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    Imaging optics and projection exposure installation for microlithography with an imaging optics
    1.
    发明授权
    Imaging optics and projection exposure installation for microlithography with an imaging optics 有权
    用于具有成像光学元件的微光刻的成像光学和投影曝光安装

    公开(公告)号：US09057964B2

    公开(公告)日：2015-06-16

    申请号：US13236873

    申请日：2011-09-20

    申请人： Hans-Juergen Mann ,  Johannes Zellner ,  Aurelian Dodoc ,  Claus Zahlten ,  Christoph Menke ,  Marco Pretorius ,  Wilhelm Ulrich ,  Hans-Juergen Rostalski

    发明人： Hans-Juergen Mann ,  Johannes Zellner ,  Aurelian Dodoc ,  Claus Zahlten ,  Christoph Menke ,  Marco Pretorius ,  Wilhelm Ulrich ,  Hans-Juergen Rostalski

    IPC分类号： G02B17/06 ,  G03F7/20 ,  G02B17/08

    CPC分类号： G03F7/70233 ,  G02B17/0663 ,  G02B17/0888

    摘要： Imaging optics includes a first mirror in the imaging beam path after the object field, a last mirror in the imaging beam path before the image field, and a fourth to last mirror in the imaging beam path before the image field. In an unfolded imaging beam path between the object plane and the image plane, an impingement point of the chief ray on a used region of each of the plurality of mirrors has a mirror spacing from the image plane. The mirror spacing of the first mirror is greater than the mirror spacing of the last mirror. The mirror spacing of the fourth to last mirror is greater than the mirror spacing of the first mirror. Chief rays that emanate from points of the object field that are spaced apart from another have a mutually diverging beam course, giving a negative back focus of the entrance pupil.

    摘要翻译： 成像光学器件包括在物场之后的成像光束路径中的第一反射镜，在图像场之前的成像光束路径中的最后一个反射镜，以及在图像场之前的成像光束路径中的第四个至最后一个镜像。 在物平面和图像平面之间的展开成像光束路径中，多个反射镜中的每一个的使用区域上的主光线的冲击点具有与图像平面相反的反射镜间隔。 第一个镜子的镜子间距大于最后一个镜子的反射镜间距。 第四到最后一个镜子的镜子间距大于第一个镜子的镜子间距。 从与物体间隔开的物体点发出的主光线具有相互发散的光束路线，给入射光瞳的负后焦距。

    IMAGING OPTICS AND PROJECTION EXPOSURE INSTALLATION FOR MICROLITHOGRAPHY WITH AN IMAGING OPTICS
    2.
    发明申请
    IMAGING OPTICS AND PROJECTION EXPOSURE INSTALLATION FOR MICROLITHOGRAPHY WITH AN IMAGING OPTICS 有权
    成像光学和投影曝光安装用于成像光学的微观算法

    公开(公告)号：US20120069315A1

    公开(公告)日：2012-03-22

    申请号：US13236873

    申请日：2011-09-20

    申请人： Hans-Juergen Mann ,  Johannes Zellner ,  Aurelian Dodoc ,  Claus Zahlten ,  Christoph Menke ,  Marco Pretorius ,  Wilhelm Ulrich ,  Hans-Juergen Rostalski

    发明人： Hans-Juergen Mann ,  Johannes Zellner ,  Aurelian Dodoc ,  Claus Zahlten ,  Christoph Menke ,  Marco Pretorius ,  Wilhelm Ulrich ,  Hans-Juergen Rostalski

    IPC分类号： G03F7/20 ,  G03B27/70 ,  G02B17/06

    CPC分类号： G03F7/70233 ,  G02B17/0663 ,  G02B17/0888

    摘要： Imaging optics includes a first mirror in the imaging beam path after the object field, a last mirror in the imaging beam path before the image field, and a fourth to last mirror in the imaging beam path before the image field. In an unfolded imaging beam path between the object plane and the image plane, an impingement point of the chief ray on a used region of each of the plurality of mirrors has a mirror spacing from the image plane. The mirror spacing of the first mirror is greater than the mirror spacing of the last mirror. The mirror spacing of the fourth to last mirror is greater than the mirror spacing of the first mirror. Chief rays that emanate from points of the object field that are spaced apart from another have a mutually diverging beam course, giving a negative back focus of the entrance pupil.

    摘要翻译： 成像光学器件包括在物场之后的成像光束路径中的第一反射镜，在图像场之前的成像光束路径中的最后一个反射镜，以及在图像场之前的成像光束路径中的第四个至最后一个镜像。 在物平面和图像平面之间的展开成像光束路径中，多个反射镜中的每一个的使用区域上的主光线的冲击点具有与图像平面相反的反射镜间隔。 第一个镜子的镜子间距大于最后一个镜子的反射镜间距。 第四到最后一个镜子的镜子间距大于第一个镜子的镜子间距。 从与物体间隔开的物体点发出的主光线具有相互发散的光束路线，给入射光瞳的负后焦距。

    Refractive projection objective for immersion lithography
    8.
    发明授权
    Refractive projection objective for immersion lithography 有权
    用于浸没光刻的折射投影物镜

    公开(公告)号：US07751129B2

    公开(公告)日：2010-07-06

    申请号：US10576754

    申请日：2003-10-22

    申请人： Aurelian Dodoc ,  Wilhelm Ulrich ,  Hans-Juergen Rostalski

    发明人： Aurelian Dodoc ,  Wilhelm Ulrich ,  Hans-Juergen Rostalski

    IPC分类号： G02B9/60

    CPC分类号： G03F7/70241 ,  G02B13/143 ,  G03F7/70341

    摘要： A purely refractive projection objective suitable for immersion microlithography is designed as a single-waist system with five lens groups in the case of which a first lens group of negative refractive power, a second lens group of positive refractive power, a third lens group of negative refractive power, a fourth lens group of positive refractive power and a fifth lens group of positive refractive power are provided. The fourth lens group has an entrance surface (E) that lies in the vicinity of a point of inflection of a marginal ray height between the third lens group (LG3) and the fourth lens group (LG4). No negative lens of substantial refractive power is arranged between the entrance surface and the system diaphragm (5). Embodiments of inventive projection objectives achieve a very high numerical aperture NA>1 in conjunction with a large image field and are distinguished by a compact design size. For working wavelengths below 200 nm, structural widths of substantially under 100 nm can be resolved when use is made of immersion fluids between the projection objective and substrate.

    摘要翻译： 适合于浸没微光刻的纯折射投影物镜被设计为具有五个透镜组的单腰系统，在这种情况下，具有负屈光力的第一透镜组，正屈光力的第二透镜组，负折射力的第三透镜组 提供折射光焦度，正屈光力的第四透镜组和正屈光力的第五透镜组。 第四透镜组具有位于第三透镜组（LG3）和第四透镜组（LG4）之间的边缘光线高度的拐点附近的入射面（E）。 在入射面和系统隔膜（5）之间没有设置具有大量屈光力的负透镜。 本发明的投影物镜的实施例结合大图像场实现非常高的数值孔径NA> 1，并且通过紧凑的设计尺寸来区分。 对于低于200nm的工作波长，当在投影物镜和基底之间使用浸没流体时，可以解决基本上在100nm以下的结构宽度。

    MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
    9.
    发明申请
    MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
    微波投影曝光装置

    公开(公告)号：US20100045952A1

    公开(公告)日：2010-02-25

    申请号：US12611999

    申请日：2009-11-04

    申请人： Aurelian Dodoc ,  Karl Heinz Schuster ,  Joerg Mallmann ,  Wilhelm Ulrich ,  Hans-Juergen Rostalski

    发明人： Aurelian Dodoc ,  Karl Heinz Schuster ,  Joerg Mallmann ,  Wilhelm Ulrich ,  Hans-Juergen Rostalski

    IPC分类号： G03B27/42 ,  G03B27/54

    摘要： A microlithographic projection exposure apparatus contains an illumination system (12) for generating projection light (13) and a projection lens (20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120) with which a reticle (24) that is capable of being arranged in an object plane (22) of the projection lens can be imaged onto a light-sensitive layer (26) that is capable of being arranged in an image plane (28) of the projection lens. The projection lens is designed for immersion mode, in which a final lens element (L5; L205; L605; L705; L805; L905; L1005; L1105) of the projection lens on the image side is immersed in an immersion liquid (34; 334a; 434a; 534a). A terminating element (44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144) that is transparent in respect of the projection light (13) is fastened between the final lens element on the image side and the light-sensitive layer.

    摘要翻译： 微光刻投影曝光装置包括用于产生投影光（13）和投影透镜（20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120）的照明系统（12） 能够布置在投影透镜的物平面（22）中的光源（24）可以被成像到能够被布置在投影透镜的像平面（28）中的感光层（26）上。 投影透镜被设计用于浸没模式，其中在像侧的投影透镜的最终透镜元件（L5; L205; L605; L705; L805; L905; L1005; L1105）浸没在浸没液体（34; 334a ; 434a; 534a）。 关于投影光（13）透明的终端元件（44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144）被紧固在图像侧的最终透镜元件与光 敏感层。

    MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
    10.
    发明申请
    MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
    微波投影曝光装置

    公开(公告)号：US20080316452A1

    公开(公告)日：2008-12-25

    申请号：US12199998

    申请日：2008-08-28

    申请人： Aurelian Dodoc ,  Karl-Heinz Schuster ,  Joerg Mallmann ,  Wilhelm Ulrich ,  Hans-Juergen Rostalski

    发明人： Aurelian Dodoc ,  Karl-Heinz Schuster ,  Joerg Mallmann ,  Wilhelm Ulrich ,  Hans-Juergen Rostalski

    IPC分类号： G03G15/08

    摘要： A microlithographic projection exposure apparatus contains an illumination system (12) for generating projection light (13) and a projection lens (20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120) with which a reticle (24) that is capable of being arranged in an object plane (22) of the projection lens can be imaged onto a light-sensitive layer (26) that is capable of being arranged in an image plane (28) of the projection lens. The projection lens is designed for immersion mode, in which a final lens element (L5; L205; L605; L705; L805; L905; L1005; L1105) of the projection lens on the image side is immersed in an immersion liquid (34; 334a; 434a; 534a). A terminating element (44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144) that is transparent in respect of the projection light (13) is fastened between the final lens element on the image side and the light-sensitive layer.

    摘要翻译： 微光刻投影曝光装置包括用于产生投影光（13）和投影透镜（20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120）的照明系统（12） 能够布置在投影透镜的物平面（22）中的光源（24）可以被成像到能够被布置在投影透镜的像平面（28）中的感光层（26）上。 投影透镜被设计用于浸没模式，其中在像侧的投影透镜的最终透镜元件（L5; L205; L605; L705; L805; L905; L1005; L1105）浸没在浸没液体（34; 334a ; 434a; 534a）。 关于投影光（13）透明的终端元件（44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144）被紧固在图像侧的最终透镜元件与光 敏感层。