公开(公告)号：US20240084062A1

公开(公告)日：2024-03-14

申请号：US18494412

申请日：2023-10-25

申请人： FUJIFILM Corporation

发明人： Takafumi NAKAYAMA ,  Naoyuki Morooka

IPC分类号： C08F220/36 ,  C08L33/14

CPC分类号： C08F220/365 ,  C08L33/14

摘要： Provided are a composition containing a component A and a component B, a cured substance or a molded body thereof, an optical member and a lens.
Component A: A compound having a nitrogen-containing fused aromatic ring as a partial structure
Component B: A compound represented by any of General Formulae (B1) to (B5)




In General Formulae (B1) to (B5), Ar101 to Ar104 represent an aryl group or a heteroaryl group, X1 represents a monovalent substituent, Y1 represents a hydrogen atom or a monovalent substituent, and adjacent two of Ar101 to Ar104, X1, and Y1 may be bonded to each other to form a ring, where none of the monovalent substituents employed as X1 or Y1 is an aryl group or a heteroaryl group.

公开(公告)号：US20230286911A1

公开(公告)日：2023-09-14

申请号：US18141968

申请日：2023-05-01

申请人： THE BOEING COMPANY

发明人： Michael MONTEIRO ,  Daloar HOSSAIN

IPC分类号： C07C275/14 ,  C08F220/18 ,  C08F120/36 ,  C07C273/18 ,  C08F220/36

CPC分类号： C07C275/14 ,  C08F220/1804 ,  C08F120/36 ,  C07C273/1827 ,  C08F220/365 ,  C08F2438/03

摘要： Aspects generally relate to a temperature responsive polymer, more specifically to a polymer exhibiting an upper critical solution temperature (UCST) in an aqueous solution. In one aspect, a monomer compound includes one or more amide or thioamide groups; one or more ureido or thioureido groups; and one or more ethylenically unsaturated groups. In one aspect, a polymer, such as a homopolymer or a copolymer, is produced by polymerization of the monomer compound. The copolymer is produced by polymerization of the monomer compound and a comonomer, such as a hydrophobic comonomer, a hydrophilic comonomer, a pH responsive comonomer, a light responsive comonomer, and combinations thereof. The polymer exhibits a UCST from about 1° C. to about 100° C. in an aqueous solution at 1 atm.

公开(公告)号：US20240287301A1

公开(公告)日：2024-08-29

申请号：US18650709

申请日：2024-04-30

申请人： DAIKIN INDUSTRIES, LTD.

发明人： Michio MATSUDA ,  Hirotoshi Sakashita ,  Yuka Kusukawa ,  Tetsuya Uehara ,  Shun Shibata ,  Hisako Nakamura

IPC分类号： C08L33/14 ,  B65D65/42 ,  C08F220/36 ,  D21H17/37 ,  D21H19/12 ,  D21H27/10

CPC分类号： C08L33/14 ,  B65D65/42 ,  C08F220/365 ,  D21H17/37 ,  D21H19/12 ,  D21H27/10

摘要： Provided is an aqueous polymer dispersion exhibiting excellent liquid repellency, oil resistance, and low-temperature storage stability, and obtained from a hydrocarbon group-containing polymer composition including (1) a hydrocarbon group-containing polymer having a repeating unit formed from an acrylic monomer having a hydrocarbon group having 7-40 carbon atoms, (2) a diol compound, and (3) an aqueous medium.

公开(公告)号：US11914248B2

公开(公告)日：2024-02-27

申请号：US17092316

申请日：2020-11-08

申请人： FUJIFILM Corporation

发明人： Yutaka Nozoe ,  Takashi Iizumi ,  Kazushige Nakagawa ,  Takahiro Kato ,  Miho Asahi ,  Hirofumi Omura ,  Yuki Hirai

IPC分类号： G02F1/1337 ,  C08F220/60 ,  C08F220/32 ,  C08F220/36 ,  G02F1/01 ,  C08F220/30 ,  C08F220/58 ,  C08F220/28

CPC分类号： G02F1/133711 ,  C08F220/30 ,  C08F220/32 ,  C08F220/325 ,  C08F220/36 ,  C08F220/365 ,  C08F220/58 ,  C08F220/603 ,  G02F1/0136 ,  G02F1/13378 ,  C08F220/281 ,  C09K2323/02 ,  G02F2202/022 ,  C08F220/603 ,  C08F220/40 ,  C08F220/603 ,  C08F220/281 ,  C08F220/58 ,  C08F220/32 ,  C08F220/32 ,  C08F220/58 ,  C08F220/281 ,  C08F220/603 ,  C08F220/40 ,  C08F220/603

摘要： An object of the invention is to provide a photo-alignment copolymer which makes it possible to produce a photo-alignment film having excellent solvent resistance and liquid crystal aligning properties, and a photo-alignment film and an optical laminate produced using the photo-alignment copolymer. A photo-alignment copolymer of the invention is a photo-alignment copolymer having a repeating unit A including a photo-alignment group represented by Formula (A) and a repeating unit B including a crosslinkable group represented by Formula (B).

公开(公告)号：US20240352169A1

公开(公告)日：2024-10-24

申请号：US18701293

申请日：2022-10-28

申请人： OSAKA ORGANIC CHEMICAL INDUSTRY LTD.

发明人： Shinpei YAMAMOTO ,  Soichi FUTAMI ,  Yumi TAKATA

IPC分类号： C08F220/36 ,  C08F220/28 ,  C09D133/14

CPC分类号： C08F220/365 ,  C08F220/281 ,  C09D133/14

摘要： The present invention relates to a resin composition comprising: a polymer (I) selected from the group consisting of a polymer (a1) containing a structural unit (i) having an ester linkage type betaine structure and a polymer (b1) containing a structural unit (ii) having a betaine structure that is not of an ester linkage type and a structural unit (iii) having a carboxyl group; an organic solvent having a Hansen solubility parameter at 25° C. in which a dispersion term δD is 10 to 24 MPa1/2, a polarity term δP is 5 to 19 MPa1/2, and a hydrogen bonding term δH is 3 to 17 MPa1/2, and having a boiling point higher than 100° C.; and water.

公开(公告)号：US20240192596A1

公开(公告)日：2024-06-13

申请号：US18376499

申请日：2023-10-04

申请人： Shin-Etsu Chemical Co., Ltd.

发明人： Masahiro Fukushima ,  Jun Hatakeyama ,  Naoki Ishibashi

IPC分类号： G03F7/039 ,  C08F212/14 ,  C08F220/18 ,  C08F220/22 ,  C08F220/28 ,  C08F220/36 ,  G03F7/038

CPC分类号： G03F7/0392 ,  C08F212/24 ,  C08F220/1806 ,  C08F220/1811 ,  C08F220/1812 ,  C08F220/1818 ,  C08F220/22 ,  C08F220/281 ,  C08F220/365 ,  G03F7/0382

摘要： A chemically amplified resist composition is provided comprising (A) a polymer adapted to increase its solubility in an aqueous alkaline under the action of an acid, the polymer comprising repeat units, represented by the formula (A1), and repeat units, represented by the formula (B1), and lacking repeat units adapted to generate an acid upon exposure, and (B) a photoacid generator represented by the formula (PAG-a) or (PAG-b) which generates an acid under the action of KrF excimer laser, ArF excimer laser, electron beams or extreme ultraviolet radiation.

公开(公告)号：US20240004293A1

公开(公告)日：2024-01-04

申请号：US18468245

申请日：2023-09-15

申请人： FUJIFILM Corporation

发明人： Naoya HATAKEYAMA ,  Akiyoshi GOTO ,  Hideyuki ISHIHARA ,  Michihiro SHIRAKAWA ,  Yosuke BEKKI

IPC分类号： G03F7/039 ,  G03F7/004 ,  G03F7/038 ,  C08F220/18 ,  C08F220/38 ,  C08F220/28 ,  C08F220/36 ,  C08F212/14

CPC分类号： G03F7/039 ,  C08F220/282 ,  G03F7/038 ,  C08F220/1809 ,  C08F220/382 ,  C08F220/281 ,  C08F220/1808 ,  C08F220/283 ,  C08F220/365 ,  C08F220/1807 ,  C08F220/1806 ,  C08F220/1811 ,  C08F212/22 ,  C08F220/1818 ,  G03F7/0045

摘要： An actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin which is decomposed by action of acid to increase polarity; and (B) a compound which generates an acid by irradiation with an actinic ray or a radiation, in which the resin (A) and the acid generated from the compound (B) form a bond by the actinic ray or the radiation or by the action of acid.

公开(公告)号：US20230400765A1

公开(公告)日：2023-12-14

申请号：US18198971

申请日：2023-05-18

申请人： JSR CORPORATION

发明人： Ryuichi NEMOTO ,  Nozomi SAKANO

IPC分类号： G03F7/004 ,  C08F220/28 ,  C08F220/36 ,  C08F220/38 ,  C08F220/18 ,  C07C381/12 ,  C07D211/62 ,  C07D211/60 ,  C07D207/16 ,  C07D327/06 ,  C07C309/12 ,  C07D405/12 ,  C07D493/10

CPC分类号： G03F7/0045 ,  C08F220/283 ,  C08F220/365 ,  C08F220/382 ,  C08F220/1807 ,  C07C381/12 ,  C07D493/10 ,  C07D211/60 ,  C07D207/16 ,  C07D327/06 ,  C07C309/12 ,  C07D405/12 ,  C07D211/62

摘要： A radiation-sensitive resin composition includes: an onium salt compound represented by formula (1). R1 is a monovalent hydrocarbon group having 1 to 20 carbon atoms; R2 and R3 are each independently a monovalent hydrocarbon group having 1 to 20 carbon atoms, or R2 and R3 taken together represent a cyclic structure having 3 to 20 ring atoms; R4 is a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms and L1 is a divalent linking group having 1 to 40 carbon atoms, or R4 and L1 taken together represent a group including a heterocyclic structure having 3 to 20 ring atoms; Rf1 and Rf2 are each independently a hydrogen atom, a fluorine atom, a monovalent hydrocarbon group having 1 to 10 carbon atoms, or a monovalent fluorinated hydrocarbon group having 1 to 10 carbon atoms.

公开(公告)号：US12038689B2

公开(公告)日：2024-07-16

申请号：US17212546

申请日：2021-03-25

申请人： FUJIFILM Corporation

发明人： Akihiro Kaneko ,  Kazunari Yagi ,  Takashi Kawashima ,  Akiyoshi Goto

IPC分类号： G03F7/039 ,  C08F212/14 ,  C08F220/18 ,  C08F220/28 ,  C08F220/36 ,  C09D125/18 ,  C09D133/10 ,  C09D133/16 ,  G03F7/004 ,  G03F7/30 ,  G03F7/38

CPC分类号： G03F7/0392 ,  C08F212/22 ,  C08F220/1808 ,  C08F220/1809 ,  C08F220/1812 ,  C08F220/1818 ,  C08F220/281 ,  C08F220/282 ,  C08F220/283 ,  C08F220/365 ,  C09D125/18 ,  C09D133/10 ,  C09D133/16 ,  G03F7/0045 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/30 ,  G03F7/38

摘要： The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition which is excellent in LER performance and a collapse suppressing ability. Furthermore, the present invention provides a resist film, a pattern forming method, and a method for manufacturing an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes an acid-decomposable resin having a repeating unit represented by General Formula (1), and a compound that generates an acid upon irradiation with actinic rays or radiation.

公开(公告)号：US20230393472A1

公开(公告)日：2023-12-07

申请号：US18446045

申请日：2023-08-08

申请人： FUJIFILM Corporation

发明人： Shuhei YAMAGUCHI ,  Taro MIYOSHI

IPC分类号： G03F7/039 ,  G03F7/004 ,  C08F212/14 ,  C08F232/08 ,  C08F220/18 ,  C08F220/58 ,  C08F220/38 ,  C08F220/28 ,  C08F220/36

CPC分类号： G03F7/039 ,  G03F7/0045 ,  C08F212/24 ,  C08F232/08 ,  C08F220/1806 ,  C08F220/1811 ,  C08F220/585 ,  C08F220/1809 ,  C08F220/1818 ,  C08F220/382 ,  C08F220/1808 ,  C08F220/282 ,  C08F220/365 ,  C08F220/283 ,  C08F220/281 ,  C08F212/30

摘要： Provided are an actinic ray-sensitive or radiation-sensitive resin composition having excellent temporal stability and excellent LWR suppression property of a pattern to be formed; a resist film; a positive tone pattern forming method; and a method for manufacturing an electronic device, which relate to the actinic ray-sensitive or radiation-sensitive resin composition.
The actinic ray-sensitive or radiation-sensitive resin composition contains a resin (A) having a repeating unit (a) and a basic compound, a pKa of a conjugate acid of which is 13.00 or less, in which the repeating unit (a) has a non-ionic group which generates an acid in a case where a leaving group is eliminated by irradiation with an actinic ray or a radiation, in which a repeating unit obtained by replacing the leaving group with a hydrogen atom has a molecular weight of 300 or less, and the repeating unit (a) is a predetermined amount with respect to a total solid content of the actinic ray-sensitive or radiation-sensitive resin composition.