METAL-FREE FUSE STRUCTURES
    1.
    发明申请

    公开(公告)号:US20220199525A1

    公开(公告)日:2022-06-23

    申请号:US17126921

    申请日:2020-12-18

    Abstract: The present disclosure relates to semiconductor structures and, more particularly, to a metal-free fuse structure and methods of manufacture. The structure includes: a first metal-free fuse structure comprising a top semiconductor material of semiconductor-on-insulator (SOI) technologies, the top semiconductor material including end portions with a first electrical resistance and a fuse portion of a second, higher electrical resistance electrically connected to the end portions; and a second metal-free fuse structure comprising the top semiconductor material of semiconductor-on-insulator (SOI) technologies, the top semiconductor material of the second metal-free fuse structure including at least a fuse portion of a lower electrical resistance than the second, higher electrical resistance.

    DOUBLE MESA HETEROJUNCTION BIPOLAR TRANSISTOR

    公开(公告)号:US20210111247A1

    公开(公告)日:2021-04-15

    申请号:US16804435

    申请日:2020-02-28

    Abstract: The present disclosure relates to semiconductor structures and, more particularly, to a heterojunction bipolar transistor and methods of manufacture. The structure includes: a sub-collector region; a collector region above the sub-collector region; an intrinsic base region composed of intrinsic base material located above the collector region; an emitter located above and separated from the intrinsic base material; and a raised extrinsic base having a stepped configuration and separated from and self-aligned to the emitter.

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