公开(公告)号：US07612867B2

公开(公告)日：2009-11-03

申请号：US12222483

申请日：2008-08-11

申请人： Gerard Van Schothorst ,  Fransiscus Hendrikus Van Deuren ,  Jan Van Eijk ,  Erik Roelof Loopstra ,  Robert-Han Munnig Schmidt ,  Felix Godfried Peter Peeters

发明人： Gerard Van Schothorst ,  Fransiscus Hendrikus Van Deuren ,  Jan Van Eijk ,  Erik Roelof Loopstra ,  Robert-Han Munnig Schmidt ,  Felix Godfried Peter Peeters

IPC分类号： G03B27/54 ,  G03B27/72

CPC分类号： G03F7/70066 ,  G03F7/70191

摘要： A lithographic apparatus including means for selectively transmitting a projection beam before imaging the patterned projection beam onto a substrate. The means may include any of the following: a selectively transmitting device disposed downstream of a patterning device in the direction of the projection beam, a fixed and a moving set of masking blades in a scanning system or an array of switchable elements. The means may be provided to a mask table/holder or to a frame or structure of the lithographic projection apparatus.

摘要翻译： 一种光刻设备，包括用于在将图案化的投影光束成像到衬底上之前选择性地透射投影光束的装置。 该装置可以包括以下任何一种：在投影光束的方向上布置在图案形成装置的下游的选择性发射装置，扫描系统中的固定的和可移动的掩蔽刀片组，或可切换元件的阵列。 该装置可以提供给掩模台/保持器或光刻投影装置的框架或结构。

公开(公告)号：US07248339B2

公开(公告)日：2007-07-24

申请号：US10880606

申请日：2004-07-01

申请人： Gerard Van Schothorst ,  Jan Van Eijk ,  Erik Roelof Loopstra ,  Robert-Han Munnig Schmidt ,  Felix Godfried Peter Peeters

发明人： Gerard Van Schothorst ,  Jan Van Eijk ,  Erik Roelof Loopstra ,  Robert-Han Munnig Schmidt ,  Felix Godfried Peter Peeters

IPC分类号： G03B27/58

CPC分类号： F16F7/1005 ,  G03F7/709

摘要： A lithographic apparatus is presented in which vibrations induced by reaction forces exerted on a base frame BF by accelerations within the apparatus are eliminated without the need for complex positioning systems and several balance masses. This is achieved by using feed-forward control to apply a compensating force using actuators to the base frame, based on knowledge of the movements and accelerations of the substrate table and other parts within the apparatus.

摘要翻译： 提出了一种光刻设备，其中消除了由设备内的加速度施加在基架BF上的反作用力引起的振动，而不需要复杂的定位系统和几个平衡块。 这是通过使用前馈控制来实现的，其基于对基板台和设备内的其它部件的运动和加速度的了解，将使用致动器的补偿力施加到基架上。

公开(公告)号：US20090002676A1

公开(公告)日：2009-01-01

申请号：US12222483

申请日：2008-08-11

申请人： Gerard Van Schothorst ,  Fransiscus Hendrikus Van Deuren ,  Jan Van Eijk ,  Erik Roelof Loopstra ,  Robert-Han Munnig Schmidt ,  Felix Godfried Peter Peeters

发明人： Gerard Van Schothorst ,  Fransiscus Hendrikus Van Deuren ,  Jan Van Eijk ,  Erik Roelof Loopstra ,  Robert-Han Munnig Schmidt ,  Felix Godfried Peter Peeters

IPC分类号： G03B27/72

CPC分类号： G03F7/70066 ,  G03F7/70191

摘要： A lithographic apparatus including means for selectively transmitting a projection beam before imaging the patterned projection beam onto a substrate. The means may include any of the following: a selectively transmitting device disposed downstream of a patterning device in the direction of the projection beam, a fixed and a moving set of masking blades in a scanning system or an array of switchable elements. The means may be provided to a mask table/holder or to a frame or structure of the lithographic projection apparatus.

公开(公告)号：US07423730B2

公开(公告)日：2008-09-09

申请号：US10848586

申请日：2004-05-19

申请人： Gerard Van Schothorst ,  Fransiscus Hendrikus Van Deuren ,  Jan Van Eijk ,  Erik Roelof Loopstra ,  Robert-Han Munnig Schmidt ,  Felix Godfried Peter Peeters

发明人： Gerard Van Schothorst ,  Fransiscus Hendrikus Van Deuren ,  Jan Van Eijk ,  Erik Roelof Loopstra ,  Robert-Han Munnig Schmidt ,  Felix Godfried Peter Peeters

IPC分类号： G03B27/72

CPC分类号： G03F7/70066 ,  G03F7/70191

摘要： A lithographic apparatus including means for selectively transmitting a projection beam before imaging the patterned projection beam onto a substrate. The means may include any of the following: a selectively transmitting device disposed downstream of a patterning device in the direction of the projection beam, a fixed and a moving set of masking blades in a scanning system or an array of switchable elements. The means may be provided to a mask table/holder or to a frame or structure of the lithographic projection apparatus.

摘要翻译： 一种光刻设备，包括用于在将图案化的投影光束成像到衬底上之前选择性地透射投影光束的装置。 该装置可以包括以下任何一种：在投影光束的方向上布置在图案形成装置的下游的选择性发射装置，扫描系统中的固定的和可移动的掩蔽刀片组，或可切换元件的阵列。 该装置可以提供给掩模台/保持器或光刻投影装置的框架或结构。

公开(公告)号：US07110086B2

公开(公告)日：2006-09-19

申请号：US10864805

申请日：2004-06-10

申请人： Erik Roelof Loopstra ,  Robert-Han Munnig Schmidt

发明人： Erik Roelof Loopstra ,  Robert-Han Munnig Schmidt

IPC分类号： G03B27/42 ,  G03B27/58 ,  H02K41/00

CPC分类号： G03F7/70766 ,  G03F7/70716 ,  G03F7/70758 ,  G03F7/709

摘要： A movable stage system capable of operating in a lithographic apparatus, is presented. The movable stage system includes a base, a platform that is movable relative to the base, a balance mass that is movable relative to the base and is configured to compensate for forces generated by a movement of the platform, and a drive mechanism configured to move the platform and the balance mass relative to the base. The drive mechanism comprises at least one belt transmission that couples the platform and the balance mass such that when the platform moves along a direction, the balance mass is moved in an at least partially opposite direction, and a driving device configured to mechanically engage the balance mass or the platform to directly drive the platform or the balance mass.

摘要翻译： 提出了一种能够在光刻设备中工作的可移动平台系统。 可移动平台系统包括基座，可相对于基座移动的平台，可相对于基座移动的平衡块，其构造成补偿由平台的运动产生的力;以及驱动机构，其构造成移动 平台和平衡质量相对于基座。 所述驱动机构包括至少一个皮带传动装置，其连接所述平台和所述平衡块，使得当所述平台沿着一个方向移动时，所述平衡块沿至少部分相反的方向移动，并且驱动装置构造成机械地接合所述平衡 质量或平台直接驱动平台或平衡块。

公开(公告)号：US09594306B2

公开(公告)日：2017-03-14

申请号：US14002000

申请日：2011-12-21

申请人： Vadim Yevgenyevich Banine ,  Wilhelmus Petrus De Boeij ,  Antonius Johannes Josephus Van Dijsseldonk Van Dijsseldonk ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels ,  Andrei Mikhailovich Yakunin

发明人： Vadim Yevgenyevich Banine ,  Wilhelmus Petrus De Boeij ,  Antonius Johannes Josephus Van Dijsseldonk Van Dijsseldonk ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels ,  Andrei Mikhailovich Yakunin

IPC分类号： G03F7/20 ,  B82Y10/00 ,  G21K1/06 ,  H05G2/00

CPC分类号： G03F7/70191 ,  B82Y10/00 ,  G02B1/11 ,  G02B5/1838 ,  G02B5/281 ,  G02B5/283 ,  G03F7/70008 ,  G03F7/702 ,  G03F7/70308 ,  G03F7/70575 ,  G21K1/062 ,  G21K1/067 ,  G21K2201/061 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

摘要： A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.

摘要翻译： 一种光刻设备，用于将辐射束图案化并将其投影到衬底上，包括至少两个光谱纯度滤光器，其被配置为在至少一个不期望的辐射波长范围内降低辐射束中的辐射强度，其中两个光谱纯度 过滤器具有彼此不同的辐射过滤结构。

公开(公告)号：US09414477B2

公开(公告)日：2016-08-09

申请号：US12540548

申请日：2009-08-13

申请人： Erik Roelof Loopstra ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels

发明人： Erik Roelof Loopstra ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels

IPC分类号： H05G2/00 ,  G03F7/20

CPC分类号： H05G2/001 ,  G03F7/70033 ,  G03F7/7085

摘要： A radiation source includes a beam generator configured to generate a radiation beam to be used to produce a radiation output of the radiation source, and a beam monitor, configured to monitor the radiation beam. A lithographic apparatus includes the radiation source. A device manufacturing method includes generating a first type of radiation by utilizing a beam of a second type of radiation, monitoring a quality of the second type of radiation, and projecting a patterned beam of the first type of radiation onto a substrate.

摘要翻译： 辐射源包括被配置为产生用于产生辐射源的辐射输出的辐射束的光束发生器，以及被配置为监视辐射束的光束监视器。 光刻设备包括辐射源。 一种器件制造方法包括通过利用第二类型的辐射束来产生第一类型的辐射，监测第二类型的辐射的质量，以及将第一类型的辐射的图案化的束投射到衬底上。

公开(公告)号：US09411250B2

公开(公告)日：2016-08-09

申请号：US13062872

申请日：2009-04-30

申请人： Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Vladimir Vitalevich Ivanov ,  Vladimir Mihailovitch Krivtsun

发明人： Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Vladimir Vitalevich Ivanov ,  Vladimir Mihailovitch Krivtsun

IPC分类号： G03F7/20 ,  H05G2/00

CPC分类号： G03F7/70916 ,  G03F7/70175 ,  G03F7/70858 ,  G03F7/70983 ,  H05G2/003 ,  H05G2/005

摘要： A radiation system is configured to generate a radiation beam. The radiation system includes a radiation source configured to generate a plasma that emits radiation and debris, and a radiation collector configured to direct collected radiation to a radiation beam emission aperture. A magnetic field generator is configured to generate a magnetic field with a gradient in magnetic field strength to direct the plasma away from the radiation collector.

摘要翻译： 辐射系统被配置为产生辐射束。 辐射系统包括被配置为产生发射辐射和碎屑的等离子体的辐射源，以及被配置为将收集的辐射引导到辐射束发射孔径的辐射收集器。 磁场发生器被配置为产生具有磁场强度梯度的磁场，以将等离子体引导离开辐射收集器。

公开(公告)号：US09268242B2

公开(公告)日：2016-02-23

申请号：US12869560

申请日：2010-08-26

申请人： Theodorus Petrus Maria Cadee ,  Johannes Henricus Wilhelmus Jacobs ,  Nicolaas Ten Kate ,  Erik Roelof Loopstra ,  Aschwin Lodewijk Hendricus Johannes Vermeer ,  Jeroen Johannes Sophia Maria Mertens ,  Christianus Gerardus Maria De Mol ,  Marcel Johannus Elisabeth Hubertus Muitjens ,  Antonius Johannus Van Der Net ,  Joost Jeroen Ottens ,  Johannes Anna Quaedackers ,  Mana Elisabeth Reuhman-Huisken ,  Marco Koert Stavenga ,  Patricius Aloysius Jacobus Tinnemans ,  Martinus Cornelis Maria Verhagen ,  Jacobus Johannus Leonardus Hendricus Verspay ,  Frederik Eduard De Jong ,  Koen Goorman ,  Boris Menchtchikov ,  Herman Boom ,  Stoyan Nihtianov ,  Richard Moerman ,  Martin Frans Pierre Smeets ,  Bart Leonard Peter Schoondermark ,  Franciscus Johannes Joseph Janssen ,  Michel Riepen

发明人： Theodorus Petrus Maria Cadee ,  Johannes Henricus Wilhelmus Jacobs ,  Nicolaas Ten Kate ,  Erik Roelof Loopstra ,  Aschwin Lodewijk Hendricus Johannes Vermeer ,  Jeroen Johannes Sophia Maria Mertens ,  Christianus Gerardus Maria De Mol ,  Marcel Johannus Elisabeth Hubertus Muitjens ,  Antonius Johannus Van Der Net ,  Joost Jeroen Ottens ,  Johannes Anna Quaedackers ,  Mana Elisabeth Reuhman-Huisken ,  Marco Koert Stavenga ,  Patricius Aloysius Jacobus Tinnemans ,  Martinus Cornelis Maria Verhagen ,  Jacobus Johannus Leonardus Hendricus Verspay ,  Frederik Eduard De Jong ,  Koen Goorman ,  Boris Menchtchikov ,  Herman Boom ,  Stoyan Nihtianov ,  Richard Moerman ,  Martin Frans Pierre Smeets ,  Bart Leonard Peter Schoondermark ,  Franciscus Johannes Joseph Janssen ,  Michel Riepen

IPC分类号： G03F7/20

CPC分类号： G03F7/70808 ,  G03F7/70341 ,  G03F7/70841 ,  G03F7/70875

摘要： A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.

摘要翻译： 描述了一种光刻设备，其具有液体供应系统，其被配置为至少部分地填充光刻设备的投影系统和具有液体的基板之间的空间，布置成基本上容纳该空间内的液体的阻挡构件和加热器。

公开(公告)号：US09152058B2

公开(公告)日：2015-10-06

申请号：US13194136

申请日：2011-07-29

申请人： Joeri Lof ,  Erik Theodorus Maria Bijlaart ,  Roelof Aeilko Siebrand Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Arie Jeffrey Maria Den Boef ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Marcus Adrianus Van De Kerkhof ,  Aleksey Yurievich Kolensnychenko ,  Mark Kroon ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Joost Jeroen Ottens ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

发明人： Joeri Lof ,  Erik Theodorus Maria Bijlaart ,  Roelof Aeilko Siebrand Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Arie Jeffrey Maria Den Boef ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Marcus Adrianus Van De Kerkhof ,  Aleksey Yurievich Kolensnychenko ,  Mark Kroon ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Joost Jeroen Ottens ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

IPC分类号： G03F7/20

CPC分类号： G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

摘要： An exposure apparatus including a movable table, a member, movably separate from the table and located on a top surface of the table, to provide a surface substantially co-planar with a top surface of an object in or on the table, a projection system configured to project a radiation beam onto a radiation-sensitive target portion of a substrate, and a liquid supply system configured to provide a liquid to a space between the projection system and the object.

摘要翻译： 一种曝光装置，包括可移动工作台，构件，可移动地与工作台分离并且位于工作台的顶表面上，以提供与桌子中或工作台上的物体的顶表面基本共面的表面;投影系统 被配置为将辐射束投射到基板的辐射敏感目标部分上，以及液体供应系统，其配置成向投影系统和物体之间的空间提供液体。