公开(公告)日：2021-06-03

申请号：US17166321

申请日：2021-02-03

Applicant: FUJIFILM Corporation

Inventor： Taro MIYOSHI ,  Yasunori YONEKUTA ,  Eiji FUKUZAKI

IPC: G03F7/039 ,  G03F7/004

Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin having a solubility in an alkali developer that increases through decomposition by an action of an acid and (B) a compound that generates an acid upon irradiation with actinic rays or radiation and is represented by a specific structure; an actinic ray-sensitive or radiation-sensitive film using the composition; a pattern forming method; a method for manufacturing an electronic device; and a compound.

公开(公告)号：US20250004377A1

公开(公告)日：2025-01-02

申请号：US18424834

申请日：2024-01-28

Applicant: FUJIFILM Corporation

Inventor： Eiji FUKUZAKI ,  Shuhei YAMAGUCHI ,  Tomoaki YOSHIOKA ,  Taro MIYOSHI

IPC: G03F7/039 ,  C08F212/14 ,  C08F212/32 ,  C08F220/30 ,  C08F220/58 ,  C08F226/06 ,  C08K5/42 ,  G03F7/00 ,  G03F7/004 ,  G03F7/16

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains (A) a resin having a repeating unit (a) having a group that is decomposed by the action of an acid to generate a carboxylic acid and (B) a compound that generates an acid upon irradiation with an actinic ray or a radiation and is represented by a specified general formula (1). The repeating unit (a) is represented by a general formula (a), and the compound (B) is represented by a general formula (1).

公开(公告)号：US20240241443A1

公开(公告)日：2024-07-18

申请号：US18421987

申请日：2024-01-25

Applicant: FUJIFILM Corporation

Inventor： Eiji FUKUZAKI ,  Shuhei YAMAGUCHI ,  Tomoaki YOSHIOKA ,  Taro MIYOSHI

IPC: G03F7/039 ,  G03F7/004

CPC classification number: G03F7/0392 ,  G03F7/0048

Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (P) having (A) a repeating unit having a group that is decomposed by the action of an acid to generate a carboxylic acid and represented by a specified general formula (a) and (B) a repeating unit having a group that is decomposed by irradiation with an actinic ray or a radiation to generate an acid and represented by a specified general formula (b), and a solvent including a solvent having a boiling point of 150° C. or more, a solvent having a boiling point of 150° C. or more being contained in 45 mass % or more with respect to the total amount of the solvent.

公开(公告)号：US20230408920A1

公开(公告)日：2023-12-21

申请号：US18458609

申请日：2023-08-30

Applicant: FUJIFILM Corporation

Inventor： Shuhei YAMAGUCHI ,  Taro MIYOSHI

IPC: G03F7/039

CPC classification number: G03F7/039

Abstract: Provided are an actinic ray-sensitive or radiation-sensitive resin composition in which LWR of a pattern to be obtained is excellent; a resist film; a pattern forming method; and a method for manufacturing an electronic device.
The actinic ray-sensitive or radiation-sensitive resin composition contains a resin having a group which is decomposed by action of acid to generate a polar group, in which the resin includes a repeating unit represented by General Formula (A2), and at least one of a requirement 1 or a requirement 2 is satisfied.



Requirement 1: the actinic ray-sensitive or radiation-sensitive resin composition contains a salt represented by General Formula (1)
Requirement 2: the resin has a residue formed by removing one hydrogen atom from the salt represented by General Formula (1)

公开(公告)号：US20230123203A1

公开(公告)日：2023-04-20

申请号：US17884181

申请日：2022-08-09

Applicant: FUJIFILM Corporation

Inventor： Taro MIYOSHI ,  Shuhei Yamaguchi

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/038 ,  C08F212/14 ,  C08F220/30 ,  C07C51/41 ,  C07C381/12

Abstract: A method for producing an actinic ray-sensitive or radiation-sensitive resin composition, the method including passing a solution including an acid compound having a pKa of 2.0 or more through a column packed with an ion-exchange resin, producing an onium salt by using the acid compound having been passed through the column, and mixing together the onium salt and a resin that undergoes an increase in polarity due to action of acid.

公开(公告)号：US20230038825A1

公开(公告)日：2023-02-09

申请号：US17939660

申请日：2022-09-07

Applicant: FUJIFILM Corporation

Inventor： Hideyuki ISHIHARA ,  Toshiya TAKAHASHI ,  Taro MIYOSHI ,  Eiji FUKUZAKI

IPC: G03F7/029

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition containing: a resin (P) of which a solubility in a developer changes by an action of an acid; a compound (A) that has a group (a) having a polarity which changes through decomposition by an action of an acid, and generates an acid (ac1) upon irradiation with actinic rays or radiation; a compound (B) that generates an acid (ac2) having a higher pKa than the acid (ac1) generated from the compound (A), upon irradiation with actinic rays or radiation; and a basic compound (C).

公开(公告)号：US20230393473A1

公开(公告)日：2023-12-07

申请号：US18449475

申请日：2023-08-14

Applicant: FUJIFILM Corporation

Inventor： Taro MIYOSHI ,  Shuhei YAMAGUCHI ,  Eiji FUKUZAKI ,  Tomoaki YOSHIOKA

IPC: G03F7/039

CPC classification number: G03F7/039

Abstract: An object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition having excellent sensitivity to exposure. Another object of the present invention is to provide a resist film, a pattern forming method, and a method for manufacturing an electronic device, which relate to the actinic ray-sensitive or radiation-sensitive resin composition. The actinic ray-sensitive or radiation-sensitive resin composition contains a resin which is decomposed by action of acid to increase polarity, in which at least one of a requirement that the actinic ray-sensitive or radiation-sensitive resin composition further contains a compound represented by Formula (1), or a requirement that the resin which is decomposed by action of acid to increase polarity has a residue formed by removing one hydrogen atom from the compound represented by Formula (1) is satisfied.

公开(公告)号：US20230120139A1

公开(公告)日：2023-04-20

申请号：US17987122

申请日：2022-11-15

Applicant: FUJIFILM Corporation

Inventor： Taro MIYOSHI ,  Eiji Fukuzaki ,  Shuhei Yamaguchi

IPC: G03F7/004 ,  G03F7/039 ,  G03F7/038 ,  C08F212/14 ,  C08F220/30 ,  C08F220/18

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition containing: a resin (A) of which polarity increases by an action of an acid, the resin (A) having a repeating unit represented by General Formula (A1) as defined herein; and a compound (B) that generates an acid upon irradiation with actinic rays or radiation.