公开(公告)号：US07612867B2

公开(公告)日：2009-11-03

申请号：US12222483

申请日：2008-08-11

申请人： Gerard Van Schothorst ,  Fransiscus Hendrikus Van Deuren ,  Jan Van Eijk ,  Erik Roelof Loopstra ,  Robert-Han Munnig Schmidt ,  Felix Godfried Peter Peeters

发明人： Gerard Van Schothorst ,  Fransiscus Hendrikus Van Deuren ,  Jan Van Eijk ,  Erik Roelof Loopstra ,  Robert-Han Munnig Schmidt ,  Felix Godfried Peter Peeters

IPC分类号： G03B27/54 ,  G03B27/72

CPC分类号： G03F7/70066 ,  G03F7/70191

摘要： A lithographic apparatus including means for selectively transmitting a projection beam before imaging the patterned projection beam onto a substrate. The means may include any of the following: a selectively transmitting device disposed downstream of a patterning device in the direction of the projection beam, a fixed and a moving set of masking blades in a scanning system or an array of switchable elements. The means may be provided to a mask table/holder or to a frame or structure of the lithographic projection apparatus.

摘要翻译： 一种光刻设备，包括用于在将图案化的投影光束成像到衬底上之前选择性地透射投影光束的装置。 该装置可以包括以下任何一种：在投影光束的方向上布置在图案形成装置的下游的选择性发射装置，扫描系统中的固定的和可移动的掩蔽刀片组，或可切换元件的阵列。 该装置可以提供给掩模台/保持器或光刻投影装置的框架或结构。

公开(公告)号：US20090002676A1

公开(公告)日：2009-01-01

申请号：US12222483

申请日：2008-08-11

申请人： Gerard Van Schothorst ,  Fransiscus Hendrikus Van Deuren ,  Jan Van Eijk ,  Erik Roelof Loopstra ,  Robert-Han Munnig Schmidt ,  Felix Godfried Peter Peeters

发明人： Gerard Van Schothorst ,  Fransiscus Hendrikus Van Deuren ,  Jan Van Eijk ,  Erik Roelof Loopstra ,  Robert-Han Munnig Schmidt ,  Felix Godfried Peter Peeters

IPC分类号： G03B27/72

CPC分类号： G03F7/70066 ,  G03F7/70191

摘要： A lithographic apparatus including means for selectively transmitting a projection beam before imaging the patterned projection beam onto a substrate. The means may include any of the following: a selectively transmitting device disposed downstream of a patterning device in the direction of the projection beam, a fixed and a moving set of masking blades in a scanning system or an array of switchable elements. The means may be provided to a mask table/holder or to a frame or structure of the lithographic projection apparatus.

公开(公告)号：US07423730B2

公开(公告)日：2008-09-09

申请号：US10848586

申请日：2004-05-19

申请人： Gerard Van Schothorst ,  Fransiscus Hendrikus Van Deuren ,  Jan Van Eijk ,  Erik Roelof Loopstra ,  Robert-Han Munnig Schmidt ,  Felix Godfried Peter Peeters

发明人： Gerard Van Schothorst ,  Fransiscus Hendrikus Van Deuren ,  Jan Van Eijk ,  Erik Roelof Loopstra ,  Robert-Han Munnig Schmidt ,  Felix Godfried Peter Peeters

IPC分类号： G03B27/72

CPC分类号： G03F7/70066 ,  G03F7/70191

摘要： A lithographic apparatus including means for selectively transmitting a projection beam before imaging the patterned projection beam onto a substrate. The means may include any of the following: a selectively transmitting device disposed downstream of a patterning device in the direction of the projection beam, a fixed and a moving set of masking blades in a scanning system or an array of switchable elements. The means may be provided to a mask table/holder or to a frame or structure of the lithographic projection apparatus.

摘要翻译： 一种光刻设备，包括用于在将图案化的投影光束成像到衬底上之前选择性地透射投影光束的装置。 该装置可以包括以下任何一种：在投影光束的方向上布置在图案形成装置的下游的选择性发射装置，扫描系统中的固定的和可移动的掩蔽刀片组，或可切换元件的阵列。 该装置可以提供给掩模台/保持器或光刻投影装置的框架或结构。

公开(公告)号：US07248339B2

公开(公告)日：2007-07-24

申请号：US10880606

申请日：2004-07-01

申请人： Gerard Van Schothorst ,  Jan Van Eijk ,  Erik Roelof Loopstra ,  Robert-Han Munnig Schmidt ,  Felix Godfried Peter Peeters

发明人： Gerard Van Schothorst ,  Jan Van Eijk ,  Erik Roelof Loopstra ,  Robert-Han Munnig Schmidt ,  Felix Godfried Peter Peeters

IPC分类号： G03B27/58

CPC分类号： F16F7/1005 ,  G03F7/709

摘要： A lithographic apparatus is presented in which vibrations induced by reaction forces exerted on a base frame BF by accelerations within the apparatus are eliminated without the need for complex positioning systems and several balance masses. This is achieved by using feed-forward control to apply a compensating force using actuators to the base frame, based on knowledge of the movements and accelerations of the substrate table and other parts within the apparatus.

摘要翻译： 提出了一种光刻设备，其中消除了由设备内的加速度施加在基架BF上的反作用力引起的振动，而不需要复杂的定位系统和几个平衡块。 这是通过使用前馈控制来实现的，其基于对基板台和设备内的其它部件的运动和加速度的了解，将使用致动器的补偿力施加到基架上。

公开(公告)号：US07110086B2

公开(公告)日：2006-09-19

申请号：US10864805

申请日：2004-06-10

申请人： Erik Roelof Loopstra ,  Robert-Han Munnig Schmidt

发明人： Erik Roelof Loopstra ,  Robert-Han Munnig Schmidt

IPC分类号： G03B27/42 ,  G03B27/58 ,  H02K41/00

CPC分类号： G03F7/70766 ,  G03F7/70716 ,  G03F7/70758 ,  G03F7/709

摘要： A movable stage system capable of operating in a lithographic apparatus, is presented. The movable stage system includes a base, a platform that is movable relative to the base, a balance mass that is movable relative to the base and is configured to compensate for forces generated by a movement of the platform, and a drive mechanism configured to move the platform and the balance mass relative to the base. The drive mechanism comprises at least one belt transmission that couples the platform and the balance mass such that when the platform moves along a direction, the balance mass is moved in an at least partially opposite direction, and a driving device configured to mechanically engage the balance mass or the platform to directly drive the platform or the balance mass.

摘要翻译： 提出了一种能够在光刻设备中工作的可移动平台系统。 可移动平台系统包括基座，可相对于基座移动的平台，可相对于基座移动的平衡块，其构造成补偿由平台的运动产生的力;以及驱动机构，其构造成移动 平台和平衡质量相对于基座。 所述驱动机构包括至少一个皮带传动装置，其连接所述平台和所述平衡块，使得当所述平台沿着一个方向移动时，所述平衡块沿至少部分相反的方向移动，并且驱动装置构造成机械地接合所述平衡 质量或平台直接驱动平台或平衡块。

公开(公告)号：US07554105B2

公开(公告)日：2009-06-30

申请号：US11263012

申请日：2005-11-01

申请人： Dominicus Jacobus Petrus A. Franken ,  Erik Roelof Loopstra ,  Pertrus Rutgerus Bartray ,  Marc Wilhelmus Maria Van Der Wijst ,  Michael Jozef Mathijs Renkens ,  Gerard Van Schothorst ,  Johan Juliana Dries

发明人： Dominicus Jacobus Petrus A. Franken ,  Erik Roelof Loopstra ,  Pertrus Rutgerus Bartray ,  Marc Wilhelmus Maria Van Der Wijst ,  Michael Jozef Mathijs Renkens ,  Gerard Van Schothorst ,  Johan Juliana Dries

IPC分类号： G21K5/10

CPC分类号： G03F7/70833 ,  G03F7/709

摘要： A lithographic apparatus includes a projection system mounted on a reference frame, which in turn is mounted on a base which supports the apparatus. Vibrations and displacement errors in the base are filtered through two sets of isolation mounts operatively between the base and reference frame and between the reference frame and a projection frame of the projection system and therefore disturbance of the projection system is reduced.

摘要翻译： 光刻设备包括安装在参考框架上的投影系统，投影系统又安装在支撑设备的基座上。 基座中的振动和位移误差通过两组隔离安装件在基座和参考框架之间以及参考框架和投影系统的投影框架之间进行过滤，因此减小了投影系统的干扰。

公开(公告)号：US07049592B2

公开(公告)日：2006-05-23

申请号：US10615421

申请日：2003-07-09

申请人： Dominicus Jacobus Petrus Adrianus Franken ,  Erik Roelof Loopstra ,  Pertrus Rutgerus Bartray ,  Marc Wilhelmus Maria Van Der Wijst ,  Michael Jozefa Mathijs Renkens ,  Gerard Van Schothorst ,  Johan Juliana Dries

发明人： Dominicus Jacobus Petrus Adrianus Franken ,  Erik Roelof Loopstra ,  Pertrus Rutgerus Bartray ,  Marc Wilhelmus Maria Van Der Wijst ,  Michael Jozefa Mathijs Renkens ,  Gerard Van Schothorst ,  Johan Juliana Dries

IPC分类号： G21K7/00 ,  G21K5/10

CPC分类号： G03F7/70833 ,  G03F7/709

摘要： A lithographic apparatus includes a projection system mounted on a reference frame, which in turn is mounted on a base which supports the apparatus. Vibrations and displacement errors in the base are filtered through two sets of isolation mounts operatively between the base and reference frame and between the reference frame and a projection frame of the projection system and therefore disturbance of the projection system is reduced.

公开(公告)号：US20130194586A1

公开(公告)日：2013-08-01

申请号：US13564665

申请日：2012-08-01

申请人： Jan Van Eijk ,  Erik Roelof Loopstra ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Johannes Petrus Martinus Bernardus Vermeulen

发明人： Jan Van Eijk ,  Erik Roelof Loopstra ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Johannes Petrus Martinus Bernardus Vermeulen

IPC分类号： G01B11/14

CPC分类号： G01B11/14 ,  G01D5/38 ,  G03F7/70775

摘要： A system for detecting motion of a body, the system comprising: a body; a first grating mounted substantially stationary relative to a frame of reference; a second grating mounted on the body; a detector arranged to receive one or more radiation beams diffracted at the first and second gratings thereby to detect motion of the body relative to the frame of reference; wherein the detector is coupled to the body and moveable relative to the body.

摘要翻译： 一种用于检测身体运动的系统，所述系统包括：主体; 相对于参考框架基本上固定的第一光栅; 安装在本体上的第二光栅; 检测器，布置成接收在第一和第二光栅处衍射的一个或多个辐射束，从而检测身体相对于参考系的运动; 其中所述检测器联接到所述主体并且相对于所述主体可移动。

公开(公告)号：US08982359B2

公开(公告)日：2015-03-17

申请号：US13564665

申请日：2012-08-01

申请人： Jan Van Eijk ,  Erik Roelof Loopstra ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Johannes Petrus Martinus Bernardus Vermeulen

发明人： Jan Van Eijk ,  Erik Roelof Loopstra ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Johannes Petrus Martinus Bernardus Vermeulen

IPC分类号： G01B11/14 ,  G01B11/24 ,  G01D5/38 ,  G03F7/20

CPC分类号： G01B11/14 ,  G01D5/38 ,  G03F7/70775

摘要： A system for detecting motion of a body, the system comprising: a body; a first grating mounted substantially stationary relative to a frame of reference; a second grating mounted on the body; a detector arranged to receive one or more radiation beams diffracted at the first and second gratings thereby to detect motion of the body relative to the frame of reference; wherein the detector is coupled to the body and moveable relative to the body.

摘要翻译： 一种用于检测身体运动的系统，所述系统包括：主体; 相对于参考框架基本上固定的第一光栅; 安装在本体上的第二光栅; 检测器，布置成接收在第一和第二光栅处衍射的一个或多个辐射束，从而检测身体相对于参考系的运动; 其中所述检测器联接到所述主体并且相对于所述主体可移动。

公开(公告)号：US09594306B2

公开(公告)日：2017-03-14

申请号：US14002000

申请日：2011-12-21

申请人： Vadim Yevgenyevich Banine ,  Wilhelmus Petrus De Boeij ,  Antonius Johannes Josephus Van Dijsseldonk Van Dijsseldonk ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels ,  Andrei Mikhailovich Yakunin

发明人： Vadim Yevgenyevich Banine ,  Wilhelmus Petrus De Boeij ,  Antonius Johannes Josephus Van Dijsseldonk Van Dijsseldonk ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels ,  Andrei Mikhailovich Yakunin

IPC分类号： G03F7/20 ,  B82Y10/00 ,  G21K1/06 ,  H05G2/00

CPC分类号： G03F7/70191 ,  B82Y10/00 ,  G02B1/11 ,  G02B5/1838 ,  G02B5/281 ,  G02B5/283 ,  G03F7/70008 ,  G03F7/702 ,  G03F7/70308 ,  G03F7/70575 ,  G21K1/062 ,  G21K1/067 ,  G21K2201/061 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

摘要： A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.

摘要翻译： 一种光刻设备，用于将辐射束图案化并将其投影到衬底上，包括至少两个光谱纯度滤光器，其被配置为在至少一个不期望的辐射波长范围内降低辐射束中的辐射强度，其中两个光谱纯度 过滤器具有彼此不同的辐射过滤结构。