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    Oxime derivatives and the use thereof as photoinitiators
    1.
    发明授权
    Oxime derivatives and the use thereof as photoinitiators 有权
    肟衍生物及其作为光引发剂的用途

    公开(公告)号：US06806024B1

    公开(公告)日：2004-10-19

    申请号：US09914433

    申请日：2001-08-27

    申请人： Hisatoshi Kura ,  Hitoshi Yamato ,  Masaki Ohwa ,  Kurt Dietliker

    发明人： Hisatoshi Kura ,  Hitoshi Yamato ,  Masaki Ohwa ,  Kurt Dietliker

    IPC分类号： G03F7004

    CPC分类号： G03F7/031 ,  B33Y70/00 ,  C07C309/66 ,  C07C309/73 ,  C07C323/57 ,  C07C381/00 ,  C07D307/66 ,  C07D333/36 ,  C07D339/08 ,  C07F9/097 ,  C07F9/655345 ,  C08F2/50 ,  Y10S430/12 ,  Y10S430/123

    摘要： Radically photopolymerizable compositions comprising (a) at least one ethylenically unsaturated photopolymerizable compound; (b) as photoinitiator, at least one compound of formulae (I, II, III, IV, V and/or VI), wherein m is 0 or 1; n is 0, 1, 2 or 3; x is 1 or 2; R1 is inter alia phenyl, naphthyl, anthracyl or phenanthryl, a heteroaryl radical, C2-C12alkenyl, C4-C8cycloalkenyl, or C6-C12bicycloalkenyl; R′1 is inter alia C2-C12alkylene, or phenylene; R2 has one of the meanings of R1 or inter alia is phenyl; y is 1 or 2; R3 if x is 1 inter alia is C1-C18alkylsulfonyl, or phenyl-C1-C3alkylsulfonyl, R3 if x is 2, is for example C2-C12alkylenedisulfonyl; R4 and R5 inter alia are hydrogen, halogen, or C1-C8alkyl; R6, R7, R8 inter alia are hydrogen, R26Y—, or phenyl; R9 inter alia is C5-C8cycloalkyl, or phenyl; A is for example —S—, —O—, or —NR10—; Q is C1-C8-alkylene optionally interrupted by —O—; X is —O— or —NR9—; R10 inter alia is hydrogen, or phenyl; and (c) at least one coinitiator; are especially suitable for the preparation of color filter systems.

    摘要翻译： 自由基光聚合组合物，其包含（a）至少一种烯属不饱和光聚合化合物; （b）作为光引发剂，至少一种式（I，II，III，IV，V和/或VI）的化合物，其中m为0或1; n为0,1,2或3; x为1或2; R 1特别是苯基，萘基，蒽基或菲基，杂芳基，C 2 -C 12烯基，C 4 -C 8环烯基或C 6 -C 12双环烯基; R'1特别是C 2 -C 12亚烷基或亚苯基; R2具有R 1的含义之一，尤其是苯基; y为1或2; 如果x是1，则R3如果是C 1 -C 18烷基磺酰基，或苯基-C 1 -C 3烷基磺酰基，如果x是2，则R 3是例如C 2 -C 12亚烷基二磺酰基; R4和R5尤其是氢，卤素或C1-C8烷基; R6，R7，R8特别是氢，R26Y-或苯基; R9尤其是C5-C8环烷基或苯基; A是例如-S-，-O-或-NR 10 - ; Q是任选被-O-间隔的C1-C8-亚烷基; X是-O-或-NR 9 - ; R 10尤其是氢或苯基; 和（c）至少一种共引发剂; 特别适用于制备滤色器系统。

    O-acyloxime photoinitiators
    2.
    发明授权
    O-acyloxime photoinitiators 有权
    O-酰基肟光引发剂

    公开(公告)号：US06596445B1

    公开(公告)日：2003-07-22

    申请号：US09338152

    申请日：1999-06-23

    申请人： Akira Matsumoto ,  Hidetaka Oka ,  Masaki Ohwa ,  Hisatoshi Kura ,  Jean-Luc Birbaum ,  Kurt Dietliker

    发明人： Akira Matsumoto ,  Hidetaka Oka ,  Masaki Ohwa ,  Hisatoshi Kura ,  Jean-Luc Birbaum ,  Kurt Dietliker

    IPC分类号： C07C25164

    CPC分类号： C07C251/66 ,  B33Y70/00 ,  C07C251/68 ,  C07C323/47 ,  C07D295/135 ,  C07D335/18 ,  C08F2/50 ,  G03F7/0007 ,  G03F7/002 ,  G03F7/0045 ,  G03F7/031 ,  G03F7/0388

    摘要： Oximeester compounds of the formulae I, II, III and IV wherein R1 is phenyl, C1-C20alkyl or C2-C20alkyl optionally interrupted by —O—, C2-C20alkanoyl or benzoyl, or R1 is C2-C12alkoxycarbonyl or phenoxycarbonyl; R1′ is C2-C12alkoxycarbonyl, or R1′ is phenoxycarbonyl, or R1′ is —CONR10R11 or CN; R2 is C2-C12alkanoyl, C4-C6alkenoyl, benzoyl, C2-C6alkoxycarbonyl or phenoxycarbonyl; R3, R4, R5, R6 and R7 are hydrogen, halogen, C1-C12alkyl, cyclopentyl, cyclohexyl, phenyl, benzyl, benzoyl, C2-C12alkanoyl, C2-C12alkoxycarbonyl, phenoxycarbonyl or a group OR8, SR9, SOR9, SO2R9 or NR10R11; R4′, R5′ and R6′ are hydrogen, halogen, C1-C12alkyl, cyclopentyl, cyclohexyl, phenyl, benzyl, benzoyl, C2-C12-alkanoyl, C2-C12alkoxycarbonyl, phenoxycarbonyl, or are a group OR8, SR9, SOR9, SO2R9, NR10R11; provided that at least one of R3, R4, R5, R6, R7, R′4, R′5 and R′6 is OR8, SR9 or NR10R11; R8, R9, R10 and R11 are for example hydrogen, C1-C12alkyl, phenyl; are suitable as initiators for the photopolymerization of radically polymerizable compounds.

    摘要翻译： 式I，II，III和IV其中R 1的肟酯化合物是苯基，任选被-O - ，C 2 -C 20烷酰基或苯甲酰基中断的C 1 -C 20烷基或C 2 -C 20烷基，或者R 1是C 2 -C 12烷氧基羰基或苯氧基羰基; R1'是C2-C12烷氧基羰基，或R1'是苯氧基羰基，或R1'是-CONR10R11或CN; R2是C2-C12烷酰基，C4-C6链烯酰基，苯甲酰基，C2-C6烷氧基羰基或苯氧基羰基; R3，R4，R5，R6和R7是氢，卤素，C1-C12烷基，环戊基，环己基，苯基，苄基，苯甲酰基，C2-C12烷酰基，C2-C12烷氧基羰基，苯氧基羰基或OR8，SR9，SOR9，SO2R9或NR10R11; R4'，R5'和R6'为氢，卤素，C1-C12烷基，环戊基，环己基，苯基，苄基，苯甲酰基，C2-C12-烷酰基，C2-C12烷氧基羰基，苯氧基羰基，或为OR8，SR9，SOR9，SO2R9 ，NR10R11; 条件是R3，R4，R5，R6，R7，R'4，R'5和R'6中的至少一个是OR8，SR9或NR10R

    Oxime derivatives and the use thereof as latent acids
    3.
    发明授权
    Oxime derivatives and the use thereof as latent acids 有权
    肟衍生物及其作为潜伏酸的用途

    公开(公告)号：US06261738B1

    公开(公告)日：2001-07-17

    申请号：US09533952

    申请日：2000-03-23

    申请人： Toshikage Asakura ,  Hitoshi Yamato ,  Masaki Ohwa ,  Jean-Luc Birbaum ,  Kurt Dietliker ,  Junichi Tanabe

    发明人： Toshikage Asakura ,  Hitoshi Yamato ,  Masaki Ohwa ,  Jean-Luc Birbaum ,  Kurt Dietliker ,  Junichi Tanabe

    IPC分类号： G03G7004

    CPC分类号： G03F7/039 ,  C07C251/62 ,  C07C309/00 ,  C07C309/65 ,  C07C317/32 ,  C07C323/47 ,  C07C381/00 ,  C07C2602/42 ,  C07D319/18 ,  C07D333/22 ,  G03F7/0045 ,  Y10S430/12

    摘要： Compounds of formula I, II and III, wherein wherein R1 is for example hydrogen, C1-C12alkyl, C3-C30cycloalkyl, C2-C12alkenyl, C4-C8cycloalkenyl, phenyl, which is unsubstituted or substituted, naphthyl, anthracyl or phenanthryl, unsubstituted or substituted, heteroaryl radical which is unsubstituted or substituted; wherein all radicals R1 with the exception of hydrogen can additionally be substituted by a group having a —O—C-bond or a —O—Si-bond which cleaves upon the action of an acid; R′1 is for example phenylene, naphthylene, diphenylene or oxydiphenylene, wherein these radicals are unsubstituted or substituted; R2 is halogen or C1-C10haloalkyl; R3 is for example C1-C18alkylsulfonyl, phenylsulfonyl, naphthylsulfonyl, anthracylsulfonyl or phenanthrylsulfonyl, wherein the groups are unsubstituted or substituted, or R3 is e.g. C2-C6haloalkanoyl, or halobenzoyl, R′3 is for example phenylenedisulfonyl, naphthylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl, wherein these radicals are unsubstituted or substituted, X is halogen; are especially suitable as phototsensitive acid-donors in chemically amplified resist formulations.

    摘要翻译： 式I，II和III的化合物，其中R1是例如氢，C1-C12烷基，C3-C30环烷基，C2-C12链烯基，C4-C8环烯基，苯基，未取代或取代的萘基，蒽基或菲基，未取代或取代的， 未取代或取代的杂芳基; 其中除氢之外的所有基团R1可以另外被具有在酸作用下切割的-O-C键或-O-Si键的基团取代; R'1是例如亚苯基，亚萘基，亚二苯基或氧联二苯基，其中这些基团是未取代的或被取代的; R2是卤素或C1-C10卤代烷基; R3是例如C1-C18烷基磺酰基，苯基磺酰基，萘基磺酰基，蒽磺酰基或菲基磺酰基，其中基团是未取代的或被取代的，或者R3是例如。 C 2 -C 6卤代烷酰基或卤代苯甲酰基，R'3是例如亚苯基二磺酰基，萘基二磺酰基，二苯基二磺酰基或氧基二苯基二磺酰基，其中这些基团是未取代的或被取代的，X是卤素; 在化学放大抗蚀剂配方中特别适合作为光敏酸供体。

    Oxime derivatives and the use thereof as latent acids
    4.
    发明授权
    Oxime derivatives and the use thereof as latent acids 有权
    肟衍生物及其作为潜伏酸的用途

    公开(公告)号：US06512020B1

    公开(公告)日：2003-01-28

    申请号：US09820115

    申请日：2001-03-28

    申请人： Toshikage Asakura ,  Hitoshi Yamato ,  Masaki Ohwa ,  Jean-Luc Birbaum ,  Kurt Dietliker ,  Junichi Tanabe

    发明人： Toshikage Asakura ,  Hitoshi Yamato ,  Masaki Ohwa ,  Jean-Luc Birbaum ,  Kurt Dietliker ,  Junichi Tanabe

    IPC分类号： C08J328

    CPC分类号： G03F7/0045 ,  B33Y70/00 ,  C07C251/62 ,  C07C309/00 ,  C07C309/65 ,  C07C317/32 ,  C07C323/47 ,  C07C381/00 ,  C07C2602/42 ,  C07D319/18 ,  C07D333/22

    摘要： Compounds of formula I, II and III, wherein wherein R1 is for example hydrogen, C1-C12alkyl, C3-C30cycloalkyl, C2-C12alkenyl, C4-C8cycloalkenyl, phenyl, which is unsubstituted or substituted, naphthyl, anthracyl or phenanthryl, unsubstituted or substituted, heteroaryl radical which is unsubstituted or substituted; wherein all radicals R1 with the exception of hydrogen can additionally be substituted by a group having a —O—C-bond or a —O—Si-bond which cleaves upon the action of an acid; R′1 is for example phenylene, naphthylene, diphenylene or oxydiphenylene, wherein these radicals are unsubstituted or substituted; R2 is halogen or C1-C10haloalkyl; R3 is for example C1-C18alkylsulfonyl, phenylsulfonyl, naphthylsulfonyl, anthracylsulfonyl or phenanthrylsulfonyl, wherein the groups are unsubstituted or substituted, or R3 is e.g. C2-C6haloalkanoyl, or halobenzoyl, R′3 is for example phenylenedisulfonyl, naphthylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl, wherein these radicals are unsubstituted or substituted, X is halogen; are especially suitable as photosensitive acid-donors in chemically amplified resist formulations.

    摘要翻译： 式I，II和III的化合物，其中R1是例如氢，C1-C12烷基，C3-C30环烷基，C2-C12链烯基，C4-C8环烯基，苯基，未取代或取代的萘基，蒽基或菲基，未取代或取代的， 未取代或取代的杂芳基; 其中除氢之外的所有基团R1可以另外被具有在酸作用下切割的-O-C键或-O-Si键的基团取代; R'1是例如亚苯基，亚萘基，亚二苯基或氧联二苯基，其中这些基团是未取代的或被取代的; R2是卤素或C1-C10卤代烷基; R3是例如C1-C18烷基磺酰基，苯基磺酰基，萘基磺酰基，蒽磺酰基或菲基磺酰基，其中基团是未取代的或被取代的，或者R3是例如。 C 2 -C 6卤代烷酰基或卤代苯甲酰基，R'3是例如亚苯基二磺酰基，萘基二磺酰基，二苯基二磺酰基或氧基二苯基二磺酰基，其中这些基团是未取代的或被取代的，X是卤素; 在化学放大抗蚀剂配方中特别适合用作光敏酸供体。

    Alkylsulfonyloximes for high-resolution i-line photoresists of high sensitivity
    5.
    发明授权
    Alkylsulfonyloximes for high-resolution i-line photoresists of high sensitivity 有权
    用于高灵敏度的高分辨率i线光刻胶的烷基磺酰亚胺

    公开(公告)号：US06770420B2

    公开(公告)日：2004-08-03

    申请号：US10612800

    申请日：2003-07-02

    申请人： Kurt Dietliker ,  Martin Kunz ,  Hitoshi Yamato ,  Christoph De Leo

    发明人： Kurt Dietliker ,  Martin Kunz ,  Hitoshi Yamato ,  Christoph De Leo

    IPC分类号： G03F7004

    CPC分类号： C07C309/66 ,  B33Y70/00 ,  C07C309/65 ,  C07D333/22 ,  C07D333/24 ,  G03F7/0045 ,  Y10S430/12 ,  Y10S430/122

    摘要： The invention describes the use of oxime alkyl sulfonate compounds of formula 1 R0 is either an R1—X group or R2; X is a direct bond, an oxygen atom or a sulfur atom; R1 is hydrogen, C1-C4alkyl or a phenyl group which is unsubstituted or substituted by a substituent selected from the group consisting of chloro, bromo, C1-C4alkyl and C1-C4-alkyloxy; R2 is hydrogen or C1-C4alkyl; and R3 is straight-chain or branched C1-C12alkyl which is unsubstituted or substituted by one or more than one halogen atom; as photosensitive add generator in a chemically amplified photoresist which is developable in alkaline medium and which is sensitive to radiation at a wavelength of 340 to 390 nanometers and correspondingly composed positive and negative photoresists for the above-mentioned wavelength range.

    摘要翻译： 本发明描述了式1RO的肟烷基磺酸酯化合物的使用是R1-X基团或R2; X是直接键合，氧原子或硫原子; R 1是氢，C 1 -C 4烷基或苯基， 未取代或被选自氯，溴，C 1 -C 4烷基和C 1 -C 4烷氧基的取代基取代; R 2为氢或C 1 -C 4烷基; R 3是未被取代或被一个或多于一个卤素原子取代的直链或支链C 1 -C 12烷基;作为在碱性介质中可显影并对波长340的辐射敏感的化学放大光致抗蚀剂中的感光加成发生剂 至390纳米，并且对应于上述波长范围的相应组合的正和负光致抗蚀剂。

    Oxime sulfonates and the use thereof as latent sulfonic acids
    6.
    发明授权
    Oxime sulfonates and the use thereof as latent sulfonic acids 失效
    肟磺酸盐及其作为潜在磺酸的用途

    公开(公告)号：US6004724A

    公开(公告)日：1999-12-21

    申请号：US104676

    申请日：1998-06-25

    申请人： Hitoshi Yamato ,  Hartmut Bleier ,  Jean-Luc Birbaum ,  Martin Kunz ,  Kurt Dietliker ,  Christoph De Leo ,  Toshikage Asakura

    发明人： Hitoshi Yamato ,  Hartmut Bleier ,  Jean-Luc Birbaum ,  Martin Kunz ,  Kurt Dietliker ,  Christoph De Leo ,  Toshikage Asakura

    IPC分类号： C07C309/65 ,  C07C309/66 ,  C07C309/73 ,  C07C323/63 ,  C07C381/00 ,  C07D207/44 ,  C07D213/90 ,  C07D333/34 ,  C07D333/36 ,  C07D333/44 ,  G03F7/004 ,  G03C1/725 ,  C07C249/04 ,  C07C251/32 ,  G03C1/72

    CPC分类号： C07D207/44 ,  C07C309/65 ,  C07C309/66 ,  C07C309/73 ,  C07C323/63 ,  C07C381/00 ,  C07D213/90 ,  C07D333/44 ,  G03F7/0045 ,  Y10S430/114 ,  Y10S430/117 ,  Y10S430/12 ,  Y10S430/122

    摘要： New oximsulfonate compounds of the formulae I or II, ##STR1## wherein m is 0 or 1; x is 1 or 2; R.sub.1 is, for example phenyl, which is unsubstituted or substituted or R.sub.1 is a heteroaryl radical that is unsubstituted or substituted, or, if m is 0, R.sub.1 additionally is C.sub.2 -C.sub.6 alkoxycarbonyl, phenoxycarbonyl or CN; R'.sub.1 is for example C.sub.2 -C.sub.12 alkylene, phenylene; R.sub.2 has for example one of the meanings of R.sub.1 ; n is 1 or 2; R.sub.3 is for example C.sub.1 -C.sub.18 alkyl, R'.sub.3 when x is 1, has one of the meanings given for R.sub.3, or R'.sub.3 in the formula IV and when x is 2 in the formula 1, is for example C.sub.2 -C.sub.12 alkylene, phenylene; R.sub.4 and R.sub.5 are independently of each other for example hydrogen, halogen, C.sub.1 -C.sub.6 alkyl; R.sub.6 is for example hydrogen, phenyl; R.sub.7 and R.sub.8 are independently of each other for example hydrogen or C.sub.1 -C.sub.12 -alkyl; R.sub.9 is for example C.sub.1 -C.sub.12 alkyl; A is S, O, NR.sub.6, or a group of formula A1, A2, A3 or A4 ##STR2## R.sub.10 and R.sub.11 independently of each other have one of the meanings given for R.sub.4 ; R.sub.12, R.sub.13, R.sub.14 and R.sub.15 independently of one another are for example hydrogen, C.sub.1 -C.sub.4 alkyl; Z is CR.sub.11 or N; Z.sub.1 is --CH.sub.2 --, S, O or NR.sub.6, are useful as latent sulfonic acids, especially in photoresist applications.

    摘要翻译： 式I或II的新的磺酸磺酸酯化合物，其中m为0或1; x为1或2; R1是例如未取代或取代的苯基，或R1是未取代或取代的杂芳基，或者如果m是0，则R1另外是C 2 -C 6烷氧基羰基，苯氧基羰基或CN; R'1例如为C 2 -C 12亚烷基，亚苯基; R2具有例如R1的含义之一; n为1或2; R3为例如C1-C18烷基，当x为1时为R'3，具有R3给出的含义之一，或式Ⅳ中的R'3，当式Ⅺ中x为2时，为例如C 2 -C 12亚烷基， 亚苯基; R4和R5彼此独立，例如氢，卤素，C1-C6烷基; R6是例如氢，苯基; R 7和R 8彼此独立地为氢或C 1 -C 12 - 烷基; R 9为例如C 1 -C 12烷基; A是S，O，NR6或式A1，A2，A3或A4的基团，R10和R11彼此独立地具有对R4给出的含义之一; R 12，R 13，R 14和R 15彼此独立地是例如氢，C 1 -C 4烷基; Z为CR11或N; Z1是-CH2-，S，O或NR6，可用作潜在的磺酸，特别是在光刻胶应用中。

    Oxime derivatives and the use thereof as latent acids
    7.
    发明授权
    Oxime derivatives and the use thereof as latent acids 失效
    肟衍生物及其作为潜伏酸的用途

    公开(公告)号：US06485886B1

    公开(公告)日：2002-11-26

    申请号：US09830248

    申请日：2001-04-24

    申请人： Hitoshi Yamato ,  Toshikage Asakura ,  Jean-Luc Birbaum ,  Kurt Dietliker

    发明人： Hitoshi Yamato ,  Toshikage Asakura ,  Jean-Luc Birbaum ,  Kurt Dietliker

    IPC分类号： G03C173

    CPC分类号： C07C255/64 ,  B33Y70/00 ,  C07D333/36 ,  Y10S430/114 ,  Y10S430/117 ,  Y10S430/12

    摘要： New oxime derivatives of formula (I) or. (II), wherein m is 0 or 1; R1 inter alia is phenyl, naphthyl, anthracyl, phenanthryl or a heteroaryl radical; R′1 is for example C2-C12alkylene, phenylene, naphthylene; R2 is CN; R3 is C2-C6haloalkanoyl, halobenzoyl, a phosphoryl or an organosilyl group; R4, R5, R10 and R11 inter alia are hydrogen, C1-C6alkyl, C1-C6alkoxy; R6 inter alia is hydrogen phenyl, C1-C12alkyl; R7 and R8 inter alia are hydrogen, C1-C12alkyl; or R7 and R8, together with the nitrogen atom to which they are bonded, form a 5-, 6 or 7-membered ring; R9 is for example C1-C12alkyl; and A inter alia is S, O, NR7a; are useful as latent acids, especially in photoresist applications.

    摘要翻译： 式（I）的新肟衍生物或。 （II），其中m为0或1; R1特别是苯基，萘基，蒽基，菲基或杂芳基; R'1例如为C 2 -C 12亚烷基，亚苯基，亚萘基; R2为CN; R3是C2-C6卤代烷酰基，卤代苯甲酰基，磷酰基或有机甲硅烷基; R4，R5，R10和R11尤其是氢，C1-C6烷基，C1-C6烷氧基; R6尤其是氢苯基，C1-C12烷基; R 7和R 8尤其是氢，C 1 -C 12烷基; 或R 7和R 8与它们所键合的氮原子一起形成5-，6-或7-元环; R 9为例如C 1 -C 12烷基; A特别是S，O，NR7a; 可用作潜酸，特别是在光致抗蚀剂中。

    Process for Preparing Acylphosphanes and Derivatives Thereof
    8.
    发明申请
    Process for Preparing Acylphosphanes and Derivatives Thereof 有权

    公开(公告)号：US20080004464A1

    公开(公告)日：2008-01-03

    申请号：US11667780

    申请日：2005-11-14

    申请人： Peter Murer ,  Jean-Pierre Wolf ,  Stephan Burkhardt ,  Hansjorg Grutzmacher ,  Daniel Stein ,  Kurt Dietliker

    发明人： Peter Murer ,  Jean-Pierre Wolf ,  Stephan Burkhardt ,  Hansjorg Grutzmacher ,  Daniel Stein ,  Kurt Dietliker

    IPC分类号： C07F9/50 ,  C07C69/66

    CPC分类号： G03F7/029 ,  C07F9/5036 ,  C07F9/5337 ,  C07F9/5537 ,  C07F9/65515 ,  C07F9/6552

    摘要： The invention relates to a process for the preparation of (bis)acylphosphanes of formula I, wherein n and m are each independently of the other 1 or 2; R1 if n=1, is e.g. unsubstituted or substituted C1-C18alkyl or C2-C18alkenyl, or phenyl, R1 if n=2, is e.g. a divalent radical of the monovalent radical defined above; R2 is e.g. C1-C18alkyl, C3-C12cycloalkyl, C2-C18alkenyl, mesityl, phenyl, naphthyl; R3 is one of the radicals defined under R1; the process comprises the steps a) contacting e.g. elemental phosphorous [P]∞, P(Hal)3 with a reducing metal optionally in the presence of a catalyst or an activator in a solvent to obtain metal phosphides Me3P or Me′3P2, wherein Me is an alkali metal and Me′ is an earth alkali metal or to obtain metal polyphosphides b) optionally adding a proton source, optionally in the presence of a catalyst or an activator to obtain metal dihydrogen phosphides MePH2; c) subsequent acylation reaction with m acid halides of formula III or m carboxylic acid esters of formula IV or, in case that in formula I m=1, with one carboxylic ester of formula IV followed by one acid halide of formula III or vice versa, wherein R is the residue of an alcohol and R2 is as defined above; d) alkylation reaction subsequent reaction with an electrophilic agent R1Hal or other electrophilic agents to obtain the compounds of formula I. An oxidation step may follow to obtain mono- and bisacylphosphane oxides or mono- and bisacylphosphane sulfides, which are used as photoinitiators.